JP2000106340A5 - - Google Patents
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- JP2000106340A5 JP2000106340A5 JP1998290053A JP29005398A JP2000106340A5 JP 2000106340 A5 JP2000106340 A5 JP 2000106340A5 JP 1998290053 A JP1998290053 A JP 1998290053A JP 29005398 A JP29005398 A JP 29005398A JP 2000106340 A5 JP2000106340 A5 JP 2000106340A5
- Authority
- JP
- Japan
- Prior art keywords
- substrate
- mask
- compartment region
- scanning exposure
- compartment
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- 239000000758 substrate Substances 0.000 description 248
- 238000000034 method Methods 0.000 description 56
- 230000001133 acceleration Effects 0.000 description 27
- 230000005484 gravity Effects 0.000 description 9
- 238000005192 partition Methods 0.000 description 6
- 230000001360 synchronised effect Effects 0.000 description 6
- 230000003287 optical effect Effects 0.000 description 5
- JUJBNYBVVQSIOU-UHFFFAOYSA-M sodium;4-[2-(4-iodophenyl)-3-(4-nitrophenyl)tetrazol-2-ium-5-yl]benzene-1,3-disulfonate Chemical compound [Na+].C1=CC([N+](=O)[O-])=CC=C1N1[N+](C=2C=CC(I)=CC=2)=NC(C=2C(=CC(=CC=2)S([O-])(=O)=O)S([O-])(=O)=O)=N1 JUJBNYBVVQSIOU-UHFFFAOYSA-M 0.000 description 4
- 230000001678 irradiating effect Effects 0.000 description 2
- 230000000803 paradoxical effect Effects 0.000 description 2
- 238000005498 polishing Methods 0.000 description 1
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP10290053A JP2000106340A (ja) | 1997-09-26 | 1998-09-28 | 露光装置及び走査露光方法、並びにステージ装置 |
Applications Claiming Priority (5)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP9-279500 | 1997-09-26 | ||
| JP27950097 | 1997-09-26 | ||
| JP10-226500 | 1998-07-27 | ||
| JP22650098 | 1998-07-27 | ||
| JP10290053A JP2000106340A (ja) | 1997-09-26 | 1998-09-28 | 露光装置及び走査露光方法、並びにステージ装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2000106340A JP2000106340A (ja) | 2000-04-11 |
| JP2000106340A5 true JP2000106340A5 (https=) | 2005-11-10 |
Family
ID=27331177
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP10290053A Withdrawn JP2000106340A (ja) | 1997-09-26 | 1998-09-28 | 露光装置及び走査露光方法、並びにステージ装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2000106340A (https=) |
Families Citing this family (24)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6927505B2 (en) | 2001-12-19 | 2005-08-09 | Nikon Corporation | Following stage planar motor |
| JP3679776B2 (ja) * | 2002-04-22 | 2005-08-03 | キヤノン株式会社 | 駆動装置、露光装置及びデバイス製造方法 |
| EP2157480B1 (en) | 2003-04-09 | 2015-05-27 | Nikon Corporation | Exposure method and apparatus, and device manufacturing method |
| SG139733A1 (en) | 2003-04-11 | 2008-02-29 | Nikon Corp | Apparatus having an immersion fluid system configured to maintain immersion fluid in a gap adjacent an optical assembly |
| KR101476087B1 (ko) | 2003-06-19 | 2014-12-23 | 가부시키가이샤 니콘 | 노광 장치 및 디바이스 제조방법 |
| TWI360158B (en) | 2003-10-28 | 2012-03-11 | Nikon Corp | Projection exposure device,exposure method and dev |
| KR100585108B1 (ko) * | 2003-11-14 | 2006-06-01 | 삼성전자주식회사 | 스캔 방식의 노광 장치를 이용한 웨이퍼 노광 방법 |
| TWI385414B (zh) | 2003-11-20 | 2013-02-11 | 尼康股份有限公司 | 光學照明裝置、照明方法、曝光裝置、曝光方法以及元件製造方法 |
| US7016019B2 (en) | 2003-12-16 | 2006-03-21 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
| US7589822B2 (en) | 2004-02-02 | 2009-09-15 | Nikon Corporation | Stage drive method and stage unit, exposure apparatus, and device manufacturing method |
| TWI609410B (zh) | 2004-02-06 | 2017-12-21 | 尼康股份有限公司 | 光學照明裝置、曝光裝置、曝光方法以及元件製造方法 |
| KR20140140648A (ko) | 2005-05-12 | 2014-12-09 | 가부시키가이샤 니콘 | 투영 광학계, 노광 장치 및 노광 방법 |
| KR101452524B1 (ko) * | 2006-09-01 | 2014-10-21 | 가부시키가이샤 니콘 | 이동체 구동 방법 및 이동체 구동 시스템, 패턴 형성 방법 및 장치, 노광 방법 및 장치, 그리고 디바이스 제조 방법 |
| JP5267029B2 (ja) | 2007-10-12 | 2013-08-21 | 株式会社ニコン | 照明光学装置、露光装置及びデバイスの製造方法 |
| US8379187B2 (en) | 2007-10-24 | 2013-02-19 | Nikon Corporation | Optical unit, illumination optical apparatus, exposure apparatus, and device manufacturing method |
| US9116346B2 (en) | 2007-11-06 | 2015-08-25 | Nikon Corporation | Illumination apparatus, illumination method, exposure apparatus, and device manufacturing method |
| JP6066610B2 (ja) * | 2012-07-31 | 2017-01-25 | キヤノン株式会社 | 露光方法、露光装置及びデバイス製造方法 |
| JP6501530B2 (ja) * | 2015-01-21 | 2019-04-17 | 株式会社ディスコ | レーザー加工装置 |
| WO2019044489A1 (ja) | 2017-08-28 | 2019-03-07 | キヤノン株式会社 | 駆動装置および撮像装置の制御方法 |
| JP7467821B2 (ja) * | 2020-02-06 | 2024-04-16 | 株式会社東京精密 | レーザ加工装置及び加工方法 |
| WO2023203612A1 (ja) * | 2022-04-18 | 2023-10-26 | ヤマハ発動機株式会社 | レーザ加工装置、レーザ加工方法、レーザ加工プログラム、記録媒体、半導体チップ製造方法および半導体チップ |
| KR102948781B1 (ko) * | 2022-04-18 | 2026-04-06 | 야마하하쓰도키 가부시키가이샤 | 레이저 가공 장치, 레이저 가공 방법, 레이저 가공 프로그램, 기록 매체, 반도체 칩 제조 방법, 및 반도체 칩 |
| KR20240148880A (ko) * | 2022-04-18 | 2024-10-11 | 야마하하쓰도키 가부시키가이샤 | 레이저 가공 장치, 레이저 가공 방법, 레이저 가공 프로그램, 기록 매체, 반도체 칩 제조 방법, 및 반도체 칩 |
| JP7614450B2 (ja) * | 2022-04-18 | 2025-01-15 | ヤマハ発動機株式会社 | レーザ加工装置、レーザ加工方法、レーザ加工プログラム、記録媒体、半導体チップ製造方法および半導体チップ |
-
1998
- 1998-09-28 JP JP10290053A patent/JP2000106340A/ja not_active Withdrawn
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