DE60233089D1 - Vertikale Waferhaltevorrichtung - Google Patents
Vertikale WaferhaltevorrichtungInfo
- Publication number
- DE60233089D1 DE60233089D1 DE60233089T DE60233089T DE60233089D1 DE 60233089 D1 DE60233089 D1 DE 60233089D1 DE 60233089 T DE60233089 T DE 60233089T DE 60233089 T DE60233089 T DE 60233089T DE 60233089 D1 DE60233089 D1 DE 60233089D1
- Authority
- DE
- Germany
- Prior art keywords
- wafer holder
- vertical wafer
- vertical
- holder
- wafer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/673—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere using specially adapted carriers or holders; Fixing the workpieces on such carriers or holders
- H01L21/67303—Vertical boat type carrier whereby the substrates are horizontally supported, e.g. comprising rod-shaped elements
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B31/00—Diffusion or doping processes for single crystals or homogeneous polycrystalline material with defined structure; Apparatus therefor
- C30B31/06—Diffusion or doping processes for single crystals or homogeneous polycrystalline material with defined structure; Apparatus therefor by contacting with diffusion material in the gaseous state
- C30B31/14—Substrate holders or susceptors
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/673—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere using specially adapted carriers or holders; Fixing the workpieces on such carriers or holders
- H01L21/67303—Vertical boat type carrier whereby the substrates are horizontally supported, e.g. comprising rod-shaped elements
- H01L21/67309—Vertical boat type carrier whereby the substrates are horizontally supported, e.g. comprising rod-shaped elements characterized by the substrate support
Landscapes
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Physics & Mathematics (AREA)
- Power Engineering (AREA)
- Chemical & Material Sciences (AREA)
- Crystallography & Structural Chemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2001141379A JP4467028B2 (ja) | 2001-05-11 | 2001-05-11 | 縦型ウェーハ支持治具 |
Publications (1)
Publication Number | Publication Date |
---|---|
DE60233089D1 true DE60233089D1 (de) | 2009-09-10 |
Family
ID=18987846
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE60233089T Expired - Lifetime DE60233089D1 (de) | 2001-05-11 | 2002-05-07 | Vertikale Waferhaltevorrichtung |
Country Status (4)
Country | Link |
---|---|
US (1) | US6796439B2 (de) |
EP (1) | EP1256975B1 (de) |
JP (1) | JP4467028B2 (de) |
DE (1) | DE60233089D1 (de) |
Families Citing this family (37)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP3377996B1 (ja) * | 2001-12-27 | 2003-02-17 | 東京エレクトロン株式会社 | 熱処理用ボート及び縦型熱処理装置 |
TW553195U (en) * | 2002-10-09 | 2003-09-11 | Foxsemicon Integrated Tech Inc | Substrate supporting slot plate and substrate cassette using the same |
KR100492977B1 (ko) * | 2002-12-12 | 2005-06-07 | 삼성전자주식회사 | 다공성 실리카 박막의 소결을 위한 웨이퍼 보트 |
