JP2000258626A - Filter for plasma display - Google Patents

Abstract

PROBLEM TO BE SOLVED: To easily fix a filter on the surface of a plasma display in a producing step and to reduce the thickness and weight of the plasma display by providing a structure obtained by disposing a near IR absorbing layer and an electromagnetic wave shielding layer on a transparent resin substrate and disposing an adhesive layer on the surface of the structure. SOLUTION: The filter stuck on the front face of a plasma display is a transparent laminated body obtained by disposing a near IR absorbing layer and an electromagnetic wave shielding layer on a transparent resin substrate comprising a polyester resin, a polycarbonate resin or the like. The near IR absorbing layer has <=15% near IR transmittance in the wavelength range of 800-1,100 nm. A transparent electrically conductive film of a metal, a metal oxide or the like capable of transmitting visible light or a mesh comprising an electrically conductive material is used as the electromagnetic wave shielding layer. An adhesive layer is disposed on the filter. The filter is stuck on the front face of a plasma display by way of the adhesive layer during or after the production of the plasma display.

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

The present invention relates to a filter for a plasma display. More specifically, the present invention relates to a filter which is provided on the front surface of a plasma display and cuts electromagnetic waves and near infrared rays generated from the plasma display, and which is very effective for simplifying a manufacturing process.

[0002]

2. Description of the Related Art In recent years, a plasma display has been rapidly developed as an image display device. However, due to the structure of the plasma display, electromagnetic waves and near infrared rays are emitted. For this reason, filter layers that block various electromagnetic waves and near-infrared rays have been developed.However, plasma display screens are usually large, and it is complicated in the process to form various filter layers on this surface. It costs money. For this reason, a post-installation type filter in which the filter is formed as a laminate different from the plasma display and is hung later in front of the plasma display has been considered.
This post-installation type filter is manufactured in a separate process from the plasma display, so the complexity of the process is reduced, but the thickness of the filter itself must be increased because the filter itself must have self-standing strength. Therefore, the plasma display device as a whole becomes thicker and heavier, which is not desirable from the development goal of a thin and lightweight display, and the cost remains.

[0003]

SUMMARY OF THE INVENTION It is an object of the present invention to provide a filter which can be easily attached to the surface of a plasma display during the manufacturing process of the plasma display or after the manufacturing of the plasma display. It is an object of the present invention to provide a filter that solves the problem.

[0004]

The gist of the present invention is to provide a filter which is used by being attached to the front surface of a plasma display panel, and has a structure in which a near infrared absorbing layer and an electromagnetic wave shielding layer are provided on a transparent resin base material. And a filter for a plasma display characterized in that an adhesive layer is provided on the surface thereof.

[0005]

DESCRIPTION OF THE PREFERRED EMBODIMENTS The present invention will be described below in detail. (1) Transparent Resin Substrate The transparent resin that is the material of the transparent resin substrate constituting the transparent laminate of the present invention may be any resin that is substantially transparent and does not significantly absorb or scatter light. Although there is no particular limitation, specific examples thereof include polyester resin, polycarbonate resin, poly (meth) acrylate resin, cyclic olefin resin, polystyrene, polyvinyl chloride, polyvinyl acetate, and the like. be able to.

(A) Polyester Resin A polyester resin is produced by a polycondensation reaction between a dicarboxylic acid component and a glycol component. As the dicarboxylic acid component, terephthalic acid, adipic acid,
Examples of glycol components such as maleic acid include ethylene glycol, propylene glycol, 1,4-butanediol and the like. Preferred polyester resins are polyethylene terephthalate, polybutylene terephthalate and the like. Although it is very desirable to use this polyester resin as a transparent resin substrate from the viewpoint of strength and transparency, other resins may be suitably used depending on required physical properties and the like.

(B) Polycarbonate resin The polycarbonate resin is produced by reacting a dihydric phenol with a carbonate precursor by a solution method or a melting method. Examples of dihydric phenols include 2,2
-Bis (4-hydroxyphenyl) propane [bisphenol A], 1,1-bis (4-hydroxyphenyl)
Ethane, 1,1-bis (4-hydroxyphenyl) cyclohexane, 2,2-bis (4-hydroxy-3,5-
Dimethylphenyl) propane, 2,2-bis (4-hydroxy-3,5-dibromophenyl) propane, 2,2
-Bis (4-hydroxy-3-methylphenyl) propane, bis (4-hydroxyphenyl) sulfide, bis (4-hydroxyphenyl) sulfone and the like.
Preferred dihydric phenols include bis (4-hydroxyphenyl) alkanes, particularly those containing bisphenol as a main component. Further, examples of the carbonate precursor include phosgene, diphenyl carbonate and the like.

