JPH02184803A - Color filter and production thereof - Google Patents
Color filter and production thereofInfo
- Publication number
- JPH02184803A JPH02184803A JP1004038A JP403889A JPH02184803A JP H02184803 A JPH02184803 A JP H02184803A JP 1004038 A JP1004038 A JP 1004038A JP 403889 A JP403889 A JP 403889A JP H02184803 A JPH02184803 A JP H02184803A
- Authority
- JP
- Japan
- Prior art keywords
- black
- color filter
- transparent electrodes
- substrate
- transparent
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000004519 manufacturing process Methods 0.000 title claims description 6
- 239000000758 substrate Substances 0.000 claims abstract description 22
- 238000000034 method Methods 0.000 claims abstract description 19
- 239000000693 micelle Substances 0.000 claims abstract description 16
- 239000000049 pigment Substances 0.000 claims abstract description 12
- 238000007747 plating Methods 0.000 claims abstract description 12
- 239000011347 resin Substances 0.000 claims description 12
- 229920005989 resin Polymers 0.000 claims description 12
- 229910052751 metal Inorganic materials 0.000 claims description 9
- 239000002184 metal Substances 0.000 claims description 8
- 239000011159 matrix material Substances 0.000 claims description 6
- 239000000463 material Substances 0.000 claims description 3
- 238000004043 dyeing Methods 0.000 claims description 2
- 239000011248 coating agent Substances 0.000 claims 1
- 238000000576 coating method Methods 0.000 claims 1
- 238000000016 photochemical curing Methods 0.000 claims 1
- 229920002120 photoresistant polymer Polymers 0.000 claims 1
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 abstract description 38
- 229910052759 nickel Inorganic materials 0.000 abstract description 19
- 238000005868 electrolysis reaction Methods 0.000 abstract description 12
- 239000011521 glass Substances 0.000 abstract description 4
- 230000015572 biosynthetic process Effects 0.000 abstract description 3
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 abstract description 2
- 229910052760 oxygen Inorganic materials 0.000 abstract description 2
- 239000001301 oxygen Substances 0.000 abstract description 2
- 239000010410 layer Substances 0.000 abstract 3
- 239000011247 coating layer Substances 0.000 abstract 1
- 239000007788 liquid Substances 0.000 abstract 1
- 239000000243 solution Substances 0.000 description 11
- 239000012860 organic pigment Substances 0.000 description 6
- 108010010803 Gelatin Proteins 0.000 description 5
- 229920000159 gelatin Polymers 0.000 description 5
- 239000008273 gelatin Substances 0.000 description 5
- 235000019322 gelatine Nutrition 0.000 description 5
- 235000011852 gelatine desserts Nutrition 0.000 description 5
- 239000004973 liquid crystal related substance Substances 0.000 description 4
- AMXOYNBUYSYVKV-UHFFFAOYSA-M lithium bromide Chemical compound [Li+].[Br-] AMXOYNBUYSYVKV-UHFFFAOYSA-M 0.000 description 4
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
- 239000007864 aqueous solution Substances 0.000 description 3
- 239000003054 catalyst Substances 0.000 description 3
- 239000004094 surface-active agent Substances 0.000 description 3
- 239000003086 colorant Substances 0.000 description 2
- 238000007772 electroless plating Methods 0.000 description 2
- 238000009713 electroplating Methods 0.000 description 2
- 238000005530 etching Methods 0.000 description 2
- 238000007654 immersion Methods 0.000 description 2
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- OWYWGLHRNBIFJP-UHFFFAOYSA-N Ipazine Chemical compound CCN(CC)C1=NC(Cl)=NC(NC(C)C)=N1 OWYWGLHRNBIFJP-UHFFFAOYSA-N 0.000 description 1
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- RWCCWEUUXYIKHB-UHFFFAOYSA-N benzophenone Chemical compound C=1C=CC=CC=1C(=O)C1=CC=CC=C1 RWCCWEUUXYIKHB-UHFFFAOYSA-N 0.000 description 1
- 239000012965 benzophenone Substances 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- VDQQXEISLMTGAB-UHFFFAOYSA-N chloramine T Chemical compound [Na+].CC1=CC=C(S(=O)(=O)[N-]Cl)C=C1 VDQQXEISLMTGAB-UHFFFAOYSA-N 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- ZOMNIUBKTOKEHS-UHFFFAOYSA-L dimercury dichloride Chemical class Cl[Hg][Hg]Cl ZOMNIUBKTOKEHS-UHFFFAOYSA-L 0.000 description 1
- 239000006185 dispersion Substances 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000003792 electrolyte Substances 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 125000001165 hydrophobic group Chemical group 0.000 description 1
- 229910010272 inorganic material Inorganic materials 0.000 description 1
- 239000011147 inorganic material Substances 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 229910017604 nitric acid Inorganic materials 0.000 description 1
- 229910052762 osmium Inorganic materials 0.000 description 1
- 229910052763 palladium Inorganic materials 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 229910052697 platinum Inorganic materials 0.000 description 1
- 230000010287 polarization Effects 0.000 description 1
- 239000010453 quartz Substances 0.000 description 1
- 229910052707 ruthenium Inorganic materials 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- 239000003115 supporting electrolyte Substances 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- 239000002966 varnish Substances 0.000 description 1
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明はフルカラーもしくはマルチカラーデイスプレィ
に用いられるカラーフィルターに関するものである。DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to a color filter used in full-color or multi-color displays.
