JP2000133769A - Power semiconductor device and method for assembling the same - Google Patents

Power semiconductor device and method for assembling the same

Info

Publication number
JP2000133769A
JP2000133769A JP30195698A JP30195698A JP2000133769A JP 2000133769 A JP2000133769 A JP 2000133769A JP 30195698 A JP30195698 A JP 30195698A JP 30195698 A JP30195698 A JP 30195698A JP 2000133769 A JP2000133769 A JP 2000133769A
Authority
JP
Japan
Prior art keywords
insulating substrate
semiconductor device
power semiconductor
adhesive
outer case
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP30195698A
Other languages
Japanese (ja)
Other versions
JP3758383B2 (en
Inventor
Susumu Toba
進 鳥羽
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fuji Electric Co Ltd
Original Assignee
Fuji Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fuji Electric Co Ltd filed Critical Fuji Electric Co Ltd
Priority to JP30195698A priority Critical patent/JP3758383B2/en
Publication of JP2000133769A publication Critical patent/JP2000133769A/en
Application granted granted Critical
Publication of JP3758383B2 publication Critical patent/JP3758383B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/4805Shape
    • H01L2224/4809Loop shape
    • H01L2224/48091Arched
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/484Connecting portions
    • H01L2224/4847Connecting portions the connecting portion on the bonding area of the semiconductor or solid-state body being a wedge bond
    • H01L2224/48472Connecting portions the connecting portion on the bonding area of the semiconductor or solid-state body being a wedge bond the other connecting portion not on the bonding area also being a wedge bond, i.e. wedge-to-wedge
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/10Details of semiconductor or other solid state devices to be connected
    • H01L2924/11Device type
    • H01L2924/13Discrete devices, e.g. 3 terminal devices
    • H01L2924/1304Transistor
    • H01L2924/1305Bipolar Junction Transistor [BJT]
    • H01L2924/13055Insulated gate bipolar transistor [IGBT]

Abstract

PROBLEM TO BE SOLVED: To provide a package structure, wherein a ceramic plate of an insulating substrate is prevented from cracking under an external force applied in assembly condition, while a high assembly precision is provided in a bonding process in which a main circuit assembly is assembled into an enclosure. SOLUTION: A power main circuit assembly 5, in which a power semiconductor element 5a, is mounted on an insulating substrate 5b which has as backing material is a ceramic plate 5b-1 is inserted, from below, in a substrate fitting hole 1a opened at the bottom surface of an enclosure 1, and a bonding agent 7 is used to fit tightly between its periphery and a stepped seat surface 1a-1 formed at the periphery on the rear surface side of the substrate-fitting hole 1a. With the rear surface of the insulating substrate 5b and the rear surface of the enclosure 1 on the same plate, the thickness of the layer of bonding agent 7 filled between the stepped seat surface 1a-1, of the substrate-fitting hole 1a and the periphery of the insulating substrate 5b is set to 0.5±0.3 mm, a projected spacer 11 comprising rubber-like elasticity is inserted, distributedly in the upper-surface periphery of the ceramic plate 5b-1 while facing the stepped seat surface 1a-1 so as to ensure a prescribed layer thickness of bonding agent in a bonding process.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は、パワートランジス
タモジュール,IGBTモジュール,インテリジェント
パワーモジュールなどを実施対象としたパワー半導体装
置に関し、詳しくはパッケージ構造,およびその組立方
法に係わる。
The present invention relates to a power semiconductor device for a power transistor module, an IGBT module, an intelligent power module, and the like, and more particularly, to a package structure and an assembling method thereof.

【0002】[0002]

【従来の技術】まず、頭記したインテリジェントパワー
モジュールを例に、従来におけるパワー半導体装置の組
立構造を図4,図5(a),(b) に示す。各図において、1
は端子一体型の外囲ケース(樹脂ケース)、2は外囲ケ
ース1の上蓋、3は外囲ケース1の一方の側壁部にイン
サート成形して上方に引出した主回路端子(入力端子
+,−,出力端子U,V,W)、4は外囲ケース1の他
方側の側壁部から上方に引出した制御用信号端子であ
り、外囲ケース1には次記の構成になる電力用の主回路
組立体5,および制御回路組立体6が組み込まれてい
る。
2. Description of the Related Art First, an assembly structure of a conventional power semiconductor device is shown in FIGS. 4, 5 (a) and 5 (b), taking the intelligent power module mentioned above as an example. In each figure, 1
Is a terminal integrated type outer case (resin case), 2 is an upper cover of the outer case 1, 3 is a main circuit terminal (input terminals +, −, Output terminals U, V, W), 4 are control signal terminals that are drawn upward from the other side wall of the outer case 1. The outer case 1 has power The main circuit assembly 5 and the control circuit assembly 6 are incorporated.