(C) Poly (meth) acrylate Resin Examples of the poly (meth) acrylate resin include polyacrylate resins and polymethacrylate resins. A typical polymethacrylate resin is a homopolymer of methyl methacrylate or a copolymer of a polymerizable unsaturated monomer mixture containing 50% or more of methyl methacrylate. Examples of the polymerizable unsaturated monomer copolymerizable with methyl methacrylate include methyl acrylate, ethyl (meth) acrylate (meaning ethyl acrylate or ethyl methacrylate; the same applies hereinafter),
Butyl (meth) acrylate, cyclohexyl (meth) acrylate, 2-ethylhexyl (meth) acrylate,
Methoxyethyl (meth) acrylate, ethoxyethyl (meth) acrylate, 2-hydroxyethyl (meth) acrylate, -N, N-diethylaminoethyl (meth) acrylate, glycidyl (meth) acrylate, (meth) Tribromophenyl acrylate, tetrahydrofurfuryl (meth) acrylate, ethylene glycol di (meth) acrylate, triethylene glycol di (meth) acrylate, tripropylene glycol di (meth) acrylate, trimethylolethanedi (meth) acrylate,
Neopentyl glycol di (meth) acrylate, trimethylolpropane tri (meth) acrylate, pentaerythritol tetra (meth) acrylate and the like can be mentioned.

(D) Cyclic Olefin Resin The cyclic olefin resin includes monocyclic olefins such as cyclobutenes, cyclopentenes and cyclohexenes and polycyclic olefins such as norbornenes and tricyclo-3-decenes. A homopolymer obtained by vinylene polymerization of a selected cyclic olefin, a copolymer obtained by vinylene polymerization of a plurality of types of cyclic olefins, or a copolymer of these cyclic olefins with ethylene is exemplified.

Examples of the cyclic olefin include monocyclic cycloolefins such as cyclopentenes such as cyclobutene, cyclopentene and 4-methylcyclopentene; cyclohexenes such as cyclohexene, 3-methylcyclohexene and 3-vinylcyclohexene; norbornene; −
Norbornenes such as methyl norbornene, 5-ethylidene-2-norbornene, methylene norbornene, 5-vinyl-2-norbornene, 5-methylene-2-norbornene, and tricyclo [4.3.0.12,5] -3-decene , 2-methyltricyclo [4.3.0.12,5
] -3-decene and the like, dicyclopentadiene (tricyclo [4.3.0.12,5
] -3,7-decadiene or tricyclo [4.3.
0.12,5] -3,8-decadiene), dicyclopentadienes such as 7-methyldicyclopentadiene, and tetracyclo [4.4.0.12,5.17,10] -3-.
Dodecene, 8-methyltetracyclo [4.4.0.1
2,5.17,10] -3-dodecene, 5,10-dimethyltetracyclo [4.4.0.12,5.17,1
0] -3-dodecene and the like, pentacyclo [6.5.1.13,6. 02,
7.09,13] -4-pentadecene, 10-methylpentacyclo [6.5.1.13, 6.02, 7.09,
13] -4-pentadecene, pentacyclo [4.7.
Pentacyclopentadecenes such as 0.12, 5.08, 13.19, 12] -3-pentadecene, and pentacyclo [6.5.1.13, 6.02, 7.09, 13]-
4,10-pentadecadiene, pentacyclo [6.5.
1.13, 6.02, 7.09, 13] pentacyclopentadecadienes such as -4,11-pentadecadiene,
Hexacyclo [6.6.1.13, 6.110, 13.
And polycyclic cyclic olefins such as hexacycloheptadecenes such as [02,7.09,14] -4-heptadecene.

The transparent resin may contain generally known additives such as antioxidants such as phenol and phosphorus, flame retardants such as halogen and phosphoric acid, heat aging inhibitors, ultraviolet absorbers, lubricants, An antistatic agent or the like can be blended. The transparent resin is formed into a film or a sheet (plate) by a method such as injection molding, T-die molding, calender molding, compression molding, or a method of dissolving in an organic solvent and casting. Used as a transparent resin substrate in the above. At this time, the surface of the transparent resin substrate may be subjected to a known surface treatment, for example, a corona treatment, a plasma treatment, a flame treatment, a chemical treatment, a coating of a primer layer, or the like. The thickness of the transparent resin substrate varies depending on the purpose, but is preferably 10 μm to 5 mm, and more preferably 30 μm.
m to 3 mm, more preferably 50 μm to 500 μm. With such a thickness, handling as a film is easy.

(2) Near-infrared absorbing (cut) layer The near-infrared absorbing layer constituting the transparent laminate of the present invention has a near-infrared transmittance in a wavelength region of 800 to 1100 nm of 15% or less, preferably 10% or less. It is desirable. This near-infrared ray cut layer is prepared by mixing a near-infrared ray absorber into the transparent resin (either directly on the above-mentioned transparent resin substrate or as another layer), or by dispersing or dissolving in an organic solvent and adding a binder resin. By applying a coating liquid obtained by adding a near-infrared absorbing agent to a hard coating agent, an anchor coating agent, an adhesive, or the like, directly or through another layer to a transparent resin substrate. can do. As a near-infrared absorbing agent, an immonium-based compound, a diimonium-based compound or an aminium salt-based compound is preferably used. Examples of the immonium-based compound and the diimonium-based compound include compounds represented by the following formulas (1) to (4).

