IT951315B - Dispositivo per la protezione del lo strato dielettrico di porta dei transistori ad effetto di campo a prota isolat - Google Patents

Dispositivo per la protezione del lo strato dielettrico di porta dei transistori ad effetto di campo a prota isolat

Info

Publication number
IT951315B
IT951315B IT2301972A IT2301972A IT951315B IT 951315 B IT951315 B IT 951315B IT 2301972 A IT2301972 A IT 2301972A IT 2301972 A IT2301972 A IT 2301972A IT 951315 B IT951315 B IT 951315B
Authority
IT
Italy
Prior art keywords
isolat
prota
protecting
field effect
effect transistors
Prior art date
Application number
IT2301972A
Other languages
English (en)
Italian (it)
Original Assignee
Rca Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Rca Corp filed Critical Rca Corp
Application granted granted Critical
Publication of IT951315B publication Critical patent/IT951315B/it

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L27/00Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
    • H01L27/02Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier
    • H01L27/12Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier the substrate being other than a semiconductor body, e.g. an insulating body
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/70Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
    • H01L21/77Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate
    • H01L21/78Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices
    • H01L21/82Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices to produce devices, e.g. integrated circuits, each consisting of a plurality of components
    • H01L21/84Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices to produce devices, e.g. integrated circuits, each consisting of a plurality of components the substrate being other than a semiconductor body, e.g. being an insulating body
    • H01L21/86Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices to produce devices, e.g. integrated circuits, each consisting of a plurality of components the substrate being other than a semiconductor body, e.g. being an insulating body the insulating body being sapphire, e.g. silicon on sapphire structure, i.e. SOS
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L27/00Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
    • H01L27/02Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier
    • H01L27/0203Particular design considerations for integrated circuits
    • H01L27/0248Particular design considerations for integrated circuits for electrical or thermal protection, e.g. electrostatic discharge [ESD] protection
    • H01L27/0251Particular design considerations for integrated circuits for electrical or thermal protection, e.g. electrostatic discharge [ESD] protection for MOS devices
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L27/00Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
    • H01L27/02Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier
    • H01L27/0203Particular design considerations for integrated circuits
    • H01L27/0248Particular design considerations for integrated circuits for electrical or thermal protection, e.g. electrostatic discharge [ESD] protection
    • H01L27/0251Particular design considerations for integrated circuits for electrical or thermal protection, e.g. electrostatic discharge [ESD] protection for MOS devices
    • H01L27/0255Particular design considerations for integrated circuits for electrical or thermal protection, e.g. electrostatic discharge [ESD] protection for MOS devices using diodes as protective elements
IT2301972A 1971-07-12 1972-04-11 Dispositivo per la protezione del lo strato dielettrico di porta dei transistori ad effetto di campo a prota isolat IT951315B (it)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US16147871A 1971-07-12 1971-07-12

Publications (1)

Publication Number Publication Date
IT951315B true IT951315B (it) 1973-06-30

Family

ID=22581334

Family Applications (1)

Application Number Title Priority Date Filing Date
IT2301972A IT951315B (it) 1971-07-12 1972-04-11 Dispositivo per la protezione del lo strato dielettrico di porta dei transistori ad effetto di campo a prota isolat

Country Status (10)

