JP2001044569A - ドープド半導体材料、ドープド半導体材料の製造方法、および半導体デバイス - Google Patents

ドープド半導体材料、ドープド半導体材料の製造方法、および半導体デバイス

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Publication number
JP2001044569A
JP2001044569A JP2000177538A JP2000177538A JP2001044569A JP 2001044569 A JP2001044569 A JP 2001044569A JP 2000177538 A JP2000177538 A JP 2000177538A JP 2000177538 A JP2000177538 A JP 2000177538A JP 2001044569 A JP2001044569 A JP 2001044569A
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JP
Japan
Prior art keywords
semiconductor material
dopant
semiconductor
layer
doped
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
JP2000177538A
Other languages
English (en)
Japanese (ja)
Other versions
JP2001044569A5 (enExample
Inventor
Alistair Henderson Kean
ヘンダーソン キーン アリスター
Haruhisa Takiguchi
治久 瀧口
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sharp Corp
Original Assignee
Sharp Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sharp Corp filed Critical Sharp Corp
Publication of JP2001044569A publication Critical patent/JP2001044569A/ja
Publication of JP2001044569A5 publication Critical patent/JP2001044569A5/ja
Withdrawn legal-status Critical Current

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Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00—Semiconductor lasers
    • H01S5/30—Structure or shape of the active region; Materials used for the active region
    • H01S5/32—Structure or shape of the active region; Materials used for the active region comprising PN junctions, e.g. hetero- or double- heterostructures
    • H01S5/323—Structure or shape of the active region; Materials used for the active region comprising PN junctions, e.g. hetero- or double- heterostructures in AIIIBV compounds, e.g. AlGaAs-laser, InP-based laser
    • H01S5/32308—Structure or shape of the active region; Materials used for the active region comprising PN junctions, e.g. hetero- or double- heterostructures in AIIIBV compounds, e.g. AlGaAs-laser, InP-based laser emitting light at a wavelength less than 900 nm
    • H01S5/32325—Structure or shape of the active region; Materials used for the active region comprising PN junctions, e.g. hetero- or double- heterostructures in AIIIBV compounds, e.g. AlGaAs-laser, InP-based laser emitting light at a wavelength less than 900 nm red laser based on InGaP
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/22—Diffusion of impurity materials, e.g. doping materials, electrode materials, into or out of a semiconductor body, or between semiconductor regions; Interactions between two or more impurities; Redistribution of impurities
    • H01L21/223—Diffusion of impurity materials, e.g. doping materials, electrode materials, into or out of a semiconductor body, or between semiconductor regions; Interactions between two or more impurities; Redistribution of impurities using diffusion into or out of a solid from or into a gaseous phase
    • H01L21/2233—Diffusion into or out of AIIIBV compounds
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00—Semiconductor lasers
    • H01S5/20—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers
    • H01S5/2054—Methods of obtaining the confinement
    • H01S5/2059—Methods of obtaining the confinement by means of particular conductivity zones, e.g. obtained by particle bombardment or diffusion
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00—Semiconductor lasers
    • H01S5/20—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers
    • H01S5/2054—Methods of obtaining the confinement
    • H01S5/2059—Methods of obtaining the confinement by means of particular conductivity zones, e.g. obtained by particle bombardment or diffusion
    • H01S5/2068—Methods of obtaining the confinement by means of particular conductivity zones, e.g. obtained by particle bombardment or diffusion obtained by radiation treatment or annealing
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00—Semiconductor lasers
    • H01S5/20—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers
    • H01S5/2054—Methods of obtaining the confinement
    • H01S5/2059—Methods of obtaining the confinement by means of particular conductivity zones, e.g. obtained by particle bombardment or diffusion
    • H01S5/2072—Methods of obtaining the confinement by means of particular conductivity zones, e.g. obtained by particle bombardment or diffusion obtained by vacancy induced diffusion
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00—Semiconductor lasers
    • H01S5/30—Structure or shape of the active region; Materials used for the active region
    • H01S5/305—Structure or shape of the active region; Materials used for the active region characterised by the doping materials used in the laser structure
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00—Semiconductor lasers
    • H01S5/30—Structure or shape of the active region; Materials used for the active region
    • H01S5/305—Structure or shape of the active region; Materials used for the active region characterised by the doping materials used in the laser structure
    • H01S5/3054—Structure or shape of the active region; Materials used for the active region characterised by the doping materials used in the laser structure p-doping
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00—Semiconductor lasers
    • H01S5/30—Structure or shape of the active region; Materials used for the active region
    • H01S5/305—Structure or shape of the active region; Materials used for the active region characterised by the doping materials used in the laser structure
    • H01S5/3072—Diffusion blocking layer, i.e. a special layer blocking diffusion of dopants
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00—Semiconductor lasers
    • H01S5/30—Structure or shape of the active region; Materials used for the active region
    • H01S5/32—Structure or shape of the active region; Materials used for the active region comprising PN junctions, e.g. hetero- or double- heterostructures
    • H01S5/3206—Structure or shape of the active region; Materials used for the active region comprising PN junctions, e.g. hetero- or double- heterostructures ordering or disordering the natural superlattice in ternary or quaternary materials
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00—Semiconductor lasers
    • H01S5/30—Structure or shape of the active region; Materials used for the active region
    • H01S5/32—Structure or shape of the active region; Materials used for the active region comprising PN junctions, e.g. hetero- or double- heterostructures
    • H01S5/3206—Structure or shape of the active region; Materials used for the active region comprising PN junctions, e.g. hetero- or double- heterostructures ordering or disordering the natural superlattice in ternary or quaternary materials
    • H01S5/3207—Structure or shape of the active region; Materials used for the active region comprising PN junctions, e.g. hetero- or double- heterostructures ordering or disordering the natural superlattice in ternary or quaternary materials ordered active layer

