JP2000517095A5 - - Google Patents
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- Publication number
- JP2000517095A5 JP2000517095A5 JP1998511148A JP51114898A JP2000517095A5 JP 2000517095 A5 JP2000517095 A5 JP 2000517095A5 JP 1998511148 A JP1998511148 A JP 1998511148A JP 51114898 A JP51114898 A JP 51114898A JP 2000517095 A5 JP2000517095 A5 JP 2000517095A5
- Authority
- JP
- Japan
- Prior art keywords
- lens
- quadrupole
- magnetic field
- gap
- optical axis
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 230000003287 optical effect Effects 0.000 description 34
- 239000004020 conductor Substances 0.000 description 21
- 238000003384 imaging method Methods 0.000 description 12
- 239000002245 particle Substances 0.000 description 11
- 230000009471 action Effects 0.000 description 10
- 238000010894 electron beam technology Methods 0.000 description 7
- 238000004804 winding Methods 0.000 description 6
- 230000008901 benefit Effects 0.000 description 5
- 230000005684 electric field Effects 0.000 description 5
- 230000035699 permeability Effects 0.000 description 4
- 230000015572 biosynthetic process Effects 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
- 238000000034 method Methods 0.000 description 3
- 239000004065 semiconductor Substances 0.000 description 3
- 235000012431 wafers Nutrition 0.000 description 3
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
- 201000009310 astigmatism Diseases 0.000 description 2
- 230000008859 change Effects 0.000 description 2
- 238000000609 electron-beam lithography Methods 0.000 description 2
- 230000004907 flux Effects 0.000 description 2
- 238000010884 ion-beam technique Methods 0.000 description 2
- 230000006978 adaptation Effects 0.000 description 1
- 230000004075 alteration Effects 0.000 description 1
- 239000002800 charge carrier Substances 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 230000001419 dependent effect Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- 239000006185 dispersion Substances 0.000 description 1
- 230000005686 electrostatic field Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000007654 immersion Methods 0.000 description 1
- 238000002164 ion-beam lithography Methods 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 238000003754 machining Methods 0.000 description 1
- 238000012634 optical imaging Methods 0.000 description 1
- 230000008569 process Effects 0.000 description 1
- 230000007480 spreading Effects 0.000 description 1
- 238000003892 spreading Methods 0.000 description 1
- 230000002195 synergetic effect Effects 0.000 description 1
- 239000011800 void material Substances 0.000 description 1
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE19634456A DE19634456A1 (de) | 1996-08-26 | 1996-08-26 | Elektronenoptische Linsenanordnung mit spaltförmigem Öffnungsquerschnitt |
| DE19634456.5 | 1996-08-26 | ||
| PCT/DE1997/001588 WO1998009313A1 (de) | 1996-08-26 | 1997-07-23 | Elektronenoptische linsenanordnung mit spaltförmigem öffnungsquerschnitt |
Related Child Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2007187439A Division JP2007280966A (ja) | 1996-08-26 | 2007-07-18 | 電子光学レンズ装置 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2000517095A JP2000517095A (ja) | 2000-12-19 |
| JP2000517095A5 true JP2000517095A5 (enExample) | 2007-09-06 |
| JP4023556B2 JP4023556B2 (ja) | 2007-12-19 |
Family
ID=7803724
Family Applications (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP51114898A Expired - Fee Related JP4023556B2 (ja) | 1996-08-26 | 1997-07-23 | 間隙状の開孔横断面を有している電子光学レンズ装置 |
