JP2000071086A - Method and device for shape processing by laser light - Google Patents

Method and device for shape processing by laser light

Info

Publication number
JP2000071086A
JP2000071086A JP10245711A JP24571198A JP2000071086A JP 2000071086 A JP2000071086 A JP 2000071086A JP 10245711 A JP10245711 A JP 10245711A JP 24571198 A JP24571198 A JP 24571198A JP 2000071086 A JP2000071086 A JP 2000071086A
Authority
JP
Japan
Prior art keywords
processing
laser beam
laser light
laser
contour
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP10245711A
Other languages
Japanese (ja)
Inventor
Masayasu Yasuoka
正泰 安岡
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
YASUOKA KK
Original Assignee
YASUOKA KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by YASUOKA KK filed Critical YASUOKA KK
Priority to JP10245711A priority Critical patent/JP2000071086A/en
Publication of JP2000071086A publication Critical patent/JP2000071086A/en
Pending legal-status Critical Current

Links

Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23KSOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00Working by laser beam, e.g. welding, cutting or boring
    • B23K26/36Removing material

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  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Plasma & Fusion (AREA)
  • Mechanical Engineering (AREA)
  • Laser Beam Processing (AREA)

Abstract

PROBLEM TO BE SOLVED: To apply deep engraving at a given depth to a processing area by moving a processing material in a direction perpendicular to a moving direction while a laser light is iteratively moved in a fixed direction at high velocity, and applying pattern processing and frame processing due to a sublimation action of the laser light. SOLUTION: When a laser light LA is oscillated along the longitudinal direction of a processing hole B at high velocity and moved in a fixed direction for forming one groove, an XY table 8 is oscillated in a horizontal direction for forming another groove. By repeating this, a large number of grooves are formed in an area of the processing hole B. Then, frame processing is applied along an outer surface of the shape of the processing hole B. The above- mentioned action is repeated until the pattern processing number, namely a processing layer number N is matched with the layer number of a given deep engraving distance. Then, semi-frame processing is applied, and a slight residual inclined taper of an end wall is further removed, so that the edge wall is processed to an approximately rectangular condition. The semi-frame processing is repeated plural times per layer, and processing is completed when a deep engraving distance becomes a given depth.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】この発明は、レーザ光により
被加工材料に所要深さの深彫り加工を行うレーザによる
形状加工方法及び装置に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method and an apparatus for processing a shape by a laser for performing a deep-cutting processing of a required depth on a material to be processed by a laser beam.

【0002】[0002]

【従来の技術】レーザ光を照射して金属部品などに切
断、穴明け、溶接など種々の加工を施すレーザ加工技術
が開発されており、レーザ加工の応用範囲は多岐に亘っ
ている。このようなレーザ加工技術の分野では、上記切
断、穴明け、溶接加工のように高エネルギのレーザ光で
被加工物の材料を溶融して加工する方法が一般的である
が、特殊な例として例えば金属組織を構成する各種元素
の溶融温度をはるかに越える高加工エネルギを加え金属
組織の一部を蒸発、気化させて加工する、いわゆるレー
ザトリミング加工あるいはレーザスクライビング加工な
どがある。
2. Description of the Related Art Laser processing techniques for performing various processes such as cutting, drilling, and welding on metal parts by irradiating a laser beam have been developed, and the application range of the laser processing is wide. In the field of such laser processing technology, a method of melting and processing a material of a workpiece with high-energy laser light, such as the above-described cutting, drilling, and welding, is generally performed. For example, there is a so-called laser trimming process or a laser scribing process in which a high working energy far exceeding the melting temperature of various elements constituting the metal structure is applied to evaporate and vaporize a part of the metal structure.

【0003】上記レーザトリミング加工、レーザスクラ
イビング加工のいずれも微小加工技術の1つであり、レ
ーザトリミング加工は例えばプリント基板上に厚膜抵抗
体、導体などを印刷形成し、それぞれの幅を所定幅とな
るように抵抗体、導体などの不要部分をレーザ光で切断
し除去するのに用いられ、レーザスクライビング加工は
例えば所定形状のブロックに予め決められた線上に沿っ
て溝入れ加工を施し、後でその溝に沿って連続的に破砕
して小さいサイズのブロックに分割する工程の前工程の
段階をいう。
Both the laser trimming and the laser scribing are one of the micromachining techniques. In the laser trimming, for example, a thick film resistor, a conductor, or the like is formed by printing on a printed circuit board, and each width is set to a predetermined width. It is used to cut and remove unnecessary parts such as resistors and conductors with laser light so that laser scribing is performed, for example, by grooving a block of a predetermined shape along a predetermined line, and Refers to a stage before the process of continuously crushing along the groove and dividing into small-sized blocks.