液晶デイスプレィやプラズマデイスプレィ等のカラー化
を目的として、デイスプレィパネルの内側にカラーフィ
ルターを配置する方式が一般に取られている。2. Description of the Related Art For the purpose of colorizing liquid crystal displays, plasma displays, etc., a method is generally adopted in which a color filter is disposed inside a display panel.
これら従来のカラーフィルターの構造は種々提案されて
いるが、本発明者らは最近、大面積に低価格で形成でき
る方法としてミセル電解法によるカラーフィルタを提案
している。Although various structures of these conventional color filters have been proposed, the present inventors have recently proposed a color filter using micelle electrolysis as a method that can be formed over a large area at low cost.
ミセル電解法とは、有機顔料等の成膜を行う方法として
佐治等（Ｊ、Ａｍ、Ｃｈｅｍ、Ｓｏｃ。The micelle electrolysis method is a method for forming films of organic pigments, etc., as described by Saji et al. (J, Am, Chem, Soc.
１０９．５８８１ （１９８７）、Ｃｈｅｍ、Ｌｅｌｌ
、８９３ （１９８Ｂ） ）が報告している。109.5881 (1987), Chem, Lell
, 893 (198B)).
このミセル電解法を用いたカラーフィルターの製造方法
としては、次の通りである。A method for manufacturing a color filter using this micelle electrolysis method is as follows.
１、透明基板上に所定のパターンで透明電極を形成する
。1. Form transparent electrodes in a predetermined pattern on a transparent substrate.
２、ミセル電解用の水溶液として、界面活性剤のミセル
水溶液中に有機顔料を分散させる。2. As an aqueous solution for micelle electrolysis, an organic pigment is dispersed in a micelle aqueous solution of a surfactant.
３、この溶液に該基板と通電用の電極を浸漬し、特定の
パターンと通電用の電極間に通電することで特定のパタ
ーン上に有機顔料粒子が析出する。3. The substrate and the current-carrying electrode are immersed in this solution, and by applying current between the specific pattern and the current-carrying electrode, organic pigment particles are deposited on the specific pattern.
４、例えば、Ｒ，Ｇ、 Ｈの三色を持ったカラーフィ
ルターを形成する場合は、Ｒ，Ｇ、 Ｂの有機顔料を
分散させた溶液を三種類調整し、２と３の工程をくり返
す。4. For example, to form a color filter with three colors R, G, and H, prepare three types of solutions in which R, G, and B organic pigments are dispersed, and repeat steps 2 and 3. .
ここで、界面活性剤としては、電解により荷電し、界面
活性剤どうし及び電極と反発することでミセルの崩壊が
起こり、ミセル中に取り込まれていた有機顔料を電極上
に析出させるものが良い。Here, the surfactant is preferably one that is charged by electrolysis and repulses each other and the electrode, causing the collapse of the micelles and causing the organic pigment incorporated in the micelles to be deposited on the electrodes.
例えば、界面活性剤の疎水基として一般式、ＣＭ （Ｃ
Ｈｓ） ２） （Ｍ ：Ｔ １１ Ｃｒ、 ＵＩ
Ｆ ｅＴＮ、Ｒｕ、Ｏｓ、Ｐｄなど）のメタロセン基
を持つものがあり、市販のものとしては、Ｆｅを導入し
たフェロセニルＰＥＧ（同化化学製）がある。For example, as a hydrophobic group of a surfactant, the general formula CM (C
Hs) 2) (M: T 11 Cr, UI
Some have metallocene groups such as (FeTN, Ru, Os, Pd, etc.), and a commercially available product is ferrocenyl PEG (manufactured by Doka Kagaku Co., Ltd.) into which Fe is introduced.
