JP2023074860A - Manufacturing method for printed wiring board - Google Patents

Manufacturing method for printed wiring board Download PDF

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Publication number
JP2023074860A
JP2023074860A JP2021188017A JP2021188017A JP2023074860A JP 2023074860 A JP2023074860 A JP 2023074860A JP 2021188017 A JP2021188017 A JP 2021188017A JP 2021188017 A JP2021188017 A JP 2021188017A JP 2023074860 A JP2023074860 A JP 2023074860A
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protective film
insulation layer
resin insulation
layer
wiring board
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徹 武仲
Toru Takenaka
亮一 工藤
Ryoichi Kudo
健作 中島
Kensaku Nakajima
進 籠橋
Susumu Kagohashi
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Ibiden Co Ltd
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Ibiden Co Ltd
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Abstract

To provide a manufacturing method for a printed wiring board with high quality.SOLUTION: A manufacturing method for a printed wiring board includes: forming, on an insulation layer 4, a conductor layer 10 with a conductor circuit; preparing a forming member 40 having a thermosetting resin insulation layer 20 with a first surface 20F and a second surface 20B on a side opposite to the first surface, and a first protective film 42 formed on the first surface of the resin insulation layer 20; and sticking the forming member 40 on the conductor layer 10 so that the conductor circuit and the second surface 20b make contact with each other. When the resin insulation layer 20 and the first protective film 42 are projected with light perpendicular to the first surface 20F, each side of the outer peripheral edge of the first protective film 42 exists outside of each side of the insulation layer 20.SELECTED DRAWING: Figure 2D

Description

本明細書によって開示される技術は、プリント配線板の製造方法に関する。 The technology disclosed by this specification relates to a method for manufacturing a printed wiring board.

特許文献1は、支持フィルムの一方の面に半硬化状態の絶縁層が設けられた絶縁層形成部材を準備する工程と、パッドと半硬化状態の絶縁層が接触するように絶縁層形成部材を貼り付ける工程と、絶縁層形成部材を貼り付けられた後に絶縁層を硬化させる工程、とを有する配線基板の製造方法を開示している。 Patent Document 1 discloses a process of preparing an insulating layer forming member having a semi-cured insulating layer provided on one surface of a support film, and placing the insulating layer forming member so that the pad and the semi-cured insulating layer are in contact with each other. Disclosed is a method for manufacturing a wiring board, which includes a step of attaching and a step of curing the insulating layer after the insulating layer forming member is attached.

特開2009-99649号公報JP 2009-99649 A

[特許文献1の課題]
特許文献1の技術では、絶縁層形成部材が貼り付けられる際、支持フィルム及び半硬化状態の絶縁層が加圧されると考えられる。加圧により、半硬化状態の絶縁層の一部が支持フィルムの外周縁から外方にはみ出ると考えられる。はみ出た絶縁層の一部はブリードと呼ばれる。ブリードの一部は支持フィルムの上方に突出すると考えられる。ブリードが上方に突出すると、配線基板の平坦性が損なわれると考えられる。その結果、配線基板の品質が低下すると考えられる。
[Problem of Patent Document 1]
In the technique of Patent Document 1, it is considered that the support film and the semi-cured insulating layer are pressed when the insulating layer forming member is attached. It is thought that part of the semi-cured insulating layer protrudes outward from the peripheral edge of the support film due to the application of pressure. A portion of the protruding insulating layer is called a bleed. Part of the bleed is believed to protrude above the support film. If the bleed protrudes upward, it is considered that the flatness of the wiring substrate is impaired. As a result, it is considered that the quality of the wiring board is degraded.

本発明のプリント配線板の製造方法は、絶縁層上に導体回路を有する導体層を形成することと、第1面と前記第1面と反対側の第2面とを有する熱硬化性の樹脂絶縁層と前記樹脂絶縁層の前記第1面上に形成される第1保護膜とを有する形成部材を準備することと、前記導体回路と前記第2面が接触するように前記導体層上に前記形成部材を貼り付けること、とを有する。前記第1面に垂直な光で前記樹脂絶縁層と前記第1保護膜が投影される場合に、前記第1保護膜の外周縁の各辺は前記樹脂絶縁層の各辺より外側に存在する。 A method for manufacturing a printed wiring board of the present invention includes forming a conductor layer having a conductor circuit on an insulating layer, and thermosetting resin having a first surface and a second surface opposite to the first surface. preparing a forming member having an insulating layer and a first protective film formed on the first surface of the resin insulating layer; and affixing the forming member. When the resin insulating layer and the first protective film are projected with light perpendicular to the first surface, each side of the outer peripheral edge of the first protective film exists outside each side of the resin insulating layer. .