【0004】このような微小加工では材料を加熱・溶融
するのを防止し、よりよい蒸発状態で切断又は溝入加工
が行われるが、いずれの場合もその加工深さは数μm〜
数百μm程度である。又、このような微小加工に用いら
れるレーザ装置は、多くの場合連続励起YAGレーザの
光共振器光路にQスイッチ素子を挿入して尖頭出力とし
て連続発振の約1000倍程のQスイッチ発振方式のも
のが用いられる。
[0004] In such micromachining, the material is prevented from being heated and melted, and cutting or grooving is performed in a better evaporation state. In any case, the machining depth is several μm or more.
It is about several hundred μm. In many cases, a laser device used for such micro-machining is a Q-switch oscillation method that inserts a Q-switch element into an optical resonator optical path of a continuous excitation YAG laser and outputs about 1.5 times the continuous oscillation as a peak output. Is used.

【0005】[0005]

【発明が解決しようとする課題】ところで、上述したレ
ーザトリミング加工、レーザスクライビング加工のいず
れも被加工材料に対し、部分的に又はその表面付近の金
属の微小深さに高ピークパワのレーザ照射を行い蒸発、
気化により金属昇華を瞬間的に生じさせて加工を施す方
式のものであるが、そのレーザ光の影響は微小スポット
径位置で限られた焦点深度の浅い状態にまでしか及ば
ず、一定深さ以上の加工はできない。
In both of the laser trimming and laser scribing processes described above, the material to be processed is irradiated with a laser beam of high peak power to a small depth of a metal partially or near the surface thereof. evaporation,
This is a method in which metal sublimation is instantaneously generated by vaporization and processing is performed.However, the effect of the laser beam reaches only a shallow state with a limited depth of focus at a small spot diameter position and a certain depth or more Cannot be processed.

【0006】しかし、電子部品や金属金型などではその
材料厚さ方向に数ミリ単位の深彫り加工を施したいもの
があり、このような材料に対しては多くの場合機械加工
装置により実施されている。そこでこのような深彫り加
工を施したい材料にレーザ加工を適用しようとすると、
次のような問題がある。
However, some electronic parts and metal molds require deep carving of several millimeters in the thickness direction of the material. Such materials are often implemented by a machining apparatus. ing. Therefore, if you try to apply laser processing to the material you want to perform such deep engraving,
There are the following problems.

【0007】その第1は、レーザ加工により深彫りしよ
うとするとレーザ光のスポット径の位置が深さによりず
れが生じ、昇華除去した金属の非照射部分の影響で光の
減衰が起こり一定以上の深さの深彫りができないことで
ある。第2に、深彫りをする際にレンズで集光されるレ
ーザ光に照射角度があるため深彫りする形状部分の断面
が表面と直角にならずテーパ状断面となることである。
このようなテーパ状断面で深彫り加工するとその深彫り
加工部分に嵌合させるべき部品が嵌合できなくなる。第
3に加工速度が遅く実際の加工には時間がかかり過ぎる
ことである。
The first problem is that when deep engraving is performed by laser processing, the position of the spot diameter of the laser beam shifts depending on the depth, and the light is attenuated due to the non-irradiated portion of the metal which has been removed by sublimation. The inability to do deep carving. Secondly, since the laser beam condensed by the lens at the time of deep engraving has an irradiation angle, the cross section of the deeply engraved portion does not become perpendicular to the surface but becomes a tapered cross section.
When the deep engraving is performed with such a tapered cross section, a part to be fitted into the deep engraved portion cannot be fitted. Third, the processing speed is slow and the actual processing takes too much time.

【0008】この発明は、上記のような問題に留意し
て、レーザ光の減衰により制限を受ける深彫りを所望深
さまで可能としかつ深彫り加工によるテーパ状断面をほ
ぼ除去して実用上仕上加工として利用することができる
レーザ光による形状加工方法及び装置を提供することを
課題とする。
In view of the above problems, the present invention makes it possible to perform deep engraving limited by laser light attenuation to a desired depth, and to substantially eliminate a tapered cross section by deep engraving to finish in practical use. It is an object of the present invention to provide a method and an apparatus for processing a shape by a laser beam which can be used as a laser beam.

【0009】[0009]

【課題を解決するための手段】この発明は、上記課題を
解決する手段として、被加工材料に所定強度以上のレー
ザ光を集光照射しそのレーザ光を高速度で一定方向に反
復移動させながら加工材料を上記移動方向と直交方向に
移動させることにより加工エリアにレーザ光の昇華作用
によるパターン加工を施すと共に加工エリアの外周に沿
ってレーザ光を照射して輪郭部を加工する輪郭線加工を
この順序で又は逆の順序で施し、このような加工作用を
レーザ光の集光位置を加工材料の厚さ方向に変化させな
がら繰り返して加工エリアを所望深さに深彫り加工する
レーザ光による形状加工方法としたのである。
According to the present invention, as a means for solving the above-mentioned problems, a laser beam having a predetermined intensity or more is condensed and irradiated onto a material to be processed, and the laser beam is repeatedly moved in a fixed direction at a high speed. By moving the processing material in the direction perpendicular to the moving direction, the processing area is subjected to pattern processing by the sublimation of laser light, and at the same time, is irradiated with laser light along the outer periphery of the processing area to process the contour line processing. This processing is performed in this order or in the reverse order, and such a processing action is repeated while changing the condensing position of the laser light in the thickness direction of the processing material, so that the processing area is deeply carved to a desired depth. It was a processing method.