また、有機顔料の分散溶液を電解する場合は支持電解質
が必要であるが、電解質であれば特に限定されない。Further, when electrolyzing a dispersion solution of an organic pigment, a supporting electrolyte is required, but there is no particular limitation as long as it is an electrolyte.
従来法で述べたようにミセル電解法で形成するカラーフ
ィルターは、透明電極上にのみ顔料が析出するため、透
明電極間には光を遮光するブラック層を形成することが
できなかった。As described in the conventional method, in the color filter formed by micelle electrolysis, the pigment is deposited only on the transparent electrodes, so it is not possible to form a black layer between the transparent electrodes to block light.
液晶デイスプレィの場合、カラーデイスプレィは透過光
を用いて見る構造になる。このため第２図に示すように
、透明電極間に遮光部がないとバックライトの透過光が
電極間から漏れＯＮ１０ ＦＦのコントラスト比が悪く
なり、画面全体が白っぼくなるという欠点がある。液晶
が立ち上がるしきい値以下の電圧がかかっている時に、
光が透過するノーマリ−ホワイトタイプのものは、この
欠点が顕著であるが、液晶が立ち上がっている時に光が
透過するノーマリ−ブラックタイプのものも、透明電極
間の光の遮光はクロス状態の偏光板が行うのみであり、
入射光の数パーセントの光が漏れることになり、同様に
０Ｎ１０ＦＦのコントラスト比を落し、画面が見にくい
という欠点を程す。In the case of a liquid crystal display, a color display is structured to be viewed using transmitted light. For this reason, as shown in FIG. 2, if there is no light shielding part between the transparent electrodes, the transmitted light of the backlight leaks between the electrodes and the contrast ratio of the ON10 FF deteriorates, resulting in the entire screen becoming whitish. When the voltage below the threshold for the liquid crystal to rise is applied,
Normally white types that transmit light have this drawback, but normally black types that transmit light when the liquid crystal is up also block light between the transparent electrodes due to cross-state polarization. Only the board does,
Several percent of the incident light will leak out, which will also reduce the contrast ratio of 0N10FF and eliminate the drawback that the screen is difficult to see.
即ち、ミセル電解法によるカラーフィルターの製造は、
大型で安価なカラーフィルターを提供することにあるが
コントラストが悪いという欠点を持っていたゆ
〔課題を解決するための手段〕
上記課題を解決するために、本発明はミセル電解法によ
るカラーフィルターにおいて、透明電極間のブラックマ
スク部をフォト法で形成することを特徴としている。In other words, the production of color filters by micellar electrolysis is as follows:
The purpose of the present invention is to provide a large and inexpensive color filter, but it has the drawback of poor contrast. [Means for Solving the Problems] In order to solve the above problems, the present invention provides a color filter using a micelle electrolysis method. , is characterized in that the black mask portion between the transparent electrodes is formed by a photo method.
より詳細に説明するために、その製造方法について述べ
る。In order to explain in more detail, the manufacturing method will be described.
本発明の電解ミセル法によるカラーフィルターは、
１、透明基板上に所定のパターンを持つ透明電極を形成
する。The color filter produced by the electrolytic micelle method of the present invention includes: 1. A transparent electrode having a predetermined pattern is formed on a transparent substrate.
２、透明電極上に、電解あるいは無電解メツキにより透
明電極上に金属膜を形成する。2. A metal film is formed on the transparent electrode by electrolytic or electroless plating.
電解メツキを行うことで、透明電極上にのみ金属膜を形
成することができる。又、無電解メツキの場合は基板全
面に金属膜が形成されるが、それを感光性レジストを用
いて、フェトリソ・エツチング工程で透明電極上にのみ
金＊ｌｌＩを形成してもよい。あるいは、３ｎ−Ｄｄの
混合触媒を用いると、透明基板がガラス、石英、水晶等
の無機材料の場合、触媒が吸着しにくいことを利用して
、透明電極上にのみ金属膜を形成することができる。By performing electrolytic plating, a metal film can be formed only on the transparent electrode. Further, in the case of electroless plating, a metal film is formed over the entire surface of the substrate, but gold *llI may be formed only on the transparent electrode by using a photosensitive resist and performing a fetolitho-etching process. Alternatively, if a mixed catalyst of 3n-Dd is used, it is possible to form a metal film only on the transparent electrode by taking advantage of the fact that the catalyst is difficult to adsorb when the transparent substrate is an inorganic material such as glass, quartz, or crystal. can.
