JP2000002805A - Color filter substrate and production of color filter substrate - Google Patents

Abstract

PROBLEM TO BE SOLVED: To omit a stage for removing the color filter materials in matching mark regions and to obtain a color filter substrate free from color filter defects by having transparent electrodes, matching patterns formed of the same material as the material of the transparent electrodes and the matching marks on a substrate and disposing color filters on the transparent electrodes. SOLUTION: The transparent electrodes 4 consisting of ITO and the matching patterns 6 are formed on the substrate 2 consisting of glass and further, the matching marks 8 consisting of, for example, metal nickel, are formed of the same shape as the shape of the matching patterns 6 on the matching patterns 6. The color filters 10 comprising single color filter groups consisting of a pigment dispersion type photosensitive resin having spectral transmittance characteristics of red, blue and green colors are formed on the transparent electrodes 4. As a result, the matching marks 8 may be recognized even through the color filter 10 material and, therefore, there is no need for the stage for removing the color filter 10 material.

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a color filter substrate, and more particularly, to a color filter substrate having an alignment mark for arranging a color filter on a transparent electrode with good consistency, and a method of manufacturing the color filter substrate. About.

[0002]

2. Description of the Related Art The structure of a conventional color filter substrate and a method of manufacturing the color filter substrate will be described below with reference to the drawings.

FIG. 5 is a sectional view showing a schematic structure of a conventional color filter substrate for a color liquid crystal element.

In FIG. 5, 2 is a substrate, 4 is a transparent electrode,
Reference numeral 8 denotes a matching mark, and reference numeral 10 denotes a color filter.

In a conventional color filter substrate for a color liquid crystal element, a transparent electrode 4 made of indium tin oxide (ITO) and a matching mark 8 are formed on a substrate 2 made of glass, and a color filter is formed on the transparent electrode 4. A color filter 10 composed of a single color filter group made of a pigment-dispersed photosensitive resin having red, blue, and green spectral transmittance characteristics as a material is formed.

The transparent electrode 4 made of ITO and the alignment mark 8 are formed at the same time by using a photolithography technique.

The color filter 10 is also formed on the transparent electrode 4 by aligning the color filter mask with the alignment mark 8 by photolithography.

FIG. 6 is a view for explaining a part of steps of a conventional method for manufacturing a substrate for a color liquid crystal element, and shows a step of forming a color filter.

In FIG. 6, 2 is a substrate, 4 is a transparent electrode,
Reference numeral 8 denotes an alignment mark, 14 denotes a color filter material, 16 denotes a color filter mask, and 18 denotes a light source.

In the conventional method of manufacturing a substrate for a color liquid crystal element, a transparent electrode 4 made of ITO and an alignment mark 8 are first formed on a substrate 2 by photolithography.

Next, a color filter material 14 having, for example, a red color spectral transmittance characteristic as a first color is formed on the entire area of the substrate 2 on which the transparent electrode 4 is formed by a spin coating method or a laminating method using a spin coater. The color filter material in the area where the mark 8 is formed is dissolved and removed by a method such as wiping with a solvent or the like of the color filter material.

After aligning the mask alignment mark 20 of the color filter mask 16 with the alignment mark 8 on the substrate 2, and exposing and curing the color filter material 14 with the light source 18 through the color filter mask 16, The color filter material 14 at the exposed portion is developed and removed to form a single color filter.

Hereinafter, the application of the color filter material 14 having the spectral transmittance characteristics of blue and green, the removal of the color filter material in the area of the alignment mark 8, the exposure through the color filter mask 16, and the development are repeated twice. Then, the color filter 10 is formed on the substrate 2 having the transparent electrode 4.

Here, the reason why the color filter material 14 in the area of the alignment mark 8 is removed is as follows.

The color filter material 14 has red, blue and green spectral transmittance characteristics, respectively. The ITO constituting the matching mark 8 has a uniform spectral transmittance of about 80 to 90% in the entire visible light region. Has characteristics.

The fact that there is not much difference from the spectral transmittance of the glass as the substrate 2 is the reason why the ITO film is referred to as a transparent conductive film.

