JP2000212000A5 - - Google Patents
Download PDFInfo
- Publication number
- JP2000212000A5 JP2000212000A5 JP1999015931A JP1593199A JP2000212000A5 JP 2000212000 A5 JP2000212000 A5 JP 2000212000A5 JP 1999015931 A JP1999015931 A JP 1999015931A JP 1593199 A JP1593199 A JP 1593199A JP 2000212000 A5 JP2000212000 A5 JP 2000212000A5
- Authority
- JP
- Japan
- Prior art keywords
- substrate
- film
- film forming
- forming
- spacer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000000758 substrate Substances 0.000 description 18
- 239000010408 film Substances 0.000 description 10
- 239000002887 superconductor Substances 0.000 description 4
- 239000010409 thin film Substances 0.000 description 4
- 238000010438 heat treatment Methods 0.000 description 2
- 239000000463 material Substances 0.000 description 1
- 230000003746 surface roughness Effects 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP11015931A JP2000212000A (ja) | 1999-01-25 | 1999-01-25 | 超伝導膜の成膜方法 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP11015931A JP2000212000A (ja) | 1999-01-25 | 1999-01-25 | 超伝導膜の成膜方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2000212000A JP2000212000A (ja) | 2000-08-02 |
JP2000212000A5 true JP2000212000A5 (de) | 2006-03-02 |
Family
ID=11902529
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP11015931A Pending JP2000212000A (ja) | 1999-01-25 | 1999-01-25 | 超伝導膜の成膜方法 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP2000212000A (de) |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP4771632B2 (ja) * | 2001-10-12 | 2011-09-14 | 富士通株式会社 | 高温超伝導体膜の形成方法 |
JP4315859B2 (ja) | 2004-05-19 | 2009-08-19 | 富士通株式会社 | 超伝導フィルタ |
JP5721144B2 (ja) * | 2012-02-07 | 2015-05-20 | 株式会社日本製鋼所 | 超電導多層構造薄膜 |
-
1999
- 1999-01-25 JP JP11015931A patent/JP2000212000A/ja active Pending
Similar Documents
Publication | Publication Date | Title |
---|---|---|
EP1217682A3 (de) | Verfahren zur Herstellung von festen anorganischen Elektrolytdünnschichten | |
WO2004015754A3 (de) | Verfahren zum oxidieren einer schicht und zugehörige aufnahmevorrichtungen für ein substrat | |
AUPP922399A0 (en) | A method and apparatus (ij46p2) | |
WO2004114312A3 (en) | Magnetic memory device on low-temperature substrate | |
JP2003524304A (ja) | 物体を均一加熱する装置 | |
JP2004536949A5 (de) | ||
EP0699375A1 (de) | Laserätzverfahren | |
WO2004032197A3 (en) | Low temperature texturing layer to enhance adhesion of subsequent layers | |
JPS5621892A (en) | Optical recorder and its manufacturing method | |
TW200707634A (en) | Semiconductor substrate and manufacturing method thereof | |
JP2000212000A5 (de) | ||
CA2027067A1 (en) | Method for forming a continuous oxide superconductor layer having different thickness portions for superconductor device | |
EP1170208A3 (de) | Wärmeregelungsverfahren und -vorrichtung | |
ATE324599T1 (de) | Antireflexionsfilm | |
JP2006512231A5 (de) | ||
JPS5510855A (en) | Method of manufacturing composite rotor | |
ATE236788T1 (de) | Strukturierte trennfolie zwischen zwei laminierten oberflächen | |
JPS54134396A (en) | Transparent conductive film and its manufacturing process | |
JPH02250952A (ja) | 温度センサ用薄膜形成方法 | |
JPH0341847U (de) | ||
JPS6390826U (de) | ||
JPS63136373U (de) | ||
JPS5634150A (en) | Manufacture of magnetic recording medium | |
JPS57172539A (en) | Information storage medium | |
JPS56166011A (en) | Decorative body with uneven pattern and manufacture thereof |