JP2001111214A - Method of forming protective film - Google Patents

Method of forming protective film

Info

Publication number
JP2001111214A
JP2001111214A JP32447699A JP32447699A JP2001111214A JP 2001111214 A JP2001111214 A JP 2001111214A JP 32447699 A JP32447699 A JP 32447699A JP 32447699 A JP32447699 A JP 32447699A JP 2001111214 A JP2001111214 A JP 2001111214A
Authority
JP
Japan
Prior art keywords
solder resist
holes
resin
protective film
board
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP32447699A
Other languages
Japanese (ja)
Inventor
Tadashi Kamio
忠伺 神尾
Jiro Mizufuji
二郎 水藤
Hirobumi Yasui
博文 安井
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NIPPON CIRCUIT KOGYO KK
Original Assignee
NIPPON CIRCUIT KOGYO KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NIPPON CIRCUIT KOGYO KK filed Critical NIPPON CIRCUIT KOGYO KK
Priority to JP32447699A priority Critical patent/JP2001111214A/en
Publication of JP2001111214A publication Critical patent/JP2001111214A/en
Pending legal-status Critical Current

Links

Landscapes

  • Non-Metallic Protective Coatings For Printed Circuits (AREA)
  • Printing Elements For Providing Electric Connections Between Printed Circuits (AREA)

Abstract

PROBLEM TO BE SOLVED: To solve the problems in prior art where all small holes of many printed boards having many small holes, especially through-holes, e.g. BGA, CSP, F/CBGA boards must be planarized uniformly in short time to meet the today's demands for making lighter, thinner, more compact, high-density and multilayer products, and where the conventional methods are inferior in quality, yield and cost. SOLUTION: After sandwiching a board having holes filled with a solder resist between an upper and lower resin layers from which solvents have been removed by heating, flat solder resist films with no rise are formed by the press method, required portions are cured by UV, unwanted uncured portions are developed and removed, the solder resist is heat set to fill up the holes, and at the same time, patterns are formed to form protective films.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は、電子機器、電気機
器、コンピューター、通信機器等に用いられるプリント
基板に係る。更には、プリント基板の保護膜の形成方法
に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a printed circuit board used for electronic equipment, electric equipment, computers, communication equipment and the like. Furthermore, the present invention relates to a method for forming a protective film on a printed circuit board.

【0002】[0002]

【従来の技術】公知の方法では、プリント基板の全面
に、印刷法によりソルダーレジストを塗布、紫外線露光
して硬化して後、ソルダーレジストの不要部分をアルカ
リで溶解する方法で、スルーホールの穴埋めを行ってい
る。この方法では、硬化したソルダーレジストがスルー
ホールの場所で凸になったり凹になって均一面とならな
い、また、内部に気泡が溜まったりソルダーレジスト膜
が剥離して穴埋めが出来なかったりという問題がある。
一般には、この状態でも使用していたが、最近の軽薄短
小化や品質精度の向上の要請によると、スルーホールで
の盛り上がりや窪みのない平坦なソルダーレジスト面や
スルーホールの内部に気泡の溜まりが無い穴埋めが求め
られている。その要請に答えるため、ソルダーレジスト
を塗布して後、加熱したり、振動を与えてソルダーレジ
ストの塗布面を平坦化したり、減圧下放置により気泡を
除去したり、紫外線硬化後、機械的に(例えば、バフ研
磨で)盛り上がった部分を削り取って平坦面にしたりし
ている。いずれにしても、この様な方法では、品質的に
も、生産性においても限界に来ている。
2. Description of the Related Art In a known method, a solder resist is applied to the entire surface of a printed circuit board by a printing method, cured by exposing to ultraviolet light, and then dissolving an unnecessary portion of the solder resist with an alkali to fill through holes. It is carried out. In this method, the cured solder resist becomes convex or concave at the location of the through-hole and does not have a uniform surface.Also, bubbles are accumulated inside the solder resist film, and the solder resist film is peeled off and the hole cannot be filled. is there.
Generally, it was used in this condition, but according to recent demands for lightness and size reduction and improvement in quality accuracy, air bubbles accumulate on the flat solder resist surface without through-holes or depressions in through-holes or inside of through-holes. There is a need to fill in the gaps. In order to respond to the request, after applying the solder resist, heating or applying vibration to flatten the coated surface of the solder resist, removing bubbles by leaving under reduced pressure, ultraviolet curing, mechanically ( For example, the raised portion is removed by buffing to make it a flat surface. In any case, such a method is reaching its limits both in terms of quality and productivity.