Country Link
JP (1) JPS5138587B1 (de)
AU (1) AU471347B2 (de)
BE (1) BE781698A (de)
CA (1) CA941515A (de)
DE (1) DE2215850A1 (de)
FR (1) FR2145460B1 (de)
GB (1) GB1380466A (de)
IT (1) IT951315B (de)
NL (1) NL7204607A (de)
SE (1) SE379117B (de)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2404922A1 (fr) * 1977-09-30 1979-04-27 Radiotechnique Compelec Dispositif semi-conducteur formant cellule de memoire morte programmable
JPS57141962A (en) * 1981-02-27 1982-09-02 Hitachi Ltd Semiconductor integrated circuit device
JPS5825264A (ja) * 1981-08-07 1983-02-15 Hitachi Ltd 絶縁ゲート型半導体装置
JPH02185069A (ja) * 1988-12-02 1990-07-19 Motorola Inc 高エネルギー阻止能力及び温度補償された阻止電圧を具備する半導体デバイス
US5025298A (en) * 1989-08-22 1991-06-18 Motorola, Inc. Semiconductor structure with closely coupled substrate temperature sense element
US5005061A (en) * 1990-02-05 1991-04-02 Motorola, Inc. Avalanche stress protected semiconductor device having variable input impedance
DE69417944T2 (de) * 1993-04-30 1999-12-09 Ibm Verfahren zum Herstellen einer Schutzdiode gegen elektrostatische Entladungen in der Silizium-auf-Insulator-Technologie
JP5924313B2 (ja) 2012-08-06 2016-05-25 株式会社デンソー ダイオード

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3728591A (en) * 1971-09-03 1973-04-17 Rca Corp Gate protective device for insulated gate field-effect transistors

Also Published As

Publication number Publication date
DE2215850A1 (de) 1973-02-08
CA941515A (en) 1974-02-05
AU4099372A (en) 1973-10-18
SE379117B (de) 1975-09-22
BE781698A (fr) 1972-07-31
NL7204607A (de) 1973-01-16
JPS5138587B1 (de) 1976-10-22
FR2145460A1 (de) 1973-02-23
GB1380466A (en) 1975-01-15
FR2145460B1 (de) 1977-01-14
AU471347B2 (en) 1973-10-18

Similar Documents

Publication Publication Date Title
IT955274B (it) Dispositivo per la protezione del la porta dei transistori ad effet to di campo a porta isolata
IT941940B (it) Transistore di memoria ad effetto di campo a porta isolat
IT1034492B (it) Transistore ad effetto di campo a porta isolata
IT956974B (it) Procedimento per la fabbricazione di pellicole termoplastiche bias sialmente stirate
IT982456B (it) Procedimento per la fabbricazione di dispositivi semiconduttori e di spositivo ottenuto con il procedi mento
IT959692B (it) Contatore utilizzante transistori ad effetto di campo a porta isolata
IT962927B (it) Transistore ad effetto di campo
IT972532B (it) Pellicola di poliolefina degradabile
IT954848B (it) Composti di tetracloroftalide
SE382940B (sv) Anordning for avgradning av ihaliga plastforemal
IT951315B (it) Dispositivo per la protezione del lo strato dielettrico di porta dei transistori ad effetto di campo a prota isolat
IT953974B (it) Transistore ad effetto di campo e procedimento per fabbricare transistori ad effetto di campo
IT940688B (it) Metodo per la fabbricazione di un dispositivo semiconduttore presen tante almeno un transistore ad ef fetto di campo a porta isolata e dispositivo semiconduttore fabbri cato con l ausilio di tale metodo
CA1011457A (en) Operation of field-effect transistor circuits having substantial distributed capacitance
IT949059B (it) Procedimento per la fabbricazione di transistori planari a valanga
SE385187B (sv) Forfarande for framstellning av plastomholjda tamponger av fibrosa organiska emnen jemte anordning for genomforande av forfarandet
BR7304898D0 (pt) Um transistor de efeito de campo
IT1022332B (it) Dispositivo con transistori a effetto di campo
IT998472B (it) Procedimento e dispositivo per la produzione ad umido di composta con melme organiche
FI55173B (fi) Nytt foerfarande foer framstaellning av 2-(3-bensoylfenyl)-laegre-alkansyror
IT995581B (it) Transistore ad effetto di campo a porta isolata
IT969355B (it) Oscillatore gunn con transistore a effetto di campo
IT998749B (it) Transistore ad eppetto di campo perfezionato
SE383636B (sv) Vulkbara polymerer av konjugerade polycykliska polyener och forfarande for framstellning derav
IT993617B (it) Dispositivo di semiconduttori