JP2000294501A - Peripheral aligner and method - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide a relative easiness even for a large-sized substrate, low costs, and further superior durability, and enhance a throughput without incurring costs, by a method wherein, in a state such that a light source, an illumination optical system, exposing region variable means, and a substrate are relatively stationary, an exposure is made to different regions of the substrate. SOLUTION: Blinds 16A, 16B are disposed between an illumination optical system and a substrate 17, and are arranged upwardly of a position where the substrate 17 is mounted, in order to avoid interference with the substrate 17 when carried in and out by a load arm 21. Next, each of the blinds 16A, 16B is moved so that a width of an irradiation region on the substrate 17 is set as a desirable value. A shutter is opened in lamp houses 18A, 18B to start a peripheral exposure. Two irradiation optical systems are provided, whereby two sides mutually parallel to the angular substrate 17 are simultaneously exposed to lights, thereby enhancing a throughput.

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a peripheral exposure apparatus and method for exposing and removing unnecessary photosensitive material such as a resist around a substrate used for manufacturing devices such as semiconductor elements and liquid crystal display elements. In particular, the present invention relates to an edge exposure apparatus and method suitable for edge exposure on a large rectangular substrate such as a liquid crystal display element.

[0002]

2. Description of the Related Art A conventional peripheral exposure apparatus of this type has a configuration as described in Japanese Patent Laid-Open No. 6-283406. An ultrahigh-pressure mercury lamp is used as a light source, an optical fiber is arranged at a second focal position by an elliptical mirror, and exposure light is guided onto a substrate by an optical fiber formed in a shape of a slit on the emission side to perform exposure. The optical fiber performs exposure by scanning over the substrate. In the scanning direction, there is a guide for scanning, and the optical fiber is controlled so as to move at a substantially constant speed.The emission side of this optical fiber is branched into two, and each emission end is directed in the same direction of the slit-shaped square substrate. It is configured to scan. When exposing in the direction orthogonal to the scanning of the substrate,
A configuration is adopted in which exposure is performed by rotating the lens by an angle.

[0003]

However, in recent years, the use of special photosensitive materials, such as photosensitive resins, having a high sensitivity to light having a wavelength of 400 nm or less, has been increasingly used for liquid crystal display elements. The size of substrates has been increasing year by year. Recently, substrates of about 600 mm × 750 mm have been frequently used.
Substrates of about 0 mm square and about 1000 mm square have been studied.

As described above, in recent years, there is a necessity to use light of 400 nm or less, and furthermore, there is a demand to cope with a large substrate such as 1 m square. In the case of a peripheral exposure apparatus as described in the conventional example, since an optical fiber is used, in order to use light having a wavelength of 400 nm or less, the fiber must be made of quartz fiber. In general, since a quartz fiber has a smaller light taking-in angle than a multi-component fiber, a long and thick quartz fiber is required to cope with a large-sized substrate as a fiber, which is expensive. In addition, due to the increase in the size of the substrate itself, it is necessary to cope with a large exposure width for peripheral exposure. For example, in order to expose the outer periphery of the substrate to 100 mm, at least the width of the fiber is also 100 m.
A width of m is required. Assuming that the slit shape of the fiber is, for example, 5 mm × 100 mm, the diameter Φ1 on the incident side of the fiber becomes Φ1 = 2 × √ (2 × 5 × 100 / π) = 35.7 mm in consideration of two branches on the exit side. In order to expose the outer periphery of the substrate, the substrate becomes long and large in diameter, which is expensive and extremely inexpensive. Further, in the conventional example, since the fiber is configured to run around on the substrate, stress may be applied to the fiber itself and the fiber may be broken. If it is inexpensive, it is possible to replace it as a replacement part, but it is expensive but also difficult.

Further, in the conventional peripheral exposure apparatus, a large guide and a mechanism for scanning at a constant speed are required for scanning the fiber, and this has been a factor of increasing the cost. Since the exposure is performed by scanning, it is necessary to increase the illuminance and scan at a higher speed in order to reduce the throughput, and it has to be a mechanically rigid structure, which is very expensive. A complicated mechanism system and a control system are required.

In view of the above-mentioned problems, the present invention is relatively easy and inexpensive even for a large-sized substrate even when light of 400 nm or less is used as the exposure light, and further has a high durability. It is an object of the present invention to provide a peripheral exposure apparatus which is excellent in performance and can improve the throughput without increasing the cost.

[0007]

In order to achieve the above-mentioned object, a peripheral exposure apparatus according to the present invention is directed to an area exposing a predetermined circuit pattern on a photosensitive material applied to a square substrate. A peripheral exposure apparatus that irradiates different regions with exposure light, comprising: a light source for supplying exposure light; an illumination optical system for directing exposure light from the light source to the substrate; And an exposure area changing unit arranged to limit an exposure area that is an area on the substrate where the exposure light is irradiated. Then, exposure is performed on the different areas of the substrate while the light source, the illumination optical system, the exposure area variable unit, and the substrate are relatively stationary.

[0008] Based on the above configuration, it is preferable that a longitudinal direction of the exposure area formed by the illumination optical system and the exposure area variable means is set to be longer than a predetermined side of the substrate. In the above configuration, a lateral direction of the exposure area formed by the illumination optical system and the exposure area variable unit is set shorter than a side adjacent to a side of the substrate on which the exposure area is formed. Is preferred.

Further, in the present invention, it is preferable that the exposure area variable means includes at least a first exposure area variable means and a second exposure area variable means, and at least two areas in a peripheral portion of the rectangular substrate. Is preferably set as the exposure area, and the at least two exposure areas are simultaneously exposed. In the present invention, it is preferable that the illumination optical system has at least a first illumination optical system and a second illumination optical system.

Further, according to a preferred aspect of the present invention, the illumination optical system has an optical integrator for making the illuminance of the exposure area on the substrate substantially uniform. In a preferred embodiment of the present invention,
Further comprising a substrate rotating mechanism for rotating the square substrate by approximately 90 °, wherein the exposure region formed by the exposure region variable means is formed so as to cross a long side or a short side of the substrate; After the exposure on the long side or the short side, the substrate is rotated by the substrate rotating mechanism to expose the short side or the long side of the substrate.