[0013]

Embedded image

[0014]

Embedded image

[0015]

Embedded image

[0016]

Embedded image

The aminium salt compound includes, for example, a compound represented by the following formula (5). Specific examples of X in the formula include antimonate hexafluoride, perchlorate, boron fluoride, arsenate hexafluoride, periodate, trifluoroacetate, and chloride. .

[0018]

Embedded image

In the present invention, as a near-infrared absorbing agent,
Imonium-based compounds, diimonium-based compounds or aminium salt-based compounds are preferably used, but other near-infrared absorbing agents may be used or used in combination. As other near-infrared absorbing agents, nitroso compounds and metal complexes thereof, which are organic substances, cyanine compounds, squarylium compounds, thiol nickel complex compounds, aminothio-nickel complex salt compounds, phthalocyanine compounds, naphthalocyanine compounds, Triarylmethane compounds, naphthoquinone compounds, anthraquinone compounds, or amino compounds, or inorganic carbon black,
Antimony oxide, tin oxide doped with indium oxide, oxides, carbides, or borides of metals belonging to Group 4, 5, or 6 of the periodic table can be given.

In this case, the wavelength range is 800 to 1100 nm
These compounds can be used in an appropriate combination so that the near-infrared transmittance of the above is 15% or less. Particularly, a combination of a diimonium compound and a phthalocyanine compound or a combination of a diimonium compound and an aminothio-nickel complex salt compound is preferable from the viewpoint of transparency and near-infrared absorption performance. Examples of the phthalocyanine-based compound include a compound having a skeleton represented by the following general formula (6).

R _{1 to} R ₁₆ in the formula are the same or different atoms or functional groups which are the same or different from each other, and specifically, a hydrogen atom, a fluorine atom, an alkoxy group, a phenoxy group, a thioalkyl group, a thiophenyl group At least one selected from an aminoalkyl group and an aminophenyl group
Is a seed. Preferably, it is a fluorine atom or an aminophenyl group. In addition, M in the formula includes at least one selected from copper, zinc, cobalt, nickel, iron, vanadyl, titanyl, chloroindium, chloroaluminum, dichlorotin, cobalt carbonyl, and iron carbonyl.

[0022]

Embedded image

Examples of the aminothio-nickel complex compound include compounds having a skeleton represented by the following general formula (7). R _{1 to} R ₈ in the formula are the same or different atoms, or the same or different functional groups, and specifically, a hydrogen atom, an alkyl group, an aryl group, an aralkyl group, an alkoxy group, a nitro group, It is at least one selected from a halogen atom, an amino group, a substituted amino group or a cyano group. Preferably, it is a hydrogen atom or an amino group.

[0024]

Embedded image

The transparent resin used for forming the near-infrared cut layer by blending the near-infrared absorbing agent with the transparent resin is a resin which is substantially transparent and does not have large absorption and scattering. Although there is no particular limitation, specific examples include the above-mentioned polycarbonate-based resin, poly (meth) acrylate-based resin, cyclic olefin-based resin, polyester resin, polystyrene, polyvinyl chloride, polyvinyl acetate, and the like. Can be. These transparent resins include known additives such as antioxidants such as phenol-based and phosphorus-based ones, halogen agents, flame-retardants such as phosphoric acid-based ones, heat-resistant anti-aging agents, ultraviolet absorbers, lubricants, and antistatic agents. Can be blended.

The above-mentioned transparent resin is mixed with the above-mentioned near-infrared absorbing agent, and is subjected to a method such as injection molding, T-die molding, calender molding, or compression molding, or a method of dissolving in an organic solvent for casting. It is formed into a film or sheet to form a near infrared cut layer. The thickness is preferably from 10 μm to 1 mm. The mixing amount of the near-infrared absorber is usually 0.0
It is 0.5 to 8 parts by weight, preferably 0.01 to 5 parts by weight. If the amount of the near infrared absorbing agent is too small, the transmittance of visible light is improved, but the near infrared absorbing ability is reduced.

On the other hand, if the blending amount is too large, the near-infrared absorbing ability is good, but the visible light transmittance is reduced. In addition, the near-infrared cut layer is dispersed or dissolved in an organic solvent, or a coating solution containing a binder resin added thereto, or a near-infrared absorbing agent, a hard coating agent, an anchor coating agent, a coating solution added to an adhesive, It can also be formed by coating on any of the transparent resin substrate, the electromagnetic wave shielding layer, the anti-scratch layer, and the anti-reflection layer according to the lamination order. As the organic solvent, a halogen-based, alcohol-based, ketone-based, ester-based, aliphatic hydrocarbon-based, aromatic hydrocarbon-based, ether-based solvent, or a mixed solvent thereof is used.

