JP2000081512A5 - - Google Patents
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- Publication number
- JP2000081512A5 JP2000081512A5 JP1998252269A JP25226998A JP2000081512A5 JP 2000081512 A5 JP2000081512 A5 JP 2000081512A5 JP 1998252269 A JP1998252269 A JP 1998252269A JP 25226998 A JP25226998 A JP 25226998A JP 2000081512 A5 JP2000081512 A5 JP 2000081512A5
- Authority
- JP
- Japan
- Prior art keywords
- substrate
- main surface
- optical element
- etching
- manufacturing
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000000758 substrate Substances 0.000 description 43
- 230000003287 optical Effects 0.000 description 13
- 229910052904 quartz Inorganic materials 0.000 description 13
- 239000010453 quartz Substances 0.000 description 13
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 13
- 238000005530 etching Methods 0.000 description 10
- 238000004519 manufacturing process Methods 0.000 description 9
- 239000010408 film Substances 0.000 description 5
- BJQHLKABXJIVAM-UHFFFAOYSA-N Bis(2-ethylhexyl) phthalate Chemical compound CCCCC(CC)COC(=O)C1=CC=CC=C1C(=O)OCC(CC)CCCC BJQHLKABXJIVAM-UHFFFAOYSA-N 0.000 description 4
- 238000000034 method Methods 0.000 description 4
- 238000005498 polishing Methods 0.000 description 3
- 239000010409 thin film Substances 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 1
- 238000005755 formation reaction Methods 0.000 description 1
- 238000007517 polishing process Methods 0.000 description 1
- 238000001039 wet etching Methods 0.000 description 1
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP25226998A JP4244410B2 (ja) | 1998-09-07 | 1998-09-07 | エタロンフィルタおよびその製造方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP25226998A JP4244410B2 (ja) | 1998-09-07 | 1998-09-07 | エタロンフィルタおよびその製造方法 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2000081512A JP2000081512A (ja) | 2000-03-21 |
| JP2000081512A5 true JP2000081512A5 (de) | 2007-11-15 |
| JP4244410B2 JP4244410B2 (ja) | 2009-03-25 |
Family
ID=17234897
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP25226998A Expired - Fee Related JP4244410B2 (ja) | 1998-09-07 | 1998-09-07 | エタロンフィルタおよびその製造方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP4244410B2 (de) |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE102006032047A1 (de) * | 2006-07-10 | 2008-01-24 | Schott Ag | Verfahren zur Herstellung optoelektronischer Bauelemente und damit hergestellte Erzeugnisse |
| JP5707107B2 (ja) | 2010-11-22 | 2015-04-22 | 浜松ホトニクス株式会社 | 分光センサ |
| JP5634836B2 (ja) * | 2010-11-22 | 2014-12-03 | 浜松ホトニクス株式会社 | 分光センサの製造方法 |
| JP5757835B2 (ja) | 2011-10-04 | 2015-08-05 | 浜松ホトニクス株式会社 | 分光センサの製造方法 |
-
1998
- 1998-09-07 JP JP25226998A patent/JP4244410B2/ja not_active Expired - Fee Related
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