本発明の実施形態の製造方法では、導体回路と第2面が接触するように導体層上に形成部材が貼り付けられる。第1面に垂直な光で樹脂絶縁層と第1保護膜が投影される場合に、第1保護膜の外周縁の各辺は樹脂絶縁層の各辺より外側に存在する。そのため、導体層上に形成部材が貼り付けられる際に、樹脂絶縁層の一部が第1保護膜の外周縁から外方にはみ出ることが抑制される。樹脂絶縁層の一部が第1保護膜の上方に突出することが抑制される。本発明の製造方法で製造されるプリント配線板の平坦性が損なわれることが抑制される。高い品質のプリント配線板が提供される。 In the manufacturing method of the embodiment of the present invention, the forming member is attached onto the conductor layer so that the conductor circuit and the second surface are in contact with each other. When the resin insulating layer and the first protective film are projected with light perpendicular to the first surface, each side of the outer peripheral edge of the first protective film exists outside each side of the resin insulating layer. Therefore, when the forming member is attached onto the conductor layer, part of the resin insulation layer is prevented from protruding outward from the outer peripheral edge of the first protective film. Part of the resin insulation layer is prevented from protruding above the first protective film. Impairment of the flatness of the printed wiring board manufactured by the manufacturing method of the present invention is suppressed. A high quality printed wiring board is provided.

実施形態のプリント配線板を模式的に示す断面図。BRIEF DESCRIPTION OF THE DRAWINGS Sectional drawing which shows typically the printed wiring board of embodiment. 実施形態のプリント配線板の製造方法を模式的に示す断面図。FIG. 4 is a cross-sectional view schematically showing a method for manufacturing a printed wiring board according to the embodiment; 実施形態のプリント配線板の製造方法を模式的に示す断面図。FIG. 4 is a cross-sectional view schematically showing a method for manufacturing a printed wiring board according to the embodiment; 実施形態のプリント配線板の製造方法を模式的に示す断面図。FIG. 4 is a cross-sectional view schematically showing a method for manufacturing a printed wiring board according to the embodiment; 実施形態のプリント配線板の製造方法を模式的に示す平面図。FIG. 4 is a plan view schematically showing a method for manufacturing a printed wiring board according to the embodiment; 図2Dの形成部材40を示す平面図。2D is a plan view of the forming member 40 of FIG. 2D; FIG. 実施形態のプリント配線板の製造方法を模式的に示す断面図。FIG. 4 is a cross-sectional view schematically showing a method for manufacturing a printed wiring board according to the embodiment; 実施形態のプリント配線板の製造方法を模式的に示す断面図。FIG. 4 is a cross-sectional view schematically showing a method for manufacturing a printed wiring board according to the embodiment; 実施形態のプリント配線板の製造方法を模式的に示す断面図。FIG. 4 is a cross-sectional view schematically showing a method for manufacturing a printed wiring board according to the embodiment; 実施形態のプリント配線板の製造方法を模式的に示す断面図。FIG. 4 is a cross-sectional view schematically showing a method for manufacturing a printed wiring board according to the embodiment; 実施形態のプリント配線板の製造方法を模式的に示す断面図。FIG. 4 is a cross-sectional view schematically showing a method for manufacturing a printed wiring board according to the embodiment; 改変例のプリント配線板の製造方法を模式的に示す断面図。Sectional drawing which shows typically the manufacturing method of the printed wiring board of a modification.

[実施形態]
図1は実施形態のプリント配線板2を示す断面図である。図1に示されるように、プリント配線板2は、絶縁層4と第1導体層10と樹脂絶縁層20と第2導体層60とビア導体70とを有する。
[Embodiment]
FIG. 1 is a cross-sectional view showing a printed wiring board 2 of the embodiment. As shown in FIG. 1 , printed wiring board 2 has insulating layer 4 , first conductor layer 10 , resin insulating layer 20 , second conductor layer 60 and via conductors 70 .