That is, since the ITO film has a uniform high spectral transmittance characteristic in the entire visible light region, and the ITO film, the glass and the color filter material have substantially similar refractive indices,
It is difficult to identify the alignment mark 8 through the color filter material 14 on the alignment mark 8.

For the above reason, the color filter material 1 in the region of the alignment mark 8 is used to identify the alignment mark 8.
The step of removing 4 is an essential step.

[0019]

However, in the conventional method of manufacturing a color filter substrate for a color liquid crystal element, the step of removing the color filter material in the alignment mark area may cause a defect in the color filter. .

That is, after the color filter material is applied onto the substrate having the alignment mark, the color filter material in the alignment mark area is removed by moving a wiping roller containing a solvent made of filter paper to remove the color filter material. When wiping or spraying the solvent on the color filter material film, dust may adhere to the color filter material film, or the solvent may splash on the color filter material film, resulting in defects in the color filter. .

An object of the present invention is to provide a color filter substrate free of the above-described color filter defect by eliminating the step of removing the color filter material in the alignment mark area.

[0022]

To achieve the above object, the structure of the color filter substrate of the present invention adopts the following configuration.

The color filter substrate of the present invention includes a transparent electrode, a matching pattern formed of the same material as the transparent electrode, a matching mark, and a color filter on the transparent electrode. The alignment mark is formed of a metal pattern having the same shape as the alignment pattern on the alignment pattern. The color filter substrate of the present invention includes a transparent electrode on a substrate, a matching pattern formed of the same material as the transparent electrode, and a matching mark, and further includes a color filter on the transparent electrode, Is characterized by being made of a colored photosensitive resin disposed in a region where the alignment mark is formed in a region different from the region where the alignment pattern is formed.

Further, in order to achieve the above object, a method for manufacturing a color filter substrate of the present invention employs the following configuration.

According to the method of manufacturing a color filter substrate of the present invention, a transparent electrode, a matching pattern formed of the same material as the transparent electrode and the transparent electrode, and a matching mark are provided on the substrate. A method of manufacturing a color filter substrate including a color filter, comprising: simultaneously forming a transparent electrode and a matching pattern; forming a matching mark using the matching pattern; and forming a color using the matching mark. Forming a filter, and forming a matching mark by using the matching pattern includes forming a metal pattern having the same shape as the matching transparent pattern on the matching pattern. And The method for manufacturing a color filter substrate of the present invention includes a transparent electrode on the substrate, a matching pattern formed of the same material as the transparent electrode and the transparent electrode, and a matching mark, and forming the color filter on the transparent electrode. A method of manufacturing a color filter substrate comprising: forming a transparent electrode and a matching pattern simultaneously; forming a matching mark using the matching pattern; and forming a color filter using the matching mark. Forming a matching mark using the matching pattern, wherein the colored photocurable resin is applied to a region where the matching mark is formed in a region different from a region where the matching pattern is formed. Partially coating, exposing the colored photosensitive resin via a photomask, and removing the unexposed portion of the colored photosensitive resin. That.

(Function) According to the above means, in the color filter substrate, the alignment mark is formed of a metal pattern on the alignment pattern or formed of a colored photosensitive resin outside the alignment pattern formation region. Also, the alignment mark can be recognized through the color filter material.

That is, when observing the identification mark including the metal pattern through the color filter material and observing the observation light for identification by reflected light, the metal has a higher reflectivity than that of glass. The contrast between the alignment mark and the glass of the substrate increases, and the colored photosensitive resin has a spectral reflectance characteristic different from that of the glass. The contrast with the glass is increased, and the matching mark can be identified.

When the observation light for identification is observed as transmitted light, the contrast between the mark for alignment of the metal pattern and the glass of the substrate increases because the transmittance of metal is smaller than that of glass. Can be identified.

[0029]

DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS The structure of a color filter substrate in the best mode for carrying out the present invention will be described below with reference to the drawings.

