ITTO940006A0 - Procedimento per produrre un wafer di semiconduttore e corrispondente sistema. - Google Patents

Procedimento per produrre un wafer di semiconduttore e corrispondente sistema.

Info

Publication number
ITTO940006A0
ITTO940006A0 ITTO940006A ITTO940006A ITTO940006A0 IT TO940006 A0 ITTO940006 A0 IT TO940006A0 IT TO940006 A ITTO940006 A IT TO940006A IT TO940006 A ITTO940006 A IT TO940006A IT TO940006 A0 ITTO940006 A0 IT TO940006A0
Authority
IT
Italy
Prior art keywords
procedure
producing
semiconductor wafer
corresponding system
wafer
Prior art date
Application number
ITTO940006A
Other languages
English (en)
Inventor
Shinji Nagatsuka
Takeshi Kagamida
Original Assignee
Tokyo Seimitsu Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP05002867A external-priority patent/JP3119324B2/ja
Priority claimed from JP286593A external-priority patent/JP3116619B2/ja
Priority claimed from JP286893A external-priority patent/JP2917262B2/ja
Priority claimed from JP286693A external-priority patent/JP3119323B2/ja
Application filed by Tokyo Seimitsu Co Ltd filed Critical Tokyo Seimitsu Co Ltd
Publication of ITTO940006A0 publication Critical patent/ITTO940006A0/it
Publication of ITTO940006A1 publication Critical patent/ITTO940006A1/it
Application granted granted Critical
Publication of IT1267970B1 publication Critical patent/IT1267970B1/it

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67017—Apparatus for fluid treatment
    • H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B28—WORKING CEMENT, CLAY, OR STONE
    • B28D—WORKING STONE OR STONE-LIKE MATERIALS
    • B28D5/00—Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor
    • B28D5/0058—Accessories specially adapted for use with machines for fine working of gems, jewels, crystals, e.g. of semiconductor material
    • B28D5/0082—Accessories specially adapted for use with machines for fine working of gems, jewels, crystals, e.g. of semiconductor material for supporting, holding, feeding, conveying or discharging work
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
    • H01L21/67739—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations into and out of processing chamber
    • H01L21/6776—Continuous loading and unloading into and out of a processing chamber, e.g. transporting belts within processing chambers
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S156/00—Adhesive bonding and miscellaneous chemical manufacture
    • Y10S156/918—Delaminating processes adapted for specified product, e.g. delaminating medical specimen slide
    • Y10S156/93—Semiconductive product delaminating, e.g. delaminating emiconductive wafer from underlayer
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T156/00—Adhesive bonding and miscellaneous chemical manufacture
    • Y10T156/11—Methods of delaminating, per se; i.e., separating at bonding face
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T156/00—Adhesive bonding and miscellaneous chemical manufacture
    • Y10T156/11—Methods of delaminating, per se; i.e., separating at bonding face
    • Y10T156/1111—Using solvent during delaminating [e.g., water dissolving adhesive at bonding face during delamination, etc.]
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T83/00—Cutting
    • Y10T83/04—Processes
    • Y10T83/0448—With subsequent handling [i.e., of product]
    • Y10T83/0472—By moving work support to which a tacky product is adhered
IT94TO000006 1993-01-11 1994-01-10 Procedimento per produrre un wafer di semiconduttore e corrispondente sistema. IT1267970B1 (it)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
JP05002867A JP3119324B2 (ja) 1993-01-11 1993-01-11 ウェーハのスライスベースの剥離装置
JP286593A JP3116619B2 (ja) 1993-01-11 1993-01-11 半導体ウェーハの製造システム
JP286893A JP2917262B2 (ja) 1993-01-11 1993-01-11 半導体ウェーハの洗浄・乾燥装置
JP286693A JP3119323B2 (ja) 1993-01-11 1993-01-11 インゴットの搬送装置

Publications (3)

Publication Number Publication Date
ITTO940006A0 true ITTO940006A0 (it) 1994-01-10
ITTO940006A1 ITTO940006A1 (it) 1995-07-10
IT1267970B1 IT1267970B1 (it) 1997-02-20

Family

ID=27453733

Family Applications (1)

Application Number Title Priority Date Filing Date
IT94TO000006 IT1267970B1 (it) 1993-01-11 1994-01-10 Procedimento per produrre un wafer di semiconduttore e corrispondente sistema.

Country Status (4)

Country Link
US (1) US5427644A (it)
KR (1) KR100197090B1 (it)
DE (1) DE4400221C2 (it)
IT (1) IT1267970B1 (it)

