JP2001085293A5 - - Google Patents

Download PDF

Info

Publication number
JP2001085293A5
JP2001085293A5 JP1999255636A JP25563699A JP2001085293A5 JP 2001085293 A5 JP2001085293 A5 JP 2001085293A5 JP 1999255636 A JP1999255636 A JP 1999255636A JP 25563699 A JP25563699 A JP 25563699A JP 2001085293 A5 JP2001085293 A5 JP 2001085293A5
Authority
JP
Japan
Prior art keywords
luminous flux
optical system
predetermined surface
optical device
illumination
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP1999255636A
Other languages
English (en)
Japanese (ja)
Other versions
JP4415223B2 (ja
JP2001085293A (ja
Filing date
Publication date
Application filed filed Critical
Priority claimed from JP25563699A external-priority patent/JP4415223B2/ja
Priority to JP25563699A priority Critical patent/JP4415223B2/ja
Priority to EP99125256A priority patent/EP1014196A3/en
Priority to KR1019990058776A priority patent/KR20000048227A/ko
Priority to US09/540,874 priority patent/US6563567B1/en
Publication of JP2001085293A publication Critical patent/JP2001085293A/ja
Priority to US10/377,700 priority patent/US20030160949A1/en
Priority to US10/378,816 priority patent/US20030156269A1/en
Priority to US10/378,867 priority patent/US20030156266A1/en
Publication of JP2001085293A5 publication Critical patent/JP2001085293A5/ja
Publication of JP4415223B2 publication Critical patent/JP4415223B2/ja
Application granted granted Critical
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

JP25563699A 1998-12-17 1999-09-09 照明光学装置および該照明光学装置を備えた露光装置 Expired - Fee Related JP4415223B2 (ja)

Priority Applications (7)

Application Number Priority Date Filing Date Title
JP25563699A JP4415223B2 (ja) 1999-09-09 1999-09-09 照明光学装置および該照明光学装置を備えた露光装置
EP99125256A EP1014196A3 (en) 1998-12-17 1999-12-17 Method and system of illumination for a projection optical apparatus
KR1019990058776A KR20000048227A (ko) 1998-12-17 1999-12-17 이미지 투사 장치를 이용한 표면 조명 방법 및 조명 광학시스템
US09/540,874 US6563567B1 (en) 1998-12-17 2000-03-31 Method and apparatus for illuminating a surface using a projection imaging apparatus
US10/377,700 US20030160949A1 (en) 1998-12-17 2003-03-04 Method and apparatus for illuminating a surface using a projection imaging apparatus
US10/378,816 US20030156269A1 (en) 1998-12-17 2003-03-05 Method and apparatus for illuminating a surface using a projection imaging apparatus
US10/378,867 US20030156266A1 (en) 1998-12-17 2003-03-05 Method and apparatus for illuminating a surface using a projection imaging apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP25563699A JP4415223B2 (ja) 1999-09-09 1999-09-09 照明光学装置および該照明光学装置を備えた露光装置

Publications (3)

Publication Number Publication Date
JP2001085293A JP2001085293A (ja) 2001-03-30
JP2001085293A5 true JP2001085293A5 (enExample) 2008-02-28
JP4415223B2 JP4415223B2 (ja) 2010-02-17

Family

ID=17281505

Family Applications (1)

Application Number Title Priority Date Filing Date
JP25563699A Expired - Fee Related JP4415223B2 (ja) 1998-12-17 1999-09-09 照明光学装置および該照明光学装置を備えた露光装置

Country Status (1)

Country Link
JP (1) JP4415223B2 (enExample)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW567406B (en) 2001-12-12 2003-12-21 Nikon Corp Diffraction optical device, refraction optical device, illuminating optical device, exposure system and exposure method
JP2006134932A (ja) * 2004-11-02 2006-05-25 Nikon Corp 可変スリット装置、照明光学装置、露光装置、及び露光方法
CN107390477B (zh) * 2011-10-24 2020-02-14 株式会社尼康 照明系统、曝光装置及制造、图像形成、照明与曝光方法

Similar Documents

Publication Publication Date Title
TW396397B (en) Illumination system and exposure apparatus having the same
EP0783135B1 (en) Imaging-apparatus and method for manufacture of microdevices
US6128068A (en) Projection exposure apparatus including an illumination optical system that forms a secondary light source with a particular intensity distribution
KR100411833B1 (ko) 공간적으로분리된수직및수평이미지평면을지니며포토리도그래피기법에서사용하는조명장치
US5420417A (en) Projection exposure apparatus with light distribution adjustment
US5797674A (en) Illumination optical system, alignment apparatus, and projection exposure apparatus using the same
KR900008299A (ko) 조명방법 및 그 장치와 투영식 노출방법 및 그 장치
JP2005236088A5 (enExample)
KR960042228A (ko) 포토리도그래피 기법에서 사용하는 혼성(hybrid) 조명 장치
JPH0378607B2 (enExample)
JP2006514441A5 (enExample)
JP3295956B2 (ja) 露光装置及び半導体素子の製造方法
TW201940986A (zh) 曝光裝置及曝光方法
KR950024024A (ko) 투영노광장치 및 이를 이용한 디바이스 제조방법
JPH0629189A (ja) 投影式露光装置およびその方法並びに照明光学装置
JP2001085293A5 (enExample)
CN109307988B (zh) 照明光学系统、曝光装置以及物品制造方法
JP3814444B2 (ja) 照明装置及びそれを用いた投影露光装置
JPH04225358A (ja) 投影露光装置及び方法、並びに素子製造方法
US10539883B2 (en) Illumination system of a microlithographic projection device and method for operating such a system
TWI805936B (zh) 曝光裝置及物品之製造方法
JPH11274060A5 (enExample)
JP2003178951A5 (enExample)
JP3102087B2 (ja) 投影露光装置及び方法、並びに回路素子形成方法
KR970022395A (ko) 조명광학계