JP2000031041A5 - - Google Patents

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Publication number
JP2000031041A5
JP2000031041A5 JP1999150260A JP15026099A JP2000031041A5 JP 2000031041 A5 JP2000031041 A5 JP 2000031041A5 JP 1999150260 A JP1999150260 A JP 1999150260A JP 15026099 A JP15026099 A JP 15026099A JP 2000031041 A5 JP2000031041 A5 JP 2000031041A5
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JP
Japan
Prior art keywords
mirror
objective
reduced
reduction
exposure apparatus
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP1999150260A
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English (en)
Japanese (ja)
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JP2000031041A (ja
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Publication of JP2000031041A publication Critical patent/JP2000031041A/ja
Publication of JP2000031041A5 publication Critical patent/JP2000031041A5/ja
Pending legal-status Critical Current

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JP11150260A 1998-05-30 1999-05-28 縮小オブジェクティブ Pending JP2000031041A (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE19824442.8 1998-05-30
DE19824442 1998-05-30

Publications (2)

Publication Number Publication Date
JP2000031041A JP2000031041A (ja) 2000-01-28
JP2000031041A5 true JP2000031041A5 (https=) 2006-03-02

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ID=7869552

Family Applications (1)

Application Number Title Priority Date Filing Date
JP11150260A Pending JP2000031041A (ja) 1998-05-30 1999-05-28 縮小オブジェクティブ

Country Status (6)

Country Link
US (1) US6244717B1 (https=)
EP (2) EP1480082B1 (https=)
JP (1) JP2000031041A (https=)
KR (1) KR100568758B1 (https=)
DE (2) DE19923609A1 (https=)
TW (1) TW512238B (https=)

