JP2534852B2 - Method for manufacturing multicolor display device - Google Patents

Description

Description: TECHNICAL FIELD The present invention relates to a method for manufacturing a multicolor display device to which a color filter is applied, and particularly to a method for manufacturing a color filter with a light-shielding film for improving display quality. .

[Outline of Invention]

In order to eliminate the drawback that precise patterning is required when forming a light-shielding film in each color filter gap, the present invention provides a light-shielding film on the photoresist mask used when patterning the transparent conductive film. Then, the resist mask on the transparent conductive film is removed together with the light-shielding film by the lift-off method, and the light-shielding film is formed only in the gaps between the patterned transparent conductive films.After that, color filters are sequentially formed on the transparent conductive film. By forming it, a great effect can be obtained by a simple method.

[Conventional technology]

FIG. 3 is a sectional view showing an example of a conventional multicolor display device.
14 is a transparent substrate made of glass or the like, 15 is a transparent electrode made of ITO or the like formed on the transparent substrate, and 16, 16 ′, 16 ″ are color filters formed by matching the pattern with the transparent electrode, and have different color tones. Reference numeral 17 denotes a second transparent substrate, which forms a second transparent electrode 18, is opposed to the transparent substrate 14, and holds a liquid crystal 19 in the gap to form a multicolor display device.

When this multicolor display device is sandwiched between a polarizer and an analyzer and a voltage is selectively applied to the liquid crystal through a transparent electrode, a portion that transmits light through a color filter and a portion that does not transmit light at all appear, resulting in a color display. It will be possible. In such a multicolor display device, it is necessary to suppress the light leakage leaking from the gap between the transparent electrodes as much as possible in order to maintain the color purity. However, even if the polarizer and the analyzer are arranged so that they become black when no voltage is applied, the thickness of the liquid crystal layer differs between the electrode part with the color filter and the gap by the thickness of the color filter. If the light is sufficiently shielded, stray light is generated in the gap portion due to light interference due to the deviation of the liquid crystal layer thickness. Furthermore, when a display mode that allows transmission when no voltage is applied is selected, the gap is always displayed in white and color purity cannot be obtained.

[Problems to be solved by the invention]

As described above, in order to obtain the ideal color purity, it is desirable to dispose the light-shielding substance in the gap between the color filters. However, it is difficult to form the light-shielding layer only in the gaps between the very fine color filters, and it is necessary to perform patterning using a fine photomask or the like, which significantly complicates the process.

[Means for solving problems]

The present invention uses a photoresist mask for patterning a transparent conductive film to easily shield light by a lift-off method without taking a special fine processing means such as a photomask to form a light-shielding film in a color filter gap. The film is formed with high precision.

Specifically, (i) a step of sequentially laminating and forming a transparent conductive film and a photoresist on the substrate.

(Ii) A step of exposing a photoresist to an arbitrary shape to cause a phenomenon and using it as a resist mask to etch and pattern a transparent conductive film.

(Iii) A step of forming a light-shielding substance on the substrate on which the resist mask is formed.

(Iv) A step of removing the resist mask on which the light-shielding substance is formed together with the above light-shielding substance so that the light-shielding substance remains only in the gap between the transparent conductive films.

(V) A step of sequentially forming color filters on the transparent conductive film from which the resist mask has been removed.

It is a very simple process in which the step of forming a light-shielding material is added to the normal transparent conductive film patterning step in the step having a step, and an extra photomask or the like for patterning the light-shielding material is unnecessary. It will be.

[Action]

FIG. 2 sequentially shows the steps of manufacturing a color filter with a light-shielding film, which is important in the method of manufacturing a multicolor display device according to the present invention.

In FIG. 2 (a), 8 is a substrate made of glass or the like IT
A transparent conductive film 9 made of O or the like is formed by a method such as sputtering or vapor deposition, and a photoresist film 10 is laminated thereon.
The photoresist film 10 may be a commercially available negative type or positive type.

In FIG. 2 (b), the photoresist film 10 is exposed through the photomask 11 to cause a phenomenon, and the transparent conductive film 9 is etched with hydrochloric acid containing ferric chloride, plasma or the like, as shown in FIG. 2 (c). Photoresist film 10 on transparent conductive film 9
The laminated pattern remains.

In FIG. 2D, the light shielding material 12 is formed on the entire surface. The light-shielding substance 12 may be a metal, a metal oxide, or a resin as long as it has a light-shielding property, but a thin film is preferable.

In FIG. 2 (e), the light-shielding substance 12 formed on the photoresist film 10 is removed by lift-off by immersing the light-shielding substance 12 in the solvent of the photoresist to dissolve the resist. Although the solvent varies depending on the resist used, organic solvents such as esters, aromatics, halogenated hydrocarbons, alcohols and ethers are often used, and in some cases, after immersion,
Energy such as ultrasonic waves may be added.

Thus, the light-shielding film is accurately formed in the gap portion other than the transparent conductive film. Next, as shown in FIG. 2 (f), color filters 13, 13 ', 13 "are sequentially formed on the transparent conductive film in different color tones. The color filter can be prepared by printing, dyeing or electrodeposition. Although any method is proposed and any of them can be used, the method for manufacturing a color filter by the electrodeposition method disclosed in detail in Japanese Patent Laid-Open No. 59-114572 uses one photomask at the time of making the color filter. A color filter can be formed without doing this, and when combined with the present invention,
It is desirable that only one photomask for patterning the transparent conductive film is required from the formation of the transparent conductive film to the production of the color filter with the light-shielding film, which is a very simple process.