【0010】この方法を実施する装置として、レーザ発
振器と、この発振器から送り出された所定の強度レベル
以上のレーザ光をガルバノミラーで一定方向に反射移動
させ、そのレーザ光を集光レンズで集光して照射される
被加工物を移動自在に支持する加工テーブルと、上記各
構成部を制御する制御部とを備え、制御部はガルバノミ
ラーを駆動してレーザ光を反射移動させると共にこれと
直交方向に加工テーブルを移動させてレーザ光を加工エ
リアに及ぼし、上記加工をレーザ光の集光位置を被加工
材料の厚さ方向に変化させながら繰り返して所望深さの
深彫り加工の制御をするレーザ光による形状加工装置を
採用することができる。
As an apparatus for performing this method, a laser oscillator and a laser beam having a predetermined intensity level or higher sent from the oscillator are reflected and moved in a fixed direction by a galvanometer mirror, and the laser beam is collected by a condenser lens. A processing table that movably supports the workpiece to be irradiated and a control unit that controls each of the above components. The control unit drives a galvanomirror to reflect and move the laser light, and orthogonally intersects the laser light. The laser beam is applied to the processing area by moving the processing table in the direction, and the above processing is repeated while changing the condensing position of the laser light in the thickness direction of the material to be processed to control the deep engraving processing to a desired depth. A shape processing device using laser light can be employed.

【0011】上記の形状加工方法及び装置では、レーザ
光は集光すれば金属やセラミック、ダイヤモンドなどに
対しても昇華作用を及ぼし得る光源強度として所定強度
レベル以上のレーザ光として被加工材料に集光照射さ
れ、集光点では超高温状態に集光されたレーザ光により
被加工材料の照射された部位は瞬間的にプラズマ化され
て蒸発気化し昇華除去される。集光点は集光レンズの焦
点位置であり、この焦点位置を1層目の除去深さとして
レーザ光を照射するとその深さまでの材料が昇華除去さ
れる。
In the above-mentioned shape processing method and apparatus, the laser light is focused on the material to be processed as a laser light having a light intensity higher than a predetermined intensity level as a light source intensity capable of exerting a sublimation effect even on metals, ceramics, diamonds, etc. if condensed. At the light-condensing point, the irradiated portion of the material to be processed is instantaneously turned into plasma by the laser light condensed in an ultra-high temperature state, and is evaporated and vaporized to be sublimated and removed. The focal point is the focal position of the condenser lens, and when this focal position is set as the removal depth of the first layer and a laser beam is irradiated, the material up to that depth is sublimated and removed.

【0012】レーザ光はガルバノミラーを高速度で反転
駆動することにより加工エリア内で往復照射されて所定
のパターン加工が行われ、その後そのパターンの外周に
沿ってレーザ光を移動させて輪郭加工が行われる。上記
高速度は例えばレーザ光の移動速度200m/min程
の速度である。この輪郭加工により1層目の除去の際端
部の断面の傾斜テーパが殆ど除去される。そして上記加
工を加工エリアに対してレーザ光の集光位置を加工材料
の厚さ方向に変化させて多数回繰り返し実施することに
より所望深さの深彫り加工が行われる。
The laser beam is reciprocated within the processing area by reversing the galvanomirror at a high speed to perform a predetermined pattern processing, and then the laser light is moved along the outer periphery of the pattern to perform the contour processing. Done. The high speed is, for example, a speed of about 200 m / min for moving the laser beam. By this contour processing, the inclination taper of the cross section at the end is almost removed when the first layer is removed. Then, the above processing is repeated a number of times while changing the focal position of the laser beam with respect to the processing area in the thickness direction of the processing material, thereby performing deep engraving processing to a desired depth.

【0013】[0013]

【実施の形態】以下、この発明の実施の形態について説
明する。図1に実施形態のレーザ加工装置の外観斜視図
を示す。図示のように、この加工装置はレーザ光の発振
器1から出射されるレーザ光をQスイッチ2でQスイッ
チ発振のパルス光として外部へ送り出し、途中の固定ミ
ラー3で光路を90°振りガルバノミラー4で下方へ導
き、集光レンズ6でレーザ光を集光して被加工材料Aに
照射するようになっている。
Embodiments of the present invention will be described below. FIG. 1 shows an external perspective view of the laser processing apparatus according to the embodiment. As shown in the figure, this processing apparatus sends a laser beam emitted from a laser beam oscillator 1 to the outside as a pulse light of a Q switch oscillation by a Q switch 2 and swings the optical path by 90 ° by a fixed mirror 3 on the way to a galvano mirror 4. The laser beam is condensed by the condensing lens 6 and irradiates the material A to be processed.