According to the present invention, it is preferable that the exposure area is provided so as to be changeable, and the width of the maximum area of the changeable exposure area in a direction perpendicular to the side of the substrate is equal to the length of the substrate. 1/2 of the difference between the length of the side and the length of the short side
It is preferable that the width includes the following. Further, according to the present invention, it is preferable that the exposure area formed by the illumination optical system and the exposure area variable unit is formed simultaneously on all sides of the substrate.

Further, according to the present invention, it is preferable that the exposure area variable means is provided corresponding to each side of the substrate, and the exposure area variable means corresponding to at least one of the sides of the substrate is provided. The means can be selectively set or retracted. In this configuration, it is preferable that a mechanism for rotating the substrate is not provided. Further, according to the present invention, it is preferable to have a plurality of the exposure region variable units and a driving unit for setting the plurality of exposure region variable units to desired positions. It is preferable to be formed of a light transmissive member having a transmissive part and a light shielding part. It is preferable that after setting the plurality of exposure area variable units at predetermined positions, exposure is performed simultaneously on at least two sides of each side of the substrate.

According to another aspect of the present invention, there is provided an illumination optical system for illuminating a rectangular area including the entire area of a rectangular substrate, a movable blind part for partially shielding the illuminated area, and a rectangular photosensitive element. A rotating mechanism for rotating the substrate by 90 °, wherein the movable blind has a movable edge portion having a shape parallel to each other and extending in a predetermined direction, and an arbitrary position in a direction crossing the predetermined direction of the two movable edge portions. A drive unit for positioning;
It is composed of an elastic light-shielding member that connects between the two movable edge portions.

In another aspect of the present invention, it is preferable that the movable blind portion includes first and second movable blind portions each having the two movable edge portions, the driving portion, and the light shielding member. In this preferred embodiment, the movable edge portion in the first movable blind portion and the movable edge portion in the second movable blind portion disposed opposite to the movable edge portion in the first movable blind portion overlap each other. It is preferable that the first and second movable blinds form one light-shielding region.

[0015] Further, it is preferable that the extendable light-shielding member in the movable blind portion is constituted by a foldable bellows. Further, it is preferable that the extendable light-shielding member in the movable blind portion is constituted by a curtain using a take-up roller. The extendable light-shielding member in the movable blind portion includes a stretchable light-shielding member in the blind portion, a rotating roller that changes a direction in which the curtain is pulled, and a tension mechanism that pulls the curtain in a direction substantially perpendicular to the edge driving direction. It is preferable to use blinds that are made.

It is preferable that the extendable light-shielding member in the movable blind portion is constituted by two or more superimposed flat plates which slide and change the degree of overlap. Now, in the peripheral exposure method according to the present invention, a first step of applying the photosensitive material to the rectangular substrate and a second step of transferring a circuit pattern to a predetermined region on the photosensitive material on the rectangular substrate And a third step of irradiating the region to which the circuit pattern is transferred with exposure light using the peripheral exposure apparatus according to any one of the above-described configurations. This is performed before or after the second step.

[0017]

Embodiments of the present invention will be described below with reference to the drawings. FIG. 1 is an apparatus schematic diagram showing a peripheral exposure apparatus according to the first embodiment of the present invention. FIG.
Has two sets of light sources 10A and 10B and irradiation optical systems 11A to 15A and 11B to 15B, which have the same configuration.
Only one configuration (the group to which reference numeral A is attached) will be described.

In FIG. 1, an ultra-high pressure mercury lamp 10A as a light source emits light (for example, i-line (3
65 nm)). This light is reflected by the elliptical mirror 11A provided so that the ultra-high pressure mercury lamp is at the first focal position, and is reflected by the dichroic mirror 12A that reflects only exposure light of 400 nm or less, and then reflected by the elliptical mirror 11A. A light source image is formed at the second focal position.
A shutter (not shown) is provided in the vicinity of the second focal position, and the shutter turns on / off the exposure.
F is controlled.

Light from the light source image formed at the second focal position of the elliptical mirror 11A is substantially collimated by the collimator lens 13A, and is incident on a fly-eye lens 14A as an optical integrator. The fly-eye lens 14A in this embodiment is formed by integrating a plurality of lens elements having a predetermined cross-sectional shape, and the cross-sectional shapes of these lens elements are similar to the irradiation area on the substrate. For example, when the irradiation area on the substrate is rectangular, the cross-sectional shape of each lens element is also rectangular. Each of the plurality of lens elements is usually constituted by a positive lens, and forms a plurality of light source images (secondary light sources) on their emission sides. The light that has passed through the fly-eye lens 14A is reflected by a concave mirror 15A arranged at a predetermined angle with respect to the fly-eye lens 14A, and a light beam is guided onto the substrate 17.
Here, each of the entrance surfaces of the plurality of lens elements of the fly-eye lens 14A forms an image on the square substrate 17 at a predetermined magnification by the plurality of lens elements and the concave mirror 15A. In the present embodiment, since the entrance surface of each lens element constituting the fly-eye lens 14A is rectangular, the irradiation area formed on the square substrate 17 is a rectangular area.

At a position between the concave mirror 15A and the rectangular substrate 17 and close to the rectangular substrate 17, a blind 16A extending in the X direction in the figure is arranged.
The blind 16A is provided so as to be movable in the Y direction in the figure, and the width of the irradiation area (exposure area) formed on the square substrate 17 in the Y direction can be made variable by the movement of the blind 16A. It is possible.

In the present embodiment, it is assumed that the size of the rectangular substrate 17 is, for example, about 700 to 1000 mm, and that the fly-eye lens 14A is used to reduce the size of the irradiation optical system (particularly, the concave mirror 15A). And concave mirror 15A
As close as possible. Since the purpose of this embodiment is to expose unnecessary peripheral resist, the substrate side of the irradiation optical system is not particularly telecentric.

It is assumed that an area (irradiation area) which can be exposed by this irradiation optical system is, for example, a rectangular shape of 700 × 100 mm. In this case, it is necessary to precisely expose the end (edge) of the irradiation area on the circuit pattern side (the −Y direction side when considered as a set of the irradiation optical systems 11A to 15A) on the substrate 17. The direction (Y direction) corresponds to the short side direction of the irradiation area. Even if the irradiation optical system is non-telecentric on the substrate side, the image height becomes small, so that the inclination angle of the principal ray falls within a small range.

