JP2000150619A - 基板処理装置 - Google Patents

基板処理装置

Info

Publication number
JP2000150619A
JP2000150619A JP36778299A JP36778299A JP2000150619A JP 2000150619 A JP2000150619 A JP 2000150619A JP 36778299 A JP36778299 A JP 36778299A JP 36778299 A JP36778299 A JP 36778299A JP 2000150619 A JP2000150619 A JP 2000150619A
Authority
JP
Japan
Prior art keywords
substrate
transfer
processing
chamber
time
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP36778299A
Other languages
English (en)
Japanese (ja)
Other versions
JP2000150619A5 (fr
Inventor
Yasushi Yoshida
安志 吉田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kokusai Electric Corp
Original Assignee
Kokusai Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kokusai Electric Corp filed Critical Kokusai Electric Corp
Priority to JP36778299A priority Critical patent/JP2000150619A/ja
Publication of JP2000150619A publication Critical patent/JP2000150619A/ja
Publication of JP2000150619A5 publication Critical patent/JP2000150619A5/ja
Pending legal-status Critical Current

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  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
JP36778299A 1999-01-01 1999-12-24 基板処理装置 Pending JP2000150619A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP36778299A JP2000150619A (ja) 1999-01-01 1999-12-24 基板処理装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP36778299A JP2000150619A (ja) 1999-01-01 1999-12-24 基板処理装置

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
JP21033298A Division JP3193904B2 (ja) 1997-08-01 1998-07-09 基板搬送制御方法及び基板製品の製造方法

Publications (2)

Publication Number Publication Date
JP2000150619A true JP2000150619A (ja) 2000-05-30
JP2000150619A5 JP2000150619A5 (fr) 2005-05-19

Family

ID=18490184

Family Applications (1)

Application Number Title Priority Date Filing Date
JP36778299A Pending JP2000150619A (ja) 1999-01-01 1999-12-24 基板処理装置

Country Status (1)

Country Link
JP (1) JP2000150619A (fr)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7630785B2 (en) 2005-01-07 2009-12-08 Tokyo Electron Limited Substrate processing system for setting uniform module cycle length and access control time lag in two pipeline processing systems
JP2010093227A (ja) * 2008-09-12 2010-04-22 Hitachi High-Technologies Corp 真空処理装置
JP2010534940A (ja) * 2007-07-24 2010-11-11 アプライド マテリアルズ インコーポレイテッド 薄膜ソーラー製造中に基板温度を制御する装置及び方法
KR101005882B1 (ko) 2008-10-14 2011-01-06 세메스 주식회사 반도체 제조 설비 및 이의 제어 방법
WO2020161873A1 (fr) * 2019-02-07 2020-08-13 株式会社日立ハイテクノロジーズ Procédé pour faire fonctionner un dispositif de traitement sous vide
JP2023045503A (ja) * 2021-09-22 2023-04-03 株式会社Kokusai Electric 基板処理装置、半導体装置の製造方法、及びプログラム

Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7630785B2 (en) 2005-01-07 2009-12-08 Tokyo Electron Limited Substrate processing system for setting uniform module cycle length and access control time lag in two pipeline processing systems
JP2010534940A (ja) * 2007-07-24 2010-11-11 アプライド マテリアルズ インコーポレイテッド 薄膜ソーラー製造中に基板温度を制御する装置及び方法
JP2010093227A (ja) * 2008-09-12 2010-04-22 Hitachi High-Technologies Corp 真空処理装置
KR101005882B1 (ko) 2008-10-14 2011-01-06 세메스 주식회사 반도체 제조 설비 및 이의 제어 방법
WO2020161873A1 (fr) * 2019-02-07 2020-08-13 株式会社日立ハイテクノロジーズ Procédé pour faire fonctionner un dispositif de traitement sous vide
JP6792098B1 (ja) * 2019-02-07 2020-11-25 株式会社日立ハイテク 真空処理装置の運転方法
TWI716275B (zh) * 2019-02-07 2021-01-11 日商日立全球先端科技股份有限公司 真空處理裝置之運轉方法
JP2023045503A (ja) * 2021-09-22 2023-04-03 株式会社Kokusai Electric 基板処理装置、半導体装置の製造方法、及びプログラム
JP7324811B2 (ja) 2021-09-22 2023-08-10 株式会社Kokusai Electric 基板処理装置、半導体装置の製造方法、及びプログラム

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