絶縁層4は熱硬化性樹脂を用いて形成される。絶縁層4はシリカ等の無機粒子を含んでもよい。絶縁層4は、ガラスクロス等の補強材を含んでもよい。 The insulating layer 4 is formed using a thermosetting resin. The insulating layer 4 may contain inorganic particles such as silica. The insulating layer 4 may contain a reinforcing material such as glass cloth.

第1導体層10は絶縁層4上に形成されている。第1導体層10はパッド12と信号配線14とを含む。図に示されていないが、第1導体層10はパッド12と信号配線14以外の導体回路も含んでいる。第1導体層10は銅によって形成される。第1導体層10は、シード層10aとシード層10a上の電解めっき膜10bで形成されている。 A first conductor layer 10 is formed on the insulating layer 4 . The first conductor layer 10 includes pads 12 and signal wirings 14 . Although not shown, the first conductor layer 10 also includes conductor circuits other than the pads 12 and the signal wirings 14 . The first conductor layer 10 is made of copper. The first conductor layer 10 is formed of a seed layer 10a and an electroplated film 10b on the seed layer 10a.

樹脂絶縁層20は絶縁層4と第1導体層10上に形成されている。樹脂絶縁層20は第1面20F(図中の上面)と第1面20Fと反対側の第2面20B(図中の下面)を有する。樹脂絶縁層20にはパッド12を露出する開口22が形成されている。樹脂絶縁層20は熱硬化性樹脂で形成されている。熱硬化性樹脂はエポキシ系樹脂とポリマー系樹脂と無機フィラーとを含む。 Resin insulation layer 20 is formed on insulation layer 4 and first conductor layer 10 . Resin insulation layer 20 has a first surface 20F (upper surface in the drawing) and a second surface 20B (lower surface in the drawing) opposite to first surface 20F. Openings 22 exposing pads 12 are formed in resin insulation layer 20 . Resin insulation layer 20 is made of a thermosetting resin. Thermosetting resins include epoxy-based resins, polymer-based resins, and inorganic fillers.

第2導体層60は樹脂絶縁層20の第1面20F上に形成されている。第2導体層60はランド62と信号配線64とを含む。図に示されていないが、第2導体層60はランド62と信号配線64以外の導体回路も含んでいる。第2導体層60は銅によって形成される。第2導体層60は、シード層60aとシード層60a上の電解めっき膜60bで形成されている。 Second conductor layer 60 is formed on first surface (20F) of resin insulation layer 20 . The second conductor layer 60 includes lands 62 and signal wirings 64 . Although not shown, the second conductor layer 60 also includes conductor circuits other than the lands 62 and the signal wirings 64 . The second conductor layer 60 is made of copper. The second conductor layer 60 is formed of a seed layer 60a and an electroplated film 60b on the seed layer 60a.

ビア導体70は開口22内に形成されている。ビア導体70は第1導体層10と第2導体層60を接続する。図1ではビア導体70はパッド12とランド62を接続する。ビア導体70はシード層60aとシード層60a上の電解めっき膜60bで形成されている。 Via conductors 70 are formed in openings 22 . Via conductors 70 connect first conductor layer 10 and second conductor layer 60 . In FIG. 1, via conductors 70 connect pads 12 and lands 62 . Via conductor 70 is formed of seed layer 60a and electrolytic plated film 60b on seed layer 60a.

[実施形態のプリント配線板2の製造方法]
図2A~図2Jは実施形態のプリント配線板2の製造方法を示す。図2A~図2D、図2F~図2Jは断面図である。図2Eは図2Dで示される形成部材40の平面図である。
[Manufacturing Method of Printed Wiring Board 2 of Embodiment]
2A to 2J show a method for manufacturing the printed wiring board 2 of the embodiment. 2A-2D and 2F-2J are cross-sectional views. FIG. 2E is a plan view of the forming member 40 shown in FIG. 2D.

図2Aは絶縁層4と絶縁層4上に形成されている第1導体層10を示す。第1導体層10はセミアディティブ法によって形成される。 FIG. 2A shows the insulating layer 4 and the first conductor layer 10 formed on the insulating layer 4 . The first conductor layer 10 is formed by a semi-additive method.