Note that the deviation (telecentric error of the edge) between the position of the blind 16A and the position of the edge of the irradiation area due to the non-telecentric irradiation optical system can be corrected by the following method. First, blind 16
The relationship between the position of A in the XY plane and the position of the end of the irradiation area defined by the blind 16A in the XY plane is determined in advance, and this relationship is stored in a predetermined storage unit. . If the offset management between the actual exposure position (the position of the end of the irradiation area) and the setting position of the blind 16A is performed based on the stored relationship, more accurate control of the exposure position can be performed. Will be possible.

If the distance between the concave mirror 15A and the substrate 17 is set to be large and the focal length of the concave mirror 15A itself is set to be long, the numerical aperture (NA) of the luminous flux toward the substrate 17 is increased.
Can be reduced, and blur at the edge of the irradiation area limited by the blind 16A can be reduced. In the present embodiment, the irradiation optical system using the concave mirrors 15A and 15B has been described as an example. However, the irradiation optical system including only a fly-eye lens, the irradiation optical system including a fly-eye lens, a lens system, and a plane mirror are naturally used. An irradiation optical system including a fly-eye lens, a lens system, and a concave mirror, or an irradiation optical system using a Fresnel lens may be used.

In a combination of a concave mirror and a simple lens system, the illuminance decreases when the image height increases on the non-irradiation surface, and illuminance unevenness may occur. In such a case, it is desirable to use a lens system to make the distortion negative so as to prevent a decrease in illuminance at the peripheral portion. FIG. 2 is a perspective view showing an overall configuration of a peripheral exposure apparatus including the irradiation optical system shown in FIG.

In FIG. 2, light sources 10A and 10B, elliptical mirrors 11A and 11B, dichroic mirrors 12A and 12B are shown.
B, collimator lenses 13A and 13B, and fly-eye lenses 14A and 14B
A, 18B. These lamp units 18A and 18B are mounted on a frame (stand) 19 of the peripheral exposure apparatus. Frame 19
Consists of a quadrangular beam portion in the XY plane and four leg portions extending in the Z-axis direction from the respective vertices of the quadrangular shape. Guides 19L and 19L are provided on the lower surfaces of the two beam portions of the frame 19 extending in the Y direction.
19R, two blinds 16A, 1
6LA holding member 20LA, 20LB, 20RA, 2
0RB is ± Y along these guides 19L and 19R.
The frame 19 is provided so as to be movable in the direction.

Next, the exposure operation will be described with reference to FIG. First, the substrate 17 is carried into the apparatus by the loader arm (load arm) 21. Here, although not shown in FIG. 2, a substrate holder having pins that can move up and down (movable in the Z direction) is located at a substrate mounting position in the peripheral exposure apparatus. Then, the load arm 21 places the substrate on the pins on the substrate holder. After the load arm 21 retreats, the pins on the substrate holder move downward, and the substrate 17 is sucked on the holder. A reference pin for positioning the substrate 17 in the XY plane is provided on or around the substrate holder. When the load arm 21 places the substrate on the pin on the substrate holder, the substrate 17 Is pressed against the reference pin to align the substrate.

When positioning the substrate 17, the position of the substrate 17 is measured by a potentiometer or the like, and then the position of the substrate 17 is measured.
The substrate may be corrected. For example, the rotation of the substrate holder may be adjusted, the rotation of the scanning guide itself may be adjusted, or the correction may be performed based on the position of the blind. In this case, the substrate holder is configured to be finely movable in a rotation direction (θ direction) around the XY directions and the Z axis.

Here, the blinds 16A and 16B disposed between the irradiation optical system and the substrate 17 are mounted on the load arm 2.
In order to avoid interference with the substrate 17 at the time of loading and unloading by the
It is installed about mm above (+ Z direction). Note that the degree of blur at the end of the irradiation area, that is, the edge accuracy is determined by the distance between the blinds 16A and 16B and the substrate 17, so that when the strict edge accuracy is required, the blinds 16A and 16B can be used for the substrate 17. It needs to be as close as possible. In such a case, the blinds 16A and 16B are configured to be retractable in the XY plane such that the blinds 16A and 16B are at positions deviated from the loading path (unloading path) of the substrate 17 when loading and unloading the substrate 17 or the blind 16A. , 16B
May be provided movably in the Z direction so as not to interfere with the substrate 17.

Next, each of the blinds 16A and 16A is adjusted so that the width (width in the Y direction) of the irradiation area on the substrate 17 becomes a desired value.
16B is moved. And the lamp house 18A, 1
The shutter in 8B is opened to start the peripheral exposure. At this time, the exposure amount (shutter open time control) is controlled by measuring the illuminance using an illuminance sensor arranged in the vicinity of the surface of the substrate holder on which the substrate 17 is placed, and controlling the exposure amount required for the substrate 17. This is done by calculating the time to achieve

Note that the illuminance sensor is replaced with the illumination optical system 11 instead of the configuration provided adjacent to the substrate holder as described above.
A part of the light passing through A to 15A and 11B to 15B may be extracted and guided to the illuminance sensor. Further, it may be provided on a substrate holder. When measuring illuminance, monitoring during exposure may be performed,
Since the purpose is to expose an unnecessary resist, a configuration in which measurement is performed once for a plurality of sheets may be adopted.

In the present embodiment, by providing two irradiation optical systems, two sides parallel to each other of the rectangular substrate 17 are simultaneously exposed to thereby improve the throughput. Next, after rotating the substrate 17 by 90 °, the width of the irradiation area (width in the Y direction) is set by the blinds 16A and 16B, and peripheral exposure is performed on two sides orthogonal to the two exposed sides.

The mechanism for rotating the substrate 17 is provided, for example, on a substrate holder and can move up and down (Z direction).
A center-up pin that can rotate about the Z direction can be used. In this case, after the peripheral exposure on one of the two sides is completed, the center-up pin is moved upward in the Z direction to lift the substrate 17 from the substrate holder. After that, the center-up pin is rotated 90 ° about the Z direction, and then moved downward in the Z direction to cause the substrate 17 to be sucked onto the substrate holder again.