【0003】[0003]

【発明が解決しようとする課題】軽薄短小化、高密度
化、多層化の時代の要請に従って、多数の細孔、特にス
ルーホールを有するプリント基板(例えば、BGA基
板、CSP基板、F/C BGA基板)では、多数の基
板の全細孔を短時間で均一に穴埋め平坦化する必要があ
り、従来の方法では、品質的にも、歩留的にも劣り、コ
スト的にも問題があり、かかる問題を解決する技術の開
発が要請されている。
According to the demands of the era of lightness, shortness, high density, and multi-layer, a printed circuit board having a large number of pores, especially a through-hole (eg, a BGA board, a CSP board, an F / CBGA) Substrate), it is necessary to uniformly fill all the pores of a large number of substrates in a short time and flatten it. Conventional methods have problems in terms of quality, yield, and cost. There is a demand for the development of a technology that solves this problem.

【0004】[0004]

【課題を解決するための手段】本発明は、プリント回路
基板形成の最終工程において、印刷法によりソルダーレ
ジストをスルーホールに充填したプリント基板に、ソル
ダーレジストを熱により溶媒を蒸発させた樹脂層を、プ
レス法で圧着することにより、充填性への板厚依存性の
ない盛り上がりのない あるいは少ない、平坦な保護膜
を形成する方法である。紫外線露光・不要な部分の現像
除去によりパターンを形成し、熱硬化してソルダーマス
ク膜を形成する。得られた製品は、均一で平坦なソルダ
ーマスク膜で保護されたプリント基板である。
According to the present invention, in a final step of forming a printed circuit board, a resin layer obtained by evaporating a solvent by heat from a solder resist is applied to a printed board in which solder resist is filled in through holes by a printing method. This is a method of forming a flat protective film with no or little swelling, which does not depend on the thickness of the filling material, by pressing with a press method. A pattern is formed by exposure to ultraviolet light and development and removal of unnecessary portions, and the pattern is thermally cured to form a solder mask film. The resulting product is a printed circuit board protected by a uniform and flat solder mask film.

【0005】本発明は、プリント基板のソルダーマスク
による保護膜の形成において、 (1)プリント基板のスルーホールに印刷法によりソル
ダーレジストインクを充填する (2)平面板にソルダーレジストインクを塗布した後、
ソルダーレジストインクから溶剤を蒸発させ樹脂層を形
成する (3)樹脂層をプリント基板にプレスする (4)紫外線露光・現像・熱硬化する ことによる保護膜の形成方法である。本発明は、樹脂膜
が、光硬化性ソルダーレジストを熱により溶媒を蒸発す
ることにより作製されることによる保護膜の形成方法で
ある。本発明は、ソルダーレジストが、光硬化性エポキ
シ変性アクリル樹脂あるいは光硬化性アクリル変性エポ
キシ樹脂である保護膜の形成方法である。
According to the present invention, in forming a protective film using a solder mask on a printed board, (1) filling a through-hole of the printed board with a solder resist ink by a printing method, and (2) after applying the solder resist ink to a flat plate ,
A solvent layer is formed by evaporating the solvent from the solder resist ink. (3) Pressing the resin layer on a printed circuit board. (4) A method of forming a protective film by ultraviolet exposure, development, and heat curing. The present invention is a method for forming a protective film by forming a resin film by evaporating a solvent from a photocurable solder resist by heat. The present invention is a method for forming a protective film in which a solder resist is a photocurable epoxy-modified acrylic resin or a photocurable acrylic-modified epoxy resin.

【0006】[0006]

【発明の実施の形態】本発明の実施の形態について以下
詳述する。本発明に使用するスルーホールのある基板
は、“プリント回路技術便覧”(プリント回路学会編)
を参考にして作製した。本発明のスルーホールのある基
板は、具体的には、BGA基板、CSP基板、F/C−
BGA基板が挙げられる。
Embodiments of the present invention will be described below in detail. The board with through holes used in the present invention is described in "Printed Circuit Technology Handbook" (edited by the Printed Circuit Society)
The reference was made. The substrate having a through hole according to the present invention is specifically a BGA substrate, a CSP substrate, an F / C-
A BGA substrate.