図2Bに示されるように、樹脂絶縁層20と樹脂絶縁層20の第2面20B上に形成される第2保護膜32とを有する第1途中部材30が準備される。この時点では樹脂絶縁層20は半硬化状態である。第2保護膜32は樹脂絶縁層20の第2面20Bを完全に覆っている。第1途中部材30が平面視される場合、第2保護膜32の外周縁の各辺と樹脂絶縁層20の外周縁の各辺は重なる。即ち樹脂絶縁層20の第1面20Fに垂直な光で樹脂絶縁層20と第2保護膜32が投影される場合に、第2保護膜32の外周縁の各辺と樹脂絶縁層20の外周縁の各辺は重なる。第2保護膜32の例は、ポリエチレンテレフタレート(PET)製のフィルムである。第2保護膜32と樹脂絶縁層20との間に離型剤が形成されている。 As shown in FIG. 2B, first intermediate member 30 having resin insulation layer 20 and second protective film 32 formed on second surface 20B of resin insulation layer 20 is prepared. At this point, resin insulation layer 20 is in a semi-cured state. Second protective film 32 completely covers second surface 20B of resin insulation layer 20 . When first intermediate member 30 is viewed from above, each side of the outer periphery of second protective film 32 overlaps with each side of the outer periphery of resin insulation layer 20 . That is, when the resin insulation layer 20 and the second protective film 32 are projected with light perpendicular to the first surface 20</b>F of the resin insulation layer 20 , each side of the outer peripheral edge of the second protective film 32 and the outside of the resin insulation layer 20 are projected. Each side of the perimeter overlaps. An example of the second protective film 32 is a film made of polyethylene terephthalate (PET). A release agent is formed between the second protective film 32 and the resin insulation layer 20 .

図2Cに示されるように、樹脂絶縁層20の第1面20F上に第1保護膜42が貼り付けられる。後で詳しく説明されるように第1保護膜42は樹脂絶縁層20よりも大きい。第1保護膜42は第1面20Fを完全に覆っている。第1保護膜42の例は、ポリエチレンテレフタレート(PET)製のフィルムである。第1保護膜42と樹脂絶縁層20との間に離型剤が形成されている。 As shown in FIG. 2C, first protective film 42 is attached on first surface (20F) of resin insulation layer 20 . First protective film 42 is larger than resin insulation layer 20 as will be described in detail later. The first protective film 42 completely covers the first surface 20F. An example of the first protective film 42 is a film made of polyethylene terephthalate (PET). A release agent is formed between first protective film 42 and resin insulation layer 20 .

図2Dに示されるように、第2保護膜32が樹脂絶縁層20の第2面20Bから取り除かれる。この結果、樹脂絶縁層20と第1保護膜42とを有する形成部材40が準備される。図2Eに示されるように、形成部材40が平面視される場合、第1保護膜42の外周縁の各辺は樹脂絶縁層20の外周縁の各辺より外側に存在する。即ち樹脂絶縁層20の第1面20Fに垂直な光で樹脂絶縁層20と第1保護膜42が投影される場合に、第1保護膜42の外周縁の各辺は樹脂絶縁層20の外周縁の各辺より外側に存在する。 As shown in FIG. 2D, second protective film 32 is removed from second surface 20B of resin insulation layer 20 . As a result, forming member 40 having resin insulating layer 20 and first protective film 42 is prepared. As shown in FIG. 2E , when forming member 40 is viewed from above, each side of the outer periphery of first protective film 42 is present outside each side of the outer periphery of resin insulation layer 20 . That is, when the resin insulation layer 20 and the first protective film 42 are projected with light perpendicular to the first surface 20</b>F of the resin insulation layer 20 , each side of the outer peripheral edge of the first protective film 42 is outside the resin insulation layer 20 . It exists outside each side of the periphery.