The size of the substrate 17 is 700 × 800.
Consider the case of a rectangular shape of mm. When the substrate is rotated at the center of the substrate 17 to perform exposure on sides orthogonal to each other, the position of an irradiation area when exposing the 800 mm side (long side of the substrate 17) and the 700 mm side (substrate 17 The difference in the Y direction from the position of the irradiation area when exposing (short side of) is 50 mm each. For example, 800mm
After the peripheral side of the side is exposed, the substrate 17 is rotated to 700
In the case of peripheral exposure of the side on the mm side, it is necessary to move the position of the irradiation area inward by 50 mm on each side.

In this case, the maximum width (in the Y direction) of the irradiation area (in the Y direction) is set so that both the irradiation area on the long side and the irradiation area on the short side can be exposed without moving the illumination optical system in the Y direction. The width of the irradiation area when 16A and 16B do not overlap the irradiation area) is set to 1 which is the difference between the width of the irradiation area required on the substrate 17 and the length of the long side and the short side of the rectangular substrate 17. / 2, and the movable range of the blinds 16A and 16B may be set to be larger than the sum of 1/2 of the difference in length between the long side and the short side of the rectangular substrate 17. .

For example, an outer periphery 8 of a substrate of 700 × 800 mm
When exposing 0 mm with this peripheral exposure apparatus, first, 8 mm
The exposure to the side on the 00 mm side is performed after setting the blinds 16A and 16B to 80 mm. Next, the substrate 17 is rotated by 90 ° to expose the 700 mm side. In this case, if the substrate 17 is rotated about the center of rotation as a rotation axis, the short side of the substrate is 50 m on one side compared to the 800 mm side.
m. In this case, blind 1
6A and 16B are moved in the Y direction so that the end of the irradiation area is positioned 50 mm inside the short side of the substrate 17 and exposure is started. That is, the blinds 16A, 16B are further positioned 50 mm inward from the positions of the blinds 16A, 16B when the 800 mm side (long side) is exposed.
Since B may be set and exposure may be performed, there is no need to move the illumination optical system due to the rotation of the substrate 17.

However, in this case, when exposing a substrate having a large aspect ratio, the amount of light substantially contributing to the exposure is reduced. Therefore, the entire irradiation optical system is moved in a direction orthogonal to the exposure width. A drive mechanism and a guide may be provided to allow movement in the Y direction. Further, a part of the irradiation optical system, for example, the concave mirrors 15A and 15B may be movable in the Y direction, the inclination of the light beams from the fly-eye lenses 14A and 14B in the YZ plane may be changeable, and the concave mirrors 15A and 15B may be moved in the X direction. It may be rotatable around the direction.

Next, a modification of the first embodiment will be described with reference to FIGS. This modification is an example in which exposure is performed not only on the peripheral portion of the substrate but also on the central portion of the substrate. This is peripheral exposure when a two-sided panel is formed on the substrate itself or when a four-sided panel is formed. Note that even the central portion of the substrate is a peripheral portion with respect to the region of the circuit pattern to be formed, so hereinafter, even the exposure of the central portion of the substrate is referred to as peripheral exposure.

In the modification shown in FIG. 3, another set of irradiation optical systems is provided in the peripheral exposure apparatus of the first embodiment shown in FIGS. FIG. 3 shows an additional illumination optical system and blinds 16A and 16B. In FIG. 3, a light source 10C, an elliptical mirror 11C, a dichroic mirror 12C, a collimator lens 13C, and a fly-eye lens 14C have the same configurations as those described in the first embodiment, and a description thereof will be omitted. The irradiation optical system shown in FIG. 3 is different from the irradiation optical system shown in FIG.
The point is that the concave mirror 15C is not fixed, but is provided rotatable about the X direction (the longitudinal direction of the irradiation area) in the figure. FIG. 3 shows an end of the blind 16A, 16B shown in FIG. 1 that is opposite to the end in the Y direction. As described above, the blind 16A,
Since the position of the concave mirror 16B can be set arbitrarily in the Y direction, the rotation of the concave mirror 15C and the blind 16
If the movements of A and 16B are linked, the position of the irradiation area on the substrate 17 in the Y direction and the width in the Y direction can be arbitrarily set.

Next, the exposure operation of this modified example will be described. As an example, in the case of an exposure pattern as shown in FIG. 4, first, the substrate 17 is carried into the apparatus, and exposure is performed on a region 171 on the periphery of the substrate 17 and a region 172 on the periphery of the substrate 17. The exposure width at this time is determined by blinds 16A and 16A.
B can be set arbitrarily. These two sides (area 17)
After the exposure of (1, 172), the substrate 17 is rotated by 90 °, and the regions 173 and 174 in the peripheral portion of the substrate 17 are exposed.

Next, the irradiation optical systems 11A to 15A in the peripheral portion
A, shutters in 11B to 15B are closed to cut light beams, and irradiation optical systems 11C to 11C
The central region 175 of the substrate 17 is exposed using 15C. At this time, the exposure width of the central region 175 is set by the blinds 16A and 16B. Thus, the exposure of the central part is started by opening the shutter of the central optical system. When the exposure of the central region 175 is completed, the substrate 17 is rotated by 90 ° and returned to the original position, and the central region 176 is further exposed. By performing the exposure four times in a time-sharing manner in this manner, the central portion of the substrate 17 can be exposed.

In the above-described modification, the central region 1
The concave mirror 15 in the irradiation optical system for performing exposure to 75 and 176
C is rotatable in a rotation direction about the long side direction of the irradiation area, and the position of the irradiation area can be moved in a direction orthogonal to the long side direction. However, exposure to the peripheral areas 171 to 174 is not performed. The concave mirrors 15A and 15B in the irradiation optical system may be configured to be rotatable so that exposure can be performed not only on the peripheral regions 171 to 174 but also on the central regions 175 and 176. In this case, there is an advantage that it is not necessary to use an optical system for exposing the central portion again.

In the above-described exposure operation, the exposure to the peripheral regions 171 to 174 and the exposure to the central regions 175 and 174 are performed.
Exposure to No. 6 was performed in a different operation, but if a space for disposing blinds corresponding to only the central irradiation optical systems 11C to 15C can be secured, the three irradiation optical systems are used at the same time, and the regions 171 and 171 are used. After simultaneously exposing 172 and 176, the substrate is rotated by 90 ° and the regions 173 and 176 are exposed.
Exposure to 4,175 can be performed simultaneously. This has the advantage that the peripheral exposure throughput can be improved.

