JP2000340641A5 - - Google Patents

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Publication number
JP2000340641A5
JP2000340641A5 JP1999148547A JP14854799A JP2000340641A5 JP 2000340641 A5 JP2000340641 A5 JP 2000340641A5 JP 1999148547 A JP1999148547 A JP 1999148547A JP 14854799 A JP14854799 A JP 14854799A JP 2000340641 A5 JP2000340641 A5 JP 2000340641A5
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JP
Japan
Prior art keywords
cassette
inert gas
port
gas supply
opened
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP1999148547A
Other languages
English (en)
Japanese (ja)
Other versions
JP2000340641A (ja
JP4308975B2 (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP14854799A priority Critical patent/JP4308975B2/ja
Priority claimed from JP14854799A external-priority patent/JP4308975B2/ja
Publication of JP2000340641A publication Critical patent/JP2000340641A/ja
Publication of JP2000340641A5 publication Critical patent/JP2000340641A5/ja
Application granted granted Critical
Publication of JP4308975B2 publication Critical patent/JP4308975B2/ja
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

JP14854799A 1999-05-27 1999-05-27 基板処理装置、基板処理方法及び半導体素子の形成方法 Expired - Lifetime JP4308975B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP14854799A JP4308975B2 (ja) 1999-05-27 1999-05-27 基板処理装置、基板処理方法及び半導体素子の形成方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP14854799A JP4308975B2 (ja) 1999-05-27 1999-05-27 基板処理装置、基板処理方法及び半導体素子の形成方法

Publications (3)

Publication Number Publication Date
JP2000340641A JP2000340641A (ja) 2000-12-08
JP2000340641A5 true JP2000340641A5 (show.php) 2006-07-06
JP4308975B2 JP4308975B2 (ja) 2009-08-05

Family

ID=15455212

Family Applications (1)

Application Number Title Priority Date Filing Date
JP14854799A Expired - Lifetime JP4308975B2 (ja) 1999-05-27 1999-05-27 基板処理装置、基板処理方法及び半導体素子の形成方法

Country Status (1)

Country Link
JP (1) JP4308975B2 (show.php)

Families Citing this family (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003007813A (ja) * 2001-06-20 2003-01-10 Nec Corp 半導体ウエハの保管ボックス、運搬装置、運搬方法及び保管倉庫
KR20030009763A (ko) * 2001-07-24 2003-02-05 삼성전자주식회사 웨이퍼 보관장치
JP2003197468A (ja) 2001-10-19 2003-07-11 Nec Tokin Toyama Ltd 固体電解コンデンサ及びその製造方法
EP2035320A4 (en) * 2006-06-19 2010-07-28 Entegris Inc SYSTEM FOR CLEANING A MASK DEPOSIT
JP4670808B2 (ja) * 2006-12-22 2011-04-13 ムラテックオートメーション株式会社 コンテナの搬送システム及び測定用コンテナ
JP2010041015A (ja) * 2008-08-05 2010-02-18 Kondo Kogyo Kk 半導体ウエハ収納容器用保管棚
JP5381054B2 (ja) * 2008-12-02 2014-01-08 シンフォニアテクノロジー株式会社 ロードポート
KR100904999B1 (ko) 2008-12-29 2009-06-26 (주)서울산업기술 샘플링캐리어
TWI575631B (zh) 2011-06-28 2017-03-21 動態微型系統公司 半導體儲存櫃系統與方法
JP5598728B2 (ja) * 2011-12-22 2014-10-01 株式会社ダイフク 不活性ガス注入装置
US9878353B2 (en) * 2012-08-21 2018-01-30 Murata Machinery, Ltd Stocker provided with purging functionality, stocker unit, and method for supplying cleaning gas
JP5984030B2 (ja) * 2013-03-05 2016-09-06 村田機械株式会社 測定ユニット及びパージガスの流量測定方法
JP6106501B2 (ja) 2013-04-12 2017-04-05 東京エレクトロン株式会社 収納容器内の雰囲気管理方法
JP6403431B2 (ja) 2013-06-28 2018-10-10 株式会社Ｋｏｋｕｓａｉ Ｅｌｅｃｔｒｉｃ 基板処理装置、流量監視方法及び半導体装置の製造方法並びに流量監視プログラム
CN105940487B (zh) * 2014-02-07 2018-12-04 村田机械株式会社 净化装置以及净化方法
JP6414525B2 (ja) * 2015-09-02 2018-10-31 株式会社ダイフク 保管設備
JP6817757B2 (ja) 2016-09-16 2021-01-20 東京エレクトロン株式会社 基板処理装置及び基板移送方法
KR102206194B1 (ko) 2017-09-26 2021-01-22 가부시키가이샤 코쿠사이 엘렉트릭 기판 처리 장치 및 반도체 장치의 제조 방법

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