As the binder, ester resins, acrylic resins, melamine resins, urethane resins, polycarbonate resins, polyolefin resins, polyvinyl resins and the like can be used. As the hard coating agent, an acrylate or a polyfunctional acrylate such as polyurethane acrylate or epoxy acrylate, a photopolymerization initiator, and an organic solvent as main components can be used. These hard coat agents 1
The above-mentioned near-infrared absorbing agent is usually added in an amount of
0 parts by weight, preferably 2 to 15 parts by weight, is applied by dipping, flow coating, spraying, bar coating, gravure coating, roll coating, blade coating, air knife coating, etc. Apply by method. Thereafter, the solvent is dried, and the coating liquid is cured by irradiating an active energy ray using a xenon lamp, a low-pressure mercury lamp, a high-pressure mercury lamp, or the like to form a near-infrared cut layer. The thickness of the near-infrared cut layer at this time is usually 0.5
５０50 μm, preferably 1-20 μm.

As the above-mentioned anchor coating agent, known anchor coating agents such as isocyanate type, polyurethane type, polyester type, polyethyleneimine type, polybutadiene type and alkyl titanate type can be used. Preferably, it is an isocyanate compound, a polyurethane, a urethane prepolymer, or a mixture and a reaction product thereof, or a mixture of a polyester polyol or a polyether polyol with an isocyanate. Usually, 1 to 50 parts by weight of the above-mentioned near-infrared absorbing agent is added to 100 parts by weight of these anchor coating agents, and this is dipped, flow coated, sprayed, bar coated, gravure coated, roll coated. Then, coating is performed by a coating method such as a blade coating method and an air knife coating method, and then the solvent is dried to form a near infrared cut layer. The coating amount of the coating liquid at this time, usually, 0.01-5 g / m ² (dry solids), and preferably from 0.1 to 3 g / m ² (dry solids).

Examples of the pressure-sensitive adhesive include rubbers such as styrene-butadiene rubber, polyisobutylene, natural rubber, neoprene, and butyl rubber, and low-polymerized polymers such as alkyl polyacrylates, or piccolite as a tackifier. , Polyester, rosin ester and the like. With respect to 100 parts by weight of these adhesives, the above-mentioned near-infrared absorbing agent is usually 0.05 to 5 parts by weight,
Preferably, 0.1 to 3 parts by weight of an organic solvent such as a halogen-based, alcohol-based, ketone-based, ester-based, ether-based, aliphatic hydrocarbon-based, or aromatic hydrocarbon-based solvent is used alone. Or, the viscosity is adjusted by dispersing or dissolving in a mixed solvent system, a dipping method, a flow coating method,
Coating is performed by a coating method such as a spraying method, a bar coating method, a gravure coating method, a roll coating method, a blade coating method, and an air knife coating method. Dry to form a near infrared cut layer. The thickness of the near-infrared cut layer at this time is usually 5 to 100 μm, preferably 10 to 50 μm.
It is.

(2) Electromagnetic Wave Shielding Layer The electromagnetic wave shielding layer constituting the filter for a plasma display of the present invention is a transparent conductive film or a mesh made of a conductive material that can transmit visible light, such as metal or metal oxide. Used. The transparent conductive film is formed of a metal or a metal oxide forming an electromagnetic wave shielding layer, preferably silver, tin oxide, indium oxide tin oxide (hereinafter referred to as “ITO”), and antimony tin oxide ( (Hereinafter referred to as “ATO”) can be formed directly or indirectly on a transparent resin substrate by a method such as a vacuum evaporation method, an ion plating method, a sputtering method, a CVD method, and a plasma chemical vapor deposition method. Further, it can also be formed by coating a metal paste (a metal fine particle dispersed in a transparent binder) on a transparent substrate. When a transparent conductive film is used, the thickness of the electromagnetic wave shielding layer varies depending on required physical properties and applications, but is preferably in the range of 20 to 300 nm from the viewpoint of transparency.

As the mesh made of the above-mentioned conductive material, a mesh obtained by coating a metal woven with fibers such as polyester or the like, preferably a conductive material such as copper, black metal or carbon black can be used. The fiber diameter at that time is 5 to 100 μm, preferably 20 to 60 μm. Further, a metal foil, preferably a copper foil, is adhered to a film of polyester or the like with an adhesive, and then patterned into a mesh by a photo-etching method such as photoresist coating-exposure-development-wet etching. You can also. At this time, the pattern width {the width (thickness) of the lines constituting the mesh} is 10 to 50 μm, preferably 15 to 30 μm. The mesh made of a conductive material has an aperture ratio of 50% in order to secure light transmittance.
It is desirable to make the above.