図2Fに示されるように、第1導体層10のパッド12と信号配線14に第2面20Bが接触するように、絶縁層4と第1導体層10上に形成部材40が貼り付けられる。この際、第1保護膜42及び半硬化状態の樹脂絶縁層20に熱と圧力が加えられる。第1保護膜42と樹脂絶縁層20は、第1保護膜42上に配置された加圧板50によって絶縁層4に向かう方向に加圧される。加圧板50は例えばSUS(ステンレス鋼)板である。形成部材30が貼り付けられることにより、半硬化状態の樹脂絶縁層20が変形する。実施形態では、第1保護膜42の外周縁の各辺は樹脂絶縁層20の各辺より外側に存在する(図2E参照)。そのため、形成部材40が貼り付けられる際に、樹脂絶縁層20の一部が第1保護膜42の外周縁から外方にはみ出ることが抑制される。即ちブリードが発生しない。そのため、第1保護膜42の上方に樹脂絶縁層20の一部が突出しない。樹脂絶縁層20の加熱は図示しない加熱機構によって行われる。加熱によって樹脂絶縁層20の硬化が進行する。 As shown in FIG. 2F, the forming member 40 is attached on the insulating layer 4 and the first conductor layer 10 so that the second surface 20B contacts the pads 12 and the signal wirings 14 of the first conductor layer 10 . At this time, heat and pressure are applied to the first protective film 42 and the semi-cured resin insulation layer 20 . First protective film 42 and resin insulating layer 20 are pressed in a direction toward insulating layer 4 by pressure plate 50 arranged on first protective film 42 . The pressure plate 50 is, for example, a SUS (stainless steel) plate. By attaching the forming member 30, the semi-cured resin insulation layer 20 is deformed. In the embodiment, each side of the outer periphery of the first protective film 42 exists outside each side of the resin insulation layer 20 (see FIG. 2E). Therefore, when forming member 40 is attached, part of resin insulation layer 20 is prevented from protruding outward from the outer peripheral edge of first protective film 42 . That is, bleeding does not occur. Therefore, part of resin insulation layer 20 does not protrude above first protective film 42 . Heating of the resin insulation layer 20 is performed by a heating mechanism (not shown). Hardening of the resin insulation layer 20 progresses by heating.

図2Gに示されるように、第1保護膜42の上からレーザ光Lが照射される。レーザ光Lは第1保護膜42と樹脂絶縁層20を同時に貫通する。第1導体層10のパッド12に至るビア導体用の開口22が形成される。レーザ光Lは例えばUVレーザ光、CO2レーザ光である。開口22によりパッド12が露出される。 As shown in FIG. 2G, laser light L is irradiated from above the first protective film 42 . The laser light L penetrates the first protective film 42 and the resin insulation layer 20 at the same time. A via-conductor opening 22 is formed to reach the pad 12 of the first conductor layer 10 . The laser light L is, for example, UV laser light or CO2 laser light. Pads 12 are exposed through openings 22 .

図2Hに示されるように、樹脂絶縁層20の第1面20Fから第1保護膜42が取り除かれる。 As shown in FIG. 2H, first protective film 42 is removed from first surface (20F) of resin insulation layer 20 .

図2Iに示されるように、樹脂絶縁層20の第1面20F上にシード層60aが形成される。シード層60aは無電解めっきによって形成される。シード層60a上にめっきレジスト100が形成される。めっきレジスト100は、ランド62と信号配線64(図1)を形成するための開口を有する。 As shown in FIG. 2I, seed layer 60a is formed on first surface (20F) of resin insulation layer 20 . The seed layer 60a is formed by electroless plating. A plating resist 100 is formed on the seed layer 60a. The plating resist 100 has openings for forming the lands 62 and the signal wirings 64 (FIG. 1).

図2Jに示されるように、めっきレジスト100から露出するシード層60a上に電解めっき膜60bが形成される。電解めっき膜60bは開口22を充填する。第1面20F上のシード層60aと電解めっき膜60bによって、ランド62と信号配線64が形成される。第2導体層60が形成される。開口22内のシード層60aと電解めっき膜60bによってビア導体70が形成される。ビア導体70は、パッド12とランド62を接続する。 Electroplated film 60b is formed on seed layer 60a exposed from plating resist 100, as shown in FIG. 2J. Electroplated film 60 b fills opening 22 . A land 62 and a signal wiring 64 are formed by the seed layer 60a and the electroplated film 60b on the first surface 20F. A second conductor layer 60 is formed. Seed layer 60 a and electrolytic plated film 60 b in opening 22 form via conductor 70 . Via conductors 70 connect pads 12 and lands 62 .

