IT7925327A0 - Processo per drogare con boro corpi di silicio. - Google Patents
Processo per drogare con boro corpi di silicio.Info
- Publication number
- IT7925327A0 IT7925327A0 IT7925327A IT2532779A IT7925327A0 IT 7925327 A0 IT7925327 A0 IT 7925327A0 IT 7925327 A IT7925327 A IT 7925327A IT 2532779 A IT2532779 A IT 2532779A IT 7925327 A0 IT7925327 A0 IT 7925327A0
- Authority
- IT
- Italy
- Prior art keywords
- dopping
- boron
- silicon bodies
- bodies
- silicon
- Prior art date
Links
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 title 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 title 1
- 229910052796 boron Inorganic materials 0.000 title 1
- 229910052710 silicon Inorganic materials 0.000 title 1
- 239000010703 silicon Substances 0.000 title 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B31/00—Diffusion or doping processes for single crystals or homogeneous polycrystalline material with defined structure; Apparatus therefor
- C30B31/02—Diffusion or doping processes for single crystals or homogeneous polycrystalline material with defined structure; Apparatus therefor by contacting with diffusion materials in the solid state
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/22—Diffusion of impurity materials, e.g. doping materials, electrode materials, into or out of a semiconductor body, or between semiconductor regions; Interactions between two or more impurities; Redistribution of impurities
- H01L21/223—Diffusion of impurity materials, e.g. doping materials, electrode materials, into or out of a semiconductor body, or between semiconductor regions; Interactions between two or more impurities; Redistribution of impurities using diffusion into or out of a solid from or into a gaseous phase
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/31—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to form insulating layers thereon, e.g. for masking or by using photolithographic techniques; After treatment of these layers; Selection of materials for these layers
- H01L21/3105—After-treatment
- H01L21/311—Etching the insulating layers by chemical or physical means
- H01L21/31105—Etching inorganic layers
- H01L21/31111—Etching inorganic layers by chemical means
- H01L21/31116—Etching inorganic layers by chemical means by dry-etching
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S257/00—Active solid-state devices, e.g. transistors, solid-state diodes
- Y10S257/918—Light emitting regenerative switching device, e.g. light emitting scr arrays, circuitry
Landscapes
- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Manufacturing & Machinery (AREA)
- General Physics & Mathematics (AREA)
- Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Crystallography & Structural Chemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Inorganic Chemistry (AREA)
- Formation Of Insulating Films (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE19782838928 DE2838928A1 (de) | 1978-09-07 | 1978-09-07 | Verfahren zum dotieren von siliciumkoerpern mit bor |
Publications (2)
Publication Number | Publication Date |
---|---|
IT7925327A0 true IT7925327A0 (it) | 1979-08-29 |
IT1122874B IT1122874B (it) | 1986-04-30 |
Family
ID=6048854
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
IT25327/79A IT1122874B (it) | 1978-09-07 | 1979-08-29 | Processo per drogare con boro corpi di silicio |
Country Status (6)
Country | Link |
---|---|
US (1) | US4249970A (it) |
EP (1) | EP0008642B1 (it) |
JP (1) | JPS6043654B2 (it) |
CA (1) | CA1125440A (it) |
DE (2) | DE2838928A1 (it) |
IT (1) | IT1122874B (it) |
Families Citing this family (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE2951292A1 (de) * | 1979-12-20 | 1981-07-02 | Ibm Deutschland Gmbh, 7000 Stuttgart | Verfahren zum dotieren von siliciumkoerpern durch eindiffundieren von bor |
JPS5840823A (ja) * | 1981-09-04 | 1983-03-09 | Hitachi Ltd | 半導体装置の製法 |
NL8104862A (nl) * | 1981-10-28 | 1983-05-16 | Philips Nv | Halfgeleiderinrichting, en werkwijze ter vervaardiging daarvan. |
JPS5994861A (ja) * | 1982-11-24 | 1984-05-31 | Hitachi Ltd | 半導体集積回路装置及びその製造方法 |
US4514440A (en) * | 1983-12-12 | 1985-04-30 | Allied Corporation | Spin-on dopant method |
US4588454A (en) * | 1984-12-21 | 1986-05-13 | Linear Technology Corporation | Diffusion of dopant into a semiconductor wafer |
JPS63205954A (ja) * | 1987-02-23 | 1988-08-25 | Meidensha Electric Mfg Co Ltd | 半導体素子 |
US5567978A (en) * | 1995-02-03 | 1996-10-22 | Harris Corporation | High voltage, junction isolation semiconductor device having dual conductivity tape buried regions and its process of manufacture |
US6544655B1 (en) * | 2000-08-08 | 2003-04-08 | Honeywell International Inc. | Methods for reducing the curvature in boron-doped silicon micromachined structures |
JP4698354B2 (ja) * | 2005-09-15 | 2011-06-08 | 株式会社リコー | Cvd装置 |
Family Cites Families (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
NL135875C (it) * | 1958-06-09 | 1900-01-01 | ||
US3281915A (en) * | 1963-04-02 | 1966-11-01 | Rca Corp | Method of fabricating a semiconductor device |
GB1115140A (en) * | 1966-12-30 | 1968-05-29 | Standard Telephones Cables Ltd | Semiconductors |
US3542609A (en) * | 1967-11-22 | 1970-11-24 | Itt | Double depositions of bbr3 in silicon |
US3577287A (en) * | 1968-02-12 | 1971-05-04 | Gen Motors Corp | Aluminum diffusion technique |
US3753809A (en) * | 1970-01-09 | 1973-08-21 | Ibm | Method for obtaining optimum phosphorous concentration in semiconductor wafers |
US3676231A (en) * | 1970-02-20 | 1972-07-11 | Ibm | Method for producing high performance semiconductor device |
FR2092728A7 (en) * | 1970-06-12 | 1972-01-28 | Radiotechnique Compelec | N-doped silicon - by phosphorus diffusion from phosphine |
US3806382A (en) * | 1972-04-06 | 1974-04-23 | Ibm | Vapor-solid impurity diffusion process |
US4149915A (en) * | 1978-01-27 | 1979-04-17 | International Business Machines Corporation | Process for producing defect-free semiconductor devices having overlapping high conductivity impurity regions |
-
1978
- 1978-09-07 DE DE19782838928 patent/DE2838928A1/de not_active Withdrawn
-
1979
- 1979-07-16 DE DE7979102455T patent/DE2963405D1/de not_active Expired
- 1979-07-16 EP EP79102455A patent/EP0008642B1/de not_active Expired
- 1979-08-20 US US06/067,846 patent/US4249970A/en not_active Expired - Lifetime
- 1979-08-24 CA CA334,391A patent/CA1125440A/en not_active Expired
- 1979-08-29 IT IT25327/79A patent/IT1122874B/it active
- 1979-09-07 JP JP54114373A patent/JPS6043654B2/ja not_active Expired
Also Published As
Publication number | Publication date |
---|---|
CA1125440A (en) | 1982-06-08 |
DE2838928A1 (de) | 1980-03-20 |
EP0008642B1 (de) | 1982-07-28 |
US4249970A (en) | 1981-02-10 |
EP0008642A1 (de) | 1980-03-19 |
IT1122874B (it) | 1986-04-30 |
JPS5538097A (en) | 1980-03-17 |
DE2963405D1 (en) | 1982-09-16 |
JPS6043654B2 (ja) | 1985-09-30 |
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