WO2003104897A3 - Objektiv, insbesondere projektionsobjektiv für die mikrolithographie - Google Patents
Objektiv, insbesondere projektionsobjektiv für die mikrolithographie Download PDFInfo
- Publication number
- WO2003104897A3 WO2003104897A3 PCT/EP2003/004772 EP0304772W WO03104897A3 WO 2003104897 A3 WO2003104897 A3 WO 2003104897A3 EP 0304772 W EP0304772 W EP 0304772W WO 03104897 A3 WO03104897 A3 WO 03104897A3
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- objective
- microlithography
- projection
- splitting element
- beam splitting
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B17/00—Systems with reflecting surfaces, with or without refracting elements
- G02B17/08—Catadioptric systems
- G02B17/0892—Catadioptric systems specially adapted for the UV
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B17/00—Systems with reflecting surfaces, with or without refracting elements
- G02B17/08—Catadioptric systems
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
- G02B27/0025—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for optical correction, e.g. distorsion, aberration
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
- G02B27/10—Beam splitting or combining systems
- G02B27/14—Beam splitting or combining systems operating by reflection only
- G02B27/144—Beam splitting or combining systems operating by reflection only using partially transparent surfaces without spectral selectivity
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B7/00—Mountings, adjusting means, or light-tight connections, for optical elements
- G02B7/18—Mountings, adjusting means, or light-tight connections, for optical elements for prisms; for mirrors
- G02B7/1805—Mountings, adjusting means, or light-tight connections, for optical elements for prisms; for mirrors for prisms
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70225—Optical aspects of catadioptric systems, i.e. comprising reflective and refractive elements
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70258—Projection system adjustments, e.g. adjustments during exposure or alignment during assembly of projection system
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Lenses (AREA)
Abstract
Ein Objektiv ist mit mehreren in einem Objektivgehäuse (1) eingesetzten Linsen, Spiegeln und wenigstens einem Strahlenteilerelement (20) versehen. Ein oder mehrere im Strahlengang liegende Flächen (26, 27, 28) des Strahlenteilerelements (20) sind als Korrekturasphären vorgesehen. Das Strahlenteilerelement (20) kann mit Manipulatoren (22) versehen sein, die auf einem Manipulatorträger (23) angeordnet sind, welcher feststehend mit dem Objektivgehäuse verbunden ist.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US10/517,265 US20050286121A1 (en) | 2002-06-07 | 2003-05-07 | Objective, especially a projection objective for microlithography |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE10225265.3 | 2002-06-07 | ||
DE10225265A DE10225265A1 (de) | 2002-06-07 | 2002-06-07 | Objektiv, insbesondere Projektionsobjektiv für die Mikrolithographie |
Publications (2)
Publication Number | Publication Date |
---|---|
WO2003104897A2 WO2003104897A2 (de) | 2003-12-18 |
WO2003104897A3 true WO2003104897A3 (de) | 2004-03-04 |
Family
ID=29557619
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/EP2003/004772 WO2003104897A2 (de) | 2002-06-07 | 2003-05-07 | Objektiv, insbesondere projektionsobjektiv für die mikrolithographie |
Country Status (4)
Country | Link |
---|---|
US (1) | US20050286121A1 (de) |
DE (1) | DE10225265A1 (de) |
TW (1) | TW200401120A (de) |
WO (1) | WO2003104897A2 (de) |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7800849B2 (en) | 2004-12-28 | 2010-09-21 | Carl Zeiss Smt Ag | Apparatus for mounting two or more elements and method for processing the surface of an optical element |
CN101479667B (zh) | 2006-07-03 | 2011-12-07 | 卡尔蔡司Smt有限责任公司 | 修正/修复光刻投影物镜的方法 |
CN101548240B (zh) * | 2006-12-01 | 2014-09-17 | 卡尔蔡司Smt有限责任公司 | 具有用于减小像差的可替换、可操纵的校正布置的光学系统 |
DE102007009867A1 (de) * | 2007-02-28 | 2008-09-11 | Carl Zeiss Smt Ag | Abbildungsvorrichtung mit auswechselbaren Blenden sowie Verfahren hierzu |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5771125A (en) * | 1996-06-14 | 1998-06-23 | Nikon Corporation | Catadioptric system for photolithography |
EP0869383A2 (de) * | 1997-04-01 | 1998-10-07 | Nikon Corporation | Katadioptrisches optisches System |
EP1122608A2 (de) * | 2000-02-05 | 2001-08-08 | Carl Zeiss | Projektionsbelichtungsanlage mit reflektivem Retikel |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP3893626B2 (ja) * | 1995-01-25 | 2007-03-14 | 株式会社ニコン | 投影光学装置の調整方法、投影光学装置、露光装置及び露光方法 |
JPH09167731A (ja) * | 1995-12-14 | 1997-06-24 | Mitsubishi Electric Corp | 投影露光装置、収差評価用マスクパタン、収差量評価方法、収差除去フィルター及び半導体装置の製造方法 |
US6157498A (en) * | 1996-06-19 | 2000-12-05 | Nikon Corporation | Dual-imaging optical system |
US20040042094A1 (en) * | 2000-12-28 | 2004-03-04 | Tomoyuki Matsuyama | Projection optical system and production method therefor, exposure system and production method therefor, and production method for microdevice |
-
2002
- 2002-06-07 DE DE10225265A patent/DE10225265A1/de not_active Withdrawn
-
2003
- 2003-05-07 US US10/517,265 patent/US20050286121A1/en not_active Abandoned
- 2003-05-07 WO PCT/EP2003/004772 patent/WO2003104897A2/de not_active Application Discontinuation
- 2003-06-05 TW TW092115213A patent/TW200401120A/zh unknown
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5771125A (en) * | 1996-06-14 | 1998-06-23 | Nikon Corporation | Catadioptric system for photolithography |
EP0869383A2 (de) * | 1997-04-01 | 1998-10-07 | Nikon Corporation | Katadioptrisches optisches System |
EP1122608A2 (de) * | 2000-02-05 | 2001-08-08 | Carl Zeiss | Projektionsbelichtungsanlage mit reflektivem Retikel |
Also Published As
Publication number | Publication date |
---|---|
US20050286121A1 (en) | 2005-12-29 |
WO2003104897A2 (de) | 2003-12-18 |
DE10225265A1 (de) | 2003-12-18 |
TW200401120A (en) | 2004-01-16 |
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