JP2000155081A5 - - Google Patents

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Publication number
JP2000155081A5
JP2000155081A5 JP1998332237A JP33223798A JP2000155081A5 JP 2000155081 A5 JP2000155081 A5 JP 2000155081A5 JP 1998332237 A JP1998332237 A JP 1998332237A JP 33223798 A JP33223798 A JP 33223798A JP 2000155081 A5 JP2000155081 A5 JP 2000155081A5
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JP
Japan
Prior art keywords
sample
sample preparation
ion beam
holder
focused ion
Prior art date
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Application number
JP1998332237A
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English (en)
Japanese (ja)
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JP2000155081A (ja
JP4126786B2 (ja
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Priority to JP33223798A priority Critical patent/JP4126786B2/ja
Priority claimed from JP33223798A external-priority patent/JP4126786B2/ja
Publication of JP2000155081A publication Critical patent/JP2000155081A/ja
Publication of JP2000155081A5 publication Critical patent/JP2000155081A5/ja
Application granted granted Critical
Publication of JP4126786B2 publication Critical patent/JP4126786B2/ja
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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JP33223798A 1998-11-24 1998-11-24 試料作成装置および方法 Expired - Lifetime JP4126786B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP33223798A JP4126786B2 (ja) 1998-11-24 1998-11-24 試料作成装置および方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP33223798A JP4126786B2 (ja) 1998-11-24 1998-11-24 試料作成装置および方法

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2008057169A Division JP4483957B2 (ja) 2008-03-07 2008-03-07 試料作成装置

Publications (3)

Publication Number Publication Date
JP2000155081A JP2000155081A (ja) 2000-06-06
JP2000155081A5 true JP2000155081A5 (enExample) 2005-12-08
JP4126786B2 JP4126786B2 (ja) 2008-07-30

Family

ID=18252718

Family Applications (1)

Application Number Title Priority Date Filing Date
JP33223798A Expired - Lifetime JP4126786B2 (ja) 1998-11-24 1998-11-24 試料作成装置および方法

Country Status (1)

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JP (1) JP4126786B2 (enExample)

Families Citing this family (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4297736B2 (ja) 2003-06-11 2009-07-15 株式会社日立ハイテクノロジーズ 集束イオンビーム装置
DE602004031073D1 (de) * 2003-06-13 2011-03-03 Fei Co Verfahren und Vorrichtung zum Manipulieren von mikroskopischen Proben
JP2005062130A (ja) * 2003-08-20 2005-03-10 Canon Inc 微小薄片作製装置
DE10362116B4 (de) * 2003-09-17 2008-08-28 Carl Zeiss Nts Gmbh Verfahren zur Präparation einer Probe für elektronenmikroskopische Untersuchungen, sowie dabei verwendeter Greifer
JP2007039106A (ja) * 2005-08-04 2007-02-15 Sii Nanotechnology Inc 弾性材料を使用した薄板状小片ホルダ
JP4747952B2 (ja) * 2006-05-31 2011-08-17 株式会社日立製作所 試料加工装置および試料加工方法
WO2008051880A2 (en) 2006-10-20 2008-05-02 Fei Company Method and apparatus for sample extraction and handling
EP2106555B1 (en) 2006-10-20 2015-01-07 FEI Company Method for s/tem sample analysis
JP5125123B2 (ja) * 2007-01-31 2013-01-23 株式会社日立製作所 微小試料加工観察方法及び装置
JP5125143B2 (ja) * 2007-02-23 2013-01-23 株式会社日立製作所 微小試料加工観察方法及び装置
JP5125184B2 (ja) * 2007-04-03 2013-01-23 株式会社日立製作所 微小試料加工観察方法及び装置
JP5126031B2 (ja) * 2008-12-01 2013-01-23 株式会社日立製作所 微小試料加工観察方法及び装置
JP2009064790A (ja) * 2008-12-22 2009-03-26 Hitachi High-Technologies Corp 集束イオンビーム装置
JP4826680B2 (ja) * 2010-07-30 2011-11-30 株式会社日立製作所 はり部材
JP5024468B2 (ja) * 2011-03-25 2012-09-12 株式会社日立製作所 試料加工装置
JP5316626B2 (ja) * 2011-11-14 2013-10-16 株式会社日立製作所 微小試料加工観察方法及び装置
JP6291972B2 (ja) 2014-03-31 2018-03-14 三菱マテリアル株式会社 サンプリング位置表示装置、サンプリング方法
CN114019201A (zh) * 2021-09-29 2022-02-08 杭州长川科技股份有限公司 模组测试装置
CN116136504B (zh) * 2023-04-17 2024-01-05 北京中科科仪股份有限公司 一种薄膜检测装置

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