その後、めっきレジスト100が除去される。電解めっき膜60bから露出するシード層60aが除去される。第2導体層60とビア導体70は同時に形成される。加熱処理が施され、樹脂絶縁層20が完全に硬化される。実施形態のプリント配線板2(図1)が得られる。 After that, the plating resist 100 is removed. The seed layer 60a exposed from the electrolytic plated film 60b is removed. The second conductor layer 60 and via conductors 70 are formed at the same time. A heat treatment is applied to completely harden the resin insulation layer 20 . A printed wiring board 2 (FIG. 1) of the embodiment is obtained.

実施形態の製造方法によると、形成部材40が貼り付けられる際に、樹脂絶縁層20の一部が第1保護膜42の外周縁から外方にはみ出ることが抑制される。ブリードが発生しない。第1保護膜42の上方に樹脂絶縁層20の一部が突出しない。従って、実施形態の製造方法で製造されるプリント配線板2の平坦性が損なわれることが抑制される。高い品質のプリント配線板2が提供される。 According to the manufacturing method of the embodiment, when the forming member 40 is attached, part of the resin insulation layer 20 is prevented from protruding outward from the outer peripheral edge of the first protective film 42 . Bleed does not occur. Part of resin insulation layer 20 does not protrude above first protective film 42 . Therefore, deterioration of the flatness of the printed wiring board 2 manufactured by the manufacturing method of the embodiment is suppressed. A high quality printed wiring board 2 is provided.

[実施形態の改変例]
改変例では、得られるプリント配線板2は実施形態と同じである(図1)。改変例では製造方法の一部が実施形態と異なる。
[Modified example of embodiment]
In a modification, the printed wiring board 2 obtained is the same as the embodiment (FIG. 1). In the modified example, part of the manufacturing method differs from the embodiment.

図3に示されるように、改変例では、第1途中部材30(図2B、図2C)に代えて、樹脂絶縁層20と樹脂絶縁層20の第1面20F上に形成される第1保護膜42とを有する第2途中部材130が準備される。この時点では樹脂絶縁層20は半硬化状態である。第1保護膜42は樹脂絶縁層20の第1面20Fを完全に覆っている。第2途中部材130が平面視される場合、第1保護膜42の外周縁の各辺と樹脂絶縁層20の外周縁の各辺は重なる。即ち樹脂絶縁層20の第1面20Fに垂直な光で樹脂絶縁層20と第1保護膜42が投影される場合に、第1保護膜42の外周縁の各辺と樹脂絶縁層20の外周縁の各辺は重なる。 As shown in FIG. 3, in the modified example, instead of first intermediate member 30 (FIGS. 2B and 2C), resin insulation layer 20 and a first protection layer formed on first surface (20F) of resin insulation layer 20 are formed. A second intermediate member 130 having a membrane 42 is provided. At this point, resin insulation layer 20 is in a semi-cured state. First protective film 42 completely covers first surface (20F) of resin insulation layer 20 . When second intermediate member 130 is viewed from above, each side of the outer peripheral edge of first protective film 42 overlaps each side of the outer peripheral edge of resin insulation layer 20 . That is, when the resin insulation layer 20 and the first protective film 42 are projected with light perpendicular to the first surface 20</b>F of the resin insulation layer 20 , each side of the outer peripheral edge of the first protective film 42 and the outside of the resin insulation layer 20 are projected. Each side of the perimeter overlaps.

続いて、樹脂絶縁層20の外周縁部200が除去される。外周縁部200は、図3の樹脂絶縁層20の破線より外側の部分である。例えば外周縁部200はレーザ光によって除去される。外周縁部200の除去は他の方法で行われてもよい。改変例では、外周縁部200が除去されることによって、図2D、図2Eに示される形成部材40が形成される。形成部材40の貼り付け以降の工程は、実施形態の図2F~図2Jで示される工程と同様である。 Subsequently, outer peripheral edge portion 200 of resin insulation layer 20 is removed. Outer peripheral edge portion 200 is a portion of resin insulation layer 20 outside the dashed line in FIG. 3 . For example, the outer peripheral edge 200 is removed by laser light. Removal of the outer peripheral edge 200 may be done in other ways. In a modification, the outer peripheral edge 200 is removed to form the forming member 40 shown in Figures 2D and 2E. The steps after attaching the forming member 40 are the same as the steps shown in FIGS. 2F to 2J of the embodiment.