(Example 1) FIG. 1 is a schematic cross-sectional view of a color filter substrate for explaining the structure of a color filter substrate according to an example of the present embodiment.

In FIG. 1, 2 is a substrate, 4 is a transparent electrode,
6 is a matching pattern, 8 is a matching mark made of a metal pattern, and 10 is a color filter.

The color filter substrate of the present embodiment is different from the conventional color filter substrate shown in FIG. 5 in that the alignment mark 8 is formed by forming a metal pattern on the alignment pattern 6.

In the color filter substrate of this embodiment, a transparent electrode 4 made of ITO and a matching pattern 6 are formed on a substrate 2 made of glass, and a matching pattern made of, for example, metallic nickel is formed on the matching pattern 6. Mark 8 is formed in the same shape as the matching pattern 6.

Each of the transparent electrodes 4 has a red color,
The color filter 10 includes a single color filter group made of a pigment-dispersed photosensitive resin having blue and green spectral transmittance characteristics. (Example 2) FIG. 2 is a schematic sectional view of a color filter substrate for explaining the structure of a color filter substrate according to an example of the present embodiment.

In FIG. 2, 2 is a substrate, 4 is a transparent electrode,
Reference numeral 6 denotes an alignment pattern, 8 denotes an alignment mark made of a colored photosensitive resin, and 10 denotes a color filter.

The color filter substrate of this embodiment is different from the conventional color filter shown in FIG. 5 in that the alignment mark 8 is formed in a region on the substrate different from the alignment pattern 6 with a colored photosensitive resin. It is different from the substrate.

In the color filter substrate of this embodiment, a transparent electrode 4 made of ITO and a matching pattern 6 are formed on a substrate 2 made of glass, and a region on the substrate 2 different from the matching pattern 6 is formed. For example, an alignment mark 8 made of a photosensitive resin in which a black pigment is dispersed is formed.

Each of the transparent electrodes 4 has a red color,
The color filter 10 includes a single color filter group made of a pigment-dispersed photosensitive resin having blue and green spectral transmittance characteristics.

Example 3 FIG. 3 is a view for explaining the structure of a method for manufacturing a color filter substrate according to the present embodiment, and is a schematic cross section of the color filter substrate in a step of forming a matching mark of the color filter substrate. FIG.

In FIG. 3, 2 is a substrate, 4 is a transparent electrode,
6 is an alignment pattern, 8 is an alignment mark made of metal,
10 is a color filter, 14 is a color filter material, 1
6 is a color filter mask, and 18 is a light source.

In the method of manufacturing a color filter substrate according to this embodiment, the alignment mark 8 is formed by forming a metal pattern on the alignment pattern 6, and the color filter material 14 in the area of the alignment mark 8 is removed. This is different from the conventional method for manufacturing a color filter substrate shown in FIG.

First, a process for simultaneously forming a transparent electrode and a matching pattern formed of the same material as the transparent electrode will be described.

In the method of manufacturing a color filter substrate according to the present embodiment, as shown in FIG. 3A, a transparent electrode 4 made of ITO and a matching pattern 6 are first formed on a glass substrate 2 by photolithography. Are formed at the same time.

That is, although not shown, after forming an ITO film by a sputtering method, a photoresist is formed, and the photoresist is irradiated with ultraviolet light from a light source through a photomask for ITO, thereby forming a photoresist in an exposed portion. Is removed by development. Next, the ITO film of the photoresist portion which has been developed and removed by immersion in an etchant comprising, for example, a ferric chloride and hydrochloric acid solution is etched away. Further, the unexposed portion of the photoresist is removed with a stripper to obtain a transparent electrode 4 and a matching pattern.

Next, the step of forming a metal pattern having the same shape as the matching transparent pattern on the matching pattern in the step of forming the matching mark using the matching pattern will be described.

Here, as a typical example of a method of forming a metal pattern on a matching pattern, a method of forming a metal pattern with a plating film by an electroless plating method will be described.