(3) Pressure-sensitive adhesive layer The plasma display filter of the present invention is provided with a pressure-sensitive adhesive layer. The filter is attached to the front surface of the plasma display by the adhesive layer during the manufacturing process of the plasma display or after the manufacturing of the plasma display. By doing so, it is not necessary to sequentially provide a near-infrared absorbing layer, an electromagnetic wave shielding layer and other layers on the front surface of the plasma display itself, and since the filter is formed integrally with the plasma display, the thickness of the plasma display is reduced. Becomes possible.

The adhesive constituting the adhesive layer includes styrene butadiene rubber, polyisobutylene, natural rubber,
Rubbers such as neoprene and butyl rubber and low-polymerized polymers such as polymethyl acrylate, polyethyl acrylate and alkyl acrylate such as polybutyl acrylate alone or piccolite and polypeel as tackifiers And rosin esters and the like. When attaching the filter to the plasma display, if air bubbles enter between the surface of the plasma display and the filter, the image will be distorted and it will be difficult to see it, so it is a serious problem in practical use. There is a need to.

Further, since the surface of the plasma display itself becomes high in temperature, an adhesive which generates gas by heating should be avoided. When generation of gas is considered, it is good to consider addition of an absorbent or the like. For this reason, a 30 μm polyester film is stuck to a 3 mm glass plate with a 30 μm adhesive,
180 degree peel strength after holding for 0 days is 300 g / c
m or more, preferably 400 g / cm or more.

Specifically, a polymer-based adhesive such as polyacrylic acid alkyl ester or a rubber-based adhesive such as styrene-butadiene rubber or natural rubber is used as a halogen-based, alcohol-based, ketone-based or ester-based adhesive. , Ether-based, aliphatic hydrocarbon-based, aromatic hydrocarbon-based or other organic solvents singly or mixed in a solvent system dispersed or dissolved to adjust the viscosity, dipping method, flow coating Law, spray
Method, bar coat method, gravure coat method, roll coat method, blade coat method, air knife coat method and the like, and then the solvent is dried. And an adhesive layer. The thickness of the pressure-sensitive adhesive layer at this time is usually 5 to 100 μm.
m, preferably 10 to 50 μm. A release film may be provided on the surface of the pressure-sensitive adhesive layer, and the pressure-sensitive adhesive layer may be protected until the pressure-sensitive adhesive layer is attached to the surface of the plasma display so that dust and the like do not adhere to the pressure-sensitive adhesive layer. In this case, between the pressure-sensitive adhesive layer at the edge of the filter and the release film, a portion without a pressure-sensitive adhesive layer is formed, or a non-adhesive portion is formed by sandwiching a non-adhesive film, and peeling is started. If it is a part, the work at the time of sticking is easy to do.

The filter for a plasma display of the present invention includes a near-infrared absorbing layer, an electromagnetic wave shielding layer, an adhesive layer, a visible light control layer, a light reflection preventing layer, an anti-glare layer, a scratch preventing layer, an antistatic layer, and an antistatic layer. A dirty layer or the like can be provided. It is possible to provide various layers, but as a filter for a plasma display, a wavelength region of 400 to 7 is used.
It is desirable that the visible light transmittance of 00 nm is 50% or more. The order of lamination is not particularly limited, but the anti-reflection layer is preferably provided on the outermost surface (the side of the observer). In particular, providing a scratch prevention layer is effective for improving durability.

(4) Scratch-preventing layer When the scratch-preventing layer is provided, it is formed by an acrylate such as polyurethane acrylate or epoxy acrylate or a polyfunctional acrylate, a photopolymerization initiator, and a coating agent mainly containing an organic solvent. Is done. Epoxy acrylate is obtained by esterifying an epoxy group of an epoxy resin with acrylic acid and converting a functional group into an acryloyl group. An acrylic acid adduct to a bisphenol A type epoxy resin, an acrylic acid adduct to a novolak type epoxy resin, etc. is there.

The urethane acrylate is obtained by acrylically modifying a urethane prepolymer obtained by reacting a polyol and a diisocyanate with an acrylate having a hydroxyl group. Examples of the polyol include ethylene glycol, propylene glycol, diethylene glycol, butylene glycol, 1,6-hexanediol, neopentyl glycol, hexanetriol, trimethylolpropane, polytetramethylene glycol, a condensation polymer of adipic acid and ethylene glycol, and the like. No. Examples of the diisocyanate include tolylene diisocyanate, isophorone diisocyanate, hexamethylene diisocyanate, and the like. Examples of the acrylate having a hydroxyl group include 2-hydroxyethyl acrylate, 2-hydroxypropyl acrylate, pentaerythritol triacrylate, dipentaerythritol pentaacrylate, and the like.