【0014】5はガルバノミラー4の駆動用のモータ、
7は光ダクトである。被加工材料AはXYテーブル8上
に載置され、XYテーブル8は台板9上でX軸、Y軸の
いずれの方向にも移動し、Z軸方向に昇降自在である。
発振器1の下部には電源・制御部10が設けられてい
る。
5 is a motor for driving the galvanomirror 4,
7 is a light duct. The work material A is placed on the XY table 8, and the XY table 8 moves on the base plate 9 in any of the X-axis and the Y-axis, and can move up and down in the Z-axis direction.
A power supply / control unit 10 is provided below the oscillator 1.

【0015】上記レーザ発振器1は、この実施形態では
YAGレーザ(波長1.06μm)が用いられ、かつそ
のレーザ光は連続出力500Wの光をQスイッチ発振に
より尖頭値500kWのパルス光として出力される。こ
のパルス光は、ガルバノミラー4で下方へ偏向される
が、ガルバノミラー4をモータ5で高速度で回転させる
ことにより一定方向へ振られ、被加工材料に対し所定幅
の範囲で往復動して照射される。移動速度は図示の例で
は200m/min程の高速度である。
In this embodiment, a YAG laser (wavelength: 1.06 μm) is used as the laser oscillator 1, and the laser light is output as continuous pulse output light of 500 W as pulse light having a peak value of 500 kW by Q-switch oscillation. You. This pulse light is deflected downward by the galvanometer mirror 4, but is oscillated in a fixed direction by rotating the galvanometer mirror 4 at a high speed by the motor 5, and reciprocates within a predetermined width range with respect to the material to be processed. Irradiated. The moving speed is a high speed of about 200 m / min in the illustrated example.

【0016】XYテーブル8は、図示していないが、
X、Y、Z軸の各軸方向へテーブルを駆動するためのモ
ータがそれぞれ設けられ、かつZ軸の周りに回転するこ
ともできるようになっている。電源・制御部10には上
記パルス波を発生するための電源回路と、レーザ発振器
1及び各駆動部を駆動制御するための制御回路とが備え
られている。
Although the XY table 8 is not shown,
A motor for driving the table in each of the X, Y, and Z axes is provided, and can rotate around the Z axis. The power supply / control unit 10 includes a power supply circuit for generating the pulse wave, and a control circuit for driving and controlling the laser oscillator 1 and each drive unit.

【0017】図2は上記構成のレーザ加工装置による加
工の概念図である。レーザ光LAはガルバノミラー4に
より図示の矢印方向に往復動で振られ、被加工材料Aに
たいして深彫りの加工穴Bを形成する。この時、レーザ
光LAは集光レンズ6の光軸中心を外れて斜め方向に通
過し加工穴Bの端部位置を照射できる。なお、深彫り加
工とは少なくともmm単位以上の深さに被加工材料Aの
物質を除去加工する加工をいう。
FIG. 2 is a conceptual diagram of processing by the laser processing apparatus having the above configuration. The laser beam LA is reciprocated by the galvanomirror 4 in the direction of the arrow shown in the figure to form a deeply machined hole B in the workpiece A. At this time, the laser light LA passes obliquely away from the optical axis center of the condenser lens 6 and can irradiate the end position of the processing hole B. The deep engraving refers to a process of removing a substance of the material A to be processed to a depth of at least a unit of mm or more.

【0018】上記構成のこの実施形態のレーザ加工装置
による形状加工作用は次のように実施される。以下、形
状加工作用について図3のフローチャートを参照して説
明する。この実施形態の形状加工は、レーザ光の照射に
より金属、セラミックス、ダイヤモンドのような難切削
性の被加工物に対して照射部位の材料を昇華(蒸発気
化)させて除去し、少なくともmm単位以上の加工深さ
に深彫り加工する点に特徴を有する。
The shape processing operation of the laser processing apparatus of this embodiment having the above-described configuration is performed as follows. Hereinafter, the shape processing operation will be described with reference to the flowchart of FIG. The shape processing according to this embodiment is performed by sublimating (evaporating and evaporating) the material of the irradiated portion of a hard-to-cut workpiece such as metal, ceramics, or diamond by laser light irradiation, and removing the material by at least mm units or more. The feature is that it is deeply carved to the processing depth of.

【0019】図3に示すように、ステップS1 ではまず
パターン加工が行われる。このパターン加工とは、図6
に示すように、例えば長方形の加工穴Bに対してその長
手方向に平行、斜め、又は直角方向に多数の溝を形成し
加工穴Bの形状の大略を形成することである。加工形状
は、図示以外のものも無数にあることは言うまでもな
い。
As shown in FIG. 3, Step S 1 the first pattern processing is performed. This pattern processing is shown in FIG.
As shown in (1), for example, a large number of grooves are formed in a rectangular processing hole B in a direction parallel, oblique or at right angles to the longitudinal direction thereof to form a rough shape of the processing hole B. Needless to say, there are numerous machining shapes other than those illustrated.