First, a pretreatment is performed to make it easier for the plating film to adhere to the matching pattern. That is, a sensitizer is dropped on the matching pattern 6 to form tin (Sn) on the surface.
(Pd) fine particle layer covered with. Next, an adhesion promoter is dropped to dissolve tin covering the surface of the palladium fine particles, thereby forming a layer in which the palladium surface is exposed. Then, a plating solution is dropped, and a plating film made of, for example, nickel-phosphorus (Ni-P) is formed on the alignment pattern 6 in the same shape as the metal pattern 12 to form the alignment mark 8.

Examples of the sensitizer, the adhesion promoter and the plating solution are, for example, trade names H manufactured by Hitachi Chemical Co., Ltd.
S-101B, manufactured by Hitachi Chemical Co., Ltd. ADP-
201, manufactured by Nippon Kanigen Co., Ltd.

Here, a nickel-phosphorus film is selected as the plating film of the metal pattern 12, but any metal may be used as long as it has a higher reflectance and a lower transmittance than glass.

Next, a process for forming a color filter using the alignment marks will be described. As shown in FIG. 3B, a color filter material 1 having, for example, a red spectral transmittance characteristic is formed on a substrate 2 on which an alignment mark 8 is formed.
4 is applied by a spin coating method using a spin coater, and the mask alignment mark 20 of the color filter mask 16 and the alignment mark 8 are aligned. The color filter material of the part is cured. Next, the color filter material in the unexposed portion is developed and removed to obtain a monochromatic color filter having a red spectral transmittance characteristic.

Here, as the relationship between the mask alignment mark 20 of the color filter mask 16 and the alignment mark 8, one of a cross shape and the other is a cross-shaped male or female cross shape is selected.

The color filter 10 is formed as a result of repeating the application of the color filter material, the exposure through the color filter mask, and the development and removal of the unexposed portions of the color filter material for the blue and green color filter materials. I do.

According to the present embodiment, since the alignment mark 8 is formed of a metal pattern, the color filter material 1
The alignment mark 8 can be identified through the reference numeral 4. Therefore,
The mask alignment mark 20 of the color filter mask 16 and the alignment mark 8 of the substrate 2 can be aligned without requiring a step of removing the color filter material 14 in the area of the alignment mark 8.

In the description of the present embodiment, a method of forming a metal pattern has been described by taking a method of forming a plating film as a representative example. In addition, ITO and a metal are previously formed on a substrate by a sputtering method. The metal pattern and the transparent electrode may be formed by photolithography technology. (Embodiment 4) FIG. 4 is a view for explaining the structure of a method for manufacturing a color filter substrate according to the present embodiment, in which a process of forming an alignment mark of the color filter substrate and a process of forming a color filter 10 are performed. It is a schematic sectional drawing of a filter substrate.

In FIG. 4, 2 is a substrate, 4 is a transparent electrode,
6 is an alignment pattern, 8 is an alignment mark, 10 is a color filter, 12 is a colored photosensitive resin, 22 is an alignment mark mask, 14 is a color filter material, 18 is a color filter mask, 20 is a mask alignment mark, 18 is Light source.

In the method of manufacturing a color filter substrate according to the present embodiment, the alignment mark 8 made of colored photosensitive resin is formed in a region on the substrate 2 different from the alignment pattern 6. This is different from the conventional method for manufacturing a color filter substrate shown in FIG. 6 in that the color filter 10 is formed without removing the color filter material 14 in the eight regions.

First, the step of simultaneously forming a transparent electrode and a matching pattern formed of the same material as the transparent electrode is performed by using the photolithography technique described in the third embodiment.

Next, a process of forming an alignment mark by using the alignment pattern will be described.

For example, a black pigment-dispersed photosensitive resin is formed as a colored photosensitive resin 12 in a part of the substrate 2 where an alignment mark is to be formed.

There are various methods for partially forming the colored photosensitive resin 12 in the region where the alignment mark is formed on the substrate 2. For example, there are various methods, such as ejection of the colored photosensitive resin by an ink jet technique or screen printing technique. Printing.

