JP1615030S - - Google Patents

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Publication number
JP1615030S
JP1615030S JPD2017-24106F JP2017024106F JP1615030S JP 1615030 S JP1615030 S JP 1615030S JP 2017024106 F JP2017024106 F JP 2017024106F JP 1615030 S JP1615030 S JP 1615030S
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
JPD2017-24106F
Other languages
Japanese (ja)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
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Publication date
Application filed filed Critical
Application granted granted Critical
Publication of JP1615030S publication Critical patent/JP1615030S/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

JPD2017-24106F 2017-04-28 2017-10-30 Active JP1615030S (enrdf_load_stackoverflow)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US29/602,207 USD842259S1 (en) 2017-04-28 2017-04-28 Plasma chamber liner

Publications (1)

Publication Number Publication Date
JP1615030S true JP1615030S (enrdf_load_stackoverflow) 2018-10-01

Family

ID=63682182

Family Applications (1)

Application Number Title Priority Date Filing Date
JPD2017-24106F Active JP1615030S (enrdf_load_stackoverflow) 2017-04-28 2017-10-30

Country Status (3)

Country Link
US (1) USD842259S1 (enrdf_load_stackoverflow)
JP (1) JP1615030S (enrdf_load_stackoverflow)
TW (1) TWD192021S (enrdf_load_stackoverflow)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP1593817S (enrdf_load_stackoverflow) * 2017-03-28 2017-12-25
USD875055S1 (en) * 2017-04-28 2020-02-11 Applied Materials, Inc. Plasma connector liner
USD882536S1 (en) * 2017-04-28 2020-04-28 Applied Materials, Inc. Plasma source liner
USD875054S1 (en) * 2017-04-28 2020-02-11 Applied Materials, Inc. Plasma connector liner
USD875053S1 (en) * 2017-04-28 2020-02-11 Applied Materials, Inc. Plasma connector liner
JP1638504S (enrdf_load_stackoverflow) * 2018-12-06 2019-08-05
USD941787S1 (en) * 2020-03-03 2022-01-25 Applied Materials, Inc. Substrate transfer blade

Family Cites Families (27)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5846332A (en) * 1996-07-12 1998-12-08 Applied Materials, Inc. Thermally floating pedestal collar in a chemical vapor deposition chamber
US6170429B1 (en) * 1998-09-30 2001-01-09 Lam Research Corporation Chamber liner for semiconductor process chambers
US6364954B2 (en) * 1998-12-14 2002-04-02 Applied Materials, Inc. High temperature chemical vapor deposition chamber
US6234219B1 (en) * 1999-05-25 2001-05-22 Micron Technology, Inc. Liner for use in processing chamber
US20020069970A1 (en) * 2000-03-07 2002-06-13 Applied Materials, Inc. Temperature controlled semiconductor processing chamber liner
US7011039B1 (en) * 2000-07-07 2006-03-14 Applied Materials, Inc. Multi-purpose processing chamber with removable chamber liner
US7670688B2 (en) * 2001-06-25 2010-03-02 Applied Materials, Inc. Erosion-resistant components for plasma process chambers
US7972467B2 (en) * 2003-04-17 2011-07-05 Applied Materials Inc. Apparatus and method to confine plasma and reduce flow resistance in a plasma reactor
US20050229849A1 (en) * 2004-02-13 2005-10-20 Applied Materials, Inc. High productivity plasma processing chamber
US8236105B2 (en) * 2004-04-08 2012-08-07 Applied Materials, Inc. Apparatus for controlling gas flow in a semiconductor substrate processing chamber
USD583838S1 (en) 2007-09-19 2008-12-30 Riley Power, Inc. Grinding chamber side liner
US20090188625A1 (en) * 2008-01-28 2009-07-30 Carducci James D Etching chamber having flow equalizer and lower liner
JP5567392B2 (ja) * 2010-05-25 2014-08-06 東京エレクトロン株式会社 プラズマ処理装置
JP5837178B2 (ja) 2011-03-22 2015-12-24 アプライド マテリアルズ インコーポレイテッドＡｐｐｌｉｅｄ Ｍａｔｅｒｉａｌｓ，Ｉｎｃｏｒｐｏｒａｔｅｄ 化学気相堆積チャンバ用のライナアセンブリ
USD658691S1 (en) * 2011-03-30 2012-05-01 Tokyo Electron Limited Liner for plasma processing apparatus
USD658693S1 (en) * 2011-03-30 2012-05-01 Tokyo Electron Limited Liner for plasma processing apparatus
USD658692S1 (en) * 2011-03-30 2012-05-01 Tokyo Electron Limited Liner for plasma processing apparatus
USD678228S1 (en) * 2011-03-30 2013-03-19 Tokyo Electron Limited Chamber block
US8627796B2 (en) 2011-04-21 2014-01-14 Eaton Corporation Pivot foot for deactivating rocker arm
USD699692S1 (en) * 2012-01-19 2014-02-18 Applied Materials, Inc. Upper liner
CN107833848B (zh) 2013-04-30 2021-12-07 应用材料公司 具有空间分布的气体通道的气流控制衬垫
USD716239S1 (en) * 2013-11-06 2014-10-28 Applied Materials, Inc. Upper chamber liner
USD717746S1 (en) * 2013-11-06 2014-11-18 Applied Materials, Inc. Lower chamber liner
USD716240S1 (en) * 2013-11-07 2014-10-28 Applied Materials, Inc. Lower chamber liner
JP1546799S (enrdf_load_stackoverflow) * 2015-06-12 2016-03-28
JP1546801S (enrdf_load_stackoverflow) * 2015-06-12 2016-03-28
JP1564934S (enrdf_load_stackoverflow) * 2016-02-26 2016-12-05

Also Published As

Publication number Publication date
TWD192021S (zh) 2018-08-01
USD842259S1 (en) 2019-03-05

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