2 :プリント配線板
4 :絶縁層
10 :第1導体層
12 :パッド
14 :信号配線
20 :樹脂絶縁層
20F :第1面
20B :第2面
30 :第1途中部材
32 :第2保護膜
40 :形成部材
42 :第1保護膜
130 :第2途中部材
200 :外周縁部
2: Printed wiring board 4: Insulating layer 10: First conductor layer 12: Pad 14: Signal wiring 20: Resin insulating layer 20F: First surface 20B: Second surface 30: First intermediate member 32: Second protective film 40 : forming member 42 : first protective film 130 : second intermediate member 200 : outer peripheral edge

Claims (4)

絶縁層上に導体回路を有する導体層を形成することと、
第1面と前記第1面と反対側の第2面とを有する熱硬化性の樹脂絶縁層と前記樹脂絶縁層の前記第1面上に形成される第1保護膜とを有する形成部材を準備することと、
前記導体回路と前記第2面が接触するように前記導体層上に前記形成部材を貼り付けること、とを有するプリント配線板の製造方法であって、
前記第1面に垂直な光で前記樹脂絶縁層と前記第1保護膜が投影される場合に、前記第1保護膜の外周縁の各辺は前記樹脂絶縁層の各辺より外側に存在する。
forming a conductor layer having a conductor circuit on the insulating layer;
a forming member having a thermosetting resin insulation layer having a first surface and a second surface opposite to the first surface; and a first protective film formed on the first surface of the resin insulation layer to prepare and
affixing the forming member on the conductor layer so that the conductor circuit and the second surface are in contact with each other, the printed wiring board manufacturing method comprising:
When the resin insulating layer and the first protective film are projected with light perpendicular to the first surface, each side of the outer peripheral edge of the first protective film exists outside each side of the resin insulating layer. .
請求項1のプリント配線板の製造方法であって、前記準備することは、前記樹脂絶縁層と前記樹脂絶縁層の前記第2面上に形成される第2保護膜とを有する第1途中部材を準備することと、前記第1面上に前記第1保護膜を貼り付けることと、前記第1保護膜が貼り付けられた後で前記第2保護膜を前記第2面から取り除くこと、とを含み、前記第1面に垂直な光で前記樹脂絶縁層と前記第2保護膜が投影される場合に、前記第2保護膜の外周縁の各辺は前記樹脂絶縁層の各辺と重なる。 2. The method of manufacturing a printed wiring board according to claim 1, wherein said preparing comprises a first intermediate member having said resin insulation layer and a second protective film formed on said second surface of said resin insulation layer. affixing the first protective film on the first surface; and removing the second protective film from the second surface after the first protective film is affixed. and when the resin insulation layer and the second protective film are projected with light perpendicular to the first surface, each side of the outer peripheral edge of the second protective film overlaps each side of the resin insulation layer . 請求項1のプリント配線板の製造方法であって、前記準備することは、前記樹脂絶縁層と前記樹脂絶縁層の前記第1面上に形成される前記第1保護膜とを有し、前記第1面に垂直な光で前記樹脂絶縁層と前記第1保護膜が投影される場合に、前記第1保護膜の外周縁の各辺は前記樹脂絶縁層の各辺と重なる、第2途中部材を準備することと、前記第2途中部材の前記樹脂絶縁層の外周縁部を除去することと、を含む。 2. The method of manufacturing a printed wiring board according to claim 1, wherein said preparing includes said resin insulating layer and said first protective film formed on said first surface of said resin insulating layer, and said When the resin insulation layer and the first protective film are projected with light perpendicular to the first surface, each side of the outer peripheral edge of the first protective film overlaps with each side of the resin insulation layer. preparing a member; and removing an outer peripheral edge portion of the resin insulation layer of the second intermediate member. 請求項1のプリント配線板の製造方法であって、前記貼り付けることは、前記第1保護膜と前記樹脂絶縁層に熱と圧力を加えることを含む。 2. The method of manufacturing a printed wiring board according to claim 1, wherein said pasting includes applying heat and pressure to said first protective film and said resin insulation layer.
JP2021188017A 2021-11-18 2021-11-18 Manufacturing method for printed wiring board Pending JP2023074860A (en)

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