JP2000515035A - 半導体センサモジュールを用いた滅菌プロセスのモニタリングおよび制御 - Google Patents
半導体センサモジュールを用いた滅菌プロセスのモニタリングおよび制御Info
- Publication number
- JP2000515035A JP2000515035A JP10504511A JP50451198A JP2000515035A JP 2000515035 A JP2000515035 A JP 2000515035A JP 10504511 A JP10504511 A JP 10504511A JP 50451198 A JP50451198 A JP 50451198A JP 2000515035 A JP2000515035 A JP 2000515035A
- Authority
- JP
- Japan
- Prior art keywords
- sterilant
- concentration
- baseline
- sensing element
- sterilization
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
- 230000001954 sterilising effect Effects 0.000 title claims abstract description 80
- 238000004659 sterilization and disinfection Methods 0.000 title claims abstract description 80
- 239000004065 semiconductor Substances 0.000 title claims abstract description 23
- 238000000034 method Methods 0.000 title claims description 24
- 238000012544 monitoring process Methods 0.000 title claims description 16
- 230000007613 environmental effect Effects 0.000 claims abstract description 42
- 239000000126 substance Substances 0.000 claims abstract description 16
- 239000000203 mixture Substances 0.000 claims abstract description 5
- 230000001590 oxidative effect Effects 0.000 claims abstract description 4
- 239000007800 oxidant agent Substances 0.000 claims abstract description 3
- 239000007789 gas Substances 0.000 claims description 34
- MHAJPDPJQMAIIY-UHFFFAOYSA-N Hydrogen peroxide Chemical compound OO MHAJPDPJQMAIIY-UHFFFAOYSA-N 0.000 claims description 32
- 239000007788 liquid Substances 0.000 claims description 28
- IAYPIBMASNFSPL-UHFFFAOYSA-N Ethylene oxide Chemical group C1CO1 IAYPIBMASNFSPL-UHFFFAOYSA-N 0.000 claims description 9
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 claims description 8
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 claims description 4
- SXRSQZLOMIGNAQ-UHFFFAOYSA-N Glutaraldehyde Chemical compound O=CCCCC=O SXRSQZLOMIGNAQ-UHFFFAOYSA-N 0.000 claims description 4
- 229910021529 ammonia Inorganic materials 0.000 claims description 4
- WSFSSNUMVMOOMR-NJFSPNSNSA-N methanone Chemical compound O=[14CH2] WSFSSNUMVMOOMR-NJFSPNSNSA-N 0.000 claims description 4
- -1 peroxide compound Chemical class 0.000 claims description 4
- 150000001875 compounds Chemical class 0.000 claims description 3
- WSFSSNUMVMOOMR-UHFFFAOYSA-N Formaldehyde Chemical compound O=C WSFSSNUMVMOOMR-UHFFFAOYSA-N 0.000 claims 6
- CBENFWSGALASAD-UHFFFAOYSA-N Ozone Chemical compound [O-][O+]=O CBENFWSGALASAD-UHFFFAOYSA-N 0.000 claims 2
- 238000005502 peroxidation Methods 0.000 claims 2
- 230000036651 mood Effects 0.000 claims 1
- 239000007787 solid Substances 0.000 abstract 1
- 238000000746 purification Methods 0.000 description 7
- 239000000523 sample Substances 0.000 description 6
- 238000004891 communication Methods 0.000 description 5
- 239000012530 fluid Substances 0.000 description 5
- 238000004886 process control Methods 0.000 description 5
- 238000012545 processing Methods 0.000 description 5
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 description 4
- 238000005259 measurement Methods 0.000 description 4
- 238000005273 aeration Methods 0.000 description 3
- 238000004140 cleaning Methods 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 238000005516 engineering process Methods 0.000 description 3
- MWUXSHHQAYIFBG-UHFFFAOYSA-N nitrogen oxide Inorganic materials O=[N] MWUXSHHQAYIFBG-UHFFFAOYSA-N 0.000 description 3
