JPS62253123A - Manufacture of electrode substrate for liquid crystal device - Google Patents

Abstract

PURPOSE:To improve the precision of the formation of a light shield film at any time by exposing photoresist on the top surface side of a transparent substrate from the reverse surface side, performing development and a leaving the exposed part, and dyeing the remaining photoresist and forming the light shield film. CONSTITUTION:An electrode 12 formed of a transparent electrode material whose surface is coated with an opaque film 13 is formed on one surface of the transparent substrate 11 and the surface of the transparent substrate 11 where the electrode 12 is formed is coated with the negative type photoresist 14 which can be dyed uniformly. Then, the photoresist 14 is exposed from the other surface side of the transparent substrate 11. In this case, the photoresist 14 arranged between adjacent electrodes 12 is exposed to an irradiation light beam and then affected to cure, but the other part of the photoresist 14 is shielded by the opaque chromium film 13 form the light beam and not exposed. Then, the development is carried out to leave the photoresist 14 at the exposed part, and the remaining photoresist 14 is dyed to form the light shield film 15; and the opaque film 13 is removed to expose the electrodes. Thus, the light shield film is formed at a no-electrode part at any time.

Description

DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a method of manufacturing an electrode substrate for a liquid crystal device used in a transmission type liquid crystal display device for televisions, a liquid crystal light shutter for an electrophotographic printer, and the like.

[Technical background of the invention and its problems]

Recently, for example, in liquid crystal display devices for televisions, especially color liquid crystal display devices, a light-shielding film has been applied to the non-electrode portions of the transparent substrate in order to suppress the leakage of light from the non-electrode portions and improve the display contrast of images. It is becoming increasingly common to form

In other words, the liquid crystal does not operate in non-electrode areas such as areas between adjacent electrodes, and light leaks from these non-electrode areas.
There is a problem that display contrast deteriorates, and as a countermeasure to this problem, a light shielding film is formed on the non-electrode portion to prevent light leakage. In particular, for color liquid crystal display devices, a method of forming a light shielding film using a color filter has been proposed.

FIG. 5 shows the process of forming a light-shielding film using the color filter described above. First, electrodes 2 made of a transparent conductive material are arranged in stripes on one surface (upper surface) of a transparent substrate 1 (step a). . Then, a dyeable negative type photoresist 3 such as casein is uniformly applied onto the transparent substrate 1 (step b). Next, a patterning mask 4 is placed on this transparent substrate 1. This patterning mask 4
The same pattern 5 as the electrode 2 is formed on one surface (lower surface) of chromium, emulsion, or the like. Then, the pattern 5 of this patterning mask 4 and the electrode 2 of the transparent substrate 1 are aligned, and in this state, the patterning mask 4
Parallel light such as ultraviolet rays is irradiated from above (Step C).

At this time, part of the irradiated light beam is blocked by the pattern 5, and the other part is the empty space (window) between the patterns 5.
The coating surface of the photoresist 3 is reached through the photoresist 3, and therefore only this portion, that is, the photoresist 3 disposed between adjacent electrodes 2, is exposed, changed in quality, and hardened. After this,
Develop the photoresist 3 (step d). Through this development process, only the exposed portion of the negative type photoresist 3 remains on the transparent substrate 1, and the other portion is removed. The photoresist 3 remaining on the transparent substrate 1 is then dyed with black dye (step e). As a result, a light-shielding film, that is, a black stripe 3a, is formed between adjacent electrodes 2.

Note that in the case of a scanning electrode substrate for a color liquid crystal display, this step e is completed, and in the case of a signal electrode substrate, this step e is completed.
Next, red, green, and blue color filter layers 6a, 6b, and 6c are sequentially and alternately formed on the electrode 2 (step f).

However, such a conventional manufacturing method requires a device and troublesome work to align the pattern 5 of the patterning mask 4 and the electrode 2 of the transparent substrate 1, which complicates the process and reduces manufacturing efficiency. In addition, there is a problem in that unless the accuracy of alignment is always maintained accurately, an inappropriate light-shielding film (black stripe 3a) will be formed.

Such problems occur particularly in liquid crystal devices such as those for televisions in which the gap width between adjacent electrodes is as narrow as 10 to 30 μm.

[Purpose of the invention]

This invention was made with attention to these points, and its purpose is to form a light-shielding film on non-electrode parts easily, efficiently, and always accurately by omitting the process of patterning mask alignment. An object of the present invention is to provide a method for manufacturing an electrode substrate for a liquid crystal device, which enables the following.

[Summary of the invention]

That is, in this invention, electrodes made of a transparent conductive material whose surfaces are coated with an opaque film are arranged and formed on one surface of a transparent substrate, and electrodes are uniformly formed on the surface of the transparent substrate on which the electrodes are formed. A negative type photoresist that can be dyed is applied to the substrate, the photoresist is exposed to light from the other side of the transparent substrate, and developed to leave the photoresist in the exposed area.The remaining photoresist is dyed to form a light-shielding film. The opaque film is then removed to expose the electrodes.

[Embodiments of the invention]

Hereinafter, one embodiment of the present invention will be described with reference to FIGS. 1 to 4.