In the above-described embodiment, a concave mirror is used as the irradiation optical system. However, the present invention is not limited to the concave mirror. For example, a lens system and a plane mirror, a lens system and a concave mirror, a lens system and a convex mirror, and a configuration including only a lens, Of course, a Fresnel lens may be used. In the above-described embodiment, a fly-eye lens is applied as an optical integrator. ) May be used as an optical integrator. When the light beam is shaped by a fiber, it is desirable that the exit end is made rectangular and the fiber end is relayed by an enlargement optical system. Alternatively, the fly-eye lens may be directly disposed near the second focal point of the elliptical mirror, and the substrate may be illuminated only by the fly-eye lens without the relay lens.

FIG. 5 shows a modification in which the irradiation optical system is composed of only a lens system and a rod type (internal reflection type) integrator is used as an optical integrator.
In FIG. 5, the light source 10 and the elliptical mirror 11 are the first
This is the same as the embodiment. Then, the rod-type integrator 22 is arranged so that the incident end face is located near the second focal position of the elliptical mirror 11. The light from the elliptical mirror entering the rod-type integrator 22 is repeatedly reflected on the inner surface of the rod-type integrator 22 to form a substantially uniform illuminance distribution on its exit surface. On the emission side of the rod-type integrator 22, an image of the emission surface is used as the substrate 1 as an irradiation surface.
A relay optical system 23 is formed on the substrate 7, and an irradiation area, which is an image of the exit surface of the rod-type integrator 22, is formed on the substrate 17. In this modification, the magnification of the relay optical system 22 is an enlargement magnification. The shape of the exit surface of the rod-type integrator is
It is formed in a shape similar to the upper irradiation area. In the example of FIG. 5, a refraction optical system (optical system having only a lens) is applied as the relay optical system. However, as described above, a combination of a Fresnel lens, a concave mirror, and the like may be used. FIG.
In the above example, the irradiation optical systems 11, 22, and 23 are linearly arranged along an optical axis having no bending. However, an optical path bending mirror may be provided in an optical path of the irradiation optical system, and the optical path may be appropriately bent. . For example, the optical path bending mirror is provided in the optical path between the relay optical system 23 and the substrate 17, in the relay optical system 23, the relay optical system 23 and the rod-type integrator 2.
2, in the optical path between the rod-type integrator 22 and the elliptical mirror 11, and so on. In addition, rod type integrator 2
2 may have an L-shape in order to have the optical path bending function. In the irradiation optical system at the center in the Y direction as in the above-described modification, the optical axis of the irradiation optical system is bent in the XZ plane by an optical path bending mirror in order to avoid interference of the light path with the peripheral irradiation optical system. Is preferred.

The optical integrator may be a randomly bundled fiber bundle (random fiber bundle). In this case, the random fiber bundle is arranged at the same position as that of the rod-type integrator shown in FIG. 5, but the exit end of the fiber bundle is connected to the substrate 17 so that the single fiber constituting the fiber bundle is not transferred onto the substrate 17. It is preferable to slightly deviate the conjugate relationship with 17, in other words, to form a defocus image of the fiber exit end on the substrate 17. Even when a fiber bundle is used, it is preferable that the shape of the entire exit end be similar to the shape of the irradiation region formed on the substrate 17.

Next, a second embodiment will be described with reference to FIG. The peripheral exposure apparatus according to the second embodiment irradiates the entire surface of the substrate with one irradiation optical system. In FIG. 6, members having the same functions as those of the peripheral exposure apparatus of the first embodiment are denoted by the same reference numerals. The configuration of the irradiation optical system itself in the example illustrated in FIG. 6 is the same as the configuration of the irradiation optical system of the above-described first embodiment, and includes a light source, an elliptical mirror, a collimating lens, a fly-eye integrator, and a concave mirror. Here, the difference from the irradiation optical system of the first embodiment is that the illumination light from the concave mirror 24 is configured to illuminate the entire substrate. Further, the configuration of the blinds 16A, 16B themselves of the second embodiment is the same as that of the first embodiment, but the central portion of the substrate 17 is exposed between the blinds 16A, 16B (in the Y direction). A light-blocking member is provided to prevent the light-blocking. The movement of the blinds 16A and 16B in the Y direction causes the board 17 to move.
The upward exposure area is variable.

In the second embodiment, the number of components is reduced by using one light source as described above, thereby reducing the cost of the apparatus. Further, as compared with the first embodiment, the number of light sources is one at the time of lamp replacement, so that downtime can be minimized. Second
The exposure operation in the embodiment includes the blinds 16A and 16A.
After the position of B in the Y direction is set,
After exposing the sides, the base 17 is rotated by 90 °, and then the positions of the blinds 16A and 16B in the Y direction are set, and the exposure is performed on two sides in a direction intersecting the exposed two sides. . As described above, in the second embodiment, the substrate 17
Is rotated by 90 ° to allow exposure of four sides of the substrate, but it is also possible to arrange four blinds corresponding to each side of the substrate. When four blinds (blinds for each side) are provided in this manner, for example, after setting an irradiation area with two blinds for two sides (two opposite sides) of the substrate 17 parallel to each other, for example. Exposure is performed on these two sides. At this time, the blind in the direction intersecting with the side to be exposed may be retracted out of the irradiation area. Thereafter, the blind extending parallel to the exposed side is retracted out of the irradiation area, and the irradiation area of two sides intersecting the exposed two sides is set and exposed using a blind in a direction intersecting the exposed side. With this configuration, 90 ° rotation of the substrate 17 is not required.

Next, a modification of the second embodiment will be described with reference to FIG. In FIG. 7, members having the same functions as those in the first and second embodiments are denoted by the same reference numerals. FIG. 7A shows a first modification of the second embodiment, and FIG. 7B shows a second modification. In the modified example of the second embodiment shown in FIGS. 7A and 7B, the light shielding member located between the blinds 16A and 16B is constituted by a light-reflective member, and the reflected light flux is transmitted to the substrate 17. By reflecting the light toward the light source, the light amount loss is reduced.