３、透明基板の金属と透明電極が形成されている側に光
硬化タイプの感光性樹脂をコートする。3. Coat a photocurable type photosensitive resin on the side of the transparent substrate where the metal and transparent electrode are formed.
この感光性樹脂は、遮光用の染料が溶解されたタイプの
ものでも良いし、又、遮光用の顔料が溶解したタイプの
ものでも良い。あるいは、染料、顔料ともに含まれない
ものでもよい。This photosensitive resin may be of a type in which a light-shielding dye is dissolved, or may be a type in which a light-shielding pigment is dissolved. Alternatively, it may contain neither dye nor pigment.
４．上記基板を感光性樹脂のコートされていない側から
Ｕ、 Ｖ、 露光を行うと、透明電極上の金属膜が
露光マスクとなり、透明電極間の樹脂だけが硬化する。4. When the substrate is exposed to U and V light from the side not coated with the photosensitive resin, the metal film on the transparent electrodes serves as an exposure mask, and only the resin between the transparent electrodes is cured.
５、更に、現像、ベーキングを行うことにより透明電極
間に遮光用のブラックマスク部が形成される。工程３で
、染料、顔料ともに含まれない感光性樹脂をコートした
場合は、この後染色工程を通すことによって樹脂を染色
する。5. Furthermore, by performing development and baking, a black mask portion for shielding light is formed between the transparent electrodes. In step 3, if a photosensitive resin containing neither dye nor pigment is coated, the resin is dyed by passing through a subsequent dyeing step.
６、透明電極上の金属膜をエツチングし、従来技術で述
べた方法によりミセル電解法により顔料膜を形成するこ
とで、ブラックマトリックスカラーフィルターを製造す
ることができる。6. A black matrix color filter can be manufactured by etching the metal film on the transparent electrode and forming a pigment film by micelle electrolysis using the method described in the prior art.
次に実施例を用いて詳細に説明する。Next, a detailed explanation will be given using examples.
〔実施例１〕
１、透明基板としてガラス基板上に、所定のパターンを
持ったＩＴＯを形成する。 （第１図（ａ））２、上記
基板をあらかじめ調整された５ｎ−Ｐｄの混合触媒液（
日立化成製Ｈ３−１０１Ｂ）に１分間浸漬し、充分水洗
後、ＩＮのＮａＯＨ水溶液に１分間浸漬することで促進
化処理を行い、充分水洗した。[Example 1] 1. ITO having a predetermined pattern is formed on a glass substrate as a transparent substrate. (Figure 1(a)) 2. The above substrate was mixed with a pre-adjusted 5n-Pd mixed catalyst solution (
H3-101B (manufactured by Hitachi Chemical Co., Ltd.) for 1 minute, and after thoroughly rinsing with water, accelerated treatment was performed by immersing it in an aqueous IN NaOH solution for 1 minute, followed by thorough rinsing with water.
この基板を、あらかじめ調整された５０°Ｃの無電解ニ
ッケルメッキ液（日本カニゼン製８６８０）に５分間浸
漬することで、ＩＴＯ上にのみ無電解ニッケルメッキ膜
４０００Ａを得た。 （第１図（ｂ））
３、該基板のニッケルメッキ膜形成側にスピンコードに
て、富士ハントエレフト口ニスステクノロジー株式会社
のカラーモザイクシステムのブラックを２μｍの厚さで
形成し、酸素遮断のオーバーコート層を形成後、ブラッ
ク層の逆サイドからＵＶ、露光を行ない、所定の溶液で
現像を行った。This substrate was immersed for 5 minutes in a pre-adjusted electroless nickel plating solution (8680 manufactured by Nippon Kanigen Co., Ltd.) at 50°C to obtain an electroless nickel plating film 4000A only on the ITO. (Fig. 1(b)) 3. Using a spin cord, apply a 2 μm thick coat of color mosaic system black from Fuji Hunt Elef Varnish Technology Co., Ltd. to the nickel-plated side of the substrate to prevent oxygen. After forming the overcoat layer, UV exposure was performed from the opposite side of the black layer, and development was performed with a predetermined solution.