Families Citing this family (48)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20050002090A1 (en) * 1998-05-05 2005-01-06 Carl Zeiss Smt Ag EUV illumination system having a folding geometry
US6438199B1 (en) * 1998-05-05 2002-08-20 Carl-Zeiss-Stiftung Illumination system particularly for microlithography
US6859328B2 (en) * 1998-05-05 2005-02-22 Carl Zeiss Semiconductor Illumination system particularly for microlithography
DE10138313A1 (de) * 2001-01-23 2002-07-25 Zeiss Carl Kollektor für Beleuchtugnssysteme mit einer Wellenlänge < 193 nm
DE19903807A1 (de) 1998-05-05 1999-11-11 Zeiss Carl Fa Beleuchtungssystem insbesondere für die EUV-Lithographie
US7186983B2 (en) 1998-05-05 2007-03-06 Carl Zeiss Smt Ag Illumination system particularly for microlithography
US6947124B2 (en) 1998-05-05 2005-09-20 Carl Zeiss Smt Ag Illumination system particularly for microlithography
US6577443B2 (en) * 1998-05-30 2003-06-10 Carl-Zeiss Stiftung Reduction objective for extreme ultraviolet lithography
US6831963B2 (en) 2000-10-20 2004-12-14 University Of Central Florida EUV, XUV, and X-Ray wavelength sources created from laser plasma produced from liquid metal solutions
EP1093021A3 (en) 1999-10-15 2004-06-30 Nikon Corporation Projection optical system as well as equipment and methods making use of said system
TW538256B (en) 2000-01-14 2003-06-21 Zeiss Stiftung Microlithographic reduction projection catadioptric objective
EP1679551A1 (en) * 2000-11-07 2006-07-12 ASML Netherlands B.V. Lithographic apparatus and device manufacturing method
TW573234B (en) * 2000-11-07 2004-01-21 Asml Netherlands Bv Lithographic projection apparatus and integrated circuit device manufacturing method
JP2003045782A (ja) 2001-07-31 2003-02-14 Canon Inc 反射型縮小投影光学系及びそれを用いた露光装置
DE10139188A1 (de) 2001-08-16 2003-03-06 Schott Glas Glaskeramik für röntgenoptische Komponenten
JP2003233002A (ja) 2002-02-07 2003-08-22 Canon Inc 反射型投影光学系、露光装置及びデバイス製造方法
US7084412B2 (en) * 2002-03-28 2006-08-01 Carl Zeiss Smt Ag Collector unit with a reflective element for illumination systems with a wavelength of smaller than 193 nm
EP1446813B1 (de) * 2002-05-10 2010-11-10 Carl Zeiss SMT AG Reflektives roentgenmikroskop zur untersuchung von objekten mit wellenlaengen = 100nm in reflexion
JP3919599B2 (ja) * 2002-05-17 2007-05-30 キヤノン株式会社 光学素子、当該光学素子を有する光源装置及び露光装置
US6975385B2 (en) 2002-11-08 2005-12-13 Canon Kabushiki Kaisha Projection optical system and exposure apparatus
EP1586087B1 (en) 2003-01-23 2013-08-21 LG Electronics, Inc. Recording medium with optional information, method of forming the recording medium, and apparatus and method for reproducing the recording medium
US20040148790A1 (en) * 2003-02-04 2004-08-05 Taiwan Semiconductor Manufacturing Company Time alarm system in detecting scanner/step module tilt
US20040157944A1 (en) * 2003-02-07 2004-08-12 China Textile Institute Preparation method for foaming waterborne PU
DE10321103A1 (de) * 2003-05-09 2004-12-02 Carl Zeiss Smt Ag Verfahren zur Vermeidung von Kontamination und EUV-Lithographievorrichtung
US8208198B2 (en) 2004-01-14 2012-06-26 Carl Zeiss Smt Gmbh Catadioptric projection objective
US7466489B2 (en) 2003-12-15 2008-12-16 Susanne Beder Projection objective having a high aperture and a planar end surface
JP5102492B2 (ja) 2003-12-19 2012-12-19 カール・ツァイス・エスエムティー・ゲーエムベーハー 結晶素子を有するマイクロリソグラフィー投影用対物レンズ
US7463422B2 (en) 2004-01-14 2008-12-09 Carl Zeiss Smt Ag Projection exposure apparatus
US20080151364A1 (en) 2004-01-14 2008-06-26 Carl Zeiss Smt Ag Catadioptric projection objective
DE602005008707D1 (de) 2004-01-14 2008-09-18 Zeiss Carl Smt Ag Catadioptrisches projektionsobjektiv
KR20160085375A (ko) 2004-05-17 2016-07-15 칼 짜이스 에스엠티 게엠베하 중간이미지를 갖는 카타디옵트릭 투사 대물렌즈
DE102005042005A1 (de) * 2004-12-23 2006-07-06 Carl Zeiss Smt Ag Hochaperturiges Objektiv mit obskurierter Pupille
EP2169465A1 (en) * 2005-05-13 2010-03-31 Carl Zeiss SMT AG A six-mirror EUV projection system
TWI366004B (en) * 2005-09-13 2012-06-11 Zeiss Carl Smt Gmbh Microlithography projection optical system, microlithographic tool comprising such an optical system, method for microlithographic production of microstructured components using such a microlithographic tool, microstructured component being produced by s
DE102005056914A1 (de) 2005-11-29 2007-05-31 Carl Zeiss Smt Ag Projektionsbelichtungsystem
KR101314974B1 (ko) * 2006-02-17 2013-10-04 칼 짜이스 에스엠티 게엠베하 마이크로리소그래픽 조명 시스템 및 이를 구비한 투사 노출장치
DE102006014380A1 (de) * 2006-03-27 2007-10-11 Carl Zeiss Smt Ag Projektionsobjektiv und Projektionsbelichtungsanlage mit negativer Schnittweite der Eintrittspupille
CN101416117B (zh) * 2006-04-07 2014-11-05 卡尔蔡司Smt有限责任公司 微光刻投影光学系统、工具及其制造方法
DE102007023411A1 (de) * 2006-12-28 2008-07-03 Carl Zeiss Smt Ag Optisches Element, Beleuchtungsoptik für die Mikrolithographie mit mindestens einem derartigen optischen Element sowie Beleuchtungssystem mit einer derartigen Beleuchtungsoptik
EP1950594A1 (de) * 2007-01-17 2008-07-30 Carl Zeiss SMT AG Abbildende Optik, Projektionsbelichtunsanlage für die Mikrolithographie mit einer derartigen abbildenden Optik, Verfahren zur Herstellung eines mikrostrukturierten Bauteils mit einer derartigen Projektionsbelichtungsanlage, durch das Herstellungsverfahren gefertigtes mikrostrukturiertes Bauelement sowie Verwendung einer derartigen abbildenden Optik
DE102007047109A1 (de) 2007-10-01 2009-04-09 Carl Zeiss Smt Ag Optisches System, insbesondere Projektionsobjektiv der Mikrolithographie
JP2009179391A (ja) * 2008-01-31 2009-08-13 Yoshino Kogyosho Co Ltd 簡易開蓋キャップ
JP4935886B2 (ja) * 2009-12-10 2012-05-23 三菱電機株式会社 画像読取装置
DE102012202675A1 (de) * 2012-02-22 2013-01-31 Carl Zeiss Smt Gmbh Abbildende Optik sowie Projektionsbelichtungsanlage für die Projektionslithografie mit einer derartigen abbildenden Optik
US9291751B2 (en) 2013-06-17 2016-03-22 Carl Zeiss Smt Gmbh Imaging optical unit and projection exposure apparatus for projection lithography comprising such an imaging optical unit
DE102014208770A1 (de) 2013-07-29 2015-01-29 Carl Zeiss Smt Gmbh Projektionsoptik zur Abbildung eines Objektfeldes in ein Bildfeld sowie Projektionsbelichtungsanlage mit einer derartigen Projektionsoptik
DE102015221984A1 (de) * 2015-11-09 2017-05-11 Carl Zeiss Smt Gmbh Abbildende Optik zur Abbildung eines Objektfeldes in ein Bildfeld sowie Projektionsbelichtungsanlage mit einer derartigen abbildenden Optik
CN118627208B (zh) * 2024-05-11 2025-10-24 南京航空航天大学 非静力大气掠入射积分数值计算方法