Then, the colored photosensitive resin 14 is exposed and cured by an ultraviolet irradiation device through an alignment mark mask 22, and the colored photosensitive resin in an unexposed portion is developed and removed, and an alignment mark made of the colored photosensitive resin is removed. Is formed at a position different from the alignment pattern.

At this time, although not shown, the alignment mark mask 22 is provided with an alignment pattern mark corresponding to the alignment pattern 6 formed on the substrate 2, and the two are aligned to form the alignment mark 8. Form.

Hereinafter, the step of forming a color filter using the alignment mark is performed by the photolithography technique described in the third embodiment.

According to the present embodiment, since the alignment mark 8 is made of a colored photosensitive resin, the alignment mark 8 can be identified through the color filter material 16. Therefore, the step of removing the color filter material 16 in the area of the alignment mark 8 is not required, and the color filter mask 18 is not required.
Can be aligned with the alignment mark 20 of the substrate 2.

[0065]

According to the present invention, the alignment mark is formed of a metal pattern on the alignment pattern, or is formed of a colored photosensitive resin outside the alignment pattern forming region. Therefore, the step of removing the color filter material in the alignment mark area is not required. Therefore, it is possible to manufacture a liquid crystal element substrate free from color filter defects caused by the step of removing the color filter material in the alignment mark area.

[Brief description of the drawings]

FIG. 1 is a view for explaining a configuration of a color filter substrate of the present invention, and is a schematic cross-sectional view of a color filter substrate in which an alignment mark is formed by a metal pattern.

FIG. 2 is a diagram for explaining the configuration of the color filter substrate of the present invention, and is a schematic cross-sectional view of the color filter substrate in which an alignment mark is formed of a colored photosensitive resin.

FIG. 3 is a view for explaining a method of manufacturing a color filter substrate according to the present invention; FIG. FIG.

FIG. 4 is a view for explaining a method of manufacturing a color filter substrate according to the present invention. FIG. 4 is a view illustrating a process of forming an alignment mark made of a colored photosensitive resin on a color filter substrate and a process of forming a color filter. It is an outline sectional view.

FIG. 5 is a schematic sectional view of a conventional color filter substrate.

FIG. 6 is a cross-sectional view of a color filter substrate in a conventional method for manufacturing a color filter substrate.

[Explanation of symbols]

 2 Substrate 4 Transparent electrode 6 Matching pattern 8 Matching mark 10 Color filter 12 Colored photosensitive resin 14 Color filter material 16 Color filter mask 18 Light source 20 Mask matching mark

Claims (6)

[Claims] 1. A color comprising: a transparent electrode on a substrate; a matching pattern formed of the same material as the transparent electrode; and a matching mark, and a color filter provided on the transparent electrode. Filter substrate. 2. The color filter substrate according to claim 1, wherein the alignment mark is a metal pattern having the same shape as the alignment pattern on the alignment pattern. 3. The colored photosensitive resin according to claim 1, wherein the alignment mark is disposed in a region where the alignment mark is formed in a region different from a region where the alignment pattern is formed. A color filter substrate comprising: 4. A transparent electrode on a substrate, a matching pattern formed of the same material as the transparent electrode and the transparent electrode,
A method for manufacturing a color filter substrate comprising a matching mark and a color filter on the transparent electrode, wherein the transparent electrode and the matching pattern are simultaneously formed, and A method for manufacturing a color filter substrate, comprising: forming an alignment mark; and forming a color filter using the alignment mark. 5. The method for manufacturing a color filter substrate according to claim 4, wherein the step of forming the alignment mark using the alignment pattern includes the same shape as the alignment transparent pattern on the alignment pattern. A method for manufacturing a color filter substrate, comprising the step of: forming a metal pattern. 6. The method for manufacturing a color filter substrate according to claim 4, wherein the step of forming the alignment mark by using the alignment pattern includes the step of forming an alignment mark different from an area where the alignment pattern is formed. A step of partially applying a colored photocurable resin to a region where the alignment mark is to be formed, and a step of exposing the colored photosensitive resin via a photomask,
Removing the colored photosensitive resin from the unexposed portions.