JP2000091846A5 - - Google Patents

Download PDF

Info

Publication number
JP2000091846A5
JP2000091846A5 JP1998259005A JP25900598A JP2000091846A5 JP 2000091846 A5 JP2000091846 A5 JP 2000091846A5 JP 1998259005 A JP1998259005 A JP 1998259005A JP 25900598 A JP25900598 A JP 25900598A JP 2000091846 A5 JP2000091846 A5 JP 2000091846A5
Authority
JP
Japan
Prior art keywords
atoms
gallium arsenide
line
ground electrode
signal line
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP1998259005A
Other languages
English (en)
Other versions
JP2000091846A (ja
JP3899193B2 (ja
Filing date
Publication date
Application filed filed Critical
Priority claimed from JP25900598A external-priority patent/JP3899193B2/ja
Priority to JP25900598A priority Critical patent/JP3899193B2/ja
Priority to US09/299,017 priority patent/US6344658B1/en
Priority to EP99108231A priority patent/EP0954039B1/en
Priority to KR10-1999-0014953A priority patent/KR100523131B1/ko
Priority to EP03025203.5A priority patent/EP1388901B1/en
Priority to DE69934933T priority patent/DE69934933T2/de
Priority to EP03025204.3A priority patent/EP1388931B1/en
Priority to EP03025205.0A priority patent/EP1388902B1/en
Priority to CNB2004100016222A priority patent/CN1278398C/zh
Priority to CNB991053869A priority patent/CN100364111C/zh
Priority to US09/540,040 priority patent/US6369663B1/en
Priority to US09/541,097 priority patent/US6514832B1/en
Priority to US09/540,041 priority patent/US6426511B1/en
Publication of JP2000091846A publication Critical patent/JP2000091846A/ja
Publication of JP2000091846A5 publication Critical patent/JP2000091846A5/ja
Priority to KR10-2005-0045357A priority patent/KR100503694B1/ko
Priority to KR1020050045356A priority patent/KR20050061415A/ko
Publication of JP3899193B2 publication Critical patent/JP3899193B2/ja
Application granted granted Critical
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Description

【0017】
線路基板10は、図2の(a),(b)に示すように、半絶縁性又は絶縁性(例えば、比抵抗が106Ωcm程度以上で、熱伝導率が140W/mK程度以上のAlN、SiC、ダイアモンド等)の平板基板11の上面に、信号線路12、その信号線路12に直流バイアスを印加するチョーク部13、その信号線路12の端部に連続させた信号電極14、その信号電極14を挟むように配置した一対の表面接地電極15が形成され、裏面には接地電極16が形成され、表面接地電極15は接地電極16に対してヴィアホール17により接続されている。この線路基板10は、その信号線路12の裏面に接地電極がなく、サスペンディド線路を形成している。
【0019】
一例として、半導体基板21は不純物濃度が1〜2×1018atom/cm 3 のn型ガリウム砒素からなり、第1のコンタクト層22は不純物濃度が2×1018atom/cm 3 で厚さ1.5μmのn型ガリウム砒素からなり、活性層23は不純物濃度が1.2×1016atom/cm 3 で厚さ1.6μmのn型ガリウム砒素からなり、第2のコンタクト層24は不純物濃度が1×1018atom/cm 3 で厚さ0.3μmのn型ガリウム砒素からなる。ガリウム砒素に代えてインジウムリン等の他の化合物半導体を使用することもできる。
JP25900598A 1998-04-28 1998-09-11 Nrdガイドガン発振器 Expired - Lifetime JP3899193B2 (ja)

Priority Applications (15)

