JP2000031013A - 回路パターンの修復方法及び装置、並びに、回路パターン修復用転写板 - Google Patents

回路パターンの修復方法及び装置、並びに、回路パターン修復用転写板

Info

Publication number
JP2000031013A
JP2000031013A JP19553898A JP19553898A JP2000031013A JP 2000031013 A JP2000031013 A JP 2000031013A JP 19553898 A JP19553898 A JP 19553898A JP 19553898 A JP19553898 A JP 19553898A JP 2000031013 A JP2000031013 A JP 2000031013A
Authority
JP
Japan
Prior art keywords
circuit pattern
transfer plate
conductive film
laser beam
defect
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP19553898A
Other languages
English (en)
Japanese (ja)
Other versions
JP2000031013A5 (https=
Inventor
Tatsuya Nakano
達也 中野
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Omron Corp
Original Assignee
Omron Corp
Omron Tateisi Electronics Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Omron Corp, Omron Tateisi Electronics Co filed Critical Omron Corp
Priority to JP19553898A priority Critical patent/JP2000031013A/ja
Publication of JP2000031013A publication Critical patent/JP2000031013A/ja
Publication of JP2000031013A5 publication Critical patent/JP2000031013A5/ja
Pending legal-status Critical Current

Links

Landscapes

  • Devices For Indicating Variable Information By Combining Individual Elements (AREA)
  • Liquid Crystal (AREA)
JP19553898A 1998-07-10 1998-07-10 回路パターンの修復方法及び装置、並びに、回路パターン修復用転写板 Pending JP2000031013A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP19553898A JP2000031013A (ja) 1998-07-10 1998-07-10 回路パターンの修復方法及び装置、並びに、回路パターン修復用転写板

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP19553898A JP2000031013A (ja) 1998-07-10 1998-07-10 回路パターンの修復方法及び装置、並びに、回路パターン修復用転写板

Publications (2)

Publication Number Publication Date
JP2000031013A true JP2000031013A (ja) 2000-01-28
JP2000031013A5 JP2000031013A5 (https=) 2005-10-27

Family

ID=16342765

Family Applications (1)

Application Number Title Priority Date Filing Date
JP19553898A Pending JP2000031013A (ja) 1998-07-10 1998-07-10 回路パターンの修復方法及び装置、並びに、回路パターン修復用転写板

Country Status (1)

Country Link
JP (1) JP2000031013A (https=)

Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6436602B1 (en) * 1999-06-30 2002-08-20 International Business Machines Corporation Method of repairing a defective portion in an electronic device
KR20030025148A (ko) * 2001-09-19 2003-03-28 노바테크 주식회사 Plasma Display Panel의 셀 결함 수리방법 및 장치
WO2007136183A1 (en) * 2006-05-18 2007-11-29 Phicom Corporation Method of repairing a polymer mask
JP2008053698A (ja) * 2006-07-28 2008-03-06 Semiconductor Energy Lab Co Ltd 半導体装置の作製方法
JP2009251119A (ja) * 2008-04-02 2009-10-29 Ntn Corp 転写部材
JP2009251120A (ja) * 2008-04-02 2009-10-29 Ntn Corp パターン修正方法およびパターン部品
US7994021B2 (en) 2006-07-28 2011-08-09 Semiconductor Energy Laboratory Co., Ltd. Method of manufacturing semiconductor device
JP2012515256A (ja) * 2009-01-14 2012-07-05 コーニンクレッカ フィリップス エレクトロニクス エヌ ヴィ 少なくとも一つの電気伝導性フィルムを基板上へ蒸着させる方法
TWI385273B (zh) * 2007-03-30 2013-02-11 Ind Tech Res Inst 缺陷修補裝置及靶材結構

Cited By (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6436602B1 (en) * 1999-06-30 2002-08-20 International Business Machines Corporation Method of repairing a defective portion in an electronic device
US6809332B2 (en) * 1999-06-30 2004-10-26 International Business Machines Corporation Electronic device and defect repair method thereof
US7126232B2 (en) 1999-06-30 2006-10-24 Au Optronics Corporation Defect repair apparatus for an electronic device
KR20030025148A (ko) * 2001-09-19 2003-03-28 노바테크 주식회사 Plasma Display Panel의 셀 결함 수리방법 및 장치
WO2007136183A1 (en) * 2006-05-18 2007-11-29 Phicom Corporation Method of repairing a polymer mask
JP2008053698A (ja) * 2006-07-28 2008-03-06 Semiconductor Energy Lab Co Ltd 半導体装置の作製方法
US7994021B2 (en) 2006-07-28 2011-08-09 Semiconductor Energy Laboratory Co., Ltd. Method of manufacturing semiconductor device
US8703579B2 (en) 2006-07-28 2014-04-22 Semiconductor Energy Laborator Co., Ltd. Method of manufacturing semiconductor device
TWI385273B (zh) * 2007-03-30 2013-02-11 Ind Tech Res Inst 缺陷修補裝置及靶材結構
JP2009251119A (ja) * 2008-04-02 2009-10-29 Ntn Corp 転写部材
JP2009251120A (ja) * 2008-04-02 2009-10-29 Ntn Corp パターン修正方法およびパターン部品
JP2012515256A (ja) * 2009-01-14 2012-07-05 コーニンクレッカ フィリップス エレクトロニクス エヌ ヴィ 少なくとも一つの電気伝導性フィルムを基板上へ蒸着させる方法

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