Families Citing this family (27)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR0183513B1 (ko) * 1994-03-22 1999-04-15 오쯔보 히데오 웨이퍼 슬라이스 베이스 박리장치
JPH07323420A (ja) * 1994-06-02 1995-12-12 Tokyo Seimitsu Co Ltd ウェーハ製造方法及びその装置
JP2642317B2 (ja) * 1994-08-03 1997-08-20 ソマール株式会社 フィルム剥離方法及び装置
US6074442A (en) * 1994-10-28 2000-06-13 Shin-Etsu Handotai Co., Ltd. Method of separating slice base mounting member from wafer and jig adapted therefor
JP4220580B2 (ja) * 1995-02-10 2009-02-04 三菱電機株式会社 半導体装置の製造装置
DE19519460A1 (de) * 1995-05-26 1996-11-28 Wacker Siltronic Halbleitermat Drahtsäge und Verfahren zum Abtrennen von Scheiben von einem Werkstück
JPH0936080A (ja) * 1995-07-13 1997-02-07 Toray Eng Co Ltd 加工済シリコンインゴットの洗浄方法
US6006736A (en) * 1995-07-12 1999-12-28 Memc Electronic Materials, Inc. Method and apparatus for washing silicon ingot with water to remove particulate matter
US5950643A (en) * 1995-09-06 1999-09-14 Miyazaki; Takeshiro Wafer processing system
US5766369A (en) * 1995-10-05 1998-06-16 Texas Instruments Incorporated Method to reduce particulates in device manufacture
TW363903B (en) * 1996-03-11 1999-07-11 Memc Electronic Materials Spa Apparatus for use in automatically cleaning semiconductor wafers and methods for drying a semiconductor wafer in the automatic drying machine
EP0817246B1 (en) * 1996-06-24 2005-02-02 Interuniversitair Microelektronica Centrum Vzw Apparatus and method for wet cleaning or etching of flat substrates
DE69732392T8 (de) 1996-06-24 2006-04-27 Interuniversitair Microelectronica Centrum Vzw Vorrichtung und Verfahren zur Nassreinigung oder zum Ätzen eines flachen Substrats
EP0849772A1 (en) * 1996-12-20 1998-06-24 Interuniversitair Micro-Elektronica Centrum Vzw Apparatus and method for wet cleaning or etching of flat substrates
JPH11123658A (ja) * 1997-10-21 1999-05-11 Speedfam Co Ltd ドレッサ及びドレッシング装置
JPH11283942A (ja) * 1998-03-30 1999-10-15 Shin Etsu Handotai Co Ltd ウェーハの回収方法および回収設備
US7793668B2 (en) * 2000-06-06 2010-09-14 Nitto Denko Corporation Cleaning sheet, conveying member using the same, and substrate processing equipment cleaning method using them
US20050118414A1 (en) * 2002-06-19 2005-06-02 Nitto Denko Corporation Cleaning sheets, transfer member having cleaning function, and method of cleaning substrate-processing apparatus with these
JP2004223696A (ja) * 2002-11-26 2004-08-12 Musashi Seimitsu Ind Co Ltd 研削方法及びその装置
WO2005109492A1 (en) * 2004-05-07 2005-11-17 Hanmi Semiconductor Co., Ltd Sawing and handler system for manufacturing semiconductor package
JP2008166804A (ja) * 2006-12-29 2008-07-17 Siltron Inc 太陽電池用基板の洗浄方法
JP4964107B2 (ja) * 2007-12-03 2012-06-27 東京応化工業株式会社 剥離装置
DE102008022476B3 (de) * 2008-05-07 2009-12-24 Siltronic Ag Verfahren zur mechanischen Bearbeitung einer Scheibe
KR20120027237A (ko) * 2009-04-16 2012-03-21 수스 마이크로텍 리소그라피 게엠바하 웨이퍼 가접합 및 분리를 위한 개선된 장치
CN105466709B (zh) * 2015-11-20 2018-03-02 同济大学 用于框架结构连续性倒塌装配式去柱装置
CN113695308B (zh) * 2021-07-20 2023-01-13 山东力冠微电子装备有限公司 一种半导体晶圆前处理系统
CN114043634B (zh) * 2021-11-12 2024-02-20 中山市海晶电子有限公司 一种晶圆切割装夹设备

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4390392A (en) * 1980-09-16 1983-06-28 Texas Instruments Incorporated Method for removal of minute physical damage to silicon wafers by employing laser annealing
US4420909B2 (en) * 1981-11-10 1997-06-10 Silicon Technology Wafering system
US4599558A (en) * 1983-12-14 1986-07-08 Ibm Photovoltaic imaging for large area semiconductors
US4897141A (en) * 1984-12-06 1990-01-30 Valtech Corporation Method for preparing semiconductor wafers
US4638601A (en) * 1985-11-04 1987-01-27 Silicon Technology Corporation Automatic edge grinder
US4852304A (en) * 1987-10-29 1989-08-01 Tokyo Seimtsu Co., Ltd. Apparatus and method for slicing a wafer
GB8806892D0 (en) * 1988-03-23 1988-04-27 Unilever Plc Lactams their synthesis & use in cosmetic compositions
US4984392A (en) * 1988-09-29 1991-01-15 Shin-Etsu Handotai Company Limited Chamfering the notch of a semiconductor wafer
US5024207A (en) * 1989-10-30 1991-06-18 Motorola, Inc. Heating apparatus and method for semiconductor material slicing process
EP0460437B1 (en) * 1990-05-18 1997-09-10 Fujitsu Limited Method of manufacturing semiconductor substrate and method of manufacturing semiconductor device composed of the substrate
US5189843A (en) * 1990-08-30 1993-03-02 Silicon Technology Corporation Wafer slicing and grinding machine and a method of slicing and grinding wafers

Also Published As

Publication number Publication date
IT1267970B1 (it) 1997-02-20
KR940018901A (ko) 1994-08-19
DE4400221C2 (de) 1999-03-11
ITTO940006A1 (it) 1995-07-10
KR100197090B1 (ko) 1999-06-15
US5427644A (en) 1995-06-27
DE4400221A1 (de) 1994-07-14

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Legal Events

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TA Fee payment date (situation as of event date), data collected since 19931001

Effective date: 19990129