ES2147015T3 - Sistema de lentes optico-electronicas por una seccion de apertura en forma de hendidura. - Google Patents
Sistema de lentes optico-electronicas por una seccion de apertura en forma de hendidura.Info
- Publication number
- ES2147015T3 ES2147015T3 ES97935493T ES97935493T ES2147015T3 ES 2147015 T3 ES2147015 T3 ES 2147015T3 ES 97935493 T ES97935493 T ES 97935493T ES 97935493 T ES97935493 T ES 97935493T ES 2147015 T3 ES2147015 T3 ES 2147015T3
- Authority
- ES
- Spain
- Prior art keywords
- lens
- opening
- pole
- optical axis
- cylindrical
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- SQEHCNOBYLQFTG-UHFFFAOYSA-M lithium;thiophene-2-carboxylate Chemical class [Li+].[O-]C(=O)C1=CC=CS1 SQEHCNOBYLQFTG-UHFFFAOYSA-M 0.000 title 1
- 230000003287 optical effect Effects 0.000 abstract 3
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
- H01J37/10—Lenses
- H01J37/145—Combinations of electrostatic and magnetic lenses
Landscapes
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Electron Beam Exposure (AREA)
- Microscoopes, Condenser (AREA)
Abstract
LA INVENCION SE REFIERE A UN SISTEMA DE LENTES, EN PARTICULAR PARA ENFOQUE DE ELECTRONES, CON UNA LENTE CILINDRICA QUE DISPONE DE PIEZAS POLARES O ELECTRODOS, ENTRE LAS CALES ESTA LOCALIZADA UNA ABERTURA. ESTA ABERTURA TIENE UNA SECCION TRANSVERSAL CON PERFIL DE RANURA PERPENDICULARMENTE AL EJE OPTICO DE LA LENTE. LA LENTE (4) CILINDRICA ESTA COMBINADA CON UNA LENTE (1) MAGNETICA CON LA CUAL PUEDE SER PRODUCIDO UN CAMPO DE CUATRO POLOS. LAS LENTES ESTAN DISPUESTAS CON PEQUEÑA DISTANCIA O SIN DISTANCIA ENTRE ELLAS Y SUS EJES OPTICOS DISCURREN PARALELAMENTE UNO CON RESPECTO A OTRO. LAS LENTES (1) DE CUATRO POLOS TIENEN UNA ABERTURA (10) CON PERFIL DE RANURA, QUE ESTA ORIENTADA PARALELAMENTE A LA ABERTURA (9-11) DE LA LENTE (4) CILINDRICA. EL PLANO DE ENFOQUE DE LA LENTE (1) DE CUATRO POLOS, QUE COMPRENDE EL EJE (19) OPTICO, ESTA ORIENTADA PARALELAMENTE AL EJE LONGITUDINAL DE LAS ABERTURAS (9-11) Y SU PLANO DE DESENFOQUE ES PERPENDICULAR A LOS EJES LONGITUDINALES. LA POTENCIA REFRACTIVA DE LALENTE (4) CILINDRICA PUEDE SER AJUSTADA EN UN VALOR DOBLE EN COMPARACION A LA LENTE (1) DE CUATRO POLOS.
