JP2000260803A - 半導体装置とその製造方法 - Google Patents
半導体装置とその製造方法Info
- Publication number
- JP2000260803A JP2000260803A JP2000005026A JP2000005026A JP2000260803A JP 2000260803 A JP2000260803 A JP 2000260803A JP 2000005026 A JP2000005026 A JP 2000005026A JP 2000005026 A JP2000005026 A JP 2000005026A JP 2000260803 A JP2000260803 A JP 2000260803A
- Authority
- JP
- Japan
- Prior art keywords
- film
- electrode
- electrode film
- photosensitive resin
- plating layer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/10—Bump connectors; Manufacturing methods related thereto
- H01L2224/11—Manufacturing methods
Landscapes
- Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2000005026A JP2000260803A (ja) | 1999-01-05 | 2000-01-04 | 半導体装置とその製造方法 |
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP11-309 | 1999-01-05 | ||
JP30999 | 1999-01-05 | ||
JP2000005026A JP2000260803A (ja) | 1999-01-05 | 2000-01-04 | 半導体装置とその製造方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2000260803A true JP2000260803A (ja) | 2000-09-22 |
JP2000260803A5 JP2000260803A5 (da) | 2007-02-15 |
Family
ID=26333266
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2000005026A Pending JP2000260803A (ja) | 1999-01-05 | 2000-01-04 | 半導体装置とその製造方法 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP2000260803A (da) |
Cited By (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7863739B2 (en) | 2001-03-05 | 2011-01-04 | Megica Corporation | Low fabrication cost, fine pitch and high reliability solder bump |
KR101009192B1 (ko) * | 2008-12-10 | 2011-01-19 | 주식회사 네패스 | 반도체 장치의 범프 구조물 및 그 제조방법 |
US7902679B2 (en) | 2001-03-05 | 2011-03-08 | Megica Corporation | Structure and manufacturing method of a chip scale package with low fabrication cost, fine pitch and high reliability solder bump |
US7960270B2 (en) | 2002-01-07 | 2011-06-14 | Megica Corporation | Method for fabricating circuit component |
US8021976B2 (en) | 2002-10-15 | 2011-09-20 | Megica Corporation | Method of wire bonding over active area of a semiconductor circuit |
US8021921B2 (en) | 2002-10-25 | 2011-09-20 | Megica Corporation | Method of joining chips utilizing copper pillar |
US8067837B2 (en) | 2004-09-20 | 2011-11-29 | Megica Corporation | Metallization structure over passivation layer for IC chip |
US8178967B2 (en) | 2001-09-17 | 2012-05-15 | Megica Corporation | Low fabrication cost, high performance, high reliability chip scale package |
US8294279B2 (en) | 2005-01-25 | 2012-10-23 | Megica Corporation | Chip package with dam bar restricting flow of underfill |
US8481418B2 (en) | 2002-05-01 | 2013-07-09 | Megica Corporation | Low fabrication cost, high performance, high reliability chip scale package |
US8901733B2 (en) | 2001-02-15 | 2014-12-02 | Qualcomm Incorporated | Reliable metal bumps on top of I/O pads after removal of test probe marks |
JP2019161108A (ja) * | 2018-03-15 | 2019-09-19 | 日亜化学工業株式会社 | 発光装置、発光素子、及び、発光素子の製造方法 |
CN113324202A (zh) * | 2021-06-07 | 2021-08-31 | 厦门天马微电子有限公司 | 灯条、包括灯条的背光模组及显示装置 |
-
2000
- 2000-01-04 JP JP2000005026A patent/JP2000260803A/ja active Pending
Cited By (28)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US8138079B2 (en) | 1998-12-21 | 2012-03-20 | Megica Corporation | Method of wire bonding over active area of a semiconductor circuit |
US8901733B2 (en) | 2001-02-15 | 2014-12-02 | Qualcomm Incorporated | Reliable metal bumps on top of I/O pads after removal of test probe marks |
US8072070B2 (en) | 2001-03-05 | 2011-12-06 | Megica Corporation | Low fabrication cost, fine pitch and high reliability solder bump |
US7902679B2 (en) | 2001-03-05 | 2011-03-08 | Megica Corporation | Structure and manufacturing method of a chip scale package with low fabrication cost, fine pitch and high reliability solder bump |
