JPH0827598B2 - Display device manufacturing method - Google Patents

Description

TECHNICAL FIELD The present invention relates to a method for manufacturing a display device of high image quality and low cost, which can be applied to a wide range of applications from small size to large size and from monochrome display to color display. .

[Outline of Invention]

The present invention, in a display device having a light-shielding film between transparent electrode patterns, selectively deposits a metal on the transparent electrode by metal plating and forms the light-shielding film using the metal as a photomask, thereby eliminating the need for alignment exposure. It is to provide a very simple method for manufacturing a display device.

[Prior art]

In recent years, the progress of thin display devices such as liquid crystal, EL, plasma, and LED has been remarkable, and it has reached 7 segment display to full dot display, and the number of pixels is 640 × 400, which is comparable to CRT. Along with this, higher image quality and higher color have been developed, and a method of providing a light-shielding film between transparent electrodes has been devised as one means for achieving this. This is to prevent light from leaking in a portion to which a voltage is not applied between the transparent electrodes, that is, a portion which does not contribute to display, and to increase the apparent contrast.
Particularly in the case of colorization, the contrast = saturation of the display color, and thus this light-shielding film is an important means for improving the image quality. Further, in the case of an active type display device using a switching element, this light shielding film can remove unnecessary light, which has an effect of reducing light leakage of the switching element.

Conventionally, the following two methods have been devised as methods for forming this light shielding film.

The first method is printing, and the light-shielding film 6 can be formed by printing black ink on the substrate 2 having the transparent electrode 4 patterned as shown in FIG. 8 (1).

The second method is a dyeing method, which is an application of a method used for forming a color filter. Transparent electrode 4 patterned as shown in FIG. 8 (2)
A dyeable photosensitive resin 7 such as gelatin is applied onto a substrate having (), then exposed using a photomask 8 corresponding to the pattern of the transparent electrode (), and then developed to remove the gelatin on the transparent electrode. After removing (), finally, the black dye (generally a mixture of a plurality of dyes) is used to dye the gelatin to obtain the light shielding film 9 ().

[Problems to be Solved by the Present Invention] The conventional light-shielding film forming methods have the following problems, respectively.

The printing method is excellent as a very simple method for a rough pattern, but it is difficult to form a uniform light-shielding film having a width of the light-shielding film of 100 μm or less, and the printing position accuracy is poor.

On the other hand, in the dyeing method, the light-shielding film has good uniformity, and since the exposure method is used, the positional accuracy is high. However, since alignment is required at the time of exposure and the alignment with the transparent electrode is required, workability is poor and this is a major factor in cost increase.

An object of the present invention is to provide a method of manufacturing a display device with high image quality and low cost by eliminating the complicated process, which has high uniformity and positional accuracy of a light shielding film even in a fine pattern.

[Means for solving problems]

For this purpose, the present invention selectively deposits a metal on the patterned transparent electrode by metal plating and uses the metal as a photomask. The process is second
Shown in the figure.

A metal 10 is selectively deposited only on the transparent electrode 4 by metal plating on the substrate 2 having the patterned transparent electrode 4 ().

Next, a photosensitive black resin or dyeable resin 11 is applied ().

Next, exposure is performed from the back surface of the substrate 2 (). At this time, the metal film 10 serves as a photomask.

Then, development is performed to remove the photosensitive resin on the metal film which has not been exposed ().

 Then, only the metal is etched ().

When a dyeable resin is used as the photosensitive resin, dyeing is performed before or after metal etching.

[Action]

The formation of the light-shielding film by the above-described manufacturing method uses a metal selectively deposited only on the transparent electrode as a photomask, so that the positional accuracy is extremely high and alignment is not required at the time of exposure. Easy to manufacture. Therefore, it is possible to provide a display device with high image quality and low cost.

Example 1 A liquid crystal display device was manufactured by the following steps (see FIG. 2).

ITO is vapor-deposited on the transparent substrate 2 and a display pattern is etched (a).

The substrate is removed from the next step, and Ni is deposited only on ITO by electroless plating.

A black negative photosensitive resin in which a phthalocyanine-based pigment and an anthraquinone-based pigment are dispersed is applied to the above substrate with a bar coater and baked at 80 ° C. for 10 minutes ().

 The substrate is exposed from the back side of the substrate ().

The above substrate is immersed in a developing solution to remove the unexposed portion, that is, the photosensitive resin of Ni, and baked at 20 ° C. for 60 minutes ().

The above substrate is dipped in 40% HNO ₃ to etch Ni ().

A liquid crystal display device is manufactured by arranging the two substrates so that the transparent electrode patterns are orthogonal to each other and sandwiching the liquid crystal.

As a result, since there is no light leakage between the transparent electrodes to which no voltage is applied, a high contrast display device can be obtained.

[Example 2] In the manufacturing process of Example 1, gelatin which is a dyeable resin was used as the photosensitive resin, and a liquid crystal display device was produced by dyeing with a black dye after etching with Ni. The effect of was obtained.

[Example 3] In Example 1, a color filter layer was formed on the transparent electrode after the formation of the light-shielding film by a polymer electrodeposition method (Japanese Patent Laid-Open No. 59-114572) to obtain a multicolor liquid crystal display device as shown in FIG. It was made.

As a result, a display color having a higher saturation than that of a display device having no light-shielding film was obtained. Further, a display quality equivalent to that of a multicolor liquid crystal display device using a light-shielding film formed by a conventional dyeing method was obtained, and the manufacturing process thereof was extremely simple.