JP4506125B2 (ja) * | 2003-07-16 | 2010-07-21 | 信越半導体株式会社 | 熱処理用縦型ボート及びその製造方法 |
US7329947B2 (en) * | 2003-11-07 | 2008-02-12 | Sumitomo Mitsubishi Silicon Corporation | Heat treatment jig for semiconductor substrate |
KR100549273B1 (ko) * | 2004-01-15 | 2006-02-03 | 주식회사 테라세미콘 | 반도체 제조장치의 기판홀더 |
US20070275570A1 (en) * | 2004-01-20 | 2007-11-29 | Hitachi Kokusai Electric Inc. | Heat Treatment Apparatus |
DE202004005378U1 (de) * | 2004-04-03 | 2004-07-01 | Heraeus Quarzglas Gmbh & Co. Kg | Trägerhorde aus Quarzglas für die Aufnahme von scheibenförmigen Substraten aus Halbleiterwerkstoff |
JP4534619B2 (ja) * | 2004-06-21 | 2010-09-01 | 株式会社Sumco | 半導体シリコン基板用熱処理治具 |
KR100852975B1 (ko) * | 2004-08-06 | 2008-08-19 | 가부시키가이샤 히다치 고쿠사이 덴키 | 열처리 장치 및 기판의 제조 방법 |
US7033168B1 (en) * | 2005-01-24 | 2006-04-25 | Memc Electronic Materials, Inc. | Semiconductor wafer boat for a vertical furnace |
JP2008186950A (ja) * | 2007-01-29 | 2008-08-14 | Asahi Glass Co Ltd | 熱処理用治具の形状測定方法及びその装置 |
TWI361469B (en) * | 2007-03-09 | 2012-04-01 | Rohm & Haas Elect Mat | Chemical vapor deposited silicon carbide articles |
US20090071918A1 (en) * | 2007-09-18 | 2009-03-19 | Panchapakesan Ramanarayanan | Vertical semiconductor wafer carrier |
US20090162183A1 (en) * | 2007-12-19 | 2009-06-25 | Peter Davison | Full-contact ring for a large wafer |
JP5071217B2 (ja) * | 2008-04-17 | 2012-11-14 | 信越半導体株式会社 | 縦型熱処理用ボートおよびそれを用いたシリコンウエーハの熱処理方法 |
JP5042950B2 (ja) * | 2008-09-05 | 2012-10-03 | 東京エレクトロン株式会社 | 縦型熱処理装置及び基板支持具 |
CN102257165A (zh) * | 2008-12-17 | 2011-11-23 | 本田技研工业株式会社 | 运送夹具、制造运送夹具的方法和采用运送夹具热处理金属环的方法 |
JP5565242B2 (ja) * | 2010-09-29 | 2014-08-06 | 東京エレクトロン株式会社 | 縦型熱処理装置 |
US9530675B2 (en) * | 2012-09-19 | 2016-12-27 | Stmicroelectronics Pte Ltd | Wafer handling station including cassette members with lateral wafer confining brackets and associated methods |
TWD161688S (zh) * | 2012-12-27 | 2014-07-11 | 日立國際電氣股份有限公司 | 半導體製造裝置用晶舟 |
TWD163542S (zh) * | 2013-03-22 | 2014-10-11 | 日立國際電氣股份有限公司 | 基板處理裝置用晶舟 |
TWD166332S (zh) * | 2013-03-22 | 2015-03-01 | 日立國際電氣股份有限公司 | 基板處理裝置用晶舟之部分 |
US10190235B2 (en) * | 2013-05-24 | 2019-01-29 | Taiwan Semiconductor Manufacturing Company, Ltd. | Wafer supporting structure and method for forming the same |
KR20150110207A (ko) * | 2014-03-24 | 2015-10-02 | 주식회사 테라세미콘 | 보트 |
JP1537313S (de) * | 2014-11-20 | 2015-11-09 | ||
JP1537312S (de) * | 2014-11-20 | 2015-11-09 | ||
JP1537630S (de) * | 2014-11-20 | 2015-11-09 | ||
JP1563649S (de) * | 2016-02-12 | 2016-11-21 | ||
USD847105S1 (en) * | 2018-05-03 | 2019-04-30 | Kokusai Electric Corporation | Boat of substrate processing apparatus |
USD846514S1 (en) * | 2018-05-03 | 2019-04-23 | Kokusai Electric Corporation | Boat of substrate processing apparatus |
USD908103S1 (en) * | 2019-02-20 | 2021-01-19 | Veeco Instruments Inc. | Transportable semiconductor wafer rack |