【0003】ここで、主回路組立体5は、パワー半導体
素子(パワートランジスタ,IGBT,フリーホイーリ
ングダイオードなど)5aをセラミックス板(板厚:
0.6mm程度)を基材とした絶縁基板(セラミックス板
5b-1の上下主面に回路パターン,放熱用の銅板5b-
2,5b-3を接合したダイレクト・ボンディング・カッ
パー基板など)5bに搭載した構成になり、外囲ケース
1の底面に開口した基板取付穴1a(絶縁基板5bの外
形寸法に相応した角穴)へ下面側から嵌め込み、セラミ
ックス板5b-1周縁を前記基板取付穴1aの周縁に沿っ
て形成した段付き座面1a-1とを重ね合わせて、両者の
間が接着剤(シリコーン系の接着剤)7で固着されてい
る。なお、主回路組立体5の絶縁基板5aと外囲ケース
1との間を固着する接着剤にシリコーン系接着剤7を採
用するのは、セラミックス板5b-1と外囲ケース1との
熱膨張差に起因して接着剤層に加わる応力をシリコーン
系接着剤のゴム弾性を利用して吸収して接着剤の剥離を
防ぐようにするためである。
Here, the main circuit assembly 5 includes a power semiconductor element (power transistor, IGBT, freewheeling diode, etc.) 5a on a ceramic plate (plate thickness:
Circuit patterns and heat-dissipating copper plates 5b- on the upper and lower main surfaces of an insulating substrate (ceramic plate 5b-1) whose base is about 0.6 mm
A board mounting hole 1a (a square hole corresponding to the outer dimensions of the insulating substrate 5b) opened on the bottom surface of the outer case 1 as a configuration mounted on the 5b. And the peripheral edge of the ceramic plate 5b-1 is overlapped with the stepped seating surface 1a-1 formed along the peripheral edge of the substrate mounting hole 1a, and an adhesive (silicone adhesive) ) 7. The reason why the silicone adhesive 7 is used as the adhesive for fixing the insulating substrate 5a of the main circuit assembly 5 and the outer case 1 is that the ceramic plate 5b-1 and the outer case 1 are thermally expanded. This is because the stress applied to the adhesive layer due to the difference is absorbed by utilizing the rubber elasticity of the silicone-based adhesive to prevent the peeling of the adhesive.

【0004】一方、制御回路組立体6はICなどの回路
素子6aをプリント板6bに実装した構成になり、前記
の主回路組立体5の側方に並べて外囲ケース1の底面に
形成した凹状台座面1b(プリント板の外形寸法に相応
した窪み)の上に載置して接着剤(エポキシ系接着剤な
ど)8で固着されている。
On the other hand, the control circuit assembly 6 has a structure in which circuit elements 6a such as ICs are mounted on a printed board 6b, and is formed on the bottom of the outer case 1 side by side with the main circuit assembly 5. It is mounted on a pedestal surface 1b (a depression corresponding to the external dimensions of the printed board) and is fixed with an adhesive (epoxy adhesive or the like) 8.

【0005】また、前記の主回路組立体5と主回路端子
3の間,制御回路組立体6と制御用信号端子4の間,お
よび主回路組立体5と制御回路組立体6の間はボンディ
ングワイヤ9で接続され、さらに外囲ケース1の内部に
封止樹脂(シリコーンゲル)10を充填した上で上蓋2
が被着されている。なお、外囲ケース1は樹脂ケース以
外に金属ケース,セラミックスケースを用いる場合もあ
る。
Further, bonding is performed between the main circuit assembly 5 and the main circuit terminal 3, between the control circuit assembly 6 and the control signal terminal 4, and between the main circuit assembly 5 and the control circuit assembly 6. It is connected by a wire 9, and is further filled with a sealing resin (silicone gel) 10 inside the outer case 1,
Has been deposited. The outer case 1 may use a metal case or a ceramic case other than the resin case.

【0006】ここで、前記主回路組立体5を外囲ケース
1に接着組立する際の手順について述べると、外囲ケー
ス1の底面に開口した基板取付穴1aの内周面全域に液
状の接着剤7を塗布した上で、絶縁基板5bを下面側か
ら嵌め込み、セラミックス板5b-1の上面が段付き座面
1a-1に殆ど密着するように押圧力を加え、この状態で
接着剤7を加熱硬化させる。なお、この組立状態では前
記接着剤7の層厚さは0.1mm以下となる。
The procedure for bonding and assembling the main circuit assembly 5 to the outer case 1 will now be described. The liquid bonding is performed over the entire inner circumferential surface of the board mounting hole 1a opened in the bottom surface of the outer case 1. After applying the agent 7, the insulating substrate 5b is fitted from the lower surface side, and a pressing force is applied so that the upper surface of the ceramic plate 5b-1 is almost in close contact with the stepped seating surface 1a-1. Heat and cure. In this assembled state, the layer thickness of the adhesive 7 is 0.1 mm or less.