- UGFAIRIUMAVXCW-UHFFFAOYSA-N Carbon monoxide Chemical compound [O+]#[C-] UGFAIRIUMAVXCW-UHFFFAOYSA-N 0.000 description 2
- KFSLWBXXFJQRDL-UHFFFAOYSA-N Peracetic acid Chemical compound CC(=O)OO KFSLWBXXFJQRDL-UHFFFAOYSA-N 0.000 description 2
- 230000005540 biological transmission Effects 0.000 description 2
- 229910002092 carbon dioxide Inorganic materials 0.000 description 2
- 239000001569 carbon dioxide Substances 0.000 description 2
- 229910002091 carbon monoxide Inorganic materials 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 230000036512 infertility Effects 0.000 description 2
- 239000011159 matrix material Substances 0.000 description 2
- 238000010926 purge Methods 0.000 description 2
- 238000005070 sampling Methods 0.000 description 2
- 230000035945 sensitivity Effects 0.000 description 2
- 238000009423 ventilation Methods 0.000 description 2
- 238000004497 NIR spectroscopy Methods 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- 238000004887 air purification Methods 0.000 description 1
- 150000001298 alcohols Chemical class 0.000 description 1
- 150000001335 aliphatic alkanes Chemical class 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 238000004364 calculation method Methods 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 238000002485 combustion reaction Methods 0.000 description 1
- 238000009833 condensation Methods 0.000 description 1
- 230000005494 condensation Effects 0.000 description 1
- 238000013500 data storage Methods 0.000 description 1
- 238000001514 detection method Methods 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 210000005069 ears Anatomy 0.000 description 1
- 239000002360 explosive Substances 0.000 description 1
- 238000001914 filtration Methods 0.000 description 1
- 229930195733 hydrocarbon Natural products 0.000 description 1
- 150000002430 hydrocarbons Chemical class 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 125000004435 hydrogen atom Chemical class [H]* 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 150000002978 peroxides Chemical class 0.000 description 1
- 238000004088 simulation Methods 0.000 description 1
- 238000001179 sorption measurement Methods 0.000 description 1
- 231100000331 toxic Toxicity 0.000 description 1
- 230000002588 toxic effect Effects 0.000 description 1
- 238000009834 vaporization Methods 0.000 description 1
- 230000008016 vaporization Effects 0.000 description 1
- 239000006200 vaporizer Substances 0.000 description 1
- 230000000007 visual effect Effects 0.000 description 1
Classifications
-
- A—HUMAN NECESSITIES
- A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
- A61L—METHODS OR APPARATUS FOR STERILISING MATERIALS OR OBJECTS IN GENERAL; DISINFECTION, STERILISATION OR DEODORISATION OF AIR; CHEMICAL ASPECTS OF BANDAGES, DRESSINGS, ABSORBENT PADS OR SURGICAL ARTICLES; MATERIALS FOR BANDAGES, DRESSINGS, ABSORBENT PADS OR SURGICAL ARTICLES
- A61L2/00—Methods or apparatus for disinfecting or sterilising materials or objects other than foodstuffs or contact lenses; Accessories therefor
- A61L2/24—Apparatus using programmed or automatic operation
-
- A—HUMAN NECESSITIES
- A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
- A61L—METHODS OR APPARATUS FOR STERILISING MATERIALS OR OBJECTS IN GENERAL; DISINFECTION, STERILISATION OR DEODORISATION OF AIR; CHEMICAL ASPECTS OF BANDAGES, DRESSINGS, ABSORBENT PADS OR SURGICAL ARTICLES; MATERIALS FOR BANDAGES, DRESSINGS, ABSORBENT PADS OR SURGICAL ARTICLES
