JP2000505905A - 導電材製膜の厚みを測定する方法 - Google Patents
導電材製膜の厚みを測定する方法Info
- Publication number
- JP2000505905A JP2000505905A JP10527162A JP52716298A JP2000505905A JP 2000505905 A JP2000505905 A JP 2000505905A JP 10527162 A JP10527162 A JP 10527162A JP 52716298 A JP52716298 A JP 52716298A JP 2000505905 A JP2000505905 A JP 2000505905A
- Authority
- JP
- Japan
- Prior art keywords
- value
- inductance value
- coil
- measuring
- film
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B7/00—Measuring arrangements characterised by the use of electric or magnetic techniques
- G01B7/02—Measuring arrangements characterised by the use of electric or magnetic techniques for measuring length, width or thickness
- G01B7/06—Measuring arrangements characterised by the use of electric or magnetic techniques for measuring length, width or thickness for measuring thickness
- G01B7/10—Measuring arrangements characterised by the use of electric or magnetic techniques for measuring length, width or thickness for measuring thickness using magnetic means, e.g. by measuring change of reluctance
- G01B7/105—Measuring arrangements characterised by the use of electric or magnetic techniques for measuring length, width or thickness for measuring thickness using magnetic means, e.g. by measuring change of reluctance for measuring thickness of coating
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Measurement Of Length, Angles, Or The Like Using Electric Or Magnetic Means (AREA)
- Investigating Or Analyzing Materials By The Use Of Magnetic Means (AREA)
Abstract
Description
Claims (1)
- 【特許請求の範囲】 1. 強磁性材製の基体(17)上にコーティングされた導電材製の膜(20 )の厚みを、交流電流が流されている少なくとも1つの測定コイル(14)を用 いて測定する方法であって、前記測定コイル(14)のインダクタンスの変化を 評価し、以下の測定ステップを有しており、即ち: −前記導電材製の膜だけを測定する際に前記測定コイル(14)のインダクタン ス値L∞を検出するステップ、 −前記強磁性材製の基体だけを測定する際に前記測定コイル(14)のインダク タンス値L0を検出するステップ、 −測定すべき膜(20)を測定する場合、前記測定コイル(14)のインダクタ ンス値LXを検出するステップ、 −無次元値Meに変換するステップ、 −前記無次元値Meを較正曲線を用いて膜厚値に変換するステップ とを有していることを特徴とする導電材製の膜の厚みを測定する方法。 2. 無次元値Meを、以下の式を用いて求め: Me=A・(Lx−L0)/(L∞−L0) この式において、 L0=コーティングされていない基体のインダクタンス値 Lx=コーティング部のインダクタンス値 L∞=膜だけのインダクタンス値 A=ファクタ である請求項1記載の方法。 3. 較正部のインダクタンス値L0を求め、規定値Meを膜厚ゼロの場合に形 成し、前記規定値Meを用いて、変換曲線を選定する請求項1及び2記載の方法 。 4. 無次元値を以下の式を用いて求め: (2)Me=A・(Lx−(LIx−LI∞))−(L0−(LI0−LI∞))/ L∞−(L0−(LI0−LI∞)) この式において、 LIx:Lxの検出前又は後の空気に対するインダクタンス値 LI0:L0の検出前又は後の空気に対するインダクタンス値 LI∞:L∞の検出前又は後の空気に対するインダクタンス値 である請求項1〜3までのいずれか1記載の方法。 5. コイル(14)には、高周波電流を流す請求項1〜4までのいずれか1 記載の方法。 6.均一な材料成分の較正体(30)で、インダク タンス値L0及びインダクタンス値LXを検出する請求項1〜5までのいずれか1 記載の方法。 7. インダクタンス値L0及びインダクタンス値LXをそれぞれ固有の測定コ イル(14,40)を用いてほぼ同時に検出する請求項1〜6までのいずれか1 記載の方法。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE19652750.3 | 1996-12-18 | ||
DE19652750A DE19652750C2 (de) | 1996-12-18 | 1996-12-18 | Verfahren zur Bestimmung einer Dicke einer Schicht aus elektrisch leitendem Material |
PCT/DE1997/002615 WO1998027400A1 (de) | 1996-12-18 | 1997-11-08 | Verfahren zur bestimmung einer dicke einer schicht aus elektrisch leitendem material |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2000505905A true JP2000505905A (ja) | 2000-05-16 |
JP4233609B2 JP4233609B2 (ja) | 2009-03-04 |