【0007】[0007]

【発明が解決しようとする課題】ところで、前記した従
来の半導体装置のパッケージ構造では、特に外囲ケース
に主回路組立体を接着剤で固着する際に次記のような問
題点がある。すなわち、主回路組立体5の通電に伴って
パワー素子5aから発熱する熱を冷却フィンを介して外
部へ効率よく放熱させるには、組立状態で外囲ケース1
の裏面と絶縁基板5bの裏面(放熱面)とを面一に合わ
せることが品質管理面で重要である。すなわち、図5に
示した半導体装置の組立状態で、組立精度のばらつきか
ら絶縁基板5bの裏面が外囲ケース1の裏面よりも0.
1mm以上引っ込んでいると、絶縁基板5bを冷却フィン
に密着させることが困難となって絶縁基板5bの放熱性
が低下する。また、逆に絶縁基板5bの裏面が外囲ケー
ス1の裏面よりも0.1mm(段差ΔS)以上突き出して
いると、外囲ケース1をその左右両端に開口しているボ
ルト穴1cにボルトを通して冷却フィンに締結する際
に、絶縁基板5bに反りを生じさせるような曲げ力が加
わり、このために曲げに脆いセラミックス基板5b-1に
クラック,割れが生じることがある。
However, the above-described conventional package structure of a semiconductor device has the following problems particularly when the main circuit assembly is fixed to the outer case with an adhesive. In other words, in order to efficiently radiate the heat generated from the power element 5a to the outside via the cooling fins when the main circuit assembly 5 is energized, the outer case 1 must be assembled.
It is important from the viewpoint of quality control that the back surface of the insulating substrate 5b and the back surface (heat radiating surface) of the insulating substrate 5b are flush. That is, in the assembled state of the semiconductor device shown in FIG.
If the insulating substrate 5b is retracted by 1 mm or more, it is difficult to bring the insulating substrate 5b into close contact with the cooling fins, and the heat radiation of the insulating substrate 5b is reduced. Conversely, when the back surface of the insulating substrate 5b protrudes 0.1 mm (step ΔS) or more from the back surface of the outer case 1, the outer case 1 is passed through the bolt holes 1c opened at both left and right ends thereof. At the time of fastening to the cooling fin, a bending force that causes the insulating substrate 5b to warp is applied, and as a result, cracks and cracks may occur in the ceramic substrate 5b-1 that is brittle in bending.

【0008】このように従来構造では、外囲ケース1に
主回路組立体5を接着組立てする工程での組立精度のば
らつきがそのまま欠陥の要因となるために、このことが
製品の品質維持を図る上でのネックとなっている。本発
明は上記の点に鑑みなされたものであり、その目的は前
記課題を解決し、組立状態で加わる外力に対して絶縁基
板のセラミックス板をクラック割れから安全に保護し、
併せて外囲ケースに主回路組立体を組付ける接着組立工
程で高い組立精度が確保できるように改良したパワー半
導体装置,およびその組立方法を提供することにある。
As described above, in the conventional structure, the variation in the assembly accuracy in the step of bonding and assembling the main circuit assembly 5 to the outer case 1 directly causes a defect, which is intended to maintain the quality of the product. It has become a bottleneck on the top. The present invention has been made in view of the above points, the object of the present invention is to solve the above problems, and to safely protect the ceramic plate of the insulating substrate from cracking against external force applied in an assembled state,
Another object of the present invention is to provide a power semiconductor device improved so that a high assembly accuracy can be ensured in an adhesive assembly process for assembling a main circuit assembly into an outer case, and an assembling method thereof.

【0009】[0009]

【課題を解決するための手段】上記目的を達成するため
に、本発明によれば、セラミックス板を基材とする絶縁
基板にパワー半導体素子を搭載した構成になる電力用の
主回路組立体を、外囲ケースの底面に開口した基板取付
穴に下方から嵌め込んでその周縁と前記基板取付穴の裏
面側周縁に形成した段付き座面との間を接着剤で固着し
たパワー半導体装置において、絶縁基板の裏面と外囲ケ
ースの裏面と同一面に揃えた上で、前記基板取付穴の段
付き座面と絶縁基板の周縁との間に充填した接着剤の層
厚さを0.5±0.3mmの範囲に設定する(請求項1)
ものとし、そのために次記のような具体的態様で接着組
立てを行う。
According to the present invention, there is provided a power main circuit assembly comprising a power semiconductor element mounted on an insulating substrate having a ceramic plate as a base. A power semiconductor device in which a peripheral portion thereof is fitted into a substrate mounting hole opened on the bottom surface of the outer case from below, and a stepped seat surface formed on a rear surface side peripheral edge of the substrate mounting hole is fixed with an adhesive. The thickness of the adhesive filled between the stepped seating surface of the substrate mounting hole and the periphery of the insulating substrate is adjusted to 0.5 ± Set within the range of 0.3mm (Claim 1)
For this purpose, the adhesive assembly is performed in the following specific manner.