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Computer Hardware Design (AREA)
  • Manufacturing & Machinery (AREA)
  • Power Engineering (AREA)
  • Electromagnetism (AREA)
  • Optics & Photonics (AREA)
  • Semiconductor Lasers (AREA)
  • Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
JP2000177538A 1999-06-16 2000-06-13 ドープド半導体材料、ドープド半導体材料の製造方法、および半導体デバイス Withdrawn JP2001044569A (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
GB9913900A GB2351390A (en) 1999-06-16 1999-06-16 A semiconductor material comprising two dopants
GB9913900.8 1999-06-16

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2009020700A Division JP2009158964A (ja) 1999-06-16 2009-01-30 半導体材料および半導体デバイス

Publications (2)

Publication Number Publication Date
JP2001044569A true JP2001044569A (ja) 2001-02-16
JP2001044569A5 JP2001044569A5 (enExample) 2005-10-20

Family

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Family Applications (2)

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JP2000177538A Withdrawn JP2001044569A (ja) 1999-06-16 2000-06-13 ドープド半導体材料、ドープド半導体材料の製造方法、および半導体デバイス
JP2009020700A Pending JP2009158964A (ja) 1999-06-16 2009-01-30 半導体材料および半導体デバイス

Family Applications After (1)

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JP2009020700A Pending JP2009158964A (ja) 1999-06-16 2009-01-30 半導体材料および半導体デバイス

Country Status (4)

Country Link
US (2) US6426522B1 (enExample)
EP (1) EP1061563A3 (enExample)
JP (2) JP2001044569A (enExample)
GB (1) GB2351390A (enExample)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005203520A (ja) * 2004-01-14 2005-07-28 Sumitomo Electric Ind Ltd 半導体発光素子
JP2007507083A (ja) * 2003-06-27 2007-03-22 オスラム　オプト　セミコンダクターズ　ゲゼルシャフト　ミット　ベシュレンクテル　ハフツング 発光半導体素子
JP2019009169A (ja) * 2017-06-21 2019-01-17 国立研究開発法人情報通信研究機構 半導体光デバイス、半導体光源、光集積回路、及び半導体光デバイスの製造方法