US7863739B2 (en) | 2001-03-05 | 2011-01-04 | Megica Corporation | Low fabrication cost, fine pitch and high reliability solder bump |
US8368213B2 (en) | 2001-03-05 | 2013-02-05 | Megica Corporation | Low fabrication cost, fine pitch and high reliability solder bump |
US8158508B2 (en) | 2001-03-05 | 2012-04-17 | Megica Corporation | Structure and manufacturing method of a chip scale package |
US9369175B2 (en) | 2001-09-17 | 2016-06-14 | Qualcomm Incorporated | Low fabrication cost, high performance, high reliability chip scale package |
US8178967B2 (en) | 2001-09-17 | 2012-05-15 | Megica Corporation | Low fabrication cost, high performance, high reliability chip scale package |
US8890336B2 (en) | 2002-01-07 | 2014-11-18 | Qualcomm Incorporated | Cylindrical bonding structure and method of manufacture |
US7960270B2 (en) | 2002-01-07 | 2011-06-14 | Megica Corporation | Method for fabricating circuit component |
US8461679B2 (en) | 2002-01-07 | 2013-06-11 | Megica Corporation | Method for fabricating circuit component |
US8481418B2 (en) | 2002-05-01 | 2013-07-09 | Megica Corporation | Low fabrication cost, high performance, high reliability chip scale package |
US9142527B2 (en) | 2002-10-15 | 2015-09-22 | Qualcomm Incorporated | Method of wire bonding over active area of a semiconductor circuit |
US8026588B2 (en) | 2002-10-15 | 2011-09-27 | Megica Corporation | Method of wire bonding over active area of a semiconductor circuit |
US9153555B2 (en) | 2002-10-15 | 2015-10-06 | Qualcomm Incorporated | Method of wire bonding over active area of a semiconductor circuit |
US8021976B2 (en) | 2002-10-15 | 2011-09-20 | Megica Corporation | Method of wire bonding over active area of a semiconductor circuit |
US8742580B2 (en) | 2002-10-15 | 2014-06-03 | Megit Acquisition Corp. | Method of wire bonding over active area of a semiconductor circuit |
US8421222B2 (en) | 2002-10-25 | 2013-04-16 | Megica Corporation | Chip package having a chip combined with a substrate via a copper pillar |
US8021921B2 (en) | 2002-10-25 | 2011-09-20 | Megica Corporation | Method of joining chips utilizing copper pillar |
US8742582B2 (en) | 2004-09-20 | 2014-06-03 | Megit Acquisition Corp. | Solder interconnect on IC chip |
US8067837B2 (en) | 2004-09-20 | 2011-11-29 | Megica Corporation | Metallization structure over passivation layer for IC chip |
US8294279B2 (en) | 2005-01-25 | 2012-10-23 | Megica Corporation | Chip package with dam bar restricting flow of underfill |
KR101009192B1 (ko) * | 2008-12-10 | 2011-01-19 | 주식회사 네패스 | 반도체 장치의 범프 구조물 및 그 제조방법 |
JP2019161108A (ja) * | 2018-03-15 | 2019-09-19 | 日亜化学工業株式会社 | 発光装置、発光素子、及び、発光素子の製造方法 |
US10727385B2 (en) | 2018-03-15 | 2020-07-28 | Nichia Corporation | Light emitting device, light emitting element and method for manufacturing the light emitting element |
CN113324202A (zh) * | 2021-06-07 | 2021-08-31 | 厦门天马微电子有限公司 | 灯条、包括灯条的背光模组及显示装置 |
CN113324202B (zh) * | 2021-06-07 | 2022-05-17 | 厦门天马微电子有限公司 | 灯条、包括灯条的背光模组及显示装置 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
A521 | Written amendment |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20061224 |
|
A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20061224 |
|
A977 | Report on retrieval |
Free format text: JAPANESE INTERMEDIATE CODE: A971007 Effective date: 20090327 |
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A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20091124 |
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A02 | Decision of refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A02 Effective date: 20100601 |