【0010】(1) 前記の接着剤として、ゴム弾性を有す
るシリコーン系,ないしはエポキシ系,ウレタン系の接
着剤を用いる(請求項2)。 (2) 外囲ケースの底面に開口した基板取付穴の段付き座
面の周域に沿い、絶縁基板のセラミックス板周縁との間
にゴム弾性を有するスペーサを分散介挿して接着剤の層
厚さを0.5±0.3mmの範囲に確保するようにする
(請求項3)。
(1) A silicone-based or epoxy-based or urethane-based adhesive having rubber elasticity is used as the adhesive. (2) Along with the peripheral area of the stepped seat surface of the board mounting hole opened on the bottom of the outer case, a spacer having rubber elasticity is interposed between the ceramic board of the insulating board and the periphery, and the adhesive layer thickness is The height is ensured in a range of 0.5 ± 0.3 mm (claim 3).

【0011】(3) 前項(2) において、スペーサをシリコ
ーン系,ないしはエポキシ系,ウレタン系樹脂を材料と
した凸起体となし、該スペーサを基板取付穴の段付き座
面,もしくは絶縁基板のセラミックス板周縁に固着する
(請求項4)。 (4) また、前記構成の組立方法として、主回路組立体の
絶縁基板,および外囲ケースを接着用治具の平坦テーブ
ル上に載置して各部品を定位置に支持し、この状態で外
囲ケース側に形成した基板取付穴の段付き座面と絶縁基
板のセラミックス板周縁との間を接着剤で接合する(請
求項5)。
(3) In the above item (2), the spacer is made of a convex body made of a silicone-based or epoxy-based or urethane-based resin, and the spacer is formed of a stepped seating surface of a substrate mounting hole or an insulating substrate. It is fixed to the periphery of the ceramic plate (claim 4). (4) As an assembling method of the above configuration, the insulating substrate of the main circuit assembly and the surrounding case are placed on the flat table of the bonding jig to support each part in a fixed position. The stepped seat surface of the substrate mounting hole formed on the outer case side and the peripheral edge of the ceramic plate of the insulating substrate are joined with an adhesive.

【0012】上記のように外囲ケースと絶縁基板との間
を固着してシールする接着剤の層厚さを従来(0.1mm
以下)と較べて十分に厚く設定することにより、製品を
放熱フィンに取付けるなどの際に絶縁基板のセラミック
ス板に過大な外力が加わった場合でも、そのストレスを
層厚の厚い接着剤層のゴム弾性が吸収してセラミックス
板のクラック割れが防げるので、製品の信頼性が向上す
る。なお、この点については、発明者等が行った破壊テ
ストの結果からも、従来製品と較べて破壊強度が1.3
〜1.5倍に改善されることが確認されている。
[0012] As described above, the thickness of the adhesive for fixing and sealing between the outer case and the insulating substrate is set to the conventional value (0.1 mm).
By setting the thickness sufficiently thicker than in the following, even if an excessive external force is applied to the ceramic plate of the insulating substrate when attaching the product to the radiating fins, the stress will be reduced by the rubber of the thick adhesive layer. Since the elasticity is absorbed to prevent crack cracking of the ceramic plate, the reliability of the product is improved. Regarding this point, the result of the destruction test performed by the inventors and others shows that the breaking strength is 1.3 as compared with the conventional product.
It has been confirmed that it is improved by 1.5 times.

【0013】また、前項(2),(3) のように外囲ケース側
の段付き座面と絶縁基板のセラミックス板との間にゴム
弾性を有する突起状のスペーサを介挿し、ここでスペー
サの突起高さを適正寸法に定めて接着組立てを行うこと
により、段付き座面とセラミックス板との間に充填した
接着剤の層厚を所定の厚さに確保することができるとと
もに、外力が加わった際にはスペーサが接着剤層と一緒
に変形するのでストレスの吸収作用をいささかも阻害す
ることはない。
Further, as shown in the preceding paragraphs (2) and (3), a rubbery projection-like spacer is interposed between the stepped seating surface on the outer case side and the ceramic plate of the insulating substrate. By setting the height of the protrusions to the appropriate dimensions and performing the adhesive assembly, the layer thickness of the adhesive filled between the stepped seat surface and the ceramic plate can be secured to a predetermined thickness, and the external force can be reduced. When added, the spacers are deformed together with the adhesive layer, so that they do not hinder any stress absorbing effect.

【0014】さらに、外囲ケースに主回路組立体を接着
組立てする工程で、前項(4) の組立用治具を用いること
により、外囲ケースの裏面と絶縁基板の裏面とを同じ面
上に揃えた状態で接着を行うことができ、これにより段
付き座面とセラミックス板との間に所定層厚の接着剤層
を保持しつつ、接着後の組立状態では高い組立精度が確
保できる。
Further, in the step of bonding and assembling the main circuit assembly to the outer case, the back surface of the outer case and the back surface of the insulating substrate are placed on the same surface by using the assembling jig of item (4). Bonding can be performed in an aligned state, so that a high assembly accuracy can be secured in an assembled state after bonding, while holding an adhesive layer having a predetermined thickness between the stepped seat surface and the ceramic plate.