このセルフアライメント露光により、無電解ニッケル膜
上のブラック層は除去され、ニッケル膜間にのみブラッ
ク層が残った。この後、濃硝酸溶液に浸漬することでＩ
ＴＯ上の無電解ニッケル膜を溶解除去した。 （第１図
（ｃ）、 （ｄ））４、次に所定のＩＴＯ電極上にミ
セル電解によってＲ，Ｇ、 Ｈの三色の顔料を成膜す
る。 （第１図（ｅ））
Ｒ，Ｇ、 Ｂの成膜用ミセル水溶液は、それぞれＲ：
フェロセニルＰＥＧ （同化化学社製）２ ｍ ｍ
ｏ １ ／ ｌ
ＬｉＢｒ Ｏ，１ｍｏｌ／１
クロモフタールＡ３Ｂ（チバガイギー社製）６ｇ／Ｉ
Ｇ： フェロセニルＰＥＧ ２ｍｍｏｌ／ｌＬｉＢｒ
Ｏ，１ｍｏｌ／Ｉ
Ｈｅｌｉｏｇｅｎ Ｇｒｅｅｎ（ＢＡＳＦ社製）１０
ｇ／Ｉ
Ｂ： フェロセニルＰＥＧ ２ｍｍｏｌ／ｌＬｉＢｒ
Ｏ，１ｍｏｌ／Ｉ
ＥＰＰＣ−Ｃ２（大日精化社製）１０ｇ／ｌの成分であ
り、超音波で十分分散された後、スターシーにて１００
時間撹拌、分散し調製した。By this self-alignment exposure, the black layer on the electroless nickel film was removed, leaving the black layer only between the nickel films. After this, I
The electroless nickel film on the TO was dissolved and removed. (Fig. 1(c), (d)) 4. Next, three color pigments of R, G, and H are formed on a predetermined ITO electrode by micelle electrolysis. (Fig. 1(e)) The R, G, and B micelle aqueous solutions for film formation were R:
Ferrocenyl PEG (manufactured by Doka Kagaku Co., Ltd.) 2 m m
o 1/l LiBr O, 1mol/1 Chromophthal A3B (manufactured by Ciba Geigy) 6g/I G: Ferrocenyl PEG 2mmol/l LiBr
O, 1 mol/I Heliogen Green (manufactured by BASF) 10
g/I B: Ferrocenyl PEG 2 mmol/lLiBr
O, 1 mol/I EPPC-C2 (manufactured by Dainichiseika Chemical Co., Ltd.) is a component of 10 g/l, and after being sufficiently dispersed with ultrasonic waves, it is
It was prepared by stirring and dispersing for hours.
使用電極は、対極として白金板、参照極としては飽和カ
ロメル電極を用いた。成膜順序はＧ、 Ｂ。The electrodes used were a platinum plate as a counter electrode and a saturated calomel electrode as a reference electrode. The film formation order is G and B.
Ｒの順であったが、この順序は任意である。Although the order was R, this order is arbitrary.
以上のプロセスにより、ブラックマトリックス付きのミ
セル電解カラーフィルターが形成できた。Through the above process, a micellar electrolytic color filter with a black matrix was formed.
（第１図（ｅ））
〔実施例２〕
実施例１と同様のプロセスで所定のパターンを持ったＩ
ＴＯ電極上に無電解ニッケルメッキ膜４０００人を形成
した。(Figure 1(e)) [Example 2] I was prepared with a predetermined pattern using the same process as in Example 1.
4000 electroless nickel plating films were formed on the TO electrode.
この後、該基板のニッケルメッキ膜形成側にスピンコー
ドにて、光硬化性ゼラチンを２μｍの厚さで形成し、ゼ
ラチン層の逆サイドからＵ、 Ｖ。After that, photocurable gelatin was formed to a thickness of 2 μm using a spin cord on the nickel plating film side of the substrate, and U and V were applied from the opposite side of the gelatin layer.
露光を行ない、所定の溶液で現像を行った。このセルフ
アライメント露光により、無電解ニッケル膜上のゼラチ
ン層は除去されニッケル膜間にのみゼラチン層が残った
。この後、濃硝酸溶液に浸漬することでＩＴＯ上の無電
解ニッケル膜を溶解除去した。Exposure was performed and development was performed with a prescribed solution. By this self-alignment exposure, the gelatin layer on the electroless nickel film was removed, leaving the gelatin layer only between the nickel films. Thereafter, the electroless nickel film on the ITO was dissolved and removed by immersion in a concentrated nitric acid solution.
