JP2000345345A5 - - Google Patents

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Publication number
JP2000345345A5
JP2000345345A5 JP1999157362A JP15736299A JP2000345345A5 JP 2000345345 A5 JP2000345345 A5 JP 2000345345A5 JP 1999157362 A JP1999157362 A JP 1999157362A JP 15736299 A JP15736299 A JP 15736299A JP 2000345345 A5 JP2000345345 A5 JP 2000345345A5
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JP
Japan
Prior art keywords
vaporizer
heat transfer
transfer member
cvd apparatus
cooling unit
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP1999157362A
Other languages
English (en)
Japanese (ja)
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JP2000345345A (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP11157362A priority Critical patent/JP2000345345A/ja
Priority claimed from JP11157362A external-priority patent/JP2000345345A/ja
Priority to US09/444,556 priority patent/US6470144B1/en
Publication of JP2000345345A publication Critical patent/JP2000345345A/ja
Publication of JP2000345345A5 publication Critical patent/JP2000345345A5/ja
Pending legal-status Critical Current

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JP11157362A 1999-06-04 1999-06-04 Ｃｖｄ装置およびｃｖｄ装置用気化装置 Pending JP2000345345A (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP11157362A JP2000345345A (ja) 1999-06-04 1999-06-04 Ｃｖｄ装置およびｃｖｄ装置用気化装置
US09/444,556 US6470144B1 (en) 1999-06-04 1999-11-19 Vaporizer for chemical vapor deposition apparatus, chemical vapor deposition apparatus, and semiconductor device manufactured thereby

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP11157362A JP2000345345A (ja) 1999-06-04 1999-06-04 Ｃｖｄ装置およびｃｖｄ装置用気化装置

Publications (2)

Publication Number Publication Date
JP2000345345A JP2000345345A (ja) 2000-12-12
JP2000345345A5 true JP2000345345A5 (https=) 2006-04-06

Family

ID=15648010

Family Applications (1)

Application Number Title Priority Date Filing Date
JP11157362A Pending JP2000345345A (ja) 1999-06-04 1999-06-04 Ｃｖｄ装置およびｃｖｄ装置用気化装置

Country Status (2)

Country Link
US (1) US6470144B1 (https=)
JP (1) JP2000345345A (https=)

Families Citing this family (33)