- A61L2/00—Methods or apparatus for disinfecting or sterilising materials or objects other than foodstuffs or contact lenses; Accessories therefor
- A61L2/26—Accessories or devices or components used for biocidal treatment
- A61L2/28—Devices for testing the effectiveness or completeness of sterilisation, e.g. indicators which change colour
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N33/00—Investigating or analysing materials by specific methods not covered by groups G01N1/00 - G01N31/00
- G01N33/0004—Gaseous mixtures, e.g. polluted air
- G01N33/0009—General constructional details of gas analysers, e.g. portable test equipment
- G01N33/0027—General constructional details of gas analysers, e.g. portable test equipment concerning the detector
- G01N33/0036—General constructional details of gas analysers, e.g. portable test equipment concerning the detector specially adapted to detect a particular component
Landscapes
- Health & Medical Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- General Health & Medical Sciences (AREA)
- Epidemiology (AREA)
- Animal Behavior & Ethology (AREA)
- Public Health (AREA)
- Veterinary Medicine (AREA)
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Food Science & Technology (AREA)
- Combustion & Propulsion (AREA)
- Medicinal Chemistry (AREA)
- Physics & Mathematics (AREA)
- Analytical Chemistry (AREA)
- Biochemistry (AREA)
- General Physics & Mathematics (AREA)
- Immunology (AREA)
- Pathology (AREA)
- Apparatus For Disinfection Or Sterilisation (AREA)
- Investigating Or Analyzing Materials By The Use Of Electric Means (AREA)
Abstract
Description
Claims (1)
- 【特許請求の範囲】 1.滅菌チャンバと、化学滅菌剤を該チャンバ内に導入する手段と、該チャンバ から滅菌剤を除去する手段と、該滅菌剤導入手段および該滅菌剤除去手段を制御 するプロセスコントローラとを備えた滅菌システムであって、 該チャンバ内に配置される感知素子であって、該滅菌剤の濃度に従って変化す る電気的特性を有する感知素子と、 該感知素子に接続される受信ユニットであって、環境パラメータ値の第1の組 における該滅菌剤のベースライン濃度に対応するベースライン電気的特性値を格 納し、該環境パラメータ値の第1の組における該滅菌剤のリアルタイムな濃度の 指標としての該ベースライン電気的特性に対する該感知素子の該電気的特性のリ アルタイムな変化を検出する受信ユニットと、 該滅菌装置コントローラが、該リアルタイム濃度値をベースライン滅菌剤濃度 範囲と比較して、該比較に基づいて該チャンバ中の滅菌剤の濃度を制御するとと もに、滅菌サイクル中の該環境パラメータ値の組の環境パラメータをモニタリン グし、モニタリングした環境パラメータの値の変化に応答して、該変化した環境 パラメータ値の組に対応する新しいベースライン電気的特性値を該受信ユニット に格納させることと、 を特徴とする、システム。 2.前記感知素子が半導体素子であることをさらに特徴とする、請求項1に記載 のシステム。 3.前記電気的特性がキャパシタンスおよび抵抗の1つを含むことをさらに特徴 とする、 上記請求項1および2のいずれかに記載のシステム。 4.前記滅菌剤が、酸化エチレン気体、液体過酸化水素、過酸化水素気体、液体 ホルムアルデヒド、ホルムアルデヒド気体、液体過酸化化合物、気体状過酸化化 合物、オゾン、アルコール、グルタルアルデヒド、アンモニア、およびこれらの 混合物からなる群より選択されることをさらに特徴とする、 上記請求項1から3のいずれかに記載のシステム。 5.前記チャンバの外部に配置され、該チャンバの外側の滅菌剤濃度を感知する 第2の感知素子であって、前記滅菌装置制御部に接続される該第2の感知素子、 をさらに特徴とする、上記請求項1から4のいずれかに記載のシステム。 6.前記感知素子の交換を容易にするために、該感知素子が前記滅菌チャンバか ら取外し可能になっていることをさらに特徴とする、 上記請求項1から5のいずれかに記載のシステム。 7.液体または気体状の化学滅菌剤を滅菌チャンバに導入し、該滅菌剤を滅菌チ ャンバから除去する滅菌方法であって、 該滅菌剤の濃度を、該化学滅菌剤の濃度とともに変化する電気的特性を有する 感知素子で感知する工程と、 環境パラメータ値の第1の組におけるベースライン電気的特性値を格納するこ とによって、該滅菌剤のベースライン濃度を確立する工程と、 滅菌中に該環境パラメータ値をモニタリングし、モニタリングした環境パラメ ータ値の変化に応答して、該ベースライン電気的特性値を新しいベースライン電 気的特性値に変更する工程と、 該ベースライン特性値に対する該電気的特性の変化をリアルタイムでモニタリ ングし、これにより、該滅菌剤のリアルタイム濃度を決定する工程と、 該モニタリングした該滅菌剤のリアルタイム濃度に従って、該チャンバ中の該 滅菌剤濃度をリアルタイムで制御する工程と、 を特徴とする、方法。 8.前記環境パラメータ値は、温度、圧力、相対湿度、空気流速、酸化物質濃度 、およびこれらの組合せの少なくとも1つを含むことを特徴とする、 請求項7に記載の方法。 9.前記滅菌剤が、酸化エチレン気体、液体過酸化水素、過酸化水素気体、液体 ホルムアルデヒド、ホルムアルデヒド気体、液体過酸化化合物、気体状過酸化化 合物、オゾン、アルコール、グルタルアルデヒド、アンモニア、およびこれらの 混合物から本質的に構成される群より選択されることをさらに特徴とする、 上記請求項7および8のいずれかに記載の方法。 10.前記電気的特性が定電位特性であることをさらに特徴とする、 上記請求項7、8および9のいずれかに記載の方法。 11.前記環境パラメータの少なくとも1つをモニタリングする工程と、 該モニタリングした環境パラメータの1つの変化に応答して、新しいベースラ イン電気的特性を確立する工程と、 をさらに特徴とする、上記請求項7、8、9および10のいずれかに記載の方法 。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US08/675,743 | 1996-07-03 | ||