In the first modification shown in FIG.
The difference from the second embodiment is that a flat mirror 26 is provided instead of the light shielding member 25, and the flat mirror 26 is moved upward (in the + Z direction).
Reflecting members 27A and 27B for reflecting the light flux reflected toward the irradiation area of the substrate 17 are provided. Thereby, the light flux which is blocked by the light blocking member 25 in the second embodiment and is lost is guided to the irradiation area of the substrate 17 in the present modification, so that the light quantity loss can be reduced, and a light source having the same output can be temporarily used. In comparison, the exposure time can be reduced. Instead of the plane mirror 26, it is also possible to use a concave mirror or a convex mirror, or a roof-type reflecting surface having a ridge line in the X direction in the drawing and protruding toward the concave mirror. In addition,
When a convex mirror or a roof-type reflecting surface is used, a larger amount of light can be guided to the reflecting members 27A and 27B, so that the exposure time can be further reduced, that is, the throughput can be improved.

In the second modification shown in FIG. 7B, reflective blinds 28A and 28B are provided obliquely outside the light shielding member 25 (in the Y direction). At this time, the inside edge of the irradiation area formed on the substrate 17 is defined by the edge portions (end portions) of the reflection blinds 28A and 28B. And the reflection blind 28
Each of the reflection blinds 28 so that the light flux reflected by the reflection surfaces A and 28B is reflected to the irradiation area on the substrate 17.
A, the inclination of 28B is set. In this configuration, the position of the end of the irradiation area on the substrate 17 in the Y direction can be set by moving the reflection blinds 28A and 28B themselves in the Y direction in the drawing.
A, 28B is also changed so that the reflection blind 2
It is preferable that the reflected light beams at 8A and 28B be guided to the irradiation area.

In the second modification, the maximum irradiation area of the irradiation optical system is set smaller than the size of the substrate 17 so that only the reflected light beams of the reflection blinds 28A and 28B are guided to the substrate 17 (concave mirror). 24 so that there is no luminous flux guided directly to the substrate 17).
In this case, the position in the Y direction of the lower part of the obliquely-reflected blinds 28A and 28B is fixed,
A, 28B is moved up and down (reflection blind 28
A, 28B is provided rotatably about the lower part), whereby the width of the irradiation area on the substrate 17 in the Y direction can be changed.

In the first and second modified examples described above,
Although the configuration in which exposure is performed on two opposing sides of the substrate 17 has been described, each modification can be applied to a configuration in which exposure is performed on four sides (all sides) of the substrate 17. In this case, in the example of FIG. 7A, two reflecting members are provided along a direction orthogonal to a straight line connecting the reflecting members 27A and 27B with the optical path between the plane mirror 26 and the concave mirror 24 interposed therebetween. The two light reflecting members may be guided to the remaining two sides on the substrate 17 by the two reflecting members. In this case, by using not a roof-type reflecting surface having a ridge line extending in the X direction but a conical (pyramidal or conical) reflecting surface or convex mirror with a convex surface facing the concave mirror side, The light use efficiency can be improved. Further, in the example of FIG. 7B, four reflection blinds may be obliquely formed so as to form a part of a pyramid shape. Next, a modified example of the blind portion will be described with reference to FIG. . FIG. 8 shows an example in which the blind is formed of a light-transmitting substrate (glass plate) having a light-shielding portion and a transmitting portion.

As shown in FIGS. 8 (a) to 8 (d), the blind has four glass substrates 29A to 29D having light shielding portions 30A to 30D provided on the surface, respectively. FIG.
As shown in (e), these glass substrates 29A-29
D is the holding members 31A to 31A so that they overlap in the Z direction.
It is held independently in 1D. Then, as shown in FIG. 8 (f), each of the holding members 31A to 31D is attached to the guide 32 so that each of the glass substrates 29A to 29D can move independently in the XY plane.

By moving the holding members 31A to 31D in the XY plane, the size and shape of the region where the light shielding portions 30A to 30D of the four glass substrates 29A to 29D overlap can be changed. Here, by adjusting the positional relationship in the Y direction between the glass substrates 29A, 29B (light shielding portions 30A, 30B) and the glass substrates 29C, 29D (light shielding portions 30C, 30D), the rectangular substrate 17 in the X direction is adjusted. The width of the irradiation area in the Y direction with respect to the extended side (short side) can be adjusted. Then, by adjusting the positional relationship in the X direction between the glass substrates 29A, 29D (light shielding portions 30A, 30D) and the glass substrates 29B, 29C (light shielding portions 30B, 30C), the rectangular substrate 17 extends in the Y direction. It is possible to adjust the width in the X direction of the irradiation area with respect to the side (long side). At this time, since the positions of the glass substrates 29A to 29D (light-shielding portions 30A to 30D) in the XY directions can be set independently, the width and the aspect ratio of the irradiation area formed around the square substrate 17 can be set. Can be changed.

The blind shown in FIG. 8 is obtained by combining the single light source and the irradiation optical system shown in the second embodiment with the substrate 17.
The four sides (all sides) are collectively exposed. At this time, in the blind shown in FIG. 8, the mechanism for driving the blinds (glass substrates 29A to 29D, light shielding units 30A to 30D) can be provided outside the substrate 17 on the XY plane. Mechanism is substrate 17
It does not block the light (irradiation light) going to. Therefore, substrate 1
7 can be exposed simultaneously (all sides),
It is possible to dramatically improve the throughput.
If the throughput is not so required, the same throughput can be used to make the lamp itself a somewhat lower output lamp.

The blind shown in FIG. 8 can be combined with the one shown in the first embodiment in which a plurality of light sources and an irradiation optical system are combined to form an irradiation area at a plurality of places on the substrate 17. It is. Next, a third embodiment will be described with reference to FIGS. FIG. 9 is a YZ plan view of the peripheral exposure apparatus according to the third embodiment. FIG. 10 is a YZ plan view showing a blind portion in the peripheral exposure apparatus of FIG.
FIG. 11 is an XY plan view showing the vicinity of the blind portion in the peripheral exposure apparatus of FIG.

In FIG. 9, members having the same functions as those in the first and second embodiments are denoted by the same reference numerals. In FIG. 9, light from an extra-high pressure mercury lamp 10 as a light source is condensed by an elliptical mirror 12 positioned such that a light emitting portion of the light source 10 is located at a first focal position, and has a predetermined wavelength (for example, a wavelength of 400 nm or less). ) Is guided to the irradiation unit 33 via the dichroic mirror 12 that reflects only).
In the irradiation unit 33, for example, the second
A collimator lens (optical integrator) for collimating light from the light source image formed at the focal position, a fly-eye lens for forming a secondary light source composed of a plurality of light source images from the collimated light, and a fly-eye lens.
It contains a condenser lens system that collects light from the next light source. Note that the irradiation unit 33 does not collimate the light from the elliptical mirror 12 and
A configuration in which a light source image formed at a focal position is directly projected on a fly-eye lens, a configuration in which a light source image formed by an elliptical mirror 12 is re-imaged in a fly-eye lens by a relay optical system, and an optical integrator as shown in FIG. A configuration using a rod-type integrator is also applicable.