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Publication number Priority date Publication date Assignee Title
JP3470055B2 (ja) * 1999-01-22 2003-11-25 株式会社渡邊商行 Ｍｏｃｖｄ用気化器及び原料溶液の気化方法
JP4230596B2 (ja) 1999-03-12 2009-02-25 東京エレクトロン株式会社 薄膜形成方法
JP4220075B2 (ja) * 1999-08-20 2009-02-04 東京エレクトロン株式会社 成膜方法および成膜装置
JP3540234B2 (ja) * 2000-02-14 2004-07-07 Ｎｅｃエレクトロニクス株式会社 半導体装置の製造方法
US7163197B2 (en) * 2000-09-26 2007-01-16 Shimadzu Corporation Liquid substance supply device for vaporizing system, vaporizer, and vaporization performance appraisal method
EP1193493A1 (en) * 2000-09-29 2002-04-03 Infineon Technologies SC300 GmbH & Co. KG Method and apparatus for measuring and controlling the water content of a water containing liquid mixture
DE10057491A1 (de) * 2000-11-20 2002-05-23 Aixtron Ag Vorrichtung und Verfahren zum Zuführen eines in die Gasform gebrachten flüssigen Ausgangsstoffes in einen CVD-Reaktor
US7246796B2 (en) 2001-01-18 2007-07-24 Masayuki Toda Carburetor, various types of devices using the carburetor, and method of vaporization
US7780785B2 (en) * 2001-10-26 2010-08-24 Applied Materials, Inc. Gas delivery apparatus for atomic layer deposition
EP1451386A1 (en) * 2001-12-04 2004-09-01 Primaxx, Inc. Chemical vapor deposition vaporizer
JP4391413B2 (ja) * 2002-05-29 2009-12-24 株式会社渡辺商行 気化器、分散器、成膜装置、及び、気化方法
US6921062B2 (en) 2002-07-23 2005-07-26 Advanced Technology Materials, Inc. Vaporizer delivery ampoule
US20040040503A1 (en) * 2002-08-29 2004-03-04 Micron Technology, Inc. Micromachines for delivering precursors and gases for film deposition
US20040040502A1 (en) * 2002-08-29 2004-03-04 Micron Technology, Inc. Micromachines for delivering precursors and gases for film deposition
US6740586B1 (en) * 2002-11-06 2004-05-25 Advanced Technology Materials, Inc. Vapor delivery system for solid precursors and method of using same
US6997403B2 (en) * 2003-01-13 2006-02-14 Micron Technology, Inc. Liquid vaporizer with positive liquid shut-off
JP4202856B2 (ja) * 2003-07-25 2008-12-24 東京エレクトロン株式会社 ガス反応装置
US7261118B2 (en) * 2003-08-19 2007-08-28 Air Products And Chemicals, Inc. Method and vessel for the delivery of precursor materials
US20050147749A1 (en) * 2004-01-05 2005-07-07 Msp Corporation High-performance vaporizer for liquid-precursor and multi-liquid-precursor vaporization in semiconductor thin film deposition
JP4975414B2 (ja) * 2005-11-16 2012-07-11 エーエスエム インターナショナル エヌ．ヴェー． Ｃｖｄ又はａｌｄによる膜の堆積のための方法
CN101410548A (zh) * 2006-04-05 2009-04-15 株式会社堀场Stec 液体材料气化装置
US8755679B2 (en) 2006-04-05 2014-06-17 Horiba Stec, Co., Ltd. Liquid material vaporizer
US20080241805A1 (en) * 2006-08-31 2008-10-02 Q-Track Corporation System and method for simulated dosimetry using a real time locating system
US9109287B2 (en) * 2006-10-19 2015-08-18 Air Products And Chemicals, Inc. Solid source container with inlet plenum
US20130037161A1 (en) 2011-08-11 2013-02-14 Aculon, Inc. Treating fluidic channels
US11867342B2 (en) 2011-08-11 2024-01-09 Aculon Inc. Fluidic channels and methods of altering the surface energy of components thereof
US12467577B2 (en) 2011-08-11 2025-11-11 Aculon, Inc. Fluidic channels and methods of altering the surface energy of components thereof
KR20230080495A (ko) 2012-05-31 2023-06-07 엔테그리스, 아이엔씨. 배취식 침착을 위한 고 물질 플럭스를 갖는 유체의 소스 시약-기반 수송
WO2016117251A1 (ja) * 2015-01-21 2016-07-28 住友電気工業株式会社 結晶成長装置、炭化珪素単結晶の製造方法、炭化珪素単結晶基板および炭化珪素エピタキシャル基板
JP6436024B2 (ja) * 2015-09-14 2018-12-12 住友電気工業株式会社 炭化珪素エピタキシャル基板の製造方法
US20220139730A1 (en) * 2019-01-31 2022-05-05 Lam Research Corporation Multi-channel liquid delivery system for advanced semiconductor applications
JP6567787B1 (ja) * 2019-02-15 2019-08-28 アコマ医科工業株式会社 麻酔装置
CN113448172A (zh) * 2020-03-27 2021-09-28 长鑫存储技术有限公司 一种光刻胶涂覆装置及方法

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US5370741A (en) * 1990-05-15 1994-12-06 Semitool, Inc. Dynamic semiconductor wafer processing using homogeneous chemical vapors
US5204314A (en) 1990-07-06 1993-04-20 Advanced Technology Materials, Inc. Method for delivering an involatile reagent in vapor form to a CVD reactor
JP3390517B2 (ja) * 1994-03-28 2003-03-24 三菱電機株式会社 液体原料用ｃｖｄ装置
JP3335492B2 (ja) 1994-12-28 2002-10-15 三菱電機株式会社 薄膜の堆積装置
US5776254A (en) * 1994-12-28 1998-07-07 Mitsubishi Denki Kabushiki Kaisha Apparatus for forming thin film by chemical vapor deposition
JP3276277B2 (ja) * 1995-11-29 2002-04-22 株式会社フジクラ Ｃｖｄ用液体原料供給装置
JP3612839B2 (ja) * 1996-02-13 2005-01-19 三菱電機株式会社 高誘電率薄膜構造、高誘電率薄膜形成方法および高誘電率薄膜形成装置
JPH108255A (ja) * 1996-06-20 1998-01-13 Ebara Corp 液体原料気化装置
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US5835677A (en) * 1996-10-03 1998-11-10 Emcore Corporation Liquid vaporizer system and method
JPH10147870A (ja) * 1996-11-20 1998-06-02 Ebara Corp 液体原料の気化装置
US6074487A (en) * 1997-02-13 2000-06-13 Shimadzu Corporation Unit for vaporizing liquid materials
JP3645682B2 (ja) * 1997-03-18 2005-05-11 三菱電機株式会社 Ｃｕ成膜用ＣＶＤ装置
US6258170B1 (en) * 1997-09-11 2001-07-10 Applied Materials, Inc. Vaporization and deposition apparatus
US6210485B1 (en) * 1998-07-21 2001-04-03 Applied Materials, Inc. Chemical vapor deposition vaporizer
JP2000223481A (ja) * 1999-02-01 2000-08-11 Hitachi Ltd 半導体の製造方法

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