【0020】図4に示すように、レーザ光LAは加工材
料Aに例えば長方形の加工穴Bを形成するため加工穴B
の長手方向に沿って高速度で振らせて一定方向に移動さ
せ1つの溝を形成すると、XYテーブル8を横方向にそ
の溝幅ピッチ分移動させ、反対方向にレーザ光LAを振
らせてもう1つの溝を形成し、これを繰り返して多数の
溝を加工穴Bのエリアに形成する。なお、レーザ光LA
をガルバノミラー4で真下に偏向させたその中心線が加
工穴Bの中心位置に合致するように加工穴Bを設定する
ものとする。
As shown in FIG. 4, a laser beam LA is applied to a processing material A to form, for example, a rectangular processing hole B in the processing material A.
When the XY table 8 is moved at a high speed along the longitudinal direction and moved in a certain direction to form one groove, the XY table 8 is moved in the horizontal direction by the pitch of the groove width, and the laser beam LA is oscillated in the opposite direction. One groove is formed, and this is repeated to form a large number of grooves in the area of the processing hole B. The laser beam LA
The processing hole B is set so that the center line deflected right below by the galvanometer mirror 4 matches the center position of the processing hole B.

【0021】上記1つの溝を形成する場合、図5に示す
ように、まず最初(a)上記中心線上で真下にレーザ光
LAを照射するとその位置でレーザ光LAを焦点位置に
集光したエネルギ密度の大きさにより決まる深さにスポ
ット状の加工穴が形成される。このとき一般にはレーザ
光はスポット径の位置で最も小さい径に集光されるか
ら、そのスポット径の位置が加工穴深さの最も深い位置
となり、その深さが1回の照射により加工し得る加工深
さとなる。この加工深さは例えばこの実施形態の装置で
は15μmである。
In the case of forming the one groove, as shown in FIG. 5, first, (a) when the laser beam LA is irradiated directly below the center line, the laser beam LA is focused on the focal position at that position. A spot-shaped processed hole is formed at a depth determined by the magnitude of the density. At this time, since the laser beam is generally focused to the smallest diameter at the position of the spot diameter, the position of the spot diameter becomes the deepest position of the processing hole depth, and the depth can be processed by one irradiation. Processing depth. This working depth is, for example, 15 μm in the apparatus of this embodiment.

【0022】(b)加工穴Bの中央にスポット状の加工
穴を形成した後レーザ光は一定方向に移動照射され、加
工穴の端位置では加工穴Bの大きさにより決まる若干の
斜め角度θ1 で端部を照射する。このため端部での穴加
工ではレーザ光は集光レンズにより一定の集光角度で照
射されること、又レーザ光の一部は端壁に当り反対側は
加工済で何も物質がないから、レーザ光が加工材料に当
接する際にレーザ光の接触面が不均一になり端壁で乱反
射し、かつ端部を移動照射した直前の昇華作用で蒸発気
化した金属などの加工材料の浮遊物(灰)にレーザ光が
吸収されたりする。
(B) After forming a spot-shaped processing hole in the center of the processing hole B, the laser beam is moved and irradiated in a fixed direction, and at the end position of the processing hole, a slight oblique angle θ determined by the size of the processing hole B Illuminate the end with 1 . For this reason, when drilling holes at the end, the laser beam is irradiated at a fixed focusing angle by the focusing lens, and part of the laser beam hits the end wall and the other side has been processed and there is no substance When the laser light comes into contact with the processing material, the contact surface of the laser light becomes non-uniform, irregularly reflected at the end wall, and the floating material of the processing material such as metal evaporated and vaporized by the sublimation action immediately before moving and irradiating the end. The laser light is absorbed by (ash).

【0023】あるいは端部位置ではレーザ光が若干傾斜
状になるため焦点位置(スポット径の位置)が少し上昇
して集光度が低下するなど種々の理由から端部での端壁
は(c)に示すように若干傾斜状(約6〜8°)とな
る。なお、図示省略しているが加工穴Bの長手方向に沿
う端壁も同様にレーザ光の集光角度などの影響で若干の
傾斜状となる。
Alternatively, the laser beam becomes slightly inclined at the end portion, so that the focal position (the position of the spot diameter) slightly increases and the degree of condensed light decreases. As shown in FIG. Although not shown, the end wall along the longitudinal direction of the processing hole B also has a slightly inclined shape due to the converging angle of the laser beam and the like.

【0024】以上の加工は1層目のパターン加工であ
り、実際にはmm単位の深彫り加工を要求されているた
め上記パターン加工を複数回繰り返す必要がある。しか
し、このパターン加工のみを複数回繰り返すとすれば、
上述したように各回毎に加工穴端の端壁に若干の傾斜テ
ーパが残りそのテーパ形状が累積し、このため加工穴B
に直角に近い部材を埋込む必要がある場合加工穴Bは仕
上加工として扱うことができない(未完成加工)。
The above processing is the pattern processing of the first layer, and in fact, deep engraving processing in units of mm is required, so that the above pattern processing must be repeated a plurality of times. However, if only this pattern processing is repeated several times,
As described above, a slight inclined taper is left on the end wall of the end of the processing hole each time, and the taper shape accumulates.
When it is necessary to embed a member close to a right angle, the machined hole B cannot be treated as a finishing process (unfinished process).