Family
ID=7815183
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP52716298A Expired - Lifetime JP4233609B2 (ja) | 1996-12-18 | 1997-11-08 | 導電材製膜の厚みを測定する方法 |
Country Status (10)
Country | Link |
---|---|
US (1) | US6198278B1 (ja) |
EP (1) | EP0891532B1 (ja) |
JP (1) | JP4233609B2 (ja) |
KR (1) | KR100485199B1 (ja) |
CN (1) | CN1133865C (ja) |
AU (1) | AU726794B2 (ja) |
BR (1) | BR9707547A (ja) |
DE (2) | DE19652750C2 (ja) |
ES (1) | ES2218708T3 (ja) |
WO (1) | WO1998027400A1 (ja) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2001165603A (ja) * | 1999-12-10 | 2001-06-22 | Keyence Corp | 渦電流式変位計とそれを用いた距離測定方法 |
JP2003522937A (ja) * | 1999-12-23 | 2003-07-29 | ケーエルエー−テンカー テクノロジィース コーポレイション | 渦電流測定あるいは光学測定を利用して、メタライゼーション処理を実状態で監視する方法 |
JP2006300719A (ja) * | 2005-04-20 | 2006-11-02 | Ribekkusu:Kk | 測定方法および装置 |
JP2009500605A (ja) * | 2005-06-29 | 2009-01-08 | ラム リサーチ コーポレーション | 導電層の電気的応答を最適化する方法、及びその装置 |
Families Citing this family (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE19820546C1 (de) * | 1998-05-08 | 1999-11-04 | Bosch Gmbh Robert | Verfahren zur Eliminierung von Meßfehlern bei der Bestimmung einer Dicke einer Schicht aus elektrisch leitendem Material |
DE19951015C1 (de) | 1999-10-22 | 2001-01-25 | Bosch Gmbh Robert | Verfahren zur Charakterisierung von Metallelektroden keramischer Sensorelemente |
DE102004034083A1 (de) | 2004-07-15 | 2006-02-09 | Robert Bosch Gmbh | Verfahren zur berührungsfreien Bestimmung einer Schichtdicke durch Widerstands- und Induktivitätsmessung einer Sensorspule |
DE102004034081A1 (de) | 2004-07-15 | 2006-02-09 | Robert Bosch Gmbh | Verfahren zur berührungsfreien Bestimmung einer Dicke einer Schicht aus elektrisch leitendem Material |
DE102006025356A1 (de) * | 2006-05-31 | 2007-12-06 | Siemens Ag | Verfahren zum Bestimmen der Schichtdicke einer elektrisch leitfähigen Beschichtung auf einem elektrisch leitfähigen Substrat |
CN102023477B (zh) * | 2009-09-17 | 2013-06-19 | 中芯国际集成电路制造(上海)有限公司 | 光刻方法 |
CN101788260B (zh) * | 2010-03-18 | 2011-12-28 | 清华大学 | 一种金属薄膜厚度的电涡流测量方法 |
CN102759722A (zh) * | 2012-07-17 | 2012-10-31 | 江苏省晶石磁性材料与器件工程技术研究有限公司 | 一种锰锌铁氧体粉体磁化强度测试装置及方法 |
CN103852000B (zh) * | 2014-03-24 | 2016-05-25 | 电子科技大学 | 多层导电涂层厚度的涡流检测方法和装置 |
CA3085011A1 (en) * | 2016-12-20 | 2018-06-28 | Greg NICKEL | Devices, systems and methods for evaluating objects subject to repair or other alteration |
DE102018206794A1 (de) | 2018-05-03 | 2019-11-07 | Robert Bosch Gmbh | Verfahren zur Vermessung von Elektrodenfilmen |
DE102019112238A1 (de) * | 2019-05-10 | 2020-11-12 | HELLA GmbH & Co. KGaA | Verfahren zur Kontrolle der Beschichtung eines elektronischen Bauteils |
Family Cites Families (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE1237335B (de) * | 1963-12-03 | 1967-03-23 | Dr Phil Friedrich Foerster | Anordnung zur Messung von Schichtdicken nichtferromagnetischer Medien auf ferromagnetischem Material |
FR2071173A5 (ja) * | 1969-12-19 | 1971-09-17 | Centre Scient Tech Batiment | |
GB2145827B (en) * | 1983-08-31 | 1987-04-08 | Fischer Gmbh & Co Inst Fur Ele | Electromagnetic measuring probe |