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US6653213B2 (en) * 2000-12-21 2003-11-25 Bookham Technology, Plc Structure and method for doping of III-V compounds
JP4265875B2 (ja) * 2001-05-28 2009-05-20 日本オプネクスト株式会社 面発光半導体レーザの製造方法
US6750482B2 (en) * 2002-04-30 2004-06-15 Rf Micro Devices, Inc. Highly conductive semiconductor layer having two or more impurities
DE10262373B3 (de) * 2002-04-30 2013-01-17 Osram Opto Semiconductors Gmbh Strahlungsemittierendes Halbleiterbauelement mit Co-Dotierung
DE10219345B4 (de) * 2002-04-30 2011-05-19 Osram Opto Semiconductors Gmbh Strahlungsemittierendes Halbleiterbauelement mit Co-Dotierung
US7110629B2 (en) * 2002-07-22 2006-09-19 Applied Materials, Inc. Optical ready substrates
US7126052B2 (en) * 2002-10-02 2006-10-24 The Boeing Company Isoelectronic surfactant induced sublattice disordering in optoelectronic devices
US7122734B2 (en) * 2002-10-23 2006-10-17 The Boeing Company Isoelectronic surfactant suppression of threading dislocations in metamorphic epitaxial layers
KR20060026027A (ko) * 2003-05-29 2006-03-22 어플라이드 머티어리얼스, 인코포레이티드 광신호의 연속 라우팅
WO2004106987A2 (en) * 2003-05-29 2004-12-09 Applied Materials, Inc. Impurity-based waveguide detectors
US7075165B2 (en) * 2003-05-29 2006-07-11 Applied Material, Inc. Embedded waveguide detectors
US7205624B2 (en) * 2003-10-07 2007-04-17 Applied Materials, Inc. Self-aligned implanted waveguide detector
US20050214964A1 (en) * 2003-10-07 2005-09-29 Applied Materials, Inc. Patent Counsel, Legal Affairs Dept. Sige super lattice optical detectors
JP2005236024A (ja) * 2004-02-19 2005-09-02 Fuji Photo Film Co Ltd 半導体レーザ素子
US7172949B2 (en) * 2004-08-09 2007-02-06 Micron Technology, Inc. Epitaxial semiconductor layer and method
WO2007027615A1 (en) * 2005-09-01 2007-03-08 Applied Materials, Inc. Ridge technique for fabricating an optical detector and an optical waveguide
FR2898433B1 (fr) * 2006-03-08 2008-06-06 Commissariat Energie Atomique Procede de preparation d'un semi-conducteur.
DE102006013228A1 (de) * 2006-03-22 2007-09-27 Osram Opto Semiconductors Gmbh Optoelektronischer Halbleiterkörper
US9142714B2 (en) * 2008-10-09 2015-09-22 Nitek, Inc. High power ultraviolet light emitting diode with superlattice
CA2931227C (en) 2010-03-08 2019-05-14 Alliance For Sustainable Energy, Llc Boron, bismuth co-doping of gallium arsenide and other compounds for photonic and heterojunction bipolar transistor devices
US8575659B1 (en) 2011-08-13 2013-11-05 Hrl Laboratories, Llc Carbon-beryllium combinationally doped semiconductor
TWI597862B (zh) * 2013-08-30 2017-09-01 晶元光電股份有限公司 具阻障層的光電半導體元件
KR20160054712A (ko) * 2014-11-06 2016-05-17 삼성전자주식회사 반도체 발광소자 및 반도체 발광소자 패키지
TWI640648B (zh) * 2017-11-24 2018-11-11 行政院原子能委員會核能硏究所 以有機金屬化學氣相沉積法製作磷化銦鎵磊晶層的方法
US11228160B2 (en) * 2018-11-15 2022-01-18 Sharp Kabushiki Kaisha AlGaInPAs-based semiconductor laser device and method for producing same
DE102023117461A1 (de) * 2023-07-03 2025-01-09 Ams-Osram International Gmbh Halbleiterstruktur für ein halbleiterbauelement

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JP2007507083A (ja) * 2003-06-27 2007-03-22 オスラム　オプト　セミコンダクターズ　ゲゼルシャフト　ミット　ベシュレンクテル　ハフツング 発光半導体素子
KR101087803B1 (ko) * 2003-06-27 2011-11-29 오스람 옵토 세미컨덕터스 게엠베하 광방출 반도체소자
JP2005203520A (ja) * 2004-01-14 2005-07-28 Sumitomo Electric Ind Ltd 半導体発光素子
JP2019009169A (ja) * 2017-06-21 2019-01-17 国立研究開発法人情報通信研究機構 半導体光デバイス、半導体光源、光集積回路、及び半導体光デバイスの製造方法

Also Published As

Publication number Publication date
US6653248B2 (en) 2003-11-25
GB9913900D0 (en) 1999-08-18
GB2351390A (en) 2000-12-27
JP2009158964A (ja) 2009-07-16
US6426522B1 (en) 2002-07-30
EP1061563A2 (en) 2000-12-20
EP1061563A3 (en) 2003-01-02
US20020149030A1 (en) 2002-10-17

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