【0007】本発明に使用するプリント基板は、市販の
銅箔5〜70μmと絶縁基材として、エポキシ樹脂、ポ
リイミド樹脂、ビスマレインイミドトリアジン(BT)
樹脂、PPE樹脂を、或いは、該樹脂をガラス繊維、ガ
ラス布或いは紙に含浸させたプリプレグを重ね合わせて
銅箔両面板あるいは多層板を製作した。その基板の厚さ
は、0.05〜2.4mmの基板である。次に、ドリル
或いはレーザーでスルーホールを形成し、メッキにより
導通を確保した。
The printed circuit board used in the present invention is a commercially available copper foil having a thickness of 5 to 70 μm and an insulating base material such as epoxy resin, polyimide resin, bismaleimide triazine (BT).
Resin, PPE resin, or a prepreg impregnated with glass fiber, glass cloth, or paper impregnated with the resin was overlaid to produce a copper foil double-sided board or a multilayer board. The thickness of the substrate is 0.05 to 2.4 mm. Next, through holes were formed with a drill or a laser, and conduction was ensured by plating.

【0008】本発明では、印刷法によりソルダーレジス
トを充填したプリント基板を作製する。本発明に使用す
るソルダーレジストは、光硬化性樹脂で、エポキシ変性
アクリル樹脂及びアクリル変性エポキシ樹脂である。ソ
ルダーレジストの粘度を調整するため一般に溶媒で希釈
されている。市販品としては、例えば、太陽インキ製造
(株)製品:PSR−4000等を使用する。
In the present invention, a printed circuit board filled with a solder resist is produced by a printing method. The solder resist used in the present invention is a photo-curable resin, such as an epoxy-modified acrylic resin and an acrylic-modified epoxy resin. It is generally diluted with a solvent to adjust the viscosity of the solder resist. As a commercially available product, for example, PSR-4000 manufactured by Taiyo Ink Manufacturing Co., Ltd. is used.

【0009】本発明の樹脂層の形成方法は、スクリーン
印刷、ロールコーター、スプレーコーター、カーテンコ
ーター、ディップコーターによる。平面板(例えば、ス
テンレス板、テフロン板)に塗布したソルダーレジスト
を、熱により溶媒を蒸発させて、溶媒のないソルダーレ
ジスト層(以下、樹脂層と言う)を形成する。具体的に
は、ソルダーレジストから溶媒が蒸発するのに適した条
件は、70から90℃、常圧から100hPaの減圧で
行う。90℃を超えると一部ソルダーレジストが分解或
は重合反応し、70℃より低い温度では溶媒蒸発の速度
が非常に遅い又は溶媒が蒸発しないので好ましくない。
樹脂層が、20〜100μmの厚みになるように塗布す
る。20μmより薄いと基板の表面あるいはスルーホー
ルに充填されているソルダーレジストとの密着性が悪い
し、100μmより厚いとスルーホールの中の気泡が抜
けないで気泡溜まりが出来易いという問題がある。
The method of forming a resin layer according to the present invention employs screen printing, a roll coater, a spray coater, a curtain coater, and a dip coater. The solvent is evaporated from the solder resist applied to a flat plate (for example, a stainless steel plate or a Teflon plate) by heat to form a solder resist layer without a solvent (hereinafter, referred to as a resin layer). Specifically, conditions suitable for evaporating the solvent from the solder resist are performed at 70 to 90 ° C. and a reduced pressure of normal pressure to 100 hPa. If the temperature exceeds 90 ° C., the solder resist partially decomposes or undergoes a polymerization reaction. If the temperature is lower than 70 ° C., the rate of solvent evaporation is extremely slow or the solvent does not evaporate, which is not preferable.
The resin layer is applied so as to have a thickness of 20 to 100 μm. If the thickness is less than 20 μm, the adhesion to the solder resist filled in the surface of the substrate or the through-hole is poor. If the thickness is more than 100 μm, the bubbles in the through-hole do not escape, and there is a problem that air bubbles easily accumulate.