【0015】[0015]

【発明の実施の形態】以下、この発明の実施の形態を図
1〜図3の実施例に基づいて説明する。なお、実施例の
図中で図5に対応する同一部材には同じ符号を付してそ
の説明は省略する。
DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS An embodiment of the present invention will be described below with reference to FIGS. In the drawings of the embodiment, the same members corresponding to FIG. 5 are denoted by the same reference numerals, and the description thereof will be omitted.

【0016】〔実施例1〕図1は本発明の請求項3,4
に対応する実施例を示すものである。この実施例におい
ては、半導体装置の組立構造は基本的に図5と同様であ
るが、図示実施例では従来構造と比べて次の点が相違す
る。
Embodiment 1 FIG. 1 shows a third embodiment of the present invention.
1 shows an embodiment corresponding to FIG. In this embodiment, the assembly structure of the semiconductor device is basically the same as that of FIG. 5, but the following points are different from the conventional structure in the illustrated embodiment.

【0017】まず、外囲ケース1の底面に開口した基板
取付穴1aについて、外囲ケース1の裏面から基板取付
穴1aの周縁に形成した段付座面1a-1までの深さ(高
さ方向)寸法Hは次のように設定されている。すなわ
ち、外囲ケース1の裏面と絶縁基板5bの裏面とを同一
面に揃えて主回路組立体5の絶縁基板5bを外囲ケース
1の基板取付穴1aに裏面側から挿入した仮組立状態
で、絶縁基板5bのセラミックス板5b-1の上面と前記
段付座面1a-1とが0.5mmの間隔を隔てて対向し合う
ように前記深さHを定める。
First, with respect to the board mounting hole 1a opened on the bottom surface of the outer case 1, the depth (height) from the back surface of the outer case 1 to the stepped seating surface 1a-1 formed on the periphery of the board mounting hole 1a. The direction) dimension H is set as follows. In other words, in a temporary assembly state in which the back surface of the outer case 1 and the back surface of the insulating substrate 5b are aligned on the same surface, and the insulating substrate 5b of the main circuit assembly 5 is inserted into the board mounting hole 1a of the outer case 1 from the back surface side. The depth H is determined so that the upper surface of the ceramic plate 5b-1 of the insulating substrate 5b and the stepped seating surface 1a-1 face each other with an interval of 0.5 mm.

【0018】また、前記した段付座面1a-1の周域に沿
って、セラミックス板5b-1の周縁との間にゴム弾性を
有するスペーサ11が分散して介挿されている。このス
ペーサ11は接着剤7と同じ種類のシリコーン系,ない
しは多少ゴム弾性が低いエポキシ系,ウレタン系樹脂を
材料とした直径1mm,高さが0.5mmより若干大き目な
半球状の突起体であって、図示実施例ではスペーサ11
が外囲ケース1側の段付座面1a-1の周域に沿って等間
隔に3〜6箇所に接着されている。
Further, spacers 11 having rubber elasticity are dispersedly interposed between the stepped seating surface 1a-1 and the peripheral edge of the ceramic plate 5b-1 along the peripheral area. The spacer 11 is a hemispherical projection having a diameter of 1 mm and a height slightly larger than 0.5 mm made of a silicone-based resin of the same kind as the adhesive 7 or an epoxy-based or urethane-based resin having somewhat lower rubber elasticity. In the illustrated embodiment, the spacer 11
Are adhered at three to six places at equal intervals along the peripheral area of the stepped seating surface 1a-1 on the outer case 1 side.

【0019】そして、外囲ケース1に主回路組立体5を
組み込む接着組立工程では、あらかじめ段付座面1a-1
を含めて外囲ケース1の基板取付穴1aの内周面にシリ
コーン系,ないしはエポキシ系,ウレタン系の接着剤7
を厚く塗布しておき、外囲ケース1の裏面側から基板取
付穴1aに主回路組立体5を挿入した後、前記したスペ
ーサ11の先端が相手側部材であるセラミックス板5b
-1の上面に突き当たるように加圧して外囲ケース1の裏
面と絶縁基板5bの裏面とが同じ面に揃うようにセット
し、この状態を保持して接着剤7を加熱硬化させる。
In the bonding and assembling step of incorporating the main circuit assembly 5 into the outer case 1, the stepped seating surface 1a-1 is set in advance.
And a silicone-based or epoxy-based or urethane-based adhesive 7 on the inner peripheral surface of the board mounting hole 1a of the outer case 1 including
After the main circuit assembly 5 is inserted into the board mounting hole 1a from the back side of the surrounding case 1, the tip of the spacer 11 is a ceramic plate 5b as a mating member.
-1 is pressed so as to hit the upper surface of the insulating substrate 5b so that the back surface of the outer case 1 and the back surface of the insulating substrate 5b are flush with each other.