| JP2007187439A Pending JP2007280966A (ja) | 1996-08-26 | 2007-07-18 | 電子光学レンズ装置 |
Family Applications After (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2007187439A Pending JP2007280966A (ja) | 1996-08-26 | 2007-07-18 | 電子光学レンズ装置 |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US6414319B1 (enExample) |
| EP (1) | EP0920709B1 (enExample) |
| JP (2) | JP4023556B2 (enExample) |
| DE (2) | DE19634456A1 (enExample) |
| ES (1) | ES2147015T3 (enExample) |
| WO (1) | WO1998009313A1 (enExample) |
Families Citing this family (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE19944857A1 (de) * | 1999-09-18 | 2001-03-22 | Ceos Gmbh | Elektronenoptische Linsenanordnung mit weit verschiebbarer Achse |
| DE60134922D1 (de) * | 2000-08-14 | 2008-09-04 | Elith Llc | Lithographischer Apparat |
| TW579536B (en) | 2001-07-02 | 2004-03-11 | Zeiss Carl Semiconductor Mfg | Examining system for the particle-optical imaging of an object, deflector for charged particles as well as method for the operation of the same |
| DE10136190A1 (de) * | 2001-07-25 | 2003-02-06 | Ceos Gmbh | Schlitzlinsenanordnung für Teilchenstrahlen |
| DE10161680A1 (de) * | 2001-12-14 | 2003-06-26 | Ceos Gmbh | Linsenanordnung mit lateral verschiebbarer optischer Achse für Teilchenstrahlen |
| US8519353B2 (en) * | 2010-12-29 | 2013-08-27 | Varian Semiconductor Equipment Associates, Inc. | Method and apparatus for controlling an asymmetric electrostatic lens about a central ray trajectory of an ion beam |
| TWI506666B (zh) * | 2014-08-08 | 2015-11-01 | Nat Univ Tsing Hua | 桌上型電子顯微鏡及其複合多極－聚焦可調式磁透鏡 |
| US10290463B2 (en) * | 2017-04-27 | 2019-05-14 | Imatrex, Inc. | Compact deflecting magnet |
Family Cites Families (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| SU705699A2 (ru) | 1976-05-03 | 1979-12-25 | Орденов Ленина И Трудового Красного Знамени Институт Электросварки Им. Е.О.Патона | Установка дл электроннолучевого нагрева материалов |
| DE2623337A1 (de) | 1976-05-25 | 1977-12-08 | Steigerwald Strahltech | Elektronenoptische magnetische zylinderlinse |
| GB2115976A (en) * | 1982-02-26 | 1983-09-14 | Philips Electronic Associated | Charged particle beam apparatus |
| DE3235068A1 (de) * | 1982-09-22 | 1984-03-22 | Siemens AG, 1000 Berlin und 8000 München | Varioformstrahl-ablenkobjektiv fuer neutralteilchen und verfahren zu seinem betrieb |
| US4789787A (en) * | 1987-05-27 | 1988-12-06 | Microbeam Inc. | Wien filter design |
| US4958078A (en) * | 1989-01-05 | 1990-09-18 | The University Of Michigan | Large aperture ion-optical lens system |
| FR2644930B1 (fr) * | 1989-03-21 | 1996-04-26 | Cameca | Lentille electromagnetique composite a focale variable |
| US4962309A (en) * | 1989-08-21 | 1990-10-09 | Rockwell International Corporation | Magnetic optics adaptive technique |
| DE4105121A1 (de) | 1991-02-19 | 1992-08-20 | Siemens Ag | Teilchenoptische einheit zur abbildung eines linienfoermigen objektes |
-
1996
- 1996-08-26 DE DE19634456A patent/DE19634456A1/de not_active Withdrawn
-
1997
- 1997-07-23 EP EP97935493A patent/EP0920709B1/de not_active Expired - Lifetime
- 1997-07-23 JP JP51114898A patent/JP4023556B2/ja not_active Expired - Fee Related
- 1997-07-23 ES ES97935493T patent/ES2147015T3/es not_active Expired - Lifetime
- 1997-07-23 US US09/242,431 patent/US6414319B1/en not_active Expired - Lifetime
- 1997-07-23 WO PCT/DE1997/001588 patent/WO1998009313A1/de not_active Ceased
- 1997-07-23 DE DE59701195T patent/DE59701195D1/de not_active Expired - Fee Related
-
2007
- 2007-07-18 JP JP2007187439A patent/JP2007280966A/ja active Pending
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