Application Number Priority Date Filing Date Title
JP25900598A JP3899193B2 (ja) 1998-09-11 1998-09-11 Nrdガイドガン発振器
US09/299,017 US6344658B1 (en) 1998-04-28 1999-04-26 Gunn diode, NRD guide gunn oscillator, fabricating method of gunn diode and structure for assembly of the same
EP99108231A EP0954039B1 (en) 1998-04-28 1999-04-27 Gunn diode, NRD guide gunn oscillator and fabricating method
KR10-1999-0014953A KR100523131B1 (ko) 1998-04-28 1999-04-27 건 다이오드, 엔알디 가이드 건 발진기와 그 제조방법 및 실장구조
EP03025203.5A EP1388901B1 (en) 1998-04-28 1999-04-27 Structure for assembly of a Gunn diode
DE69934933T DE69934933T2 (de) 1998-04-28 1999-04-27 Gunndiode, NRD Leitungsschaltung und Verfahren zur Herstellung
EP03025204.3A EP1388931B1 (en) 1998-04-28 1999-04-27 NRD guide Gunn oscillator
EP03025205.0A EP1388902B1 (en) 1998-04-28 1999-04-27 Fabricating method of Gunn diode
CNB2004100016222A CN1278398C (zh) 1998-04-28 1999-04-28 耿氏二极管制造方法以及耿氏振荡器
CNB991053869A CN100364111C (zh) 1998-04-28 1999-04-28 耿氏二极管及其安装结构
US09/540,040 US6369663B1 (en) 1998-04-28 2000-03-31 NRD guide Gunn oscillator
US09/541,097 US6514832B1 (en) 1998-04-28 2000-03-31 Gunn diode, NRD guide Gunn oscillator, fabricating method of Gunn diode and structure for assembly of the same
US09/540,041 US6426511B1 (en) 1998-04-28 2000-03-31 Gunn diode, NRD guide gunn oscillator, fabricating method of gunn diode and structure for assembly of the same
KR10-2005-0045357A KR100503694B1 (ko) 1998-04-28 2005-05-30 건 다이오드, 엔알디 가이드 건 발진기와 그 제조방법 및실장구조
KR1020050045356A KR20050061415A (ko) 1998-04-28 2005-05-30 건 다이오드, 엔알디 가이드 건 발진기와 그 제조방법 및실장구조

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP25900598A JP3899193B2 (ja) 1998-09-11 1998-09-11 Nrdガイドガン発振器

Publications (3)

Publication Number Publication Date
JP2000091846A JP2000091846A (ja) 2000-03-31
JP2000091846A5 true JP2000091846A5 (ja) 2004-10-14
JP3899193B2 JP3899193B2 (ja) 2007-03-28

Family

ID=17328039

Family Applications (1)

Application Number Title Priority Date Filing Date
JP25900598A Expired - Lifetime JP3899193B2 (ja) 1998-04-28 1998-09-11 Nrdガイドガン発振器

Country Status (1)

Country Link
JP (1) JP3899193B2 (ja)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4493773B2 (ja) * 1999-12-27 2010-06-30 新日本無線株式会社 ガンダイオード及びその製造方法

Similar Documents

Publication Publication Date Title
EP0952611A3 (en) Semiconductor device
JP2002305304A5 (ja)
EP0368246A3 (en) Insulated gate bipolar semiconductor device having a Schottky barrier layer and method of manufacturing the same
EP1083607A3 (en) High voltage SOI semiconductor device
DE69921189D1 (de) Verbindungshalbleiterstruktur für optoelektronische bauelemente
ATE240588T1 (de) Siliziumkarbid feldgesteuerter zweipoliger schalter
ATE313090T1 (de) Diamant-strahlungs-detektor
KR900008668A (ko) 반도체 장치
JP2000022241A5 (ja)
JP2000091846A5 (ja)
EP0677877A3 (en) Insulating gate type semiconductor device and power inverter using such a device
JPS55150271A (en) Semiconductor device
JP2000114823A5 (ja)
JPS58137240A (ja) 半導体装置
JPS6484733A (en) Semiconductor device
JPS5676573A (en) Field effect semiconductor device
JPS5851556A (ja) 半導体集積回路装置
JPS60181058U (ja) シヨツトキーバリアダイオード
RU96108212A (ru) Инжекционный полупроводниковый лазер
JPH0723958Y2 (ja) 半導体装置
JPH0426224B2 (ja)
JPS6482650A (en) Semiconductor integrated circuit device
JPS6435759U (ja)
JPS6183328U (ja)
TW373192B (en) Method for fabricating surge protection device