次に、ＩＴＯ間に残っているゼラチン層を黒色染料によ
って染色した。黒色染料として、日本化薬社製Ｂ１８１
（Ｌｏｇ／ｌ）を、６０℃に加温し、該基板を浸漬す
ることで行った。Next, the gelatin layer remaining between the ITO was dyed with black dye. As a black dye, B181 manufactured by Nippon Kayaku Co., Ltd.
(Log/l) by heating to 60° C. and immersing the substrate.
更に実施例１と同様のプロセスを通すことで、所定のパ
ターンのＩＴＯ上にそれぞれＲ，Ｇ、 Ｈの顔料膜を
形成し、ブラックマトリックス付きのミセル電解カラー
フィルターを形成した。Furthermore, by passing through the same process as in Example 1, pigment films of R, G, and H were respectively formed on the ITO in a predetermined pattern to form a micellar electrolytic color filter with a black matrix.
〔実施例３〕
実施例１と同様のプロセスで所定のパターンを持ったＩ
ＴＯ電極上に無電解ニッケルメッキ膜４０００人を形成
した。[Example 3] I was made with a predetermined pattern using the same process as in Example 1.
4000 electroless nickel plating films were formed on the TO electrode.
この後、該基板のニッケルメッキ膜形成側にスピンコー
ドにて、遮光材料を含んだ光硬化性樹脂を２μｍの厚さ
で形成した。Thereafter, a photocurable resin containing a light-shielding material was formed to a thickness of 2 μm on the side of the substrate on which the nickel plating film was to be formed using a spin cord.
上記材料は ブナコール １００ｇ ベンゾフェノン ２ｇ チタンブラック１３Ｒ２０ｇ （三菱金属株式会社製） を２本ロールで練り込んだものを使用した。The above materials are Bunacol 100g Benzophenone 2g Titanium black 13R20g (manufactured by Mitsubishi Metals Co., Ltd.) A mixture of two rolls was used.
次にこの基板の光硬化性−樹脂層の逆サイドからＵ、
Ｖ、 露光を行ない、所定の溶液で現像を行った。Next, from the opposite side of the photocurable resin layer of this substrate,
V. Exposure was performed and development was performed with a prescribed solution.
このセルフアライメント露光により、無電解ニッケル上
の樹脂層は除去され、ニッケル膜間にのみ樹脂層が残っ
た。この後、漂硝ｖ！溶液に浸漬することでＩＴＯ上の
無電解ニッケルメッキ膜を溶解除去した。This self-alignment exposure removed the resin layer on the electroless nickel, leaving the resin layer only between the nickel films. After this, Bleach V! The electroless nickel plating film on the ITO was dissolved and removed by immersion in a solution.
更に、実施例１と同様のプロセスを通すことで所定のパ
ターンのＩＴＯ上にそれぞれＲ，Ｇ、 Ｈの顔料膜を
形成しブラックマトリックス付きのミセル電解カラーフ
ィルターを形成した。Further, by passing through the same process as in Example 1, pigment films of R, G, and H were respectively formed on the ITO in a predetermined pattern to form a micellar electrolytic color filter with a black matrix.
以上実施例かられかるように、本発明によりミセル電解
カラーフィルターの課題であったＲ、 Ｇ。As can be seen from the examples above, R and G, which were problems of the micellar electrolytic color filter according to the present invention.
３間のすき間からの光漏れによるコントラスト比の低下
を防ぐことができた。また、本発明はセルフアライメン
ト方式であるため、ブラックマトリックス部を最小限に
とどめることができ、画素部面積を大きくとることがで
きるため、明るいカラー表示の可能なカラーフィルター
を提供することができた。It was possible to prevent a decrease in contrast ratio due to light leakage from the gap between the two. Furthermore, since the present invention uses a self-alignment method, it is possible to minimize the black matrix portion and increase the area of the pixel portion, making it possible to provide a color filter capable of displaying bright colors. .
