WO2005015316A3 - Projection objective for microlithography - Google Patents

Projection objective for microlithography Download PDF

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Publication number
WO2005015316A3
WO2005015316A3 PCT/EP2004/008220 EP2004008220W WO2005015316A3 WO 2005015316 A3 WO2005015316 A3 WO 2005015316A3 EP 2004008220 W EP2004008220 W EP 2004008220W WO 2005015316 A3 WO2005015316 A3 WO 2005015316A3
Authority
WO
WIPO (PCT)
Prior art keywords
radiance
projection objective
image plane
distribution
beam height
Prior art date
Application number
PCT/EP2004/008220
Other languages
French (fr)
Other versions
WO2005015316A2 (en
Inventor
David Shafer
Alexander Epple
Wilhelm Ulrich
Original Assignee
Zeiss Carl Smt Ag
David Shafer
Alexander Epple
Wilhelm Ulrich
Beierl Helmut
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Zeiss Carl Smt Ag, David Shafer, Alexander Epple, Wilhelm Ulrich, Beierl Helmut filed Critical Zeiss Carl Smt Ag
Publication of WO2005015316A2 publication Critical patent/WO2005015316A2/en
Publication of WO2005015316A3 publication Critical patent/WO2005015316A3/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70225—Optical aspects of catadioptric systems, i.e. comprising reflective and refractive elements

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Lenses (AREA)

Abstract

A projection objective for projecting a pattern of a mask arranged in an object plane of the projection objective into an image plane of the projection objective has a pupil surface (11) near the image plane, a radiance transformation group (100) that is arranged at a distance upstream of the image plane (4); and an aperture-generating group (200) arranged downstream of the radiance transformation group. The radiance transformation group is designed to transform an input radiance distribution with a uniform angular radiance that is substantially independent of beam height into an output radiance distribution with a nonuniform angular radiance that is dependent on beam height, wherein the angular radiance decreases with increasing beam height, at least in a region near a maximum beam height. The output radiance distribution is adapted to beam guidance properties of the aperture-generating group in such a way that the sine condition is substantially fulfilled in the image plane for all beams of the input light distribution.
PCT/EP2004/008220 2003-08-12 2004-07-23 Projection objective for microlithography WO2005015316A2 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US49412303P 2003-08-12 2003-08-12
US60/494,123 2003-08-12

Publications (2)

Publication Number Publication Date
WO2005015316A2 WO2005015316A2 (en) 2005-02-17
WO2005015316A3 true WO2005015316A3 (en) 2005-08-18

Family

ID=34135321

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/EP2004/008220 WO2005015316A2 (en) 2003-08-12 2004-07-23 Projection objective for microlithography

Country Status (1)

Country Link
WO (1) WO2005015316A2 (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8908269B2 (en) 2004-01-14 2014-12-09 Carl Zeiss Smt Gmbh Immersion catadioptric projection objective having two intermediate images
US8913316B2 (en) 2004-05-17 2014-12-16 Carl Zeiss Smt Gmbh Catadioptric projection objective with intermediate images
US9086635B2 (en) 2003-05-06 2015-07-21 Nikon Corporation Projection optical system, exposure apparatus, and exposure method
US9500943B2 (en) 2003-05-06 2016-11-22 Nikon Corporation Projection optical system, exposure apparatus, and exposure method

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7466489B2 (en) 2003-12-15 2008-12-16 Susanne Beder Projection objective having a high aperture and a planar end surface
JP5102492B2 (en) 2003-12-19 2012-12-19 カール・ツァイス・エスエムティー・ゲーエムベーハー Objective lens for microlithography projection with crystal elements
US20080151364A1 (en) 2004-01-14 2008-06-26 Carl Zeiss Smt Ag Catadioptric projection objective
KR101653514B1 (en) 2005-06-02 2016-09-01 칼 짜이스 에스엠티 게엠베하 Microlithography projection objective

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5392119A (en) * 1993-07-13 1995-02-21 Litel Instruments Plate correction of imaging systems
US5835285A (en) * 1995-01-06 1998-11-10 Nikon Corporation Projection optical system and exposure apparatus using the same
JP2000284178A (en) * 1999-03-29 2000-10-13 Nikon Corp Projection optical system and projection exposure device equipped with the projection optical system
US6392822B1 (en) * 1996-06-19 2002-05-21 Nikon Corporation Dual-imaging optical system

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5392119A (en) * 1993-07-13 1995-02-21 Litel Instruments Plate correction of imaging systems
US5835285A (en) * 1995-01-06 1998-11-10 Nikon Corporation Projection optical system and exposure apparatus using the same
US6392822B1 (en) * 1996-06-19 2002-05-21 Nikon Corporation Dual-imaging optical system
JP2000284178A (en) * 1999-03-29 2000-10-13 Nikon Corp Projection optical system and projection exposure device equipped with the projection optical system

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
PATENT ABSTRACTS OF JAPAN vol. 2000, no. 13 5 February 2001 (2001-02-05) *

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9086635B2 (en) 2003-05-06 2015-07-21 Nikon Corporation Projection optical system, exposure apparatus, and exposure method
US9500943B2 (en) 2003-05-06 2016-11-22 Nikon Corporation Projection optical system, exposure apparatus, and exposure method
US8908269B2 (en) 2004-01-14 2014-12-09 Carl Zeiss Smt Gmbh Immersion catadioptric projection objective having two intermediate images
US8913316B2 (en) 2004-05-17 2014-12-16 Carl Zeiss Smt Gmbh Catadioptric projection objective with intermediate images
US9019596B2 (en) 2004-05-17 2015-04-28 Carl Zeiss Smt Gmbh Catadioptric projection objective with intermediate images
US9134618B2 (en) 2004-05-17 2015-09-15 Carl Zeiss Smt Gmbh Catadioptric projection objective with intermediate images

Also Published As

Publication number Publication date
WO2005015316A2 (en) 2005-02-17

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