JP2001102533A5 - - Google Patents

Download PDF

Info

Publication number
JP2001102533A5
JP2001102533A5 JP1999312806A JP31280699A JP2001102533A5 JP 2001102533 A5 JP2001102533 A5 JP 2001102533A5 JP 1999312806 A JP1999312806 A JP 1999312806A JP 31280699 A JP31280699 A JP 31280699A JP 2001102533 A5 JP2001102533 A5 JP 2001102533A5
Authority
JP
Japan
Prior art keywords
insulating film
fuse
solid
fuses
film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP1999312806A
Other languages
English (en)
Japanese (ja)
Other versions
JP2001102533A (ja
JP4395941B2 (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP31280699A priority Critical patent/JP4395941B2/ja
Priority claimed from JP31280699A external-priority patent/JP4395941B2/ja
Priority to KR1020000057446A priority patent/KR20010030546A/ko
Publication of JP2001102533A publication Critical patent/JP2001102533A/ja
Publication of JP2001102533A5 publication Critical patent/JP2001102533A5/ja
Application granted granted Critical
Publication of JP4395941B2 publication Critical patent/JP4395941B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

JP31280699A 1999-09-29 1999-09-29 任意電圧発生構造及びこれを用いた固体撮像素子 Expired - Fee Related JP4395941B2 (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP31280699A JP4395941B2 (ja) 1999-09-29 1999-09-29 任意電圧発生構造及びこれを用いた固体撮像素子
KR1020000057446A KR20010030546A (ko) 1999-09-29 2000-09-29 임의 전압 발생 구조 및 이 구조를 사용하는 고체 촬상 소자

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP31280699A JP4395941B2 (ja) 1999-09-29 1999-09-29 任意電圧発生構造及びこれを用いた固体撮像素子

Publications (3)

Publication Number Publication Date
JP2001102533A JP2001102533A (ja) 2001-04-13
JP2001102533A5 true JP2001102533A5 (enrdf_load_stackoverflow) 2006-05-11
JP4395941B2 JP4395941B2 (ja) 2010-01-13

Family

ID=18033644

Family Applications (1)

Application Number Title Priority Date Filing Date
JP31280699A Expired - Fee Related JP4395941B2 (ja) 1999-09-29 1999-09-29 任意電圧発生構造及びこれを用いた固体撮像素子

Country Status (2)

Country Link
JP (1) JP4395941B2 (enrdf_load_stackoverflow)
KR (1) KR20010030546A (enrdf_load_stackoverflow)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4940517B2 (ja) * 2001-08-07 2012-05-30 ソニー株式会社 固体撮像装置およびその製造方法
JP2005277398A (ja) * 2004-02-25 2005-10-06 Sony Corp Ccdリニアセンサ
KR100594262B1 (ko) * 2004-03-05 2006-06-30 삼성전자주식회사 바이어스 회로, 이를 구비한 고체 촬상 소자 및 그 제조방법
KR101096439B1 (ko) 2006-06-29 2011-12-20 주식회사 하이닉스반도체 반도체 소자의 퓨즈 박스 형성방법

Similar Documents

Publication Publication Date Title
JPH11191628A5 (enrdf_load_stackoverflow)
KR950034797A (ko) 반도체집적회로장치 및 그 제조방법
JP2003520417A5 (enrdf_load_stackoverflow)
JPS52102690A (en) Semiconductor capacitance device
JP2001076484A5 (enrdf_load_stackoverflow)
JPS6442161A (en) Semiconductor device and manufacture thereof
JPH10163429A5 (enrdf_load_stackoverflow)
JP2001102533A5 (enrdf_load_stackoverflow)
TW429597B (en) Ferroelectric memory device and method for fabricating the same
EP1091618A3 (en) Semiconductor device
JP2687917B2 (ja) 半導体装置の製造方法
JP4395941B2 (ja) 任意電圧発生構造及びこれを用いた固体撮像素子
JPH1051005A5 (enrdf_load_stackoverflow)
JPS5617039A (en) Semiconductor device
JPH03124047A (ja) 集積回路装置
JPH11177105A5 (enrdf_load_stackoverflow)
KR970003807A (ko) 도전층을 포함하는 소자분리구조를 갖는 반도체장치 및 그 제조방법
JP4154928B2 (ja) 半導体装置
JPH04243150A (ja) ポリシリコンヒューズ
JPS5391622A (en) Solid state pick up unit
JPH03237787A (ja) 混成集積回路
JP2000315835A5 (enrdf_load_stackoverflow)
JPH1197703A5 (ja) 半導体装置の作製方法
JPH0381647U (enrdf_load_stackoverflow)
JPS55110059A (en) Manufacture of semiconductor device