JP2000164555A5 - - Google Patents
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- Publication number
- JP2000164555A5 JP2000164555A5 JP1998340406A JP34040698A JP2000164555A5 JP 2000164555 A5 JP2000164555 A5 JP 2000164555A5 JP 1998340406 A JP1998340406 A JP 1998340406A JP 34040698 A JP34040698 A JP 34040698A JP 2000164555 A5 JP2000164555 A5 JP 2000164555A5
- Authority
- JP
- Japan
- Prior art keywords
- substrate
- rotating
- drying apparatus
- light source
- irradiating
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000000758 substrate Substances 0.000 claims description 42
- 238000001035 drying Methods 0.000 claims description 10
- 239000007788 liquid Substances 0.000 claims description 6
- 238000005498 polishing Methods 0.000 claims description 6
- 238000001704 evaporation Methods 0.000 claims description 3
- 230000001678 irradiating Effects 0.000 claims description 3
- 230000032258 transport Effects 0.000 claims 2
- 238000000034 method Methods 0.000 claims 1
- 238000004140 cleaning Methods 0.000 description 4
- 238000004378 air conditioning Methods 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP10340406A JP2000164555A (ja) | 1998-11-30 | 1998-11-30 | 基板乾燥装置及び方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP10340406A JP2000164555A (ja) | 1998-11-30 | 1998-11-30 | 基板乾燥装置及び方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2000164555A JP2000164555A (ja) | 2000-06-16 |
| JP2000164555A5 true JP2000164555A5 (ko) | 2005-07-21 |
Family
ID=18336651
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP10340406A Pending JP2000164555A (ja) | 1998-11-30 | 1998-11-30 | 基板乾燥装置及び方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2000164555A (ko) |
Families Citing this family (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4055503B2 (ja) | 2001-07-24 | 2008-03-05 | 日亜化学工業株式会社 | 半導体発光素子 |
| US6837943B2 (en) * | 2002-12-17 | 2005-01-04 | Samsung Electronics Co., Ltd. | Method and apparatus for cleaning a semiconductor substrate |
| KR100749548B1 (ko) | 2006-08-01 | 2007-08-14 | 세메스 주식회사 | 기판 처리 장치 |
| JP5043406B2 (ja) * | 2006-11-21 | 2012-10-10 | 大日本スクリーン製造株式会社 | 基板乾燥方法および基板乾燥装置 |
| US9355883B2 (en) * | 2011-09-09 | 2016-05-31 | Lam Research Ag | Method and apparatus for liquid treatment of wafer shaped articles |
| JP5878441B2 (ja) * | 2012-08-20 | 2016-03-08 | 株式会社荏原製作所 | 基板洗浄装置及び基板処理装置 |
| JP6351948B2 (ja) * | 2012-10-12 | 2018-07-04 | ラム・リサーチ・アーゲーＬａｍ Ｒｅｓｅａｒｃｈ Ａｇ | 円板状物品の液体処理装置およびかかる装置で用いる加熱システム |
| DE102013104577B3 (de) | 2013-05-03 | 2014-07-24 | Heraeus Noblelight Gmbh | Vorrichtung zum Trocknen und Sintern metallhaltiger Tinte auf einem Substrat |
| US9245777B2 (en) * | 2013-05-15 | 2016-01-26 | Lam Research Ag | Apparatus for liquid treatment of wafer shaped articles and heating system for use in such apparatus |
| KR20170143035A (ko) * | 2013-12-02 | 2017-12-28 | 고쿠리츠켄큐카이하츠호진 상교기쥬츠 소고켄큐쇼 | 웨트 처리 장치 |
| JP6184015B2 (ja) * | 2013-12-02 | 2017-08-23 | 国立研究開発法人産業技術総合研究所 | 被処理体に臨んだ位置で加熱する加熱ウェット処理装置およびその方法 |
| JP6563762B2 (ja) * | 2015-09-29 | 2019-08-21 | 芝浦メカトロニクス株式会社 | 基板処理装置及び基板処理方法 |
-
1998
- 1998-11-30 JP JP10340406A patent/JP2000164555A/ja active Pending
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