JP2000284178A - 投影光学系及び該投影光学系を備える投影露光装置 - Google Patents

投影光学系及び該投影光学系を備える投影露光装置

Info

Publication number
JP2000284178A
JP2000284178A JP11086435A JP8643599A JP2000284178A JP 2000284178 A JP2000284178 A JP 2000284178A JP 11086435 A JP11086435 A JP 11086435A JP 8643599 A JP8643599 A JP 8643599A JP 2000284178 A JP2000284178 A JP 2000284178A
Authority
JP
Japan
Prior art keywords
optical system
optical element
light
projection
optical
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
JP11086435A
Other languages
English (en)
Japanese (ja)
Other versions
JP2000284178A5 (enrdf_load_stackoverflow
Inventor
Tokuo Murayama
徳雄 村山
Tetsuo Takahashi
哲男 高橋
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nikon Corp
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corp filed Critical Nikon Corp
Priority to JP11086435A priority Critical patent/JP2000284178A/ja
Publication of JP2000284178A publication Critical patent/JP2000284178A/ja
Publication of JP2000284178A5 publication Critical patent/JP2000284178A5/ja
Withdrawn legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70225—Optical aspects of catadioptric systems, i.e. comprising reflective and refractive elements

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Lenses (AREA)
JP11086435A 1999-03-29 1999-03-29 投影光学系及び該投影光学系を備える投影露光装置 Withdrawn JP2000284178A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP11086435A JP2000284178A (ja) 1999-03-29 1999-03-29 投影光学系及び該投影光学系を備える投影露光装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP11086435A JP2000284178A (ja) 1999-03-29 1999-03-29 投影光学系及び該投影光学系を備える投影露光装置

Publications (2)

Publication Number Publication Date
JP2000284178A true JP2000284178A (ja) 2000-10-13
JP2000284178A5 JP2000284178A5 (enrdf_load_stackoverflow) 2006-06-29

Family

ID=13886847

Family Applications (1)

Application Number Title Priority Date Filing Date
JP11086435A Withdrawn JP2000284178A (ja) 1999-03-29 1999-03-29 投影光学系及び該投影光学系を備える投影露光装置

Country Status (1)

Country Link
JP (1) JP2000284178A (enrdf_load_stackoverflow)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2005015316A3 (en) * 2003-08-12 2005-08-18 Zeiss Carl Smt Ag Projection objective for microlithography
CN115113366A (zh) * 2022-05-23 2022-09-27 江西晶超光学有限公司 光学系统、镜头模组和电子设备

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2005015316A3 (en) * 2003-08-12 2005-08-18 Zeiss Carl Smt Ag Projection objective for microlithography
CN115113366A (zh) * 2022-05-23 2022-09-27 江西晶超光学有限公司 光学系统、镜头模组和电子设备
CN115113366B (zh) * 2022-05-23 2023-12-15 江西欧菲光学有限公司 光学系统、镜头模组和电子设备

Similar Documents

Publication Publication Date Title
JP4345232B2 (ja) 反射屈折結像光学系および該光学系を備えた投影露光装置
JP4717974B2 (ja) 反射屈折光学系及び該光学系を備える投影露光装置
US7030965B2 (en) Catadioptric system and exposure device having this system
KR101647934B1 (ko) 투영 광학계, 노광 장치 및 노광 방법
JP4292497B2 (ja) 投影光学系、露光装置および露光方法
US20040160677A1 (en) Catadioptric reduction lens
JPH103039A (ja) 反射屈折光学系
JP2003114387A (ja) 反射屈折光学系および該光学系を備える投影露光装置
JP2004333761A (ja) 反射屈折型の投影光学系、露光装置、および露光方法
JP4780364B2 (ja) 反射屈折光学系および該光学系を備えた露光装置
JP2002208551A (ja) 反射屈折光学系及び投影露光装置
JP2004317534A (ja) 反射屈折型の結像光学系、露光装置、および露光方法
US6600550B1 (en) Exposure apparatus, a photolithography method, and a device manufactured by the same
JP2006086141A (ja) 投影光学系、露光装置、および露光方法
JP2000133588A (ja) 露光装置及び方法、該露光装置の製造方法並びに該露光装置を用いたデバイス製造方法
JP2002082285A (ja) 反射屈折光学系および該光学系を備えた露光装置
JP2000195772A (ja) 投影露光装置
JP2000284178A (ja) 投影光学系及び該投影光学系を備える投影露光装置
JP4868209B2 (ja) 投影光学系、露光装置、および露光方法
JP2000206410A (ja) 投影光学系、投影露光装置、及び投影露光方法
JP2000221405A (ja) 投影光学系、投影露光装置、及び投影露光方法
JPH11354436A (ja) 投影露光装置及び方法、並びに反射屈折光学系
JP2004004415A (ja) 投影光学系、露光装置および露光方法
JP2000208396A (ja) 視野絞り投影光学系及び投影露光装置
JP2018077519A (ja) 露光装置、露光方法およびデバイス製造方法

Legal Events

Date Code Title Description
A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20060111

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20060510

A761 Written withdrawal of application

Free format text: JAPANESE INTERMEDIATE CODE: A761

Effective date: 20090218