【0025】そこで、図示した例の形状加工ではステッ
プS2 で上記各層毎のパターン加工をする度毎に加工穴
Bの形状の外周に沿って輪郭線加工を施す。この輪郭線
加工は、図4の(b)に示すように、加工穴Bの長手方
向の端部では長手方向と直交方向にXYテーブル8を移
動させて直交方向に、又加工穴Bの幅方向両端では長手
方向に沿ってレーザ光を照射して行われる。
[0025] Therefore, in the shaping of the illustrated example subjected to contour machining along the outer shape of the machined hole B every time in step S 2 to the patterned for each said layer. In this contour processing, as shown in FIG. 4 (b), the XY table 8 is moved in the direction perpendicular to the longitudinal direction at the end of the processing hole B in the longitudinal direction, and the width of the processing hole B is changed in the perpendicular direction. Laser irradiation is performed along the longitudinal direction at both ends in the direction.

【0026】このような輪郭線加工は、図示の例ではパ
ターン加工による各層の深彫りが行われるごとに各パタ
ーンの外周に輪郭線を施して行われる。この輪郭線加工
では、加工穴Bの端壁に作用するレーザ光の角度はパタ
ーン加工の時とほぼ同じであるが、レーザ光の照射が繰
り返されることにより端壁に作用して前述した傾斜テー
パを少しずつ削り取る。
In the illustrated example, such contour processing is performed by forming a contour on the outer periphery of each pattern every time deep engraving of each layer is performed by pattern processing. In this contour processing, the angle of the laser light acting on the end wall of the processing hole B is almost the same as that in the pattern processing. Scrape off little by little.

【0027】このため輪郭線を入れることにより端壁の
傾斜テーパがより小さい角度になり、加工穴の仕上精度
として高くなくてもよい部材を埋込む場合は実際上は十
分仕上加工済として扱うことができる。なお、図4
(b)には複数の輪郭線を示しているが、これはパター
ン加工の各層毎に深彫りをしても若干傾斜テーパ壁が外
周に残るためその各層での加工線のいくつかを示してい
る。輪郭線の最外側が仕上寸法線である。
[0027] Therefore, when the contour line is inserted, the inclination taper of the end wall becomes a smaller angle, and when embedding a member which does not need to have high finishing accuracy of the machined hole, it is actually treated as sufficiently finished. Can be. FIG.
(B) shows a plurality of contour lines, which show some of the processing lines in each layer because a slightly inclined tapered wall remains on the outer periphery even if deep engraving is performed for each layer in the pattern processing. I have. The outermost side of the contour is the finish dimension line.

【0028】上記のように多数の輪郭線を入れて深彫り
加工をすると前述のように傾斜テーパが少しずつ削り取
られるが、その断面状態を図4(c)に示している。破
線の傾斜テーパは輪郭線を入れない場合、実線の傾斜テ
ーパは輪郭線を入れた場合の仕上状態である。
When a large number of contour lines are inserted and deep engraving is performed as described above, the inclined taper is gradually removed as described above. The cross-sectional state is shown in FIG. The broken taper indicated by the dashed line indicates the finish when the contour is not inserted, and the slope taper indicated by the solid line indicates the finished state when the contour is inserted.

【0029】以上のように輪郭線を入れる加工をした後
1層目の輪郭線加工が終了すると、S3 でXYテーブル
8を1層目のパターン加工による加工深さに相当する距
離だけ上昇させる。そして、この上昇距離を制御回路内
のカウンタで計測してその上昇距離の合計が所要の深彫
り距離に一致したかをS4 で比較して加工終了すべきか
を判断する。
[0029] When the contour line machining of the first layer after the machining to put an outline is completed as described above, is raised by a distance corresponding to the XY table 8 to the machining depth by patterning the first layer in S 3 . Then, by measuring the increase in distance in the counter in the control circuit determines whether the sum of the elevating distance matches the required depth engraving distance should be finished machined as compared with S 4.

【0030】パターン加工が1層目のときは深彫り距離
に当然一致しないから上記作用を繰り返す。このとき、
パターン加工の回数である加工層数NにS5 で1インク
リメントしながらNが所要の深彫り距離の層数に一致す
るまで上記作用を繰り返す。
When the pattern processing is the first layer, the above operation is repeated because the pattern does not coincide with the deep engraving distance. At this time,
The number a is working layer number N of patterned to N while 1 incremented at S 5 is equal to the number of layers of required depth carving distance repeat the above action.