In FIG. 1, 11 is a transparent substrate, and this transparent substrate 11
A layer of a transparent conductive material made of indium oxide, tin oxide, etc. and an opaque material such as chromium are formed on one surface (upper surface) of the substrate, and then a strip of transparent conductive material is formed by pattern etching. Live electrode 12
is formed with a chromium film 13 adhered to its surface (step a). Then, on this transparent substrate 11, a negative type photoresist 14 that can be dyed with casein or the like is uniformly applied.
is applied and dried (step b). Next, the transparent substrate 11
The photoresist 14 is exposed by irradiating parallel light such as ultraviolet light from below (Step C).

At this time, photoresist 1 placed between adjacent electrodes 12
The photoresist 14 in other parts is exposed to the irradiation light and is changed and hardened, but the photoresist 14 in other parts is exposed to the chromium film 13.
It is not exposed because it is blocked by Thereafter, the photoresist 14 is developed (step d). Through this development process, only the exposed portion of the negative type photoresist 14 located between adjacent electrodes 12 remains as a light-shielding film base 14a, and the other portions are removed.

After the light-shielding film base 14a is thus formed between adjacent electrodes 2, the light-shielding film base 14a is dyed with black dye to form a light-shielding film, that is, a black stripe 15 (step e). Then, the chromium g! deposited on the electrode 6-12! 13 is removed by etching to expose the electrode 12 (step f). In addition,
If it is desired to leave chromium 1113 on the lead portion of the electrode 12, etc., that portion may be covered with photoresist and etched in this state.

In the scanning electrode substrate for color liquid crystal display, the manufacturing process is completed in step f, and in the signal electrode substrate, after step f, each electrode 12 is divided into groups for each dynasty, and the electrodes in each group are Red, green, and blue color filter layers 16a, 16b, and 16c are alternately formed on the color filter layer 12 (step 0). In addition,
In the case of signal electrode substrates for monochrome liquid crystal displays,
■End at step f.

Next, the step of forming the color filter layer in step Q will be described with reference to FIG. 2. First, a dyeable negative type photoresist 21 is uniformly coated on the transparent substrate 11 on which the above step f has been completed (step a), and then a patterning mask 22 is placed on this photoresist 21. A portion of the photoresist 21 corresponding to the red electrode 12 is exposed (step b), and then the photoresist 21 is developed to leave the filter base 21a on the red electrode 12 and remove the rest (step C). > Then, the filter base 21a is dyed with red dye and then subjected to resist dyeing treatment to form a red color filter layer 16a (step d).
.

Next, the same process is repeated to form a green color filter layer 16b on the green electrode 12, and the same process is further repeated to form a blue color filter layer 16c on the blue electrode 12. do.

3 and 4 show a color liquid crystal display device constructed by scanning electrode substrate A and signal electrode substrate B manufactured in the above manufacturing process. Each electrode 12 of scanning electrode substrate A and signal electrode The respective electrodes 12 of the substrate B are arranged facing each other so as to be orthogonal to each other, and each intersection portion constitutes a dot portion for controlling light transmission. A black stripe 15 as a light-shielding film is located on the outer periphery of this dot portion C, so that the black stripe 15 reliably suppresses light leakage. Although not shown, an alignment film is formed on the inner surface of each substrate A, B.
The liquid crystals filled between the substrates are oriented in TN orientation, and polarizing plates are arranged parallel to each other on the outer surface of each substrate A and B, respectively.

Incidentally, in the above embodiment, a conductive chromium film is applied as an opaque covering layer on the electrode, but it is not limited to a chromium film, but a film made of other conductive materials or a film made of an insulating material may be used. You can. Furthermore, the present invention can be applied not only to the production of electrode substrates for liquid crystal display devices for televisions, but also to the production of electrode substrates for liquid crystal light shutters of electrophotographic printers. .

(Effects of the Invention) As explained above, according to the present invention, a light shielding film can be easily and efficiently formed on a non-electrode portion by omitting the troublesome process of aligning the pattern of a patterning mask with the electrode of a transparent substrate. Moreover, the formation accuracy of the light-shielding film can always be maintained at a good level based on the opaque coating layer provided on the electrode.

[Brief explanation of drawings]

FIG. 1 is a cross-sectional view sequentially showing the manufacturing process of an electrode substrate according to an embodiment of the present invention, FIG. 2 is a cross-sectional view sequentially showing the process of forming a color filter layer, and FIG. FIG. 4 is a perspective view schematically showing a state in which a color liquid crystal display device is constructed using electrode substrates obtained in the manufacturing process, FIG. 4 is a plan view, and FIG. . DESCRIPTION OF SYMBOLS 11... Transparent substrate, 12... Electrode, 13... Chrome film (coating layer), 14... Photoresist, 15...
・Black stripe (light shielding) Applicant's representative Patent attorney Takehiko Suzue (a) (d) (e) (f) 5th vA

Claims (1)

[Claims] A negative type in which electrodes made of a transparent conductive material whose surface is coated with an opaque film are arranged on one side of a transparent substrate, and the surface of the transparent substrate on which these electrodes are formed can be uniformly dyed. Apply a photoresist of A method for manufacturing an electrode substrate for a liquid crystal device, which comprises subsequently removing the opaque film to expose the electrodes.