JP1624353S - - Google Patents

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Publication number
JP1624353S
JP1624353S JPD2018-15809F JP2018015809F JP1624353S JP 1624353 S JP1624353 S JP 1624353S JP 2018015809 F JP2018015809 F JP 2018015809F JP 1624353 S JP1624353 S JP 1624353S
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JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
JPD2018-15809F
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
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Publication date
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Priority to JPD2018-15809F priority Critical patent/JP1624353S/ja
Priority to TW107306663F priority patent/TWD197466S/zh
Priority to US29/672,222 priority patent/USD924823S1/en
Application granted granted Critical
Publication of JP1624353S publication Critical patent/JP1624353S/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

JPD2018-15809F 2018-07-19 2018-07-19 Active JP1624353S (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JPD2018-15809F JP1624353S (ja) 2018-07-19 2018-07-19
TW107306663F TWD197466S (zh) 2018-07-19 2018-11-12 基板處理裝置用隔熱板
US29/672,222 USD924823S1 (en) 2018-07-19 2018-12-04 Adiabatic plate for substrate processing apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JPD2018-15809F JP1624353S (ja) 2018-07-19 2018-07-19

Publications (1)

Publication Number Publication Date
JP1624353S true JP1624353S (ja) 2019-02-12

Family

ID=65269381

Family Applications (1)

Application Number Title Priority Date Filing Date
JPD2018-15809F Active JP1624353S (ja) 2018-07-19 2018-07-19

Country Status (3)

Country Link
US (1) USD924823S1 (ja)
JP (1) JP1624353S (ja)
TW (1) TWD197466S (ja)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
USD971192S1 (en) * 2019-06-03 2022-11-29 Space Exploration Technologies Corp. Antenna apparatus
USD976242S1 (en) 2019-06-03 2023-01-24 Space Exploration Technologies Corp. Antenna apparatus
USD971900S1 (en) 2019-06-03 2022-12-06 Space Exploration Technologies Corp. Antenna apparatus
USD966276S1 (en) 2019-07-29 2022-10-11 Samsung Display Co., Ltd. Display module for wearable device
USD940131S1 (en) * 2019-07-29 2022-01-04 Samsung Display Co., Ltd. Display panel
USD958094S1 (en) 2019-07-29 2022-07-19 Samsung Display Co., Ltd. Display panel
TWI735115B (zh) * 2019-12-24 2021-08-01 力成科技股份有限公司 晶圓儲存裝置及晶圓承載盤
USD962206S1 (en) * 2020-01-09 2022-08-30 Space Exploration Technologies Corp. Antenna apparatus
JP1700781S (ja) 2021-03-22 2021-11-29
JP1730244S (ja) * 2021-12-21 2022-11-21 フレキシブルプリント基板

Family Cites Families (28)

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Publication number Priority date Publication date Assignee Title
JPH0785919B2 (ja) * 1990-11-30 1995-09-20 ソマール株式会社 断熱板
US5088006A (en) * 1991-04-25 1992-02-11 International Business Machines Corporation Liquid film interface cooling system for semiconductor wafer processing
USD359476S (en) * 1993-08-06 1995-06-20 Sankyo Seiki Mfg. Co., Ltd. Circuit board with mounting flange
USD404374S (en) * 1997-08-20 1999-01-19 Tokyo Electron Limited Fin for use in a semiconductor wafer heat processing apparatus
US6783299B2 (en) * 1999-07-26 2004-08-31 Ovadia Meron Latch for detachably attaching and mounting a semiconductor wafer to a support ring
US6631935B1 (en) * 2000-08-04 2003-10-14 Tru-Si Technologies, Inc. Detection and handling of semiconductor wafer and wafer-like objects
WO2004049430A1 (ja) * 2002-11-26 2004-06-10 Disco Corporation 複数枚の半導体ウエーハを収容するためのカセット
US7329947B2 (en) * 2003-11-07 2008-02-12 Sumitomo Mitsubishi Silicon Corporation Heat treatment jig for semiconductor substrate
USD547147S1 (en) * 2006-09-01 2007-07-24 Huy Tran Window tinting tool
JP4748193B2 (ja) * 2008-09-01 2011-08-17 ソニー株式会社 非水電解質二次電池の絶縁板、非水電解質二次電池および非水電解質二次電池の絶縁板の製造方法
USD616392S1 (en) * 2009-03-06 2010-05-25 Tokyo Electron Limited Heat radiation fin of heat insulating cylinder for manufacturing semiconductor wafers
JP1441120S (ja) * 2010-08-17 2015-05-11
USD654883S1 (en) * 2010-10-21 2012-02-28 Tokyo Electron Limited Top plate for reactor for manufacturing semiconductor
USD654884S1 (en) * 2010-10-21 2012-02-28 Tokyo Electron Limited Top plate for reactor for manufacturing semiconductor
USD720309S1 (en) * 2011-11-18 2014-12-30 Tokyo Electron Limited Inner tube for process tube for manufacturing semiconductor wafers
TWD174921S (zh) * 2014-12-17 2016-04-11 日本碍子股份有限公司 複合基板之部分
KR102173376B1 (ko) * 2015-02-25 2020-11-03 가부시키가이샤 코쿠사이 엘렉트릭 기판 처리 장치, 히터 및 반도체 장치의 제조 방법
JP1568061S (ja) 2016-03-30 2017-01-30
USD843184S1 (en) * 2016-06-02 2019-03-19 David Harold Woodcock Cutting tool for adhesive tape dispensers
USD793352S1 (en) * 2016-07-11 2017-08-01 Asm Ip Holding B.V. Getter plate
USD804437S1 (en) * 2016-09-30 2017-12-05 Norton (Waterford) Limited Circuit board
WO2018096684A1 (ja) * 2016-11-28 2018-05-31 三菱電機株式会社 半導体ウエハ、半導体チップ、および半導体装置の製造方法
US10453713B2 (en) * 2016-11-29 2019-10-22 Taiwan Semiconductor Manufacturing Co., Ltd. Method for controlling temperature of furnace in semiconductor fabrication process
JP6770461B2 (ja) * 2017-02-21 2020-10-14 クアーズテック株式会社 縦型ウエハボート
JP6916413B2 (ja) * 2017-04-25 2021-08-11 株式会社島津製作所 電源一体型真空ポンプ
USD852763S1 (en) * 2017-08-31 2019-07-02 ebm-papst Lanshut GmbH Circuit board
US10861727B2 (en) * 2018-03-13 2020-12-08 Samsung Electronics Co., Ltd. Segmented vertical wafer boat
USD879730S1 (en) * 2018-12-18 2020-03-31 SiFive, Inc. Circuit board

Also Published As

Publication number Publication date
USD924823S1 (en) 2021-07-13
TWD197466S (zh) 2019-05-11

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