DE3404720A1 (de) * | 1984-02-10 | 1985-08-14 | Karl Deutsch Prüf- und Meßgerätebau GmbH + Co KG, 5600 Wuppertal | Verfahren und vorrichtung zur schichtdickenmessung |
DE4119903C5 (de) * | 1991-06-17 | 2005-06-30 | Immobiliengesellschaft Helmut Fischer Gmbh & Co. Kg | Verfahren und Vorrichtung zur Messung dünner Schichten |
DE4227735C2 (de) * | 1992-08-21 | 1995-10-12 | Leybold Ag | Anordnung zum berührungslosen Messen der Dicke von Schichten |
US5343146A (en) * | 1992-10-05 | 1994-08-30 | De Felsko Corporation | Combination coating thickness gauge using a magnetic flux density sensor and an eddy current search coil |
DE4327712C2 (de) * | 1993-08-18 | 1997-07-10 | Micro Epsilon Messtechnik | Sensoranordnung und Verfahren zum Erfassen von Eigenschaften der Oberflächenschicht eines metallischen Targets |
-
1996
- 1996-12-18 DE DE19652750A patent/DE19652750C2/de not_active Expired - Lifetime
-
1997
- 1997-11-08 WO PCT/DE1997/002615 patent/WO1998027400A1/de active IP Right Grant
- 1997-11-08 US US09/125,434 patent/US6198278B1/en not_active Expired - Lifetime
- 1997-11-08 CN CNB971921210A patent/CN1133865C/zh not_active Expired - Lifetime
- 1997-11-08 AU AU53072/98A patent/AU726794B2/en not_active Ceased
- 1997-11-08 EP EP97949895A patent/EP0891532B1/de not_active Expired - Lifetime
- 1997-11-08 DE DE59711472T patent/DE59711472D1/de not_active Expired - Lifetime
- 1997-11-08 ES ES97949895T patent/ES2218708T3/es not_active Expired - Lifetime
- 1997-11-08 KR KR10-1998-0706374A patent/KR100485199B1/ko not_active IP Right Cessation
- 1997-11-08 JP JP52716298A patent/JP4233609B2/ja not_active Expired - Lifetime
- 1997-11-08 BR BR9707547A patent/BR9707547A/pt not_active IP Right Cessation
Cited By (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2001165603A (ja) * | 1999-12-10 | 2001-06-22 | Keyence Corp | 渦電流式変位計とそれを用いた距離測定方法 |
JP4643782B2 (ja) * | 1999-12-10 | 2011-03-02 | 株式会社キーエンス | 渦電流式変位計とそれを用いた距離測定方法 |
JP2003522937A (ja) * | 1999-12-23 | 2003-07-29 | ケーエルエー−テンカー テクノロジィース コーポレイション | 渦電流測定あるいは光学測定を利用して、メタライゼーション処理を実状態で監視する方法 |
JP4817575B2 (ja) * | 1999-12-23 | 2011-11-16 | ケーエルエー−テンカー コーポレイション | 渦電流測定を利用して、メタライゼーション処理を実状態で監視する方法 |
JP2006300719A (ja) * | 2005-04-20 | 2006-11-02 | Ribekkusu:Kk | 測定方法および装置 |
JP4699797B2 (ja) * | 2005-04-20 | 2011-06-15 | 株式会社リベックス | 測定方法および装置 |
JP2009500605A (ja) * | 2005-06-29 | 2009-01-08 | ラム リサーチ コーポレーション | 導電層の電気的応答を最適化する方法、及びその装置 |
Also Published As
Publication number | Publication date |
---|---|
KR19990082635A (ko) | 1999-11-25 |
EP0891532B1 (de) | 2004-03-31 |
US6198278B1 (en) | 2001-03-06 |
JP4233609B2 (ja) | 2009-03-04 |
BR9707547A (pt) | 1999-07-27 |
DE19652750A1 (de) | 1998-07-02 |
CN1133865C (zh) | 2004-01-07 |
AU726794B2 (en) | 2000-11-23 |
KR100485199B1 (ko) | 2005-08-17 |
EP0891532A1 (de) | 1999-01-20 |
DE59711472D1 (de) | 2004-05-06 |
CN1210584A (zh) | 1999-03-10 |
DE19652750C2 (de) | 1999-12-02 |
WO1998027400A1 (de) | 1998-06-25 |
ES2218708T3 (es) | 2004-11-16 |
AU5307298A (en) | 1998-07-15 |
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