【0010】本発明の基板の上 及び/叉は下から樹脂
層をプレス成型機で基板面に圧着することにより、平坦
なソルダーレジスト膜を基板に形成する事ができる。即
ち、先に印刷法で塗布することにより、スルーホールを
穴埋めした基板に、溶媒を蒸発させた光硬化性ソルダー
レジストを圧着することにより平滑で密着性の良いソル
ダーレジスト膜を形成する。樹脂層のプレスの条件は、
樹脂温度を50〜100℃にすることにより、溶媒が蒸
発したソルダーレジストが分解或いは重合反応すること
なく、適度の流動性(例えば、100℃で20〜50セ
ンチポイズ)を持たせる事が出来る。100℃より高く
すると、ソルダーレジストが分解或いは重合反応をし
て、後工程での不要部分の現像除去ができなくなり好ま
しくない。叉、プレスの操作の際、プレスの雰囲気を常
圧から減圧(例えば、≦50mmHg)にすることも出
来る。作業性、生産性を考慮すると、多数枚(例えば5
〜20枚)を重ね合わせてプレスすることもできる。プ
レス圧としては、2〜20Kg/cmで、時間は3〜
30分である。
A flat solder resist film can be formed on the substrate of the present invention by pressing the resin layer from above and / or below the substrate surface with a press molding machine. That is, by applying a printing method first, a light-curable solder resist in which a solvent has been evaporated is pressure-bonded to the substrate in which the through-holes have been filled, thereby forming a smooth and well-adhered solder resist film. The conditions for pressing the resin layer are as follows:
By setting the resin temperature to 50 to 100 ° C., a suitable fluidity (for example, 20 to 50 centipoise at 100 ° C.) can be provided without decomposing or polymerizing the solder resist in which the solvent has evaporated. If the temperature is higher than 100 ° C., the solder resist is decomposed or polymerized, and thus undesired portions cannot be developed and removed in a subsequent step, which is not preferable. In the operation of the press, the atmosphere of the press can be reduced from normal pressure to reduced pressure (for example, ≦ 50 mmHg). Considering workability and productivity, a large number (for example, 5
(Up to 20 sheets) can be overlapped and pressed. The pressing pressure is 2 to 20 kg / cm 2 and the time is 3 to
30 minutes.

【0011】本発明のパターン形成は、紫外線照射・現
像による。プリント基板上の必要な部分に紫外線(例え
ば、365nm)を照射して硬化し、不要な部分はアル
カリ溶液(例えば、炭酸ソーダ水溶液)で現像除去して
パターンを形成する。
The pattern formation of the present invention is performed by ultraviolet irradiation and development. A necessary portion on the printed board is irradiated with ultraviolet rays (for example, 365 nm) to be cured, and an unnecessary portion is developed and removed with an alkali solution (for example, an aqueous solution of sodium carbonate) to form a pattern.

【0012】本発明の最後の工程では、紫外線硬化して
得られたソルダーレジストパターンを、熱硬化して完全
に硬化した製品を作製する。熱硬化の条件は、120〜
180℃で60〜120分間加熱することにより、硬化
した保護膜を形成する。この方法で完全に穴埋めされた
スルーホールを有し、平坦な保護膜を有するプリント基
板を作製することができる。従来の製品とは違って、本
方法で得られたソルダーレジストで保護されたプリント
基板は、スルーホールは完全に穴埋めされ(スルーホー
ル内に気泡がない)、表面平滑性が良く(具体的には、
表面凸凹の振れ幅が0〜15μm程度)、基板とソルダ
ーレジスト膜の密着性(例えば、スタッドプルテストあ
るいはセロテープテストで検査)は良好である。
In the last step of the present invention, a solder resist pattern obtained by curing with ultraviolet rays is thermally cured to produce a completely cured product. Thermal curing conditions are 120-
By heating at 180 ° C. for 60 to 120 minutes, a cured protective film is formed. With this method, a printed board having through holes completely filled and having a flat protective film can be manufactured. Unlike conventional products, the printed circuit board protected by the solder resist obtained by this method completely fills through holes (no bubbles in the through holes) and has good surface smoothness (specifically, Is
The fluctuation width of the surface irregularities is about 0 to 15 μm), and the adhesion between the substrate and the solder resist film (for example, a stud pull test or a cellophane test) is good.