【0020】これにより、接着後の組立状態では、基板
取付穴1aの段付座面1a-1と絶縁基板5bのセラミッ
クス板5b-1の上面との間に充填された接着剤7の層厚
さDが0.5mmないしは0.5±0.3mmの範囲に確保
されるようになる。なお、この接着剤7は外部から湿気
などがケース内に侵入するのを阻止するシーリング材と
しての役目も果たす。
Thus, in the assembled state after the bonding, the thickness of the adhesive 7 filled between the stepped seating surface 1a-1 of the substrate mounting hole 1a and the upper surface of the ceramic plate 5b-1 of the insulating substrate 5b. The distance D is maintained in the range of 0.5 mm or 0.5 ± 0.3 mm. The adhesive 7 also serves as a sealing material for preventing moisture and the like from entering the case from the outside.

【0021】〔実施例2〕図2は先記実施例1の応用実
施例を示すものであり、この実施例においては、先記し
た半球状突起体のスペーサ11が外囲ケース1の段付座
面1a-1に対向して絶縁基板5bのセラミックス板5b
-1の上面周域に分散して取付けられており、そのほかの
構成,基板取付穴1aの深さ寸法などは図1と同様であ
る。
[Embodiment 2] FIG. 2 shows an applied embodiment of the above-described embodiment 1. In this embodiment, the above-mentioned hemispherical projection spacer 11 is provided with a step on the outer case 1. Ceramic plate 5b of insulating substrate 5b facing seating surface 1a-1
1, and the other configuration, the depth dimension of the board mounting hole 1a, and the like are the same as those in FIG.

【0022】〔実施例3〕図3は本発明の請求項5に対
応した組立方法の実施例を示すものである。この組立方
法の実施には図示のような接着用治具12を用いて外囲
ケース1と主回路組立体5の絶縁基板5bとの間を接着
する。
[Embodiment 3] FIG. 3 shows an embodiment of an assembling method according to claim 5 of the present invention. In carrying out this assembling method, the surrounding case 1 and the insulating substrate 5b of the main circuit assembly 5 are bonded using a bonding jig 12 as shown.

【0023】すなわち、接着用治具12は上面が平坦な
テーブルで、外囲ケース1,主回路組立体5をテーブル
上の定位置に位置決め支持するために、外囲ケースのボ
ルト穴1cに嵌合する位置決めピン12a,および外囲
ケース1の裏面を前記テーブル面に押し付ける押さえ具
(一端を治具にねじ締結した板ばね)12bと、主回路
組立体5の絶縁基板5bをテーブル面に押し付ける押さ
え具(ばね付勢されたピン)12cを装備しいてる。な
お、12dは接着工程で裏面側にはみ出した接着剤を逃
がすように、外囲ケース1の基板取付穴1aの周域に沿
ってテーブル上面に形成した凹溝である。
That is, the bonding jig 12 is a table having a flat upper surface, and is fitted into the bolt hole 1c of the outer case to position and support the outer case 1 and the main circuit assembly 5 at fixed positions on the table. The positioning pin 12a to be fitted, a holding tool (a leaf spring having one end screwed to a jig) for pressing the back surface of the outer case 1 against the table surface, and the insulating substrate 5b of the main circuit assembly 5 are pressed against the table surface. A holding tool (spring biased pin) 12c is provided. Reference numeral 12d denotes a concave groove formed on the upper surface of the table along the peripheral area of the board mounting hole 1a of the outer case 1 so as to allow the adhesive which has protruded to the rear surface side in the bonding step to escape.

【0024】そして、半導体装置の組立工程で外囲ケー
ス1に主回路組立体5を接着する際には、先記実施例と
同様に外囲ケース1の基板取付穴1aの内周面に接着剤
7を塗布した後、図示のように接着用治具12のテーブ
ル上に主回路組立体5の絶縁基板5b,および外囲ケー
ス1を載置し、各部品を治具12の押さえ具12c,1
2dで定位置に加圧保持し、この状態で接着剤7を加熱
硬化させる。
When the main circuit assembly 5 is bonded to the outer case 1 in the process of assembling the semiconductor device, the main circuit assembly 5 is bonded to the inner peripheral surface of the board mounting hole 1a of the outer case 1 in the same manner as in the previous embodiment. After applying the agent 7, the insulating substrate 5b of the main circuit assembly 5 and the surrounding case 1 are placed on the table of the bonding jig 12 as shown in the figure, and each component is pressed by the holding member 12c of the jig 12. , 1
The pressure is held at a fixed position in 2d, and the adhesive 7 is cured by heating in this state.