第１図（ａ）〜（ｅ）は本発明のカラーフィルターの製
造プロセスを示す図。
１・・・ガラス基板
２・・・透明電極
３・・・無電解ニッケルメッキ膜
４・・・光硬化性樹脂
実施例１，３はブラック顔料含む
５・・・ミセル電解法によって形成された顔料層以
上
出願人 セイコーエプソン株式会社
代理人 弁理士 銘木 喜三部 他１名第１図FIGS. 1(a) to 1(e) are diagrams showing the manufacturing process of the color filter of the present invention. 1... Glass substrate 2... Transparent electrode 3... Electroless nickel plating film 4... Photocurable resin Examples 1 and 3 contain black pigment 5... Pigment formed by micelle electrolysis method layer below
Applicant Seiko Epson Co., Ltd. Agent Patent attorney Kisanbe Meiki and 1 other person Figure 1
Claims (1)
すま間にブラック層を有するブラックマトリックスカラ
ーフィルターにおいて、Ｒ，Ｇ，Ｂ層は電解ミセル法で
、ブラックマスク部はフォト法で形成したことを特徴と
するカラーフィルター。 ２）請求項１記載のカラーフィルターにおいて、ブラッ
クマスク部が染色法により形成されたことを特徴とする
カラーフィルター。 ３）請求項１において、ブラックマス ク部が顔料を含む光硬化タイプの感光性樹脂であること
を特徴とするカラーフィルター。 ４）請求項１記載のカラーフィルターにおいて、そのブ
ラック層の形成方法において、透明基板上にあらかじめ
所定のパターンに形成された透明電極にメッキにより金
属膜を形成した後、遮光材料を含むネガレジストをコー
ティングし、該透明基板の逆側からＵ．Ｖ．露光し、現
像することで透明電極間にブラック層を形成することを
特徴とするカラーフィルターの製造方法。[Claims] 1) In a black matrix color filter having a black layer between three R, G, and B color layers divided into three on a transparent electrode, the R, G, and B layers are formed by an electrolytic micelle method, A color filter characterized by the black mask part being formed using a photo method. 2) The color filter according to claim 1, wherein the black mask portion is formed by a dyeing method. 3) The color filter according to claim 1, wherein the black mask portion is a photocuring type photosensitive resin containing a pigment. 4) In the color filter according to claim 1, in the method for forming the black layer, a metal film is formed by plating on a transparent electrode formed in a predetermined pattern on a transparent substrate, and then a negative resist containing a light-shielding material is applied. coating, and applying U.sub. from the opposite side of the transparent substrate. V. A method for producing a color filter, characterized by forming a black layer between transparent electrodes by exposing and developing.
Priority Applications (6)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1004038A JPH02184803A (en) | 1989-01-11 | 1989-01-11 | Color filter and production thereof |
| EP19890304234 EP0340968A3 (en) | 1988-04-30 | 1989-04-27 | Thin film device and method of manufacturing the same |
| KR1019890005597A KR900016364A (en) | 1988-04-30 | 1989-04-28 | Thin film former and manufacturing method thereof |
| US07/714,817 US5240797A (en) | 1988-04-30 | 1991-06-13 | Thin film device and method of manufacture |
| US07/714,970 US5395678A (en) | 1988-04-30 | 1991-06-13 | Thin film color filter for liquid crystal display |
| US07/724,000 US5242558A (en) | 1988-04-30 | 1991-07-01 | Method for forming a thin film device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1004038A JPH02184803A (en) | 1989-01-11 | 1989-01-11 | Color filter and production thereof |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH02184803A true JPH02184803A (en) | 1990-07-19 |
Family
ID=11573789
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1004038A Pending JPH02184803A (en) | 1988-04-30 | 1989-01-11 | Color filter and production thereof |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH02184803A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH03102302A (en) * | 1989-09-18 | 1991-04-26 | Idemitsu Kosan Co Ltd | Color filter and production thereof |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS63144390A (en) * | 1986-12-08 | 1988-06-16 | セイコーインスツルメンツ株式会社 | Manufacture of display device |
| JPS63243298A (en) * | 1987-03-31 | 1988-10-11 | Idemitsu Kosan Co Ltd | Production of organic thin film |
-
1989
- 1989-01-11 JP JP1004038A patent/JPH02184803A/en active Pending
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS63144390A (en) * | 1986-12-08 | 1988-06-16 | セイコーインスツルメンツ株式会社 | Manufacture of display device |
| JPS63243298A (en) * | 1987-03-31 | 1988-10-11 | Idemitsu Kosan Co Ltd | Production of organic thin film |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH03102302A (en) * | 1989-09-18 | 1991-04-26 | Idemitsu Kosan Co Ltd | Color filter and production thereof |
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