If a display material such as liquid crystal is sandwiched between the filter substrate and the counter substrate prepared as described above, a multicolor display device is obtained.

〔Example〕

Hereinafter, the present invention will be described more specifically based on Examples.

(Embodiment 1) FIG. 1 shows a sectional view of an example of a multicolor display device according to the present invention. 1 is a substrate made of glass, on which a transparent electrode 2 and a light shielding film 3 are formed. In this forming method, ITO is deposited on the entire surface of the substrate 1 by vapor deposition, and a photoresist OFP is formed on the ITO.
R-800 (manufactured by Tokyo Ohka) was applied by spin coating and prebaked. Next, it is exposed using a predetermined photomask and NM
A phenomenon was caused by D-3 (manufactured by Tokyo Ohka), and a photoresist mask having a predetermined shape was prepared. Then, the substrate was immersed in a hydrochloric acid aqueous solution containing ferric chloride to dissolve and remove the ITO in the portion not covered with the photoresist mask. Next, a light-shielding substance obtained by dissolving a black dye in an aqueous gelatin solution was applied on the entire surface by spin coating and cured. This substrate was immersed in acetone to dissolve the photoresist and remove the light-shielding substance formed on the substrate, and the light-shielding film 3 and the transparent electrode 2 were patterned by a very simple method and with high precision.

4,4 'and 4 "are color filters and were prepared by the electrodeposition method as described below.

Change the electrodeposition bath of the following composition to red, green and blue pigments, I made 3 types. First, connect the transparent electrodes to form a red filter, immerse them in a red electrodeposition bath, and apply a voltage between them and the counter electrode to deposit a red filter on the electrode to which the voltage was applied. . Pull up this substrate, wash with water,
After heat curing, the same operation was repeated for green and blue electrodeposition baths to produce color filters 4, 4 ', 4 ".

Thus, the substrate 1 having the light-shielding film and the color filter formed thereon and the second substrate 6 having the second transparent electrode 5 faced each other, and the liquid crystal 7 was held in the gap, to manufacture a multicolor display device.

Although the multicolor display device manufactured as described above was manufactured by a simple method, stray light from the color filter gap was not observed, and high display quality without deterioration of color purity was obtained.

(Example 2) The light-shielding film 3 in Example 1 was manufactured by the method described below.

ITO was deposited on the entire surface of the substrate 1 by vapor deposition, and a photoresist, Selectilax P (manufactured by Merck) was applied thereon by spin coating and prebaked. Next, exposure was performed using a predetermined photomask, and the phenomenon was caused by Selectiplast P (manufactured by Merck) to prepare a photoresist mask having a predetermined shape. After that, the substrate is immersed in an aqueous hydrochloric acid solution containing ferric chloride, and the portion of the ITO not covered by the photoresist mask is removed.
Was removed by dissolution. Next, a light-shielding substance made of chromium oxide was formed on the entire surface by reactive sputtering. By dipping this substrate in acetone to dissolve the photoresist and peeling off the light-shielding substance formed thereon, it was possible to pattern the light-shielding film 3 and the alliance electrode 2 with a very simple method and with high precision.

Hereinafter, when a multicolor display device was manufactured in the same manner as in Transparent Example 1, the same effect as in Example 1 was obtained.

〔The invention's effect〕

As described above in detail in the embodiments, according to the present invention, the patterning of the transparent electrode and the light-shielding film is achieved by one photomask, which is very simple, but the accuracy may be deteriorated such as the positional deviation. There is no such thing. In addition, the multicolor display device manufactured by the present invention has a large improvement in display quality even though the light-shielding film is added by a simple method, and has high color purity without leakage of light from the color filter gap. Is provided.

[Brief description of drawings]

FIG. 1 is a cross-sectional view of an embodiment of a multicolor display device according to the present invention, FIGS. 2A to 2F are views showing steps of a method for manufacturing a multicolor display device according to the present invention, and FIG. It is sectional drawing of an example of the conventional multicolor display device. 1,6,8,14,17 …… Substrate 2,5,9,15,18 …… Transparent electrode 3,12 …… Shading film 4,4 ′, 4 ″, 13,13 ′, 13 ″, 16, 16 ′, 16 ″ …… Color filter 7,19 …… LCD

Claims (5)

(57) [Claims] 1. A method of manufacturing a multi-color display device using a color filter, a step of sequentially laminating and forming a transparent conductive film and a photoresist on a substrate, exposing the photoresist to an arbitrary shape, causing a phenomenon, and forming the resist. A step of etching and patterning the transparent conductive film as a mask, a step of forming a light-shielding substance on the substrate on which the resist mask is formed, a resist mask on which the light-shielding substance is formed is removed together with the above light-shielding substance, A method for manufacturing a multicolor display device, comprising: a step of leaving a light-shielding substance only in the gaps of the transparent conductive film; and a step of sequentially forming a color filter on the conductive film from which the resist mask has been removed. 2. The method of manufacturing a multicolor display device according to claim 1, wherein the color filter formed on the transparent conductive film is formed by electrodeposition. 3. The method for manufacturing a multicolor display device according to claim 1, wherein the light-shielding substance is a resin containing a black pigment. 4. The method for manufacturing a multicolor display device according to claim 1, wherein the light-shielding substance is made of a metal or a metal oxide having a light-shielding property. 5. The method of manufacturing a multicolor display device according to claim 1, wherein the multicolor display device is a multicolor liquid crystal display device.