The light from the irradiation unit 33 is reflected by a plane mirror 34 as an optical path bending mirror, and irradiates an area covering the entire surface of the substrate 17. Also in the present embodiment, movable blind portions 35A and 35B for limiting (blocking) light from the irradiation optical system and forming an irradiation region of a desired shape on the substrate 17 are provided directly above the substrate 17. ing.

Referring to FIG. 10, movable blind portion 35
A and 35B will be described. Since the configurations of the movable blind portions 35A and 35B in the present embodiment are the same, only the configuration of one of the possible blind portions 35A will be described here. In FIG. 10, the movable blind portion 35A is provided so as to be movable in the Y direction by being guided by a linear guide 36 linearly extending along the Y direction.
Two movable edge portions 351A and 352A, and a foldable bellows (bellows) provided between these two movable edge portions 351A and 352A and provided with a width in the Y direction so as to be stretchable.
353A. With this configuration, the movable edge portion 3
Light traveling toward the substrate 17 through the space between 51A and 352A is shielded by the folding bellows 353A, and the movable edge 35
1A and 352A in the Y direction (movable edge 3
Light passing through the + Y direction side of 51A and the −Y direction side of the movable edge portion 352A) is guided to the substrate 17. Therefore, the width of the irradiation area on the substrate 17 in the Y direction can be changed by moving the movable edge portions 351A and 352A in the Y direction. The movable edge 352A and the movable edge 35
By adjusting the interval between 1B, the width in the Y direction of the irradiation area formed near the center of the substrate 17 can be adjusted,
By overlapping the movable edge portions 352A and 351B, the central portion of the substrate 17 can not be exposed. At this time, it is preferable that the heights of the blades 3520A and 3510B formed at the ends of the movable edge portions 352A and 351B in the Z direction are slightly different.

Referring to FIG. 11, the positional relationship between the substrate 17 and a mechanism for driving the movable blinds 35A and 35B will be described. In FIG. 11, two linear guides 36L and 36R are provided so as to sandwich the position where the substrate 17 is placed. Here, each movable edge portion 351A, 35
Each of the linear guides 1B, 352A, and 352B is guided by these linear guides 36L and 36R so as to be movable in the Y direction. The motors 371LA, 371LB, 371RA, and 37 are located outside the linear guides.
1RB and feed screw 372LA, 372LB, 372R
Drive units 37L and 37R containing A and 372RB are provided. Here, + X of the movable edge portion 351A
The end in the direction is driven via a feed screw 372LA which is rotationally driven by a motor 371LA. Similarly, the end of the movable edge portion 351B in the −X direction is a feed screw 372RA.
The end of the movable edge 352A in the + X direction is driven by a motor 371LB via a feed screw 372LB, and the end of the movable edge 352B in the -X direction is via a feed screw 372RB. Driven by the motor 371RB.

Returning to FIG. 9, the peripheral exposure apparatus of the third embodiment has a substrate rotating unit 38 for rotating a rectangular substrate by 90 °, and performs exposure before and after the substrate is rotated by 90 °. Thereby, a cross-shaped exposure region (irradiation region) as shown in FIG. 4 can be formed on the substrate 17. The exposure operation for obtaining the irradiation area in FIG. 4 will be briefly described. First, after setting the positions of the movable blinds 35A and 35B in the Y direction to desired positions, exposure is performed on the irradiation regions 171, 172, and 176 via the irradiation optical system. Thereafter, the substrate 17 is rotated by 90 ° by the substrate rotating unit 38, and the positions of the movable blinds 35A and 35B in the Y direction are set to desired positions, and the exposure regions 173, 174, and 175 are exposed through the irradiation optical system. I do.

In the third embodiment, the movable edges 351A, 351B, 352A, 352A,
Although the space between 352B is covered with the light shielding member composed of the folding bellows 353A and 353B, the structure shown in FIG. 12 is also possible. Here, FIG. 12A shows the movable edge portion 351.
A and 352A and between the movable edge portions 351B and 352B are covered with curtain-shaped light shielding members 354A and 354B, and correspond to changes in the interval between the movable edge portions 351A and 352A and the interval between the movable edge portions 351B and 352B. For this purpose, a modified example is shown in which winding rollers 355A and 355B for winding curtain-shaped light shielding members 354A and 354B are provided.

FIG. 12B shows a rotary roller 356 in place of the winding rollers 355A and 355B of FIG.
A, 356B, and a tension mechanism (tensile spring) 357A, 3 for applying tension to the ends of the curtain-shaped light shielding members 354A, 354B.
57B. And FIG. 12 (c)
Flat light shielding plates 358A, 359A extending inward are formed on the movable edge portions 351A, 352A, and flat light shielding plates 358B, 359B extending inward are formed on the movable edge portions 351B, 352B. is there. At this time, the heights of the light shielding plates 358A and 359A in the Z direction are slightly different from each other, and the heights of the light shielding plates 358B and 359B in the Z direction are slightly different from each other. In the modification of FIG. 12C, the movable edge portions 351A and 351A
The light shielding plate is provided so as to cover between 2A and between the movable edge portions 351B and 352B.
A, 351B so as to cover the space between them.
8B may be formed. At this time, the movable edge 3
Not only can the width of the irradiation region formed between 52A and 351B be made variable, but also during this time (near the center of substrate 17).
It is also possible not to form an irradiation area on the substrate.

The blind portion shown in FIGS. 10 and 12 can be applied to the peripheral exposure apparatuses of the first and second embodiments. In the third embodiment, two movable blind portions are provided. However, as in the second embodiment, one movable blind portion may be provided. As described above, according to each embodiment of the present invention, the exposure light
Even when exposure is performed using light of nm or less, the price of the fiber itself is lower than that of a case where only the fiber of quartz is used, and the fiber is different from the configuration in which the fiber runs around the substrate. There is no stress on itself and no disconnection. Furthermore, a large-sized guide for scanning the fiber and a mechanism for scanning at a constant speed are not required, so that a significant cost reduction and a stable peripheral exposure apparatus are realized. In addition, since the optical system is fixedly arranged, if the lamp power is increased to increase the throughput, the illuminance will increase,
It is also possible to easily improve the throughput.