Although the same effect can be obtained by other manufacturing methods such as a printing method, a dyeing method, etc., the polymer electrodeposition method is suitable from the viewpoints of simplicity and accuracy of the manufacturing process.

[Example 4] In Example 1, a resist was applied to a portion of the liquid crystal display device excluding the electrode terminals before etching with Ni, and the liquid crystal display device shown in Fig. 4 was manufactured by the same process. In this case, since the Ni film remains only on the terminal portion, the mounting reliability is improved. Also, because soldering is possible, TAB substrates can be used, and the range of mounting methods has expanded, making it possible to select a mounting method that suits the application of the liquid crystal display device.

[Fifth Embodiment] In the fourth embodiment, the ITO pattern of the electrode terminal portion is changed to IC ch.
A liquid crystal display device was produced in the same manner with a shape in which ip could be mounted.

In this case, IC chip12 is displayed on the liquid crystal panel as shown in FIG.
Can be implemented.

[Example 6] In Example 4 or 5, Au was deposited only on Ni through a substitution Au plating process after Ni etching. In this case, the connection reliability was further improved as compared with Ni alone.

Example 7 In Example 3, a resist was applied to a part of the transparent electrode for display along the transparent electrode for display before etching with Ni, and the liquid crystal display device of FIG. 6 was manufactured by the same process. In this case, since Ni10 remains on the display transparent electrode 4, so-called metal wiring is used especially when the width of the transparent electrode pattern is small and the resistance value of the transparent electrode becomes a problem as in a color liquid crystal display device. Because of the structure, it was possible to prevent the display quality from being degraded.

[Embodiment 8] As shown in FIG. 7, a substrate 18 having the transparent electrode 4 formed on the entire surface of the substrate prepared in Embodiment 4 and a substrate 17 having a switch element 16 and a pixel electrode 15 connected thereto are combined. A liquid crystal display device was manufactured, and display was performed by back lighting from the substrate 18 side.

As a result, it was possible to obtain a high-quality display with less light leakage of the switching element as compared with the case without the light shielding film. Further, the same display quality was obtained as compared with the case of using the light shielding film by the conventional manufacturing method.

In addition, the present invention is not limited to liquid crystal, but also EL, plasma, LED
Etc. can be applied to various display devices.

〔The invention's effect〕

As described in detail above, the present invention is a method of manufacturing a display device in which a light-shielding film is formed between transparent electrodes by selectively depositing a metal on a patterned transparent electrode by metal plating and using the metal as a photomask. Is the way. Therefore, since alignment exposure or the like as in the related art is unnecessary, a light-shielding film having extremely high positional accuracy can be formed, and a display device with high image quality can be provided. Further, the manufacturing process does not require a complicated device and is extremely simple, and it is possible to suppress the cost increase due to the formation of the light shielding film. Further, when metallizing is required on the substrate, such as mounting an IC chip on a panel, the metal by the metal plating of the present invention can be used as it is.

[Brief description of drawings]

FIG. 1 is a schematic sectional view of a display device for explaining the present invention,
FIG. 2 is a schematic diagram of a method of manufacturing a light-shielding film according to the present invention,
5, 6 and 7 show a schematic sectional view and a perspective view of an embodiment according to the present invention. Further, FIGS. 8 (1) and 8 (2) are schematic views of a conventional method of manufacturing a light shielding film. 1 ... Polarizer, 2 ... Transparent substrate 23,4 ... Transparent electrode 5,6,9,15 ... Shading film 7 ... Staining resin, 8 ... Photomask 10 ... Metal, 11 ... Light-shielding resin 12 …… IC chip, 13 …… liquid crystal, 14 …… color filter 15 …… pixel electrode, 16 …… switching element 17,18 …… substrate

 ─────────────────────────────────────────────────── --- Continuation of the front page (56) References JP-A-61-46931 (JP, A) JP-A-63-118126 (JP, A) JP-A-62-273512 (JP, A)

Claims (6)

[Claims] 1. A display device in which at least one of two transparent electrode substrates has a patterned transparent electrode and a light-shielding film between the transparent electrodes, and an electro-optical material is sandwiched between the substrates. In the step of preparing a transparent electrode substrate in which a substrate having a light-shielding film in the transparent electrode gap is patterned on the surface of the substrate, a metal film is selectively deposited on the transparent electrode by metal plating. Steps, a step of applying a photosensitive light-shielding resin over the entire surface of the substrate that has undergone the above steps, a step of exposing from the back surface of the substrate using the metal film as a photomask, and a step of exposing the unexposed metal film And a developing step of removing the photosensitive resin, and a step of removing the metal film. 2. The method of manufacturing a display device according to claim 1, wherein the photosensitive light-shielding resin is a dyeable resin, and a dyeing step is provided after the developing step. 3. The display according to claim 1 or 2, wherein color filters of at least two colors are provided corresponding to the transparent electrode pattern on the substrate on which the light shielding film is formed. Device manufacturing method. 4. The method for manufacturing a display device according to claim 1, wherein in the step of removing the metal film, at least a metal other than the display electrode terminal portion is etched. 5. The display according to claim 1 or 2, wherein in the step of removing the metal film, the metal film is etched along the transparent electrode for display while leaving a part thereof. Device manufacturing method. 6. The method of manufacturing a display device according to claim 1 or 2, wherein at least one of the transparent electrode substrates has a switching element or a non-linear element.