US08/675,743 US5882590A (en) | 1996-07-03 | 1996-07-03 | Monitoring and control of sterilization processes with semiconductor sensor modules |
PCT/US1997/011753 WO1998000176A1 (en) | 1996-07-03 | 1997-07-02 | Monitoring and control of sterilization processes with semiconductor sensor modules |
Related Child Applications (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2007234658A Division JP2008055179A (ja) | 1996-07-03 | 2007-09-10 | 半導体センサモジュールを用いた滅菌プロセスのモニタリングおよび制御 |
JP2007234657A Division JP4088662B2 (ja) | 1996-07-03 | 2007-09-10 | 半導体センサモジュールを用いた滅菌プロセスのモニタリングおよび制御 |
Publications (1)
Publication Number | Publication Date |
---|---|
JP2000515035A true JP2000515035A (ja) | 2000-11-14 |
Family
ID=24711794
Family Applications (3)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP10504511A Withdrawn JP2000515035A (ja) | 1996-07-03 | 1997-07-02 | 半導体センサモジュールを用いた滅菌プロセスのモニタリングおよび制御 |
JP2007234658A Withdrawn JP2008055179A (ja) | 1996-07-03 | 2007-09-10 | 半導体センサモジュールを用いた滅菌プロセスのモニタリングおよび制御 |
JP2007234657A Expired - Lifetime JP4088662B2 (ja) | 1996-07-03 | 2007-09-10 | 半導体センサモジュールを用いた滅菌プロセスのモニタリングおよび制御 |
Family Applications After (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2007234658A Withdrawn JP2008055179A (ja) | 1996-07-03 | 2007-09-10 | 半導体センサモジュールを用いた滅菌プロセスのモニタリングおよび制御 |
JP2007234657A Expired - Lifetime JP4088662B2 (ja) | 1996-07-03 | 2007-09-10 | 半導体センサモジュールを用いた滅菌プロセスのモニタリングおよび制御 |
Country Status (7)
Country | Link |
---|---|
US (1) | US5882590A (ja) |
EP (1) | EP0969881B1 (ja) |
JP (3) | JP2000515035A (ja) |
AU (1) | AU3515897A (ja) |
DE (1) | DE69708688T2 (ja) |
TW (1) | TW358155B (ja) |
WO (1) | WO1998000176A1 (ja) |
Cited By (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2003505303A (ja) * | 1999-07-26 | 2003-02-12 | アボット・ラボラトリーズ | 滅菌剤モニタリングアセンブリおよび装置 |
JP2003521710A (ja) * | 2000-02-07 | 2003-07-15 | ステリス インコーポレイテッド | パルス電流測定法を用いる水溶液中の過酢酸の特異的検出のための電気化学的センサー |
JP2007256131A (ja) * | 2006-03-24 | 2007-10-04 | Tokaseiki Co Ltd | 燻蒸ガス濃度測定装置 |
JP2008504515A (ja) * | 2004-06-18 | 2008-02-14 | アメリカン ステリライザー カンパニー | 蒸気の純度および/または品質をモニターする方法および装置 |
JP2008188043A (ja) * | 2007-01-31 | 2008-08-21 | Ihi Shibaura Machinery Corp | 殺菌ガス浸透装置 |
JP2011218094A (ja) * | 2010-04-14 | 2011-11-04 | Tamura Teco:Kk | オゾン滅菌試験装置 |
JP2012035013A (ja) * | 2010-08-11 | 2012-02-23 | Miura Co Ltd | ガス滅菌装置 |
WO2023119757A1 (ja) * | 2021-12-24 | 2023-06-29 | ニッタ株式会社 | 除染強度センサ、除染システム、除染強度の検出方法、除染強度の検出プログラム |
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US6156267A (en) * | 1996-02-16 | 2000-12-05 | Steris Corporation | Apparatus and method for real-time monitoring and control of anti-microbial processing |
US6394111B1 (en) | 1997-06-11 | 2002-05-28 | Ethicon, Inc. | Detection of cleanliness of a medical device during a washing process |
US20050163655A1 (en) * | 1997-06-11 | 2005-07-28 | Szu-Min Lin | Integrated washing and sterilization process |
US7246627B2 (en) * | 1997-06-11 | 2007-07-24 | Ethicon, Inc. | Monitoring of cleaning process |
US7556767B2 (en) * | 1997-12-17 | 2009-07-07 | Ethicon, Inc. | Integrated washing and sterilization process |
JP3291227B2 (ja) * | 1997-11-28 | 2002-06-10 | 大陽東洋酸素株式会社 | 過酸化水素蒸気による処理システムにおける過酸化水素蒸気濃度検出方法及びその装置 |
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US6333002B1 (en) * | 1998-12-30 | 2001-12-25 | Ethicon, Inc. | Sterilization process using small amount of sterilant to determine the load |
