ITMI20031045A0 - Procedimento per la definizione di aperture di dimensioni sub-litografiche in substrati di silicio - Google Patents
Procedimento per la definizione di aperture di dimensioni sub-litografiche in substrati di silicioInfo
- Publication number
- ITMI20031045A0 ITMI20031045A0 IT2003MI001045A ITMI20031045A ITMI20031045A0 IT MI20031045 A0 ITMI20031045 A0 IT MI20031045A0 IT 2003MI001045 A IT2003MI001045 A IT 2003MI001045A IT MI20031045 A ITMI20031045 A IT MI20031045A IT MI20031045 A0 ITMI20031045 A0 IT MI20031045A0
- Authority
- IT
- Italy
- Prior art keywords
- definition
- openings
- sub
- procedure
- silicon substrates
- Prior art date
Links
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 title 1
- 229910052710 silicon Inorganic materials 0.000 title 1
- 239000010703 silicon Substances 0.000 title 1
- 239000000758 substrate Substances 0.000 title 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70425—Imaging strategies, e.g. for increasing throughput or resolution, printing product fields larger than the image field or compensating lithography- or non-lithography errors, e.g. proximity correction, mix-and-match, stitching or double patterning
- G03F7/70466—Multiple exposures, e.g. combination of fine and coarse exposures, double patterning or multiple exposures for printing a single feature
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
- G03F7/201—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image characterised by an oblique exposure; characterised by the use of plural sources; characterised by the rotation of the optical device; characterised by a relative movement of the optical device, the light source, the sensitive system or the mask
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/2022—Multi-step exposure, e.g. hybrid; backside exposure; blanket exposure, e.g. for image reversal; edge exposure, e.g. for edge bead removal; corrective exposure
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
IT001045A ITMI20031045A1 (it) | 2003-05-23 | 2003-05-23 | Procedimento per la definizione di aperture di dimensioni sub-litografiche in substrati di silicio. |
US10/851,756 US20050014099A1 (en) | 2003-05-23 | 2004-05-20 | Method for providing apertures having sublithographic dimensions in silicon substrates |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
IT001045A ITMI20031045A1 (it) | 2003-05-23 | 2003-05-23 | Procedimento per la definizione di aperture di dimensioni sub-litografiche in substrati di silicio. |
Publications (2)
Publication Number | Publication Date |
---|---|
ITMI20031045A0 true ITMI20031045A0 (it) | 2003-05-23 |
ITMI20031045A1 ITMI20031045A1 (it) | 2004-11-24 |
Family
ID=30131075
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
IT001045A ITMI20031045A1 (it) | 2003-05-23 | 2003-05-23 | Procedimento per la definizione di aperture di dimensioni sub-litografiche in substrati di silicio. |
Country Status (2)
Country | Link |
---|---|
US (1) | US20050014099A1 (it) |
IT (1) | ITMI20031045A1 (it) |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0338110B1 (en) * | 1988-04-21 | 1993-03-17 | International Business Machines Corporation | Method for forming a photoresist pattern and apparatus applicable with said method |
US5266445A (en) * | 1991-10-31 | 1993-11-30 | Intel Corporation | Method of selectively irradiating a resist layer using radiation pulses |
US5407785A (en) * | 1992-12-18 | 1995-04-18 | Vlsi Technology, Inc. | Method for generating dense lines on a semiconductor wafer using phase-shifting and multiple exposures |
US6670109B2 (en) * | 2001-08-29 | 2003-12-30 | Micron Technology, Inc. | Photolithographic methods of using a single reticle to form overlapping patterns |
-
2003
- 2003-05-23 IT IT001045A patent/ITMI20031045A1/it unknown
-
2004
- 2004-05-20 US US10/851,756 patent/US20050014099A1/en not_active Abandoned
Also Published As
Publication number | Publication date |
---|---|
US20050014099A1 (en) | 2005-01-20 |
ITMI20031045A1 (it) | 2004-11-24 |
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