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE19634456A DE19634456A1 (de) | 1996-08-26 | 1996-08-26 | Elektronenoptische Linsenanordnung mit spaltförmigem Öffnungsquerschnitt |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| ES2147015T3 true ES2147015T3 (es) | 2000-08-16 |
Family
ID=7803724
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| ES97935493T Expired - Lifetime ES2147015T3 (es) | 1996-08-26 | 1997-07-23 | Sistema de lentes optico-electronicas por una seccion de apertura en forma de hendidura. |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US6414319B1 (es) |
| EP (1) | EP0920709B1 (es) |
| JP (2) | JP4023556B2 (es) |
| DE (2) | DE19634456A1 (es) |
| ES (1) | ES2147015T3 (es) |
| WO (1) | WO1998009313A1 (es) |
Families Citing this family (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE19944857A1 (de) * | 1999-09-18 | 2001-03-22 | Ceos Gmbh | Elektronenoptische Linsenanordnung mit weit verschiebbarer Achse |
| DE60134922D1 (de) * | 2000-08-14 | 2008-09-04 | Elith Llc | Lithographischer Apparat |
| TW579536B (en) | 2001-07-02 | 2004-03-11 | Zeiss Carl Semiconductor Mfg | Examining system for the particle-optical imaging of an object, deflector for charged particles as well as method for the operation of the same |
| DE10136190A1 (de) * | 2001-07-25 | 2003-02-06 | Ceos Gmbh | Schlitzlinsenanordnung für Teilchenstrahlen |
| DE10161680A1 (de) * | 2001-12-14 | 2003-06-26 | Ceos Gmbh | Linsenanordnung mit lateral verschiebbarer optischer Achse für Teilchenstrahlen |
| US8519353B2 (en) | 2010-12-29 | 2013-08-27 | Varian Semiconductor Equipment Associates, Inc. | Method and apparatus for controlling an asymmetric electrostatic lens about a central ray trajectory of an ion beam |
| TWI506666B (zh) * | 2014-08-08 | 2015-11-01 | Nat Univ Tsing Hua | 桌上型電子顯微鏡及其複合多極-聚焦可調式磁透鏡 |
| US10290463B2 (en) * | 2017-04-27 | 2019-05-14 | Imatrex, Inc. | Compact deflecting magnet |
Family Cites Families (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| SU705699A2 (ru) * | 1976-05-03 | 1979-12-25 | Орденов Ленина И Трудового Красного Знамени Институт Электросварки Им. Е.О.Патона | Установка дл электроннолучевого нагрева материалов |
| DE2623337A1 (de) * | 1976-05-25 | 1977-12-08 | Steigerwald Strahltech | Elektronenoptische magnetische zylinderlinse |
| GB2115976A (en) * | 1982-02-26 | 1983-09-14 | Philips Electronic Associated | Charged particle beam apparatus |
| DE3235068A1 (de) * | 1982-09-22 | 1984-03-22 | Siemens AG, 1000 Berlin und 8000 München | Varioformstrahl-ablenkobjektiv fuer neutralteilchen und verfahren zu seinem betrieb |
| US4789787A (en) * | 1987-05-27 | 1988-12-06 | Microbeam Inc. | Wien filter design |
| US4958078A (en) * | 1989-01-05 | 1990-09-18 | The University Of Michigan | Large aperture ion-optical lens system |
| FR2644930B1 (fr) * | 1989-03-21 | 1996-04-26 | Cameca | Lentille electromagnetique composite a focale variable |
| US4962309A (en) * | 1989-08-21 | 1990-10-09 | Rockwell International Corporation | Magnetic optics adaptive technique |
| DE4105121A1 (de) * | 1991-02-19 | 1992-08-20 | Siemens Ag | Teilchenoptische einheit zur abbildung eines linienfoermigen objektes |
-
1996
- 1996-08-26 DE DE19634456A patent/DE19634456A1/de not_active Withdrawn
-
1997
- 1997-07-23 DE DE59701195T patent/DE59701195D1/de not_active Expired - Fee Related
- 1997-07-23 US US09/242,431 patent/US6414319B1/en not_active Expired - Lifetime
- 1997-07-23 EP EP97935493A patent/EP0920709B1/de not_active Expired - Lifetime
- 1997-07-23 JP JP51114898A patent/JP4023556B2/ja not_active Expired - Fee Related
- 1997-07-23 WO PCT/DE1997/001588 patent/WO1998009313A1/de not_active Ceased
- 1997-07-23 ES ES97935493T patent/ES2147015T3/es not_active Expired - Lifetime
-
2007
- 2007-07-18 JP JP2007187439A patent/JP2007280966A/ja active Pending
Also Published As
| Publication number | Publication date |
|---|---|
| DE19634456A1 (de) | 1998-03-05 |
| JP2007280966A (ja) | 2007-10-25 |
| EP0920709A1 (de) | 1999-06-09 |
| JP4023556B2 (ja) | 2007-12-19 |
| US6414319B1 (en) | 2002-07-02 |
| EP0920709B1 (de) | 2000-03-01 |
| DE59701195D1 (de) | 2000-04-06 |
| JP2000517095A (ja) | 2000-12-19 |
| WO1998009313A1 (de) | 1998-03-05 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| FG2A | Definitive protection |
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