JP2000056479A - サイドウォールの除去方法 - Google Patents
サイドウォールの除去方法Info
- Publication number
- JP2000056479A JP2000056479A JP22411398A JP22411398A JP2000056479A JP 2000056479 A JP2000056479 A JP 2000056479A JP 22411398 A JP22411398 A JP 22411398A JP 22411398 A JP22411398 A JP 22411398A JP 2000056479 A JP2000056479 A JP 2000056479A
- Authority
- JP
- Japan
- Prior art keywords
- sidewall
- side wall
- nitric acid
- wiring material
- semiconductor substrate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000007788 liquid Substances 0.000 title abstract description 14
- 239000000758 substrate Substances 0.000 claims abstract description 25
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- 229910017604 nitric acid Inorganic materials 0.000 claims abstract description 22
- 239000004065 semiconductor Substances 0.000 claims abstract description 21
- 239000000243 solution Substances 0.000 claims abstract description 19
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims abstract description 14
- 238000001312 dry etching Methods 0.000 claims abstract description 12
- 239000007864 aqueous solution Substances 0.000 claims abstract description 9
- 238000004519 manufacturing process Methods 0.000 claims abstract description 5
- 238000000034 method Methods 0.000 claims description 21
- 238000007654 immersion Methods 0.000 claims description 3
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- 238000005260 corrosion Methods 0.000 description 10
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- 238000005530 etching Methods 0.000 description 7
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- -1 halogen radicals Chemical class 0.000 description 6
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- 238000010306 acid treatment Methods 0.000 description 2
- 239000000654 additive Substances 0.000 description 2
- 150000003973 alkyl amines Chemical class 0.000 description 2
- WPYMKLBDIGXBTP-UHFFFAOYSA-N benzoic acid Chemical compound OC(=O)C1=CC=CC=C1 WPYMKLBDIGXBTP-UHFFFAOYSA-N 0.000 description 2
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- 235000010356 sorbitol Nutrition 0.000 description 1
- 150000005846 sugar alcohols Chemical class 0.000 description 1
- HXJUTPCZVOIRIF-UHFFFAOYSA-N sulfolane Chemical compound O=S1(=O)CCCC1 HXJUTPCZVOIRIF-UHFFFAOYSA-N 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
- 150000003852 triazoles Chemical class 0.000 description 1
- 239000002699 waste material Substances 0.000 description 1
- 239000000811 xylitol Substances 0.000 description 1
- 235000010447 xylitol Nutrition 0.000 description 1
- HEBKCHPVOIAQTA-SCDXWVJYSA-N xylitol Chemical compound OC[C@H](O)[C@@H](O)[C@H](O)CO HEBKCHPVOIAQTA-SCDXWVJYSA-N 0.000 description 1
- 229960002675 xylitol Drugs 0.000 description 1
Landscapes
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Detergent Compositions (AREA)
- Drying Of Semiconductors (AREA)
- Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP22411398A JP2000056479A (ja) | 1998-08-07 | 1998-08-07 | サイドウォールの除去方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP22411398A JP2000056479A (ja) | 1998-08-07 | 1998-08-07 | サイドウォールの除去方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2000056479A true JP2000056479A (ja) | 2000-02-25 |
| JP2000056479A5 JP2000056479A5 (enrdf_load_stackoverflow) | 2005-10-27 |
Family
ID=16808747
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP22411398A Pending JP2000056479A (ja) | 1998-08-07 | 1998-08-07 | サイドウォールの除去方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2000056479A (enrdf_load_stackoverflow) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR20020019813A (ko) * | 2000-09-07 | 2002-03-13 | 주식회사 동진쎄미켐 | 암모늄 플로라이드를 함유하는 포토레지스트 리무버조성물 |
| WO2004019134A1 (ja) * | 2002-08-22 | 2004-03-04 | Daikin Industries, Ltd. | 剥離液 |
| JP2006066533A (ja) * | 2004-08-25 | 2006-03-09 | Kanto Chem Co Inc | フォトレジスト残渣及びポリマー残渣除去組成物、並びにそれを用いた残渣除去方法 |
| JP2007165514A (ja) * | 2005-12-13 | 2007-06-28 | Toshiba Corp | 半導体装置の製造方法 |
-
1998
- 1998-08-07 JP JP22411398A patent/JP2000056479A/ja active Pending
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR20020019813A (ko) * | 2000-09-07 | 2002-03-13 | 주식회사 동진쎄미켐 | 암모늄 플로라이드를 함유하는 포토레지스트 리무버조성물 |
| WO2004019134A1 (ja) * | 2002-08-22 | 2004-03-04 | Daikin Industries, Ltd. | 剥離液 |
| US7833957B2 (en) | 2002-08-22 | 2010-11-16 | Daikin Industries, Ltd. | Removing solution |
| JP2006066533A (ja) * | 2004-08-25 | 2006-03-09 | Kanto Chem Co Inc | フォトレジスト残渣及びポリマー残渣除去組成物、並びにそれを用いた残渣除去方法 |
| KR101206366B1 (ko) | 2004-08-25 | 2012-11-29 | 간또 가가꾸 가부시끼가이샤 | 포토레지스트 잔류물 및 폴리머 잔류물 제거조성물, 그리고, 이것을 이용한 잔류물 제거방법 |
| JP2007165514A (ja) * | 2005-12-13 | 2007-06-28 | Toshiba Corp | 半導体装置の製造方法 |
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