In each of the above embodiments, it is assumed that exposure light having a wavelength of 400 nm or less is used.
It is not limited to an apparatus using exposure light of 0 nm or less.

[0067]

According to the present invention as described above, the exposure width can be easily expanded without using a long quartz fiber, so that it is possible to make the structure inexpensive and to not move the fiber itself. It is possible to provide an inexpensive peripheral exposure apparatus having excellent durability.

[Brief description of the drawings]

FIG. 1 is a plan view showing a schematic configuration of a peripheral exposure apparatus according to a first embodiment of the present invention.

FIG. 2 is a perspective view showing the overall configuration of the peripheral exposure apparatus according to the first embodiment.

FIG. 3 is a plan view showing a main part of a peripheral exposure apparatus according to a modification of the first embodiment.

FIG. 4 is a plan view showing an example of an irradiation area formed on a substrate using a peripheral exposure apparatus according to a modification of the first embodiment.

FIG. 5 is a plan view showing a modification of the first embodiment.

FIG. 6 is a perspective view showing an entire configuration of a peripheral exposure apparatus according to a second embodiment of the present invention.

FIG. 7 is a view showing a modification of the peripheral exposure apparatus according to the second embodiment.

FIG. 8 is a view showing a main part of a modification of the peripheral exposure apparatus according to the second embodiment.

FIG. 9 is a view showing a schematic configuration of a peripheral exposure apparatus according to a third embodiment of the present invention.

FIG. 10 is a diagram showing a main part of a peripheral exposure apparatus according to a third embodiment.

FIG. 11 is a plan view showing a peripheral exposure apparatus according to a third embodiment.

FIG. 12 is a diagram showing a main part of a peripheral exposure apparatus according to a modification of the third embodiment.

[Explanation of symbols]

 10A, 10B: light source 16A, 16B: blind (exposure area variable means) 17: substrate

 ──────────────────────────────────────────────────続 き Continuing on the front page (72) Inventor Takahiro Horikoshi 3-2-2, Marunouchi, Chiyoda-ku, Tokyo Nikon Corporation (72) Inventor Tetsuo Kikuchi 3-2-2, Marunouchi, Chiyoda-ku, Tokyo Stock Company F term in Nikon Corporation (reference) 2H097 AA02 AA04 AA08 BB01 CA05 CA07 CA12 LA10 LA12 5F046 AA05 AA06 CA07 CB05 CB13 CC03 CC05 CC06 DA02 DA30 DB01

Claims (12)

[Claims] 1. A peripheral exposure apparatus for irradiating an exposure light to an area different from an area where a predetermined circuit pattern on a photosensitive material applied to a square substrate is transferred, and supplying the exposure light. A light source; an illumination optical system for directing exposure light from the light source to the substrate; and an illumination region disposed between the light source and the substrate to limit an exposure region that is a region on the substrate where the exposure light is irradiated. Exposure area varying means for performing exposure to the different areas of the substrate while the light source, the illumination optical system and the exposure area variable means and the substrate are relatively stationary. A peripheral exposure apparatus characterized by the above-mentioned. 2. The periphery according to claim 1, wherein a longitudinal direction of said exposure area formed by said illumination optical system and said exposure area variable means is set longer than a predetermined side of said substrate. Exposure equipment. 3. A lateral direction of the exposure area formed by the illumination optical system and the exposure area variable means is set shorter than a side adjacent to a side of the substrate on which the exposure area is formed. The peripheral exposure apparatus according to claim 2, wherein: 4. The exposure area variable means has at least a first exposure area variable means and a second exposure area variable means, and sets at least two areas around the rectangular substrate as the exposure area. 4. The peripheral exposure apparatus according to claim 1, wherein the at least two exposure areas are exposed simultaneously. 5. The illumination optical system according to claim 1, wherein the illumination optical system includes a first illumination optical system and a second illumination optical system.
The peripheral exposure apparatus according to claim 4, further comprising at least an illumination optical system. 6. An illumination optical system according to claim 1, wherein said illumination optical system has an optical integrator for making illuminance of said exposure area on said substrate substantially uniform.
A peripheral exposure apparatus according to any one of the preceding claims. 7. The apparatus according to claim 1, further comprising a substrate rotating mechanism for rotating said rectangular substrate by approximately 90 °, wherein said exposure region formed by said exposure region variable means crosses a long side or a short side of said substrate. The method according to claim 1, wherein after the exposure on the long side or the short side of the substrate, the substrate is rotated by the substrate rotation mechanism to perform the exposure on the short side or the long side of the substrate. 6
A peripheral exposure apparatus according to any one of the preceding claims. 8. The exposure area is provided so as to be changeable, and a width of a maximum area of the changeable exposure area in a direction orthogonal to a side of the substrate is a length of a long side and a length of a short side of the substrate. 2. The width including half of the difference between
A peripheral exposure apparatus according to any one of claims 1 to 7. 9. The apparatus according to claim 1, wherein said exposure area formed by said illumination optical system and said exposure area changing means is formed simultaneously on all sides of said substrate. A peripheral exposure apparatus according to claim 1. 10. The exposure area variable means is provided corresponding to each side of the substrate, and the exposure area variable means corresponding to at least one of the sides of the substrate can be selectively set or retracted. The peripheral exposure apparatus according to claim 1, wherein: 11. A method according to claim 11, further comprising: a plurality of exposure area variable means; and a driving means for setting the plurality of exposure area variable means at a desired position. And after setting the plurality of exposure region variable means at predetermined positions, simultaneously exposing at least two sides of each side of the substrate. The peripheral exposure apparatus according to claim 1, wherein: 12. A first step of applying the photosensitive material to the square substrate, and a second step of transferring a circuit pattern to a predetermined region on the photosensitive material on the square substrate. A third step of irradiating an exposure light to a region where the circuit pattern is transferred, using the peripheral exposure apparatus according to any one of claims 11 to 11, wherein the third step is the same as that of the second step. A peripheral exposure method performed before or after.