The polyfunctional acrylate has three or more acryloyl groups in the molecule. Specifically, trimethylolpropane triacrylate, EO-modified trimethylolpropane triacrylate, PO-modified trimethylolpropane triacrylate, Tris (acryloxyethyl) isocyanurate, caprolactone-modified tris (acryloxyethyl) isocyanurate, pentaerythritol triacrylate, pentaerythritol tetraacrylate, dipentaerythritol tetraacrylate, dipentaerythritol pentaacrylate, dipentaerythritol hexaacrylate, alkyl-modified Dipentaerythritol triacrylate,
Examples thereof include alkyl-modified dipentaerythritol tetraacrylate, alkyl-modified dipentaerythritol pentaacrylate, caprolactone-modified dipentaerythritol hexaacrylate, and a mixture of two or more of these.

Examples of the photopolymerization initiator include benzoin methyl ether, benzoin ethyl ether, benzoin isopropyl ether, benzoin butyl ether, diethoxyacetophenone, benzyl dimethyl ketal,
Hydroxy-2-methylpropiophenone, 1-hydroxycyclohexylphenyl ketone, benzophenone,
2,4,6-trimethylbenzoindiphenylphosphine oxide, Michler's ketone, isoamyl N, N-dimethylaminobenzoate, 2-chlorothioxanthone,
Examples thereof include 2,4-diethylthioxanthone, and two or more of these photopolymerization initiators may be used in combination.

Examples of the organic solvent include aromatic hydrocarbons such as toluene and xylene, esters such as ethyl acetate, propyl acetate and butyl acetate, methyl alcohol, ethyl alcohol, n-propyl alcohol, i-propyl alcohol, and n-propyl alcohol. Alcohols such as butyl alcohol; ketones such as acetone, methyl ethyl ketone, methyl isobutyl ketone and cyclohexanone; ethers such as 2-methoxyethanol, 2-ethoxyethanol, 2-butoxyethanol, ethylene glycol dimethyl ether, ethylene glycol diethyl ether, diethylene glycol dimethyl ether And ether esters such as 2-methoxyethyl acetate, 2-ethoxyethyl acetate, and 2-butoxyethyl acetate.
Also, two or more of these can be used in combination.

In addition to the above components, a colloidal metal oxide or a silica sol using an organic solvent as a dispersion medium can be added to improve abrasion resistance. The anti-scratch layer is formed by applying the coating solution of the above coating agent by a dipping method, a flow coating method, a spray method, a bar coating method, a gravure coating method, a roll coating method, a blade coating method, or an air knife coating method. After the application, the solvent is dried, and the applied coating agent is cross-linked and cured by irradiating with an active energy ray. As the active energy ray, a xenon lamp,
Ultraviolet light emitted from a light source such as a low-pressure mercury lamp, a high-pressure mercury lamp, an ultra-high-pressure mercury lamp, a metal halide lamp, a carbon arc lamp, and a tungsten lamp, or usually 20 to 200
An electron beam extracted from a 0 keV electron beam accelerator, α
Rays, β rays, γ rays and the like can be used. The thus formed scratch prevention layer has a thickness of usually 1 to 50 μm, preferably 3 to 20 μm.

(5) Anti-reflection layer When the anti-reflection layer is provided, silicon oxide, zirconium oxide, titanium oxide, magnesium fluoride, calcium fluoride, aluminum oxide, etc. having a relatively low refractive index, or antireflection Coating agent (eg Asahi Glass Co., Ltd.)
(Cytop, trade name). These layers are provided as a single layer or a combination of two or more types to form a multilayer to form an antireflection layer. As a method for forming the antireflection layer, a method of baking after applying a metal alkoxide, a vacuum deposition method, a sputtering method, an ion plating method, a chemical vapor deposition (CVD) method, a plasma chemical vapor deposition method, or a roll coating method, a dipping method And the like. This antireflection layer is preferably provided on the outermost surface of the transparent laminate. The thickness of the antireflection layer is usually in the range of 50 to 100 nm. Alternatively, a commercially available antireflection film having the above antireflection layer provided on a polyester film may be attached to the outermost surface of the transparent laminate via an adhesive layer. An example of a commercially available antireflection film is manufactured by Nippon Yushi Co., Ltd .;

[0045]

EXAMPLES Specific embodiments of the present invention will be described in more detail with reference to the following Examples, which should not be construed as limiting the scope of the present invention.
In the following examples, the near-infrared transmittance was measured using a spectrophotometer (manufactured by BIO-RAD: FTS-60A) (trade name), and the visible light transmittance was measured using a spectrophotometer (trade name).
The measurement was performed using Shimadzu Corporation MPS-2000 (trade name).

Example 1 A 50 μm-thick polyester film was used as a transparent resin substrate, and silver was laminated on one surface of the polyester film to a thickness of 20 nm by a vacuum evaporation method. On top of that, a near-infrared absorbing agent (manufactured by Nippon Shokubai Co., Ltd .: trade name “EEXCOLOR 803K” (phthalocyanine) 1% by weight, and Nippon Kayaku Co., Ltd .: trade name “IRG-022” 2 parts by weight of a solution obtained by dissolving 4% by weight of a diimmonium-based compound in a solvent (methyl ethyl ketone: toluene = 1: 1), and an acrylic resin manufactured by Mitsubishi Rayon Co., Ltd. (trade name "Dianal BR-8") as a binder
0 ") with a solvent (methyl ethyl ketone: toluene = 1: 1).
A coating solution obtained by mixing 8 parts by weight of a solution obtained by dissolving 25% by weight in 1) was coated and dried (1 ° C. at 40 ° C.).
) To form a near-infrared absorbing layer.