USD908102S1 (en) * | 2019-02-20 | 2021-01-19 | Veeco Instruments Inc. | Transportable semiconductor wafer rack |
JP7245071B2 (ja) * | 2019-02-21 | 2023-03-23 | 株式会社ジェイテクトサーモシステム | 基板支持装置 |
CN111312637B (zh) * | 2020-02-28 | 2023-03-21 | 北京北方华创微电子装备有限公司 | 一种晶片承载装置和立式扩散炉 |
CN111576924A (zh) * | 2020-06-21 | 2020-08-25 | 厉小勇 | 一种楼板高度控制器 |
JP1700777S (de) * | 2021-03-15 | 2021-11-29 |
Family Cites Families (19)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS512161U (de) * | 1974-06-24 | 1976-01-09 | ||
US4228902A (en) * | 1979-02-21 | 1980-10-21 | Kasper Instruments, Inc. | Carrier for semiconductive wafers |
US4407654A (en) * | 1982-01-21 | 1983-10-04 | The Potters Supply Company | Handling and support system for kiln fired ware |
US5310339A (en) * | 1990-09-26 | 1994-05-10 | Tokyo Electron Limited | Heat treatment apparatus having a wafer boat |
JP2564640Y2 (ja) | 1992-01-31 | 1998-03-09 | 信越石英株式会社 | 縦型ウエーハ収納治具 |
JPH0645332A (ja) | 1992-07-22 | 1994-02-18 | Nec Corp | 半導体装置の製造方法 |
US5458688A (en) * | 1993-03-09 | 1995-10-17 | Tokyo Electron Kabushiki Kaisha | Heat treatment boat |
TW323633U (en) * | 1995-09-07 | 1997-12-21 | Samsung Electronics Co Ltd | Cassette for loading glasses for liquid crystal display device |
KR0155930B1 (ko) * | 1995-11-28 | 1998-12-01 | 김광호 | 종형확산로의 보우트-바 |
KR970053327A (ko) * | 1995-12-29 | 1997-07-31 | 김광호 | 크리닝 챔버의 웨이퍼 홀더 |
JP3122364B2 (ja) * | 1996-02-06 | 2001-01-09 | 東京エレクトロン株式会社 | ウエハボート |
EP0884769A1 (de) * | 1996-02-29 | 1998-12-16 | Tokyo Electron Limited | Wärme behandlungshalter für halbleiterscheiben |
JP3388668B2 (ja) | 1996-02-29 | 2003-03-24 | 東京エレクトロン株式会社 | 熱処理用ボ−ト及び縦型熱処理装置 |
TW298337U (en) * | 1996-08-19 | 1997-02-11 | guo-min Gao | Tilting-type stackable CD rack |
JP3212890B2 (ja) * | 1996-10-15 | 2001-09-25 | 九州日本電気株式会社 | ウェハキャリア |
KR20000002833A (ko) * | 1998-06-23 | 2000-01-15 | 윤종용 | 반도체 웨이퍼 보트 |
US6171400B1 (en) * | 1998-10-02 | 2001-01-09 | Union Oil Company Of California | Vertical semiconductor wafer carrier |
US6378538B1 (en) * | 1999-12-13 | 2002-04-30 | Advanced Micro Devices, Inc. | Durable, multi-piece rotor for spray acid tools |
US6287112B1 (en) * | 2000-03-30 | 2001-09-11 | Asm International, N.V. | Wafer boat |
-
2001
- 2001-05-11 JP JP2001141379A patent/JP4467028B2/ja not_active Expired - Fee Related
-
2002
- 2002-05-07 EP EP02010097A patent/EP1256975B1/de not_active Expired - Lifetime
- 2002-05-07 DE DE60233089T patent/DE60233089D1/de not_active Expired - Lifetime
- 2002-05-08 US US10/140,764 patent/US6796439B2/en not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
JP2002343730A (ja) | 2002-11-29 |
EP1256975A2 (de) | 2002-11-13 |
EP1256975A3 (de) | 2003-01-08 |
US20020187023A1 (en) | 2002-12-12 |
US6796439B2 (en) | 2004-09-28 |
EP1256975B1 (de) | 2009-07-29 |
JP4467028B2 (ja) | 2010-05-26 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition |