JPS63231315A - Formation of light shielding film - Google Patents
Formation of light shielding filmInfo
- Publication number
- JPS63231315A JPS63231315A JP62064741A JP6474187A JPS63231315A JP S63231315 A JPS63231315 A JP S63231315A JP 62064741 A JP62064741 A JP 62064741A JP 6474187 A JP6474187 A JP 6474187A JP S63231315 A JPS63231315 A JP S63231315A
- Authority
- JP
- Japan
- Prior art keywords
- light
- shielding film
- electrodes
- glass substrate
- base material
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 230000015572 biosynthetic process Effects 0.000 title 1
- 239000000758 substrate Substances 0.000 claims abstract description 28
- 239000011521 glass Substances 0.000 claims abstract description 19
- 239000000463 material Substances 0.000 claims abstract description 9
- 239000010408 film Substances 0.000 claims description 33
- 229910052751 metal Inorganic materials 0.000 claims description 14
- 239000002184 metal Substances 0.000 claims description 14
- 239000010409 thin film Substances 0.000 claims description 14
- 238000000034 method Methods 0.000 claims description 5
- 239000003086 colorant Substances 0.000 claims description 2
- 238000007772 electroless plating Methods 0.000 abstract description 2
- 239000011248 coating agent Substances 0.000 abstract 1
- 238000000576 coating method Methods 0.000 abstract 1
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 2
- 238000007796 conventional method Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 239000004973 liquid crystal related substance Substances 0.000 description 2
- 238000004544 sputter deposition Methods 0.000 description 2
- 238000007740 vapor deposition Methods 0.000 description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 239000011651 chromium Substances 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000004043 dyeing Methods 0.000 description 1
- 238000004070 electrodeposition Methods 0.000 description 1
- 238000009713 electroplating Methods 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 229910052763 palladium Inorganic materials 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 238000000059 patterning Methods 0.000 description 1
- 238000000206 photolithography Methods 0.000 description 1
- 239000000049 pigment Substances 0.000 description 1
- 238000007639 printing Methods 0.000 description 1
Landscapes
- Optical Filters (AREA)
- Liquid Crystal (AREA)
Abstract
Description
【発明の詳細な説明】
（イ〉産業上の利用分野
本発明は液晶表示装置に使用される遮光膜の形成方法に
関し、特に分離された電極間を遮光するための遮光膜の
形成方法に関する。DETAILED DESCRIPTION OF THE INVENTION (A) Field of Industrial Application The present invention relates to a method of forming a light shielding film used in a liquid crystal display device, and more particularly to a method of forming a light shielding film for shielding light between separated electrodes.
（ロ）従来の技術
従来の遮光膜形成方法は、第３図Ａ及びＢに示す如く、
ガラス基板（１０）（１１）上に列又は行方向の細長い
しま状の透明電極（１２）（１３）を形成し、透明電極
（１２）（１３）上には透明電極（１２）（１３）を分
割する遮光膜（１４）（１５）を形成する。遮光膜（１
４）（１５）はクロムやパラジウムやニッケルが用いら
れ、蒸着やスパッタ或は電気メッキで行われ、ホトリソ
グラフィやマスク蒸着によってパ久・−ニングされる。(B) Prior art The conventional method for forming a light shielding film is as shown in FIGS. 3A and 3B.
Elongated striped transparent electrodes (12) (13) are formed on the glass substrates (10) (11) in the column or row direction, and transparent electrodes (12) (13) are formed on the transparent electrodes (12) (13). A light shielding film (14) (15) is formed to divide the area. Light shielding film (1
4) (15) uses chromium, palladium, or nickel, and is performed by vapor deposition, sputtering, or electroplating, and is permanent by photolithography or mask vapor deposition.
次に第３図Ｃに示す如く、第３図Ａ及び第３図Ｂに示さ
れたガラス基板（１０）（１１）を対向配置する。画素
（１６）間のすき間（１７）は、第３図Ａの電極すき間
（１８）に相当し、第３図Ｂの遮光膜（１５）により遮
光され、すき間（１９）は、第３図Ｂ０′）電極すき間
（２０〉に相当し、第３図Ａの遮光膜（１４）により遮
光される。Next, as shown in FIG. 3C, the glass substrates (10) and (11) shown in FIGS. 3A and 3B are placed facing each other. The gap (17) between the pixels (16) corresponds to the electrode gap (18) in FIG. 3A, and is shielded from light by the light shielding film (15) in FIG. 3B, and the gap (19) corresponds to the electrode gap (18) in FIG. 3B. ') Corresponds to the electrode gap (20>) and is shielded from light by the light shielding film (14) in FIG. 3A.
（ハ）発明が解決しようとする問題点
しかしながら、従来の遮光膜の形成方法では、画素の４
隅の部分は空間となり遮光されずそこから光が漏れ表示
に悪影響を与える問題点があった。(c) Problems to be solved by the invention However, in the conventional method of forming a light-shielding film,
There was a problem in that the corners were empty spaces and were not blocked by light, which caused light to leak and adversely affect the display.
また、遮光膜を形成するために遮光膜専用のマスクが必
要であると共に電極のすき間に遮光膜が配置する様に組
立てなければならず、位置ズレが発生した場合、画素領
域と遮光膜とが交差し画素に悪影響を与える問題点があ
った。Furthermore, in order to form the light-shielding film, a mask dedicated to the light-shielding film is required, and the assembly must be arranged so that the light-shielding film is placed between the electrodes, and if positional misalignment occurs, the pixel area and the light-shielding film may There was a problem in that they intersected and had a negative effect on the pixels.
（二〉問題点を解決するための手段
本発明は上述した問題点に鑑みて為されたものであり、
先ず第１図Ａに示す如く、透明ガラス基板（１）上に複
数の透明電極（２）を形成し、次に第１図Ｂに示す如く
、複数の透明電極り２）上に黒色の金属薄膜（３）を形
成し、次に第１図Ｃに示す如く、ガラス基板（１）全面
に黒色の感光性基材（４）を塗布した後、ガラス基板（
１）の裏面から露光し、透明電極（２〉間に遮光膜（４
′）を形成して解決する。(2) Means for solving the problems The present invention has been made in view of the above-mentioned problems,
First, as shown in FIG. 1A, a plurality of transparent electrodes (2) are formed on a transparent glass substrate (1), and then, as shown in FIG. 1B, a black metal is formed on a plurality of transparent electrodes (2). After forming a thin film (3) and then applying a black photosensitive substrate (4) to the entire surface of the glass substrate (1) as shown in FIG.
1) is exposed to light from the back side, and a light-shielding film (4) is placed between the transparent electrodes (2).
′) and solve it.
（ホ）作用
以上の如く、本発明に依れば、ガラス基板（１）に透明
電極（２）を形成し、透明電極（２）上に黒色の金属薄
膜（３）を形成し、ガラス基板（１）全面に感光性基材
（４）を塗布し、ガラス基板（１）の裏面から露光する
ことにより、金属薄膜〈３）がマスクとなり、専用のマ
スクを用いることなくセルファライニングで遮光膜（４
′）を形成することができる。(E) Function As described above, according to the present invention, a transparent electrode (2) is formed on a glass substrate (1), a black metal thin film (3) is formed on the transparent electrode (2), and a black metal thin film (3) is formed on the glass substrate (1). (1) By applying a photosensitive substrate (4) to the entire surface and exposing it to light from the back side of the glass substrate (1), the metal thin film (3) becomes a mask, and a light-shielding film is formed using Selfa lining without using a special mask. (4
′) can be formed.
（へ〉実施例
以下に図面に示した実施例に基づいて本発明の詳細な説
明する。(F) Example The present invention will be described in detail below based on the example shown in the drawings.
第１図Ａ乃至第１図りは本発明の遮光膜の製造方法であ
る。FIGS. 1A to 1D illustrate a method for manufacturing a light-shielding film of the present invention.
先ず第１図Ａに示す如く、透明なガラス基板（１）上に
透明電極ＣＩＴＯ膜）をスパッタリング等で塗布し、Ｉ
ＴＯ膜を所望の形状即ち、表示パターン及びリードパタ
ーンにパターニングして複数の透明電極（２）を形成す
る。First, as shown in FIG. 1A, a transparent electrode CITO film (CITO film) is coated on a transparent glass substrate (1) by sputtering, etc.
A plurality of transparent electrodes (2) are formed by patterning the TO film into a desired shape, that is, a display pattern and a lead pattern.
次に第１図Ｂに示す如く、透明電極（２）上に黒色の金
属薄膜（３）を形成する。金属薄膜（３）は透明電極（
２）の表示パターン以外の領域を遮光するために形成す
るものであり、ここでは無電解メッキにより、透明電極
（２）のみに金属薄膜（３）が付着し形成される。Next, as shown in FIG. 1B, a black metal thin film (3) is formed on the transparent electrode (2). The metal thin film (3) is a transparent electrode (
It is formed to shield areas other than the display pattern 2) from light, and here the metal thin film (3) is formed by adhering only to the transparent electrode (2) by electroless plating.
次に第１図Ｃに示す如く、ガラス基板（１）全面に黒色
のネガ型感光性基材（４）を塗布する。感光性基材（４
）は黒色にするために黒色素、例えばカーボン粒子等が
混入されている。又、カラーフィルタ用の基材を用いた
場合は、後で黒色に染色する。感光性基材（４）を塗布
した後、ガラス基板（１）の裏面から平行光線（５）を
照射して露光する。露光すると感光性基材（４）はネガ
型であるため、金属薄膜（３）によって平行光線（５）
が当らない部分が感光きれないので、その部分が現像時
に除去されて第１図りの如く、透明電極（２）間に遮光
膜（４゛）が形成される。この際カラーフィルタ用の感
光性基材を用いた場合は黒色に染色する。透明電極（２
）上の表示部分となるところの金属薄膜（３〉は除去さ
れ表示パターンが形成される。Next, as shown in FIG. 1C, a black negative type photosensitive substrate (4) is applied to the entire surface of the glass substrate (1). Photosensitive base material (4
) is mixed with black pigment, such as carbon particles, to make it black. Moreover, when a base material for a color filter is used, it is dyed black later. After applying the photosensitive substrate (4), parallel light beams (5) are irradiated from the back surface of the glass substrate (1) for exposure. When exposed to light, since the photosensitive substrate (4) is negative type, parallel light rays (5) are exposed by the metal thin film (3).
Since the areas that are not exposed to the light are not fully exposed, these areas are removed during development and a light-shielding film (4') is formed between the transparent electrodes (2) as shown in the first diagram. At this time, when a photosensitive substrate for color filters is used, it is dyed black. Transparent electrode (2
) is removed to form a display pattern.
この様に透明電極（２）上に形成した金属薄膜（３）を
遮光膜（４′）を形成する際のマスクとして利用するこ
とにより、従来の如き、遮光膜を形成する際の専用のマ
スクを必要としないと共にセルファライニングにより露
光のズレ等が生じないものである。In this way, by using the metal thin film (3) formed on the transparent electrode (2) as a mask when forming the light-shielding film (4'), it is possible to use a special mask when forming the light-shielding film as in the past. In addition, self-lining does not require exposure misalignment.
次に本発明を用いたインターデジタル形状のマルチカラ
ーの液晶表示パネル（以下ＬＣＤとする）について簡単
に説明する。Next, an interdigital multicolor liquid crystal display panel (hereinafter referred to as LCD) using the present invention will be briefly described.
第２図はガラス基板上に形成された櫛歯状に嵌合した共
通電極（５）（６）を示す要部拡大図であり、この共通
電極（５）（６）上には夫々異なった色の着色膜が形成
されるが表示パターン以外が遮光されたＬＣＤの着色膜
間の空間領域（７）を遮光する場合、第１図Ａ乃至第１
図りの方法で透明電極間に遮光膜を形成し、第１図Ｂで
形成した共通電極の表示パターン部分となる共通電極（
５）（６）上の金属薄膜をエツチング除去し、共通電極
（５）＜６）上に電着、染色、あるいは印刷により着色
膜を形成することにより、マルチカラーのＬＣＤを形成
することができる。Figure 2 is an enlarged view of the main parts showing the common electrodes (5) and (6) formed on the glass substrate and fitted in a comb-like shape. In the case of shielding the spatial region (7) between the colored films of an LCD in which colored films are formed but light is shielded except for the display pattern, FIGS.
A light shielding film is formed between the transparent electrodes by the method shown in the figure, and the common electrode (which becomes the display pattern part of the common electrode formed in FIG. 1B)
5) A multicolor LCD can be formed by etching away the metal thin film on (6) and forming a colored film on the common electrode (5) < 6) by electrodeposition, dyeing, or printing. .