The thickness after drying was 2 μm. Next, silicon dioxide was deposited thereon by sputtering using a vacuum deposition apparatus to form an antireflection layer. This film thickness
It was 200 nm. An acrylic resin-based pressure-sensitive adhesive manufactured by Soken Chemical Co., Ltd. (trade name "SK Dyne FP-7", resin content = 1)
5% by weight, solvent = ethyl acetate, methyl ethyl ketone,
Others: 1000 parts by weight of curing agent 1 (trade name “L-
45 ") 2 parts by weight and a curing agent 2 (trade name" E-5 ")
XM ") A pressure-sensitive adhesive solution prepared by mixing and adjusting 0.5 parts by weight so as not to involve air was applied by a doctor roll and dried, and a release film made of a 38-μm-thick polyester film was adhered. The thickness of the adhesive layer at this time is 20
μm.

A peeling start portion was formed by sandwiching the polyester film at one position at the edge. This filter was attached to the surface of the plasma display panel. The filter was pressed against the plasma display panel from the end while peeling the release film from the peeling start portion, and the filter was stuck while preventing the entrapment of air bubbles. Adhesion was possible without causing entrapment of large bubbles. This transparent laminate showed excellent near-infrared cut performance, electromagnetic wave shielding performance, anti-scratch performance, and transparency, and could be suitably used as a filter for a plasma display panel. Its near-infrared transmittance is 800-110
It was 15% or less in the range of 0 nm. Also, at 80 ° C, 1
After holding for 0 days, when the 180-degree peel strength of the pressure-sensitive adhesive layer was measured, it was about 500 g / cm, not much different from that at normal temperature, and no generation or peeling of bubbles was observed.

Example 2 A 50 μm thick polyester film was used as a transparent resin substrate, and silver was laminated on one surface of the polyester film to a thickness of 20 nm by a vacuum evaporation method. Further, a 1% by weight of a near-infrared ray absorbing agent (produced by Mitsubishi Chemical Corporation: prototype name "Ni76" (aminothio-nickel complex salt), the following formula (8)) is further added to a solvent (methyl ethyl ketone: toluene = 1: 1). And a solvent (methyl ethyl ketone: toluene = 1: 1) containing 25% by weight of an acrylic resin (trade name "Dianal BR-80") manufactured by Mitsubishi Rayon Co., Ltd. as a binder. The coating solution obtained by mixing 8 parts by weight of the solution dissolved in the above was coated and dried (at 40 ° C. for 1 day) to form a near-infrared absorbing layer 1. The thickness after drying was 2 μm.

[0050]

Embedded image

Next, a near infrared absorbing agent (trade name “IRG-022” (manufactured by Nippon Kayaku Co., Ltd.) (trade name: IRG-022) (diimonium-based)) is provided on the surface of the film opposite to the surface on which the near infrared absorbing layer 1 is formed. % By weight in a solvent (methyl ethyl ketone: toluene = 1: 1) and an acrylic resin manufactured by Mitsubishi Rayon Co., Ltd. (trade name "Dianal BR-80") as a binder. : Solution 1 dissolved in toluene = 1: 1) at a concentration of 25% by weight
The coating solution obtained by mixing the coating solution with
(At 0 ° C. for 1 day) to form a near-infrared absorbing layer 2. The thickness after drying was 2 μm.

Next, an anti-reflection film “Real-Look” (trade name) manufactured by NOF Corporation having an adhesive layer was adhered on the near-infrared absorbing layer 1 to form an anti-reflection layer. An acrylic resin-based adhesive (trade name “SK Dyne F”) manufactured by Soken Chemical Co., Ltd.
P-7 ", resin content = 15% by weight, solvent = ethyl acetate, methyl ethyl ketone, etc.) 1000 parts by weight, 2 parts by weight of a curing agent 1 (trade name" L-45 ") and 2 (parts by the same company) A pressure-sensitive adhesive solution prepared by mixing and adjusting 0.5 parts by weight of air (trade name “E-5XM”) so as not to entrap air was applied by a doctor roll, and then dried, and a release film made of a 38 μm-thick polyester film was adhered. At this time, the thickness of the pressure-sensitive adhesive layer was 20 μm. A peeling start portion was formed by sandwiching the polyester film at one position at the edge.