【0013】[0013]

【実施例】以下、本発明の実施例を図面に基づいて説明
する。本発明において使用したBGA基板は、12μm
の銅箔のBT樹脂両面板(三菱ガス化学(株)社製品;
厚み:0.4mm)に、銅メッキされたスルーホール
(内径:0.2mmで、3cm四角形内に250個のス
ールホール)あるいはホールを有する集合基板である
Embodiments of the present invention will be described below with reference to the drawings. The BGA substrate used in the present invention is 12 μm
Copper foil BT resin double-sided board (Mitsubishi Gas Chemical Co., Ltd. product;
It is a collective substrate having copper-plated through-holes (inner diameter: 0.2 mm, 250 holes in a 3 cm square) or holes plated with copper (thickness: 0.4 mm).

【図1】。光硬化性ソルダーレジスト(太陽インキ製造
社製:PSR−4000)をこの集合基板のスルーホー
ルの部分にスクリーン印刷法で充填する。叉、プレス用
の2枚のステンレス板の表面には、カーテンコーター法
で該光硬化性ソルダーレジストを塗布した。集合基板と
2枚のステンレス板を80℃で10分間加熱して、溶剤
を蒸発させたソルダーレジストを形成した。1枚の樹脂
層を形成したステンレス板上に集合基板を載せ、もう一
枚の樹脂層のステンレス板を裏返して載せ、基板面と樹
脂面とで重ね合わせ
FIG. A photo-curable solder resist (manufactured by Taiyo Ink Mfg. Co., Ltd .: PSR-4000) is filled into the through-hole portion of this assembly substrate by a screen printing method. In addition, the photocurable solder resist was applied to the surfaces of two stainless steel plates for pressing by a curtain coater method. The collective substrate and the two stainless steel plates were heated at 80 ° C. for 10 minutes to form a solder resist in which the solvent was evaporated. Place the collective substrate on the stainless steel plate on which one resin layer is formed, place the other stainless steel plate of the resin layer upside down, and overlap the board surface and the resin surface

【図2】、加温(90℃)しながら、加圧プレス機(1
0Kg/cmで10分)でソルダーレジスト膜を形成
した。続いて、紫外線を照射して必要部分を光硬化さ
せ、不要部分は1%炭酸ソーダ水溶液で溶解除去した。
続いて、乾燥器の中に入れて、150℃で60分間加熱
してソルダーレジスト膜を完全硬化し、保護膜を形成し
FIG. 2 shows a press machine (1) while heating (90 ° C.)
(0 Kg / cm 2 for 10 minutes) to form a solder resist film. Subsequently, a necessary portion was light-cured by irradiating ultraviolet rays, and the unnecessary portion was dissolved and removed with a 1% aqueous sodium carbonate solution.
Subsequently, the solder resist film was placed in a dryer and heated at 150 ° C. for 60 minutes to completely cure the solder resist film, thereby forming a protective film.

【図3】。硬化したソルダーレジスト膜は、全面平滑な
面になっていて、基材樹脂上のソルダーレジストの厚さ
は30μm程度で、スルーホールの上下に発生し易い凸
凹はなかった。又、50個のスルーホール内部の穴埋め
状態を調べるため、切断機でスルーホールをカットし
て、その断面のソルダーレジストの穴埋め状態を目視し
たが、ソルダーレジストが完全に充填されていて全く空
洞部は確認できなかった。
FIG. The cured solder resist film had a smooth surface over the entire surface, the thickness of the solder resist on the base resin was about 30 μm, and there were no irregularities easily generated above and below the through holes. Also, in order to check the filled state inside the 50 through holes, the through hole was cut with a cutting machine and the filled state of the solder resist on the cross section was visually observed. Could not be confirmed.

【0014】[0014]

【発明の効果】多数個の細孔、特にスルーホールを有す
るプリント基板において、全細孔を短時間で充填し、平
滑なソルダーレジスト膜を形成することで、品質的に
も、歩留的にも、コスト的にも有利な基板を製造するこ
とにより、軽薄短小化、高密度化、多層化の時代の要請
に対応できる。
According to the present invention, by filling all the pores in a short time and forming a smooth solder resist film on a printed circuit board having a large number of pores, especially through holes, the quality and the yield can be improved. However, by manufacturing a substrate that is also advantageous in terms of cost, it is possible to meet the demands of the age of lightness, shortness, high density, and multi-layering.