【0025】これにより、接着剤硬化後の組立状態で
は、外囲ケース1の裏面と絶縁基板5bの裏面が同一面
上に揃い、図5で述べたような段差ΔSの発生を抑えた
高い組立精度が確保できる。しかも、外囲ケース1に開
口した基板取付穴1aの深さを図1と同様に設定してお
くことにより、実施例1,2で述べたスペーサ11を用
いなくても、接着後の組立状態では、基板取付穴1aの
段付座面1a-1と絶縁基板5bのセラミックス板5b-1
の上面との間に充填された接着剤7の層厚さDを所定の
厚さである0.5±0.3mmの範囲に確保できる。な
お、この実施例の接着用治具12は、スペーサ11を用
いた先記実施例1,2の接着組立工程にも同様に使用す
ることができるのは勿論である。
As a result, in the assembled state after the adhesive is cured, the back surface of the outer case 1 and the back surface of the insulating substrate 5b are aligned on the same surface, and a high assembly in which the occurrence of the step ΔS as shown in FIG. Accuracy can be ensured. Moreover, by setting the depth of the board mounting hole 1a opened in the outer case 1 in the same manner as in FIG. 1, the assembled state after bonding can be achieved without using the spacer 11 described in the first and second embodiments. Now, the stepped seating surface 1a-1 of the substrate mounting hole 1a and the ceramic plate 5b-1 of the insulating substrate 5b
The thickness D of the adhesive 7 filled in between the upper surface and the upper surface can be secured within a predetermined thickness of 0.5 ± 0.3 mm. It is needless to say that the bonding jig 12 of this embodiment can be similarly used in the bonding and assembling steps of the first and second embodiments using the spacer 11.

【0026】[0026]

【発明の効果】以上述べたように、本発明によれば、製
品を使用先で冷却フィンに取付ける際のボルト締結で絶
縁基板のセラミックス板に大きな外力が加わった場合で
も、ゴム弾性を有する層厚の厚い接着剤がストレスを吸
収してセラミックス板をクラック割れから安全に保護す
ることができて製品の信頼性が向上する。なお、この点
については発明者等が行った破壊テストからも、従来製
品と較べて1.3〜1.5倍の過大な外力に耐えること
が実証されている。
As described above, according to the present invention, even when a large external force is applied to the ceramic plate of the insulating substrate by bolting when attaching the product to the cooling fin at the place of use, the layer having rubber elasticity can be used. The thick adhesive absorbs the stress and can protect the ceramic plate safely from crack cracking, thereby improving the reliability of the product. In this connection, a destructive test performed by the inventors has demonstrated that the device can withstand an external force 1.3 to 1.5 times as large as that of a conventional product.

【0027】また、接着部に請求項3,4のスペーサを
付加することにより、接着組立ての際に接着剤の層厚を
所定の厚さ0.5±0.3mmの範囲に確保することがで
き、さらに請求項5の接着用治具を採用することによ
り、組立状態では外囲ケースの裏面と絶縁基板の裏面が
同一面に揃って両者の間に段差のない高い組立精度が確
保できるなど、半導体装置の組立工程における信頼性の
向上,製品の品質安定化が図れる。
In addition, by adding the spacer according to the third and fourth aspects to the bonding portion, it is possible to secure the layer thickness of the adhesive within a predetermined thickness of 0.5 ± 0.3 mm at the time of bonding and assembling. In addition, by employing the bonding jig according to the fifth aspect, in the assembled state, the back surface of the enclosing case and the back surface of the insulating substrate are aligned on the same surface, and high assembly accuracy without a step therebetween can be ensured. In addition, the reliability of the semiconductor device assembling process can be improved and the quality of the product can be stabilized.

【図面の簡単な説明】[Brief description of the drawings]

【図1】本発明の実施例1に対応したパワー半導体装置
の要部構造の断面図
FIG. 1 is a cross-sectional view of a main structure of a power semiconductor device according to a first embodiment of the present invention.

【図2】本発明の実施例2に対応したパワー半導体装置
の要部構造の断面図
FIG. 2 is a sectional view of a main part structure of a power semiconductor device according to a second embodiment of the present invention;

【図3】本発明の実施例3に対応する接着用治具を用い
たパワー半導体装置の接着組立工程の状態を表す図
FIG. 3 is a diagram showing a state of a bonding assembly process of a power semiconductor device using a bonding jig according to a third embodiment of the present invention;

【図4】本発明の実施対象となるインテリジェントパワ
ーモジュールの外観斜視図
FIG. 4 is an external perspective view of an intelligent power module to which the present invention is applied.