【0031】S4 で上記加工層数Nが所要の深彫り距離
の層数に一致すると、次にS6 以下のステップで半輪郭
線加工を施す。この半輪郭線加工は、上述した輪郭線加
工までの加工処理ではなお残留する端壁のわずかな傾斜
テーパをさらに除去し、端壁の加工をほぼ直角に近い状
態に加工するために行われるものである。
[0031] When S 4 above processing layer number N is equal to the number of layers of required depth engraving distance, then subjected to semi-contour machining S 6 following steps. This half contour line processing is performed in order to further remove the slight inclined taper of the end wall still remaining in the processing processing up to the above-described contour line processing, and to process the end wall into a state close to a right angle. It is.

【0032】ステップS6 ではXYテーブル8をX、Y
軸いずれかの方向に移動して、図7に示すように、レー
ザ光の中心線を加工穴Bの中心線から所定距離ずらす。
この状態でS7 において前述したS2 での輪郭線加工と
同様の輪郭線加工を施すが、この場合レーザ光の中心線
がずれたため加工穴Bの片側、即ち中心線をずらした方
向と反対側の端壁しか加工できない。
[0032] The XY table 8 in step S 6 X, Y
The center line of the laser beam is shifted by a predetermined distance from the center line of the processing hole B as shown in FIG.
While subjected to similar contour machining the contour line processing at S 2 described above in S 7 in this state, one side of the machined hole B since the center line of the case where the laser beam is shifted, that is, the direction of shifting the center line opposite Only the side wall can be machined.

【0033】従って、この場合の加工は半輪郭線加工と
呼ばれる。この半輪郭線加工では端壁に照射される角度
(θ2 )が先の輪郭線加工のときの照射角度(θ1 )よ
り大きく、このためレーザ光による昇華作用が端壁にさ
らに入り込み易くなり、端壁に残留する若干の傾斜テー
パ部はこれによって端壁がほぼ直角となる程削り取られ
る。
Therefore, the processing in this case is called semi-contour processing. In this half contour processing, the angle (θ 2 ) irradiated to the end wall is larger than the irradiation angle (θ 1 ) in the previous contour processing, so that the sublimation effect by the laser light is more likely to enter the end wall. The slight taper remaining on the end wall is thereby cut away so that the end wall is substantially perpendicular.

【0034】上記半輪郭線加工はS2 の輪郭線加工と同
様に各層ごとに複数回繰り返されるが、各層ごとに削り
取られた深彫り距離に相当する距離ずつXYテーブル8
をS8 で上昇させ、S9 でその距離によって加工終了し
たかを判定し、S10では各層数Mを1ずつインクリメン
トする。深彫り距離が所定深さになれば加工は終了す
る。上記加工処理では例えば5cm角の穴を5mm程度
の深さの深彫り加工するのに約20分程で加工できる。
[0034] the semi While contour machining is repeated a plurality of times for each layer like the outline processing of S 2, each distance corresponding to the depth carving distance scraped for each layer XY table 8
The raised at S 8, it is determined whether the processing end by the distance S 9, increments the S 10 each number in M by one. The processing ends when the deep engraving distance reaches a predetermined depth. In the above-mentioned processing, for example, it takes about 20 minutes to deeply carve a hole of 5 cm square to a depth of about 5 mm.

【0035】なお、上記例では各層毎にパターン加工の
後輪郭線加工をし、この加工処理を複数回繰り返すとし
たが、パターン加工を全層について先に行い、その後輪
郭線加工を全層について行うようにしてもよい。又、パ
ターン加工と輪郭線加工は前者を先にするとしたが、逆
の順序で行ってもよい。
In the above example, contour processing is performed after pattern processing for each layer, and this processing is repeated a plurality of times. However, pattern processing is performed for all layers first, and then contour processing is performed for all layers. It may be performed. Although the pattern processing and the contour processing are performed first, the processing may be performed in the reverse order.

【0036】[0036]

【発明の効果】以上詳細に説明したように、この発明の
形状加工方法及び装置では高速度で移動するレーザ光の
昇華作用によるパターン加工と輪郭線加工を加工エリア
に複数回繰り返して施すことにより所望深さの深彫り加
工をするようにしたから、従来不可能とされていた難切
削材料のレーザ加工による深彫り加工が可能となり、か
つ深彫り加工により端部断面に生じる傾斜テーパ部も殆
ど除去でき、実用上仕上加工として取扱うことができる
形状加工方法及び装置が得られる。
As described above in detail, in the shape processing method and apparatus according to the present invention, pattern processing and contour processing by sublimation of a laser beam moving at a high speed are repeatedly performed on a processing area a plurality of times. Because the deep carving of the desired depth is performed, it becomes possible to perform deep carving by laser processing of difficult-to-cut materials, which has been impossible in the past, and the inclined taper part generated in the end cross section by the deep carving is almost A shape processing method and apparatus which can be removed and practically handled as finish processing can be obtained.

【図面の簡単な説明】[Brief description of the drawings]

【図1】レーザ加工装置の外観斜視図FIG. 1 is an external perspective view of a laser processing apparatus.

