JP2000056479A5 - - Google Patents
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- Publication number
- JP2000056479A5 JP2000056479A5 JP1998224113A JP22411398A JP2000056479A5 JP 2000056479 A5 JP2000056479 A5 JP 2000056479A5 JP 1998224113 A JP1998224113 A JP 1998224113A JP 22411398 A JP22411398 A JP 22411398A JP 2000056479 A5 JP2000056479 A5 JP 2000056479A5
- Authority
- JP
- Japan
- Prior art keywords
- sidewall
- nitric acid
- solution
- semiconductor substrate
- aqueous
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000000034 method Methods 0.000 claims description 6
- 239000004065 semiconductor Substances 0.000 claims description 5
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 claims description 4
- 229910017604 nitric acid Inorganic materials 0.000 claims description 4
- 239000007864 aqueous solution Substances 0.000 claims description 2
- 238000007654 immersion Methods 0.000 claims description 2
- 239000000243 solution Substances 0.000 claims 3
- 239000000758 substrate Substances 0.000 claims 2
- 238000001312 dry etching Methods 0.000 claims 1
- 238000004519 manufacturing process Methods 0.000 claims 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims 1
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP22411398A JP2000056479A (ja) | 1998-08-07 | 1998-08-07 | サイドウォールの除去方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP22411398A JP2000056479A (ja) | 1998-08-07 | 1998-08-07 | サイドウォールの除去方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2000056479A JP2000056479A (ja) | 2000-02-25 |
| JP2000056479A5 true JP2000056479A5 (enrdf_load_stackoverflow) | 2005-10-27 |
Family
ID=16808747
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP22411398A Pending JP2000056479A (ja) | 1998-08-07 | 1998-08-07 | サイドウォールの除去方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2000056479A (enrdf_load_stackoverflow) |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR20020019813A (ko) * | 2000-09-07 | 2002-03-13 | 주식회사 동진쎄미켐 | 암모늄 플로라이드를 함유하는 포토레지스트 리무버조성물 |
| US7833957B2 (en) | 2002-08-22 | 2010-11-16 | Daikin Industries, Ltd. | Removing solution |
| JP2007165514A (ja) * | 2005-12-13 | 2007-06-28 | Toshiba Corp | 半導体装置の製造方法 |
| JP4776191B2 (ja) * | 2004-08-25 | 2011-09-21 | 関東化学株式会社 | フォトレジスト残渣及びポリマー残渣除去組成物、並びにそれを用いた残渣除去方法 |
-
1998
- 1998-08-07 JP JP22411398A patent/JP2000056479A/ja active Pending
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