JP2000011424A5 - - Google Patents
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- Publication number
- JP2000011424A5 JP2000011424A5 JP1998177725A JP17772598A JP2000011424A5 JP 2000011424 A5 JP2000011424 A5 JP 2000011424A5 JP 1998177725 A JP1998177725 A JP 1998177725A JP 17772598 A JP17772598 A JP 17772598A JP 2000011424 A5 JP2000011424 A5 JP 2000011424A5
- Authority
- JP
- Japan
- Prior art keywords
- light
- optical
- magneto
- grating
- anisotropic
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
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- 230000003287 optical effect Effects 0.000 description 58
- 230000010287 polarization Effects 0.000 description 37
- 238000000034 method Methods 0.000 description 35
- 239000005264 High molar mass liquid crystal Substances 0.000 description 22
- 239000000758 substrate Substances 0.000 description 22
- 239000010409 thin film Substances 0.000 description 22
- 239000004065 semiconductor Substances 0.000 description 18
- 239000011521 glass Substances 0.000 description 14
- 239000000945 filler Substances 0.000 description 11
- 229920002120 photoresistant polymer Polymers 0.000 description 9
- 239000010408 film Substances 0.000 description 8
- 238000001312 dry etching Methods 0.000 description 7
- 238000004519 manufacturing process Methods 0.000 description 7
- 238000004528 spin coating Methods 0.000 description 6
- 239000000853 adhesive Substances 0.000 description 5
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- 238000000206 photolithography Methods 0.000 description 5
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 4
- 239000012790 adhesive layer Substances 0.000 description 4
- 230000002547 anomalous effect Effects 0.000 description 4
- 238000010586 diagram Methods 0.000 description 4
- 239000005304 optical glass Substances 0.000 description 4
- 229910052710 silicon Inorganic materials 0.000 description 4
- 239000010703 silicon Substances 0.000 description 4
- 230000002159 abnormal effect Effects 0.000 description 3
- 230000003667 anti-reflective effect Effects 0.000 description 3
- 230000015572 biosynthetic process Effects 0.000 description 3
- 239000004973 liquid crystal related substance Substances 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- 239000000178 monomer Substances 0.000 description 3
- 238000006116 polymerization reaction Methods 0.000 description 3
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 2
- 238000013459 approach Methods 0.000 description 2
- 201000009310 astigmatism Diseases 0.000 description 2
- 238000005094 computer simulation Methods 0.000 description 2
- 230000007423 decrease Effects 0.000 description 2
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- 238000005530 etching Methods 0.000 description 2
- 230000001747 exhibiting effect Effects 0.000 description 2
- 239000010410 layer Substances 0.000 description 2
- 238000003825 pressing Methods 0.000 description 2
- 239000011347 resin Substances 0.000 description 2
- 229920005989 resin Polymers 0.000 description 2
- 238000007711 solidification Methods 0.000 description 2
- 230000008023 solidification Effects 0.000 description 2
- 239000004925 Acrylic resin Substances 0.000 description 1
- 229920000178 Acrylic resin Polymers 0.000 description 1
- 230000005374 Kerr effect Effects 0.000 description 1
- 239000004642 Polyimide Substances 0.000 description 1
- 229920006397 acrylic thermoplastic Polymers 0.000 description 1
- 230000004075 alteration Effects 0.000 description 1
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- 239000013078 crystal Substances 0.000 description 1
- 238000005520 cutting process Methods 0.000 description 1
- 230000002708 enhancing effect Effects 0.000 description 1
- 239000003822 epoxy resin Substances 0.000 description 1
- 230000014509 gene expression Effects 0.000 description 1
- CNQCVBJFEGMYDW-UHFFFAOYSA-N lawrencium atom Chemical compound [Lr] CNQCVBJFEGMYDW-UHFFFAOYSA-N 0.000 description 1
- 230000031700 light absorption Effects 0.000 description 1
- 125000005395 methacrylic acid group Chemical group 0.000 description 1
- 238000003199 nucleic acid amplification method Methods 0.000 description 1
- 230000000737 periodic effect Effects 0.000 description 1
- 229920003229 poly(methyl methacrylate) Polymers 0.000 description 1
- 229920000515 polycarbonate Polymers 0.000 description 1
- 239000004417 polycarbonate Substances 0.000 description 1
- 229920006289 polycarbonate film Polymers 0.000 description 1
- 229920000647 polyepoxide Polymers 0.000 description 1
- 229920001721 polyimide Polymers 0.000 description 1
- 229920001296 polysiloxane Polymers 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 239000010453 quartz Substances 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- ISXSCDLOGDJUNJ-UHFFFAOYSA-N tert-butyl prop-2-enoate Chemical compound CC(C)(C)OC(=O)C=C ISXSCDLOGDJUNJ-UHFFFAOYSA-N 0.000 description 1
- 239000013585 weight reducing agent Substances 0.000 description 1
Images
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP10177725A JP2000011424A (ja) | 1998-06-24 | 1998-06-24 | 光ヘッド装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP10177725A JP2000011424A (ja) | 1998-06-24 | 1998-06-24 | 光ヘッド装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2000011424A JP2000011424A (ja) | 2000-01-14 |
| JP2000011424A5 true JP2000011424A5 (enExample) | 2005-05-26 |
Family
ID=16036031
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP10177725A Pending JP2000011424A (ja) | 1998-06-24 | 1998-06-24 | 光ヘッド装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2000011424A (enExample) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2001014717A (ja) | 1999-04-28 | 2001-01-19 | Matsushita Electronics Industry Corp | 光学装置 |
| JP3977796B2 (ja) * | 2003-10-29 | 2007-09-19 | 株式会社東芝 | 半導体装置 |
-
1998
- 1998-06-24 JP JP10177725A patent/JP2000011424A/ja active Pending
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