【図2】主要構成部分の概略図FIG. 2 is a schematic diagram of main components.

【図3】形状加工動作のフローチャートFIG. 3 is a flowchart of a shape processing operation.

【図4】形状加工の作用の説明図FIG. 4 is an explanatory view of the function of shape processing.

【図5】形状加工の作用の説明図FIG. 5 is an explanatory view of an operation of the shape processing.

【図6】パターン加工の種類の説明図FIG. 6 is a diagram illustrating types of pattern processing.

【図7】半輪郭線加工の説明図FIG. 7 is an explanatory diagram of half contour processing.

【符号の説明】[Explanation of symbols]

1 レーザ発振器 2 Qスイッチ 3 固定ミラー 4 ガルバノミラー 5 モータ 6 集光レンズ 8 XYテーブル 9 台板 10 電源・制御部 DESCRIPTION OF SYMBOLS 1 Laser oscillator 2 Q switch 3 Fixed mirror 4 Galvano mirror 5 Motor 6 Condensing lens 8 XY table 9 Base plate 10 Power supply / control part

Claims (3)

【特許請求の範囲】[Claims] 【請求項1】 被加工材料に所定強度以上のレーザ光を
集光照射しそのレーザ光を高速度で一定方向に反復移動
させながら加工材料を上記移動方向と直交方向に移動さ
せることにより加工エリアにレーザ光の昇華作用による
パターン加工を施すと共に加工エリアの外周に沿ってレ
ーザ光を照射して輪郭部を加工する輪郭線加工をこの順
序で又は逆の順序で施し、このような加工作用をレーザ
光の集光位置を加工材料の厚さ方向に変化させながら繰
り返して加工エリアを所望深さに深彫り加工することを
特徴とするレーザ光による形状加工方法。
1. A processing area by converging and irradiating a laser beam having a predetermined intensity or more on a material to be processed and moving the processing material in a direction orthogonal to the moving direction while repeatedly moving the laser beam in a fixed direction at a high speed. The pattern processing by laser light sublimation is performed on the surface, and the contour processing for processing the contour by irradiating the laser light along the outer periphery of the processing area is performed in this order or in the reverse order, and such a processing action is performed. A shape processing method using laser light, wherein a processing area is repeatedly carved to a desired depth while changing the focal position of the laser light in the thickness direction of the processing material.
【請求項2】 前記深彫り加工の後、レーザ光の照射中
心位置を適宜距離移動して加工エリアの外周に沿ってレ
ーザ光を照射する半輪郭線加工を施し、この半輪郭線加
工をレーザ光の集光位置を加工材料の厚さ方向に変化さ
せながら繰り返すことを特徴とする請求項1に記載のレ
ーザ光による形状加工方法。
2. After the deep engraving, the laser beam irradiation center position is moved by an appropriate distance to perform a semi-contour processing for irradiating the laser beam along the outer periphery of the processing area. 2. The method according to claim 1, wherein the light condensing position is repeated while changing the light condensing position in the thickness direction of the processing material.
【請求項3】 レーザ発振器と、この発振器から送り出
された所定の強度レベル以上のレーザ光をガルバノミラ
ーで一定方向に反射移動させ、そのレーザ光を集光レン
ズで集光して照射される被加工物を移動自在に支持する
加工テーブルと、上記各構成部を制御する制御部とを備
え、制御部はガルバノミラーを駆動してレーザ光を反射
移動させると共にこれと直交方向に加工テーブルを移動
させてレーザ光を加工エリアに及ぼし、上記加工をレー
ザ光の集光位置を被加工材料の厚さ方向に変化させなが
ら繰り返して所望深さの深彫り加工の制御をするように
構成したことを特徴とするレーザ光による形状加工装
置。
3. A laser oscillator, and a laser beam having a predetermined intensity level or higher sent from the oscillator is reflected and moved in a fixed direction by a galvanomirror, and the laser beam is condensed by a condenser lens and irradiated. A machining table for movably supporting the workpiece and a control unit for controlling the above-mentioned components; the control unit drives the galvanomirror to reflect and move the laser beam and to move the machining table in a direction orthogonal to the laser beam; The laser beam is applied to the processing area, and the above processing is repeated while changing the laser light focusing position in the thickness direction of the material to be processed, thereby controlling the deep engraving processing to a desired depth. Characteristic shape processing device using laser light.
JP10245711A 1998-08-31 1998-08-31 Method and device for shape processing by laser light Pending JP2000071086A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP10245711A JP2000071086A (en) 1998-08-31 1998-08-31 Method and device for shape processing by laser light

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP10245711A JP2000071086A (en) 1998-08-31 1998-08-31 Method and device for shape processing by laser light

Publications (1)

Publication Number Publication Date
JP2000071086A true JP2000071086A (en) 2000-03-07

Family

ID=17137676

Family Applications (1)

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Country Status (1)

Country Link
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