【図5】従来におけるパワー半導体装置の組立構造を表
す構成図であり、(a) は半導体装置全体の側視断面図、
(b) は(a) 図におけるA部の詳細構造を表す拡大図
5A and 5B are configuration diagrams showing a conventional power semiconductor device assembly structure, in which FIG. 5A is a cross-sectional side view of the entire semiconductor device,
(b) is an enlarged view showing the detailed structure of part A in (a)

【符号の説明】[Explanation of symbols]

1 外囲ケース 1a 基板取付穴 1a-1 段付座面 5 主回路組立体 5a パワー半導体素子 5b 絶縁基板 5b-1 セラミックス板 7 接着剤 11 スペーサ 12 接着用治具 DESCRIPTION OF SYMBOLS 1 Outer case 1a Board mounting hole 1a-1 Stepped seating surface 5 Main circuit assembly 5a Power semiconductor element 5b Insulating substrate 5b-1 Ceramic plate 7 Adhesive 11 Spacer 12 Adhesive jig

Claims (5)

【特許請求の範囲】[Claims] 【請求項1】外囲ケースに電力用の主回路組立体を組み
込んだパワー半導体装置であり、前記主回路組立体がセ
ラミックス板を基材とする絶縁基板にパワー半導体素子
を搭載した構成になり、該絶縁基板を前記外囲ケースの
底面に開口した基板取付穴に下方から嵌め込んでその周
縁と前記基板取付穴の裏面側周縁に形成した段付き座面
との間を接着剤で固着したものにおいて、絶縁基板の裏
面と外囲ケースの裏面と同一面に揃えるとともに、前記
基板取付穴の段付き座面と絶縁基板の周縁との間に充填
した接着剤の層厚さを0.5±0.3mmの範囲に設定し
たことを特徴とするパワー半導体装置。
1. A power semiconductor device having a main circuit assembly for electric power incorporated in an outer case, wherein the main circuit assembly has a structure in which a power semiconductor element is mounted on an insulating substrate having a ceramic plate as a base material. The insulating substrate was fitted from below into a substrate mounting hole opened in the bottom surface of the outer case, and the peripheral edge thereof and the stepped seating surface formed on the rear peripheral edge of the substrate mounting hole were fixed with an adhesive. In this case, the rear surface of the insulating substrate and the rear surface of the outer case are flush with each other, and the layer thickness of the adhesive filled between the stepped seat surface of the substrate mounting hole and the peripheral edge of the insulating substrate is set to 0.5. A power semiconductor device characterized in that it is set within a range of ± 0.3 mm.
【請求項2】請求項1記載のパワー半導体装置におい
て、接着剤がゴム弾性を有するシリコーン系,ないしエ
ポキシ系,ウレタン系の接着剤であることを特徴とする
パワー半導体装置。
2. The power semiconductor device according to claim 1, wherein the adhesive is a silicone-based, epoxy-based, or urethane-based adhesive having rubber elasticity.
【請求項3】請求項1記載のパワー半導体装置におい
て、外囲ケースの底面に開口した基板取付穴の段付き座
面の周域に沿って、絶縁基板のセラミックス板周縁との
間にゴム弾性を有するスペーサを分散介挿して接着剤の
層厚さを0.5±0.3mmの範囲に確保するようにした
ことを特徴とするパワー半導体装置。
3. The power semiconductor device according to claim 1, wherein a rubber elasticity is provided between the peripheral edge of the ceramic plate of the insulating substrate and the periphery of the stepped seat surface of the substrate mounting hole opened in the bottom surface of the outer case. A power semiconductor device characterized in that spacers having the following are dispersed and interposed to secure the thickness of the adhesive layer in a range of 0.5 ± 0.3 mm.
【請求項4】請求項3記載のパワー半導体装置におい
て、スペーサがシリコーン系,ないしはエポキシ系,ウ
レタン系樹脂からなる突起体であり、該スペーサを基板
取付穴の段付き座面,もしくは絶縁基板のセラミックス
板周縁に固着したことを特徴とするパワー半導体装置。
4. The power semiconductor device according to claim 3, wherein the spacer is a projection made of a silicone-based, epoxy-, or urethane-based resin, and the spacer is formed as a stepped seating surface of a substrate mounting hole or an insulating substrate. A power semiconductor device fixed to a peripheral edge of a ceramic plate.
【請求項5】請求項1記載のパワー半導体装置におい
て、主回路組立体の絶縁基板,および外囲ケースを接着
用治具の平坦なテーブル上に載置して各部品を定位置に
支持し、この状態で外囲ケース側に形成した基板取付穴
の段付き座面と絶縁基板のセラミックス板周縁との間を
接着剤で固着したことを特徴とする半導体装置の組立方
法。
5. The power semiconductor device according to claim 1, wherein the insulating substrate of the main circuit assembly and the surrounding case are placed on a flat table of a bonding jig to support each part in a fixed position. In this state, a method of assembling a semiconductor device, wherein a stepped seating surface of a substrate mounting hole formed on the outer case and a peripheral edge of the ceramic plate of the insulating substrate are fixed with an adhesive.
JP30195698A 1998-10-23 1998-10-23 Power semiconductor device and assembly method thereof Expired - Lifetime JP3758383B2 (en)

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JP2000133769A true JP2000133769A (en) 2000-05-12
JP3758383B2 JP3758383B2 (en) 2006-03-22

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Country Link
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CN110509213B (en) * 2019-08-16 2024-03-12 河南鑫宇光科技股份有限公司 SMT type free space isolator assembling tool and using method thereof

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