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US6824695B2 (en) | 2003-02-28 | 2004-11-30 | Gerard F. Tempest, Jr. | System and method for water purification |
US6927582B2 (en) * | 2003-03-14 | 2005-08-09 | Steris Inc. | Method and apparatus for monitoring the state of a chemical solution for decontamination of chemical and biological warfare agents |
US6960921B2 (en) * | 2003-03-14 | 2005-11-01 | Steris Inc. | Method and apparatus for real time monitoring of metallic cation concentrations in a solution |
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US6844742B2 (en) * | 2003-03-14 | 2005-01-18 | Steris Inc. | Method and apparatus for measuring chemical concentration in a fluid |
US6946852B2 (en) * | 2003-03-14 | 2005-09-20 | Steris Inc. | Method and apparatus for measuring concentration of a chemical component in a gas mixture |
US6930493B2 (en) * | 2003-03-14 | 2005-08-16 | Steris Inc. | Method and apparatus for monitoring detergent concentration in a decontamination process |
US6909972B2 (en) * | 2003-06-06 | 2005-06-21 | Steris Inc. | Method and apparatus for formulating and controlling chemical concentrations in a solution |
US6917885B2 (en) * | 2003-06-06 | 2005-07-12 | Steris Inc. | Method and apparatus for formulating and controlling chemical concentration in a gas mixture |
US20040262170A1 (en) * | 2003-06-27 | 2004-12-30 | Steris Inc. | Sensor for sensing a chemical component concentration using an electroactive material |
US20050089442A1 (en) * | 2003-10-28 | 2005-04-28 | Young William T. | Method for sterilization using ethylene oxide |
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1997
- 1997-07-02 EP EP97931563A patent/EP0969881B1/en not_active Expired - Lifetime
- 1997-07-02 DE DE69708688T patent/DE69708688T2/de not_active Expired - Fee Related
- 1997-07-02 WO PCT/US1997/011753 patent/WO1998000176A1/en active IP Right Grant
- 1997-07-02 JP JP10504511A patent/JP2000515035A/ja not_active Withdrawn
- 1997-07-02 AU AU35158/97A patent/AU3515897A/en not_active Abandoned
- 1997-07-03 TW TW086109385A patent/TW358155B/zh active
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2007
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JP2003505303A (ja) * | 1999-07-26 | 2003-02-12 | アボット・ラボラトリーズ | 滅菌剤モニタリングアセンブリおよび装置 |
JP4955879B2 (ja) * | 1999-07-26 | 2012-06-20 | アボット・ラボラトリーズ | 滅菌剤モニタリングアセンブリおよび装置 |
JP2003521710A (ja) * | 2000-02-07 | 2003-07-15 | ステリス インコーポレイテッド | パルス電流測定法を用いる水溶液中の過酢酸の特異的検出のための電気化学的センサー |
JP2008504515A (ja) * | 2004-06-18 | 2008-02-14 | アメリカン ステリライザー カンパニー | 蒸気の純度および/または品質をモニターする方法および装置 |
JP2007256131A (ja) * | 2006-03-24 | 2007-10-04 | Tokaseiki Co Ltd | 燻蒸ガス濃度測定装置 |
JP2008188043A (ja) * | 2007-01-31 | 2008-08-21 | Ihi Shibaura Machinery Corp | 殺菌ガス浸透装置 |
JP2011218094A (ja) * | 2010-04-14 | 2011-11-04 | Tamura Teco:Kk | オゾン滅菌試験装置 |
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WO2023119757A1 (ja) * | 2021-12-24 | 2023-06-29 | ニッタ株式会社 | 除染強度センサ、除染システム、除染強度の検出方法、除染強度の検出プログラム |
Also Published As
Publication number | Publication date |
---|---|
JP2008068088A (ja) | 2008-03-27 |
WO1998000176A1 (en) | 1998-01-08 |
DE69708688D1 (de) | 2002-01-10 |
JP4088662B2 (ja) | 2008-05-21 |
DE69708688T2 (de) | 2002-09-05 |
EP0969881A1 (en) | 2000-01-12 |
AU3515897A (en) | 1998-01-21 |
TW358155B (en) | 1999-05-11 |
JP2008055179A (ja) | 2008-03-13 |
EP0969881B1 (en) | 2001-11-28 |
US5882590A (en) | 1999-03-16 |
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