This filter was attached to the surface of a plasma display panel. The filter was pressed against the plasma display panel from the end while peeling the release film from the peeling start portion, and the filter was stuck while preventing the entrapment of air bubbles. Adhesion was possible without causing entrapment of large bubbles. This transparent laminate exhibited excellent near-infrared cut performance, electromagnetic wave shielding performance, anti-scratch performance, and transparency, and could be suitably used as a filter for a plasma display panel. Its near-infrared transmittance is 10% in the range of 800 to 1100 nm.
It was below. After holding at 80 ° C. for 10 days, the 180-degree peel strength of the pressure-sensitive adhesive layer was measured. As a result, the pressure-sensitive adhesive layer had a peel strength of about 500 g / cm, which was not much different from that at normal temperature, and neither generation of bubbles nor peeling was observed.

Example 3 A polyester film having a thickness of 50 μm was used as a transparent resin base material. And Nippon Kayaku Co., Ltd .: 2 parts by weight of a solution obtained by dissolving 4% by weight of a trade name "IRG-022" (diimonium type) in a solvent (methyl ethyl ketone: toluene = 1: 1), and Mitsubishi Reid as a binder -Acrylic resin manufactured by Yeon Co., Ltd.
In a solvent (methyl ethyl ketone: toluene = 1: 1)
A coating solution mixed with 8 parts by weight of a solution dissolved at a concentration of 5% by weight was coated and dried (at 40 ° C. for 1 day) to form a near-infrared absorbing layer. The thickness after drying was 2 μm.

Then, an electromagnetic shield film (trade name "Su-4X-805") manufactured by Selen Co., Ltd.
5 ") was attached via an adhesive. Further, silicon dioxide was deposited by sputtering using a vacuum deposition apparatus to form an antireflection layer. This film thickness was 200 nm. An acrylic resin-based adhesive (manufactured by Soken Chemical Co., Ltd., “SK Dyne FP-7”, resin content = 15% by weight, solvent = ethyl acetate, To 1000 parts by weight of methyl ethyl ketone, etc., 2 parts by weight of the company's hardener 1 (trade name "L-45") and 0.5 parts by weight of the company's hardener 2 (brand name "E-5XM") are entrained in air. A 38 μm-thick polyester film release film was applied while drying after applying with a pressure-sensitive adhesive solution doctor roll that was mixed and adjusted so as not to cause any adhesion.

At this time, the thickness of the pressure-sensitive adhesive layer was 20 μm. A peeling start portion was formed by sandwiching the polyester film at one position at the edge. This filter was attached to the surface of the plasma display panel. The filter was pressed against the plasma display panel from the end while peeling the release film from the peeling start portion, and the filter was stuck while preventing the entrapment of air bubbles. Adhesion was possible without causing entrapment of large bubbles. This transparent laminate has excellent near-infrared cut performance, electromagnetic wave shielding performance,
It exhibited anti-scratch performance and transparency, and could be suitably used as a filter for a plasma display panel. Its near-infrared transmittance was 15% or less in the range of 800 to 1100 nm. Further, the electromagnetic wave shielding effect showed a very high performance of 40 dB (10 MHz). After holding at 80 ° C. for 10 days,
When the 80 ° peel strength was measured, it was 5
It was around 00 g / cm, and no generation of bubbles or peeling was observed.

[0057]

The plasma display filter of the present invention has near-infrared cut performance and electromagnetic wave shielding performance, and is directly adhered to the front surface of the plasma display with an adhesive layer. It is effective for conversion.

──────────────────────────────────────────────────の Continued on the front page (51) Int.Cl. ⁷ Identification symbol FI Theme coat ゛ (Reference) H05K 9/00 H05K 9/00 VF term (Reference) 2H048 CA04 CA09 CA12 CA19 CA23 CA25 CA29 5C040 GH01 GH10 JA09 MA04 MA08 5C058 AA11 AB05 BA35 5E321 AA04 AA23 BB23 CC16 GG05 GG11 5G435 AA00 AA16 AA17 BB06 FF00 GG11 GG33 HH02 HH12 KK07

Claims (6)

[Claims] 1. A filter used by being attached to the front surface of a plasma display panel, having a structure in which a near-infrared absorbing layer and an electromagnetic wave shielding layer are provided on a transparent resin base material, and an adhesive layer is provided on the surface thereof. A filter for a plasma display, characterized in that: 2. The plasma display filter according to claim 1, wherein the transparent resin substrate is made of a polyester resin having a visible light transmittance of 70% or more. 3. The near-infrared absorbing layer has a wavelength of 800 nm to 110.
The filter for a plasma display according to claim 1 or 2, wherein the absorption layer cuts 85% or more of near-infrared rays of 0 nm. 4. The plasma display filter according to claim 1, wherein the electromagnetic wave shielding layer is made of a transparent conductive film or a mesh made of a conductive material. 5. The filter for a plasma display according to claim 1, wherein a release film is provided on the surface of the pressure-sensitive adhesive layer. 6. The plasma display filter according to claim 5, wherein a non-adhesive portion between the pressure-sensitive adhesive layer and the release film is formed at an edge of the filter to form a release start portion.