Family Cites Families (27)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE501365C (de) 1930-07-01 Walter Stoye Verbindung, insbesondere der die Wagenkastenwaende bildenden Bleche mit dem aus I-Profilstaeben gebildeten Wagenkastengerippe, insbesondere fuer Kraftfahrzeuge
BE369232A (https=) 1929-04-13
DE701652C (https=) 1937-04-16 1941-01-21 Gerhard Zur Nedden
US2970518A (en) * 1958-12-29 1961-02-07 Karl F Ross Catoptric system
US3748015A (en) * 1971-06-21 1973-07-24 Perkin Elmer Corp Unit power imaging catoptric anastigmat
CH543009A (de) 1972-08-25 1973-10-15 Kuehlmoebelfabrik Alfons Laemm Einrichtung zur Verbindung baukastenartig aneinandergefügter Kühlmöbel-Baueinheiten
EP0237041B1 (en) * 1986-03-12 1993-08-18 Matsushita Electric Industrial Co., Ltd. Projection optical system for use in precise copy
US4804258A (en) * 1986-05-05 1989-02-14 Hughes Aircraft Company Four mirror afocal wide field of view optical system
EP0947882B1 (en) * 1986-07-11 2006-03-29 Canon Kabushiki Kaisha X-ray reduction projection exposure system of reflection type
US5071240A (en) * 1989-09-14 1991-12-10 Nikon Corporation Reflecting optical imaging apparatus using spherical reflectors and producing an intermediate image
US5063586A (en) * 1989-10-13 1991-11-05 At&T Bell Laboratories Apparatus for semiconductor lithography
US5315629A (en) * 1990-10-10 1994-05-24 At&T Bell Laboratories Ringfield lithography
JPH04333011A (ja) * 1991-05-09 1992-11-20 Nikon Corp 反射縮小投影光学装置
DE9110413U1 (de) 1991-08-23 1991-10-24 Remaplan Anlagenbau GmbH, 8000 München Behälter, insbesondere Komposter
US5353322A (en) * 1992-05-05 1994-10-04 Tropel Corporation Lens system for X-ray projection lithography camera
US5361292A (en) * 1993-05-11 1994-11-01 The United States Of America As Represented By The Department Of Energy Condenser for illuminating a ring field
US5410434A (en) * 1993-09-09 1995-04-25 Ultratech Stepper, Inc. Reflective projection system comprising four spherical mirrors
US5379157A (en) * 1993-12-02 1995-01-03 Hughes Aircraft Company Compact, folded wide-angle large reflective unobscured optical system
US5459771A (en) * 1994-04-01 1995-10-17 University Of Central Florida Water laser plasma x-ray point source and apparatus
JP3358097B2 (ja) * 1994-04-12 2002-12-16 株式会社ニコン Ｘ線投影露光装置
US5805365A (en) * 1995-10-12 1998-09-08 Sandia Corporation Ringfield lithographic camera
US5737137A (en) * 1996-04-01 1998-04-07 The Regents Of The University Of California Critical illumination condenser for x-ray lithography
JP3284045B2 (ja) * 1996-04-30 2002-05-20 キヤノン株式会社 Ｘ線光学装置およびデバイス製造方法
US5956192A (en) * 1997-09-18 1999-09-21 Svg Lithography Systems, Inc. Four mirror EUV projection optics
US6014252A (en) * 1998-02-20 2000-01-11 The Regents Of The University Of California Reflective optical imaging system
US5973826A (en) * 1998-02-20 1999-10-26 Regents Of The University Of California Reflective optical imaging system with balanced distortion
WO1999042902A2 (en) * 1998-02-20 1999-08-26 The Regents Of The University Of California Reflective optical imaging systems with balanced distortion

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