この様に共通電極間に遮光膜を形成することにより、光
の漏れを防止できカラー色が淡く見えることなくカラー
表示を行うことができる。By forming a light-shielding film between the common electrodes in this way, light leakage can be prevented and color display can be performed without colors appearing pale.
（ト〉発明の効果
以上に詳述した如く、本発明に依れば、透明電極上に金
属薄膜を形成し、金属薄膜上に感光性基材を塗布し、ガ
ラス基板の裏面から露光し透明電極間に遮光膜を形成す
ることにより７．従来の如き、遮光膜を形成する専用マ
スクを必要としないと共にセルファライニングにより確
実に位置ズレの無い遮光膜を形成することができる。(G) Effects of the Invention As described in detail above, according to the present invention, a metal thin film is formed on a transparent electrode, a photosensitive base material is coated on the metal thin film, and the glass substrate is exposed to light from the back side to make it transparent. By forming a light-shielding film between the electrodes, 7. There is no need for a dedicated mask for forming a light-shielding film as in the past, and a light-shielding film can be reliably formed without any positional shift by self-lining.
第１図Ａ乃至第１図りは本発明の実施例を示す断面図、
第２図は他の実施例を示す要部拡大図、第３図Ａ乃至第
３図Ｃは従来例を示す断面図である。
（１）はガラス基板、 （２）は透明電極、 （３〉
は金属薄膜、 （４）は感光性基材、 （４′）は遮光
膜。FIG. 1A to the first drawing are cross-sectional views showing embodiments of the present invention;
FIG. 2 is an enlarged view of main parts showing another embodiment, and FIGS. 3A to 3C are sectional views showing a conventional example. (1) is a glass substrate, (2) is a transparent electrode, (3)
is a metal thin film, (4) is a photosensitive substrate, and (4') is a light-shielding film.
Claims (1)
数色からなる着色層間を遮光する遮光膜の形成方法にお
いて、前記ガラス基板上に複数の透明電極を形成し、前
記透明電極上に黒色の金属薄膜を形成し、前記ガラス基
板全面に黒色の感光性基材を塗布した後、前記ガラス基
板の裏面から露光して前記透明電極間に遮光膜を形成す
ることを特徴とする遮光膜の形成方法。(1) In a method for forming a light-shielding film that blocks light between colored layers of a plurality of colors formed on a plurality of transparent electrodes on a glass substrate, a plurality of transparent electrodes are formed on the glass substrate, and a plurality of transparent electrodes are formed on the transparent electrode. A light-shielding film characterized in that a black metal thin film is formed, a black photosensitive base material is applied to the entire surface of the glass substrate, and then the glass substrate is exposed to light from the back side to form a light-shielding film between the transparent electrodes. How to form.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP62064741A JPS63231315A (en) | 1987-03-19 | 1987-03-19 | Formation of light shielding film |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP62064741A JPS63231315A (en) | 1987-03-19 | 1987-03-19 | Formation of light shielding film |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS63231315A true JPS63231315A (en) | 1988-09-27 |
Family
ID=13266881
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP62064741A Pending JPS63231315A (en) | 1987-03-19 | 1987-03-19 | Formation of light shielding film |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS63231315A (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5419991A (en) * | 1991-12-19 | 1995-05-30 | Sony Corporation | Method of manufacturing a liquid crystal display |
| EP0735402A1 (en) * | 1995-03-29 | 1996-10-02 | Seiko Instruments Inc. | Method of manufacturing a multicolor liquid-crystal display unit |
| WO1996036903A1 (en) * | 1995-05-16 | 1996-11-21 | Citizen Watch Co., Ltd. | Liquid crystal display, method of manufacturing active substrate, and method of manufacturing color filter substrate |
-
1987
- 1987-03-19 JP JP62064741A patent/JPS63231315A/en active Pending
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5419991A (en) * | 1991-12-19 | 1995-05-30 | Sony Corporation | Method of manufacturing a liquid crystal display |
| EP0735402A1 (en) * | 1995-03-29 | 1996-10-02 | Seiko Instruments Inc. | Method of manufacturing a multicolor liquid-crystal display unit |
| WO1996036903A1 (en) * | 1995-05-16 | 1996-11-21 | Citizen Watch Co., Ltd. | Liquid crystal display, method of manufacturing active substrate, and method of manufacturing color filter substrate |
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