【図面の簡単な説明】[Brief description of the drawings]

【図1】銅メッキされたスルーホールあるいはホールを
有するBGAの集合基板
FIG. 1 BGA aggregate substrate with copper plated through holes or holes

【図2】両面板に樹脂層を形成したステンレス板を上
及び 下からプレスする配置図
FIG. 2 shows a stainless steel plate having a resin layer formed on both sides of the plate.
And layout drawing to press from below

【図3】スルーホールの内部の充填、平滑なソルダーレ
ジスト膜のプリント基板
FIG. 3 shows a printed circuit board having a smooth solder resist film filled in a through hole.

【図4】スルーホールの内部の空隙、凸凹のあるソルダ
ーレジスト膜のプリント基板
FIG. 4 is a printed circuit board having a solder resist film having voids and irregularities inside through holes.

【符号の説明】[Explanation of symbols]

1:絶縁層 2:銅パターン 3:銅メッキされたスルーホール 4:ホール 5:樹脂層 6:ステンレス板 7:ソルダーレジスト膜 8;プレス機によるプレスの方向 9:空洞 10:ソルダーレジスト膜の凸凹 1: Insulation layer 2: Copper pattern 3: Copper plated through hole 4: Hole 5: Resin layer 6: Stainless steel plate 7: Solder resist film 8; Pressing direction by press 9: Cavity 10: Unevenness of solder resist film

───────────────────────────────────────────────────── フロントページの続き Fターム(参考) 5E314 AA25 AA27 AA32 AA33 BB11 BB12 BB13 CC06 DD06 DD07 FF01 GG24 5E317 AA24 BB01 BB11 CD21 CD23 CD27 CD31 CD32 GG16  ──────────────────────────────────────────────────続 き Continued on the front page F term (reference) 5E314 AA25 AA27 AA32 AA33 BB11 BB12 BB13 CC06 DD06 DD07 FF01 GG24 5E317 AA24 BB01 BB11 CD21 CD23 CD27 CD31 CD32 GG16

Claims (3)

【特許請求の範囲】[Claims] 【請求項1】プリント基板のソルダーマスクによる保護
膜の形成において、(1)プリント基板のスルーホール
に印刷法によりソルダーレジストインクを充填する (2)平面板にソルダーレジストインクを塗布した後、
ソルダーレジストインクから溶剤を蒸発させ樹脂層を形
成する (3)樹脂層をプリント基板にプレスする (4)紫外線露光・現像・熱硬化する ことを特徴とする保護膜の形成方法
In the formation of a protective film using a solder mask on a printed board, (1) filling a through hole of the printed board with solder resist ink by a printing method; and (2) applying the solder resist ink to a flat plate,
Forming a resin layer by evaporating the solvent from the solder resist ink. (3) Pressing the resin layer on a printed circuit board. (4) A method of forming a protective film, which comprises performing ultraviolet exposure, development, and heat curing.
【請求項2】樹脂層が、光硬化性ソルダーレジストを加
熱により溶媒を蒸発することにより作製されることを特
徴とする請求項1に記載の保護膜の形成方法
2. The method according to claim 1, wherein the resin layer is formed by evaporating the solvent by heating the photocurable solder resist.
【請求項3】ソルダーレジストが、光硬化性エポキシ変
性アクリル樹脂あるいは光硬化性アクリル変性エポキシ
樹脂であることを特徴とする請求項2に記載の保護膜の
形成方法
3. The method according to claim 2, wherein the solder resist is a photocurable epoxy-modified acrylic resin or a photocurable acrylic-modified epoxy resin.
JP32447699A 1999-10-12 1999-10-12 Method of forming protective film Pending JP2001111214A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP32447699A JP2001111214A (en) 1999-10-12 1999-10-12 Method of forming protective film

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP32447699A JP2001111214A (en) 1999-10-12 1999-10-12 Method of forming protective film

Publications (1)

Publication Number Publication Date
JP2001111214A true JP2001111214A (en) 2001-04-20

Family

ID=18166241

Family Applications (1)

Application Number Title Priority Date Filing Date
JP32447699A Pending JP2001111214A (en) 1999-10-12 1999-10-12 Method of forming protective film

Country Status (1)

Country Link
JP (1) JP2001111214A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102006037273B4 (en) 2005-08-11 2020-07-09 San-Ei Kagaku Co., Ltd. Flattened, printed circuit board coated with resin

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102006037273B4 (en) 2005-08-11 2020-07-09 San-Ei Kagaku Co., Ltd. Flattened, printed circuit board coated with resin

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