IT7848011A0 - Sistema ottico a campo anulare costituente una unita' di potenza - Google Patents
Sistema ottico a campo anulare costituente una unita' di potenzaInfo
- Publication number
- IT7848011A0 IT7848011A0 IT7848011A IT4801178A IT7848011A0 IT 7848011 A0 IT7848011 A0 IT 7848011A0 IT 7848011 A IT7848011 A IT 7848011A IT 4801178 A IT4801178 A IT 4801178A IT 7848011 A0 IT7848011 A0 IT 7848011A0
- Authority
- IT
- Italy
- Prior art keywords
- optical system
- power unit
- field optical
- system constituting
- annular field
- Prior art date
Links
- 230000003287 optical effect Effects 0.000 title 1
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B17/00—Systems with reflecting surfaces, with or without refracting elements
- G02B17/08—Catadioptric systems
- G02B17/0836—Catadioptric systems using more than three curved mirrors
- G02B17/0844—Catadioptric systems using more than three curved mirrors off-axis or unobscured systems in which all of the mirrors share a common axis of rotational symmetry
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B17/00—Systems with reflecting surfaces, with or without refracting elements
- G02B17/008—Systems specially adapted to form image relays or chained systems
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B17/00—Systems with reflecting surfaces, with or without refracting elements
- G02B17/08—Catadioptric systems
- G02B17/0804—Catadioptric systems using two curved mirrors
- G02B17/0812—Catadioptric systems using two curved mirrors off-axis or unobscured systems in which all of the mirrors share a common axis of rotational symmetry
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70225—Optical aspects of catadioptric systems, i.e. comprising reflective and refractive elements
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70275—Multiple projection paths, e.g. array of projection systems, microlens projection systems or tandem projection systems
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Lenses (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Stereoscopic And Panoramic Photography (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US76790677A | 1977-02-11 | 1977-02-11 |
Publications (2)
Publication Number | Publication Date |
---|---|
IT7848011A0 true IT7848011A0 (it) | 1978-02-10 |
IT1101789B IT1101789B (it) | 1985-10-07 |
Family
ID=25080934
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
IT48011/78A IT1101789B (it) | 1977-02-11 | 1978-02-10 | Sistema ottico a campo anulare costituente una unita' di potenza |
Country Status (7)
Country | Link |
---|---|
JP (1) | JPS53100230A (it) |
CA (1) | CA1103498A (it) |
CH (1) | CH625055A5 (it) |
DE (1) | DE2801882A1 (it) |
FR (1) | FR2380563A1 (it) |
GB (2) | GB1605161A (it) |
IT (1) | IT1101789B (it) |
Families Citing this family (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4331390A (en) * | 1979-10-09 | 1982-05-25 | The Perkin-Elmer Corporation | Monocentric optical systems |
JPS5890610A (ja) * | 1981-11-24 | 1983-05-30 | Matsushita Electric Ind Co Ltd | カタデイオプトリツク光学系 |
US4469414A (en) * | 1982-06-01 | 1984-09-04 | The Perkin-Elmer Corporation | Restrictive off-axis field optical system |
JPS59144127A (ja) * | 1983-02-07 | 1984-08-18 | Canon Inc | 像調整された光学装置 |
JPS6093410A (ja) * | 1983-10-27 | 1985-05-25 | Canon Inc | 反射光学系 |
JPS6147916A (ja) * | 1984-08-14 | 1986-03-08 | Canon Inc | 反射光学系 |
US4747678A (en) * | 1986-12-17 | 1988-05-31 | The Perkin-Elmer Corporation | Optical relay system with magnification |
JP2565149B2 (ja) * | 1995-04-05 | 1996-12-18 | キヤノン株式会社 | 回路の製造方法及び露光装置 |
JP5196869B2 (ja) * | 2007-05-15 | 2013-05-15 | キヤノン株式会社 | 投影光学系、露光装置及びデバイス製造方法 |
CN102981255B (zh) * | 2011-09-07 | 2016-04-20 | 上海微电子装备有限公司 | 一种大视场投影物镜 |
JP2020052342A (ja) * | 2018-09-28 | 2020-04-02 | キヤノン株式会社 | 光学機器 |
Family Cites Families (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US2344756A (en) * | 1941-01-06 | 1944-03-21 | Taylor Taylor & Hobson Ltd | Optical objective |
US2682197A (en) * | 1951-08-13 | 1954-06-29 | American Optical Corp | Folded reflecting optical system of the schmidt type |
SU126911A1 (ru) * | 1959-03-30 | 1959-11-30 | Н.Н. Петрушов | Зеркально-линзовый объектив |
US3748015A (en) * | 1971-06-21 | 1973-07-24 | Perkin Elmer Corp | Unit power imaging catoptric anastigmat |
US3821763A (en) * | 1971-06-21 | 1974-06-28 | Perkin Elmer Corp | Annular field optical imaging system |
US3951546A (en) * | 1974-09-26 | 1976-04-20 | The Perkin-Elmer Corporation | Three-fold mirror assembly for a scanning projection system |
-
1977
- 1977-12-29 CA CA294,050A patent/CA1103498A/en not_active Expired
-
1978
- 1978-01-17 DE DE19782801882 patent/DE2801882A1/de active Granted
- 1978-01-23 FR FR7801763A patent/FR2380563A1/fr active Granted
- 1978-02-10 IT IT48011/78A patent/IT1101789B/it active
- 1978-02-10 CH CH148678A patent/CH625055A5/fr not_active IP Right Cessation
- 1978-02-10 JP JP1485178A patent/JPS53100230A/ja active Granted
- 1978-02-13 GB GB23809/80A patent/GB1605161A/en not_active Expired
- 1978-02-13 GB GB5682/78A patent/GB1605160A/en not_active Expired
Also Published As
Publication number | Publication date |
---|---|
DE2801882A1 (de) | 1978-08-17 |
GB1605161A (en) | 1982-08-11 |
CH625055A5 (en) | 1981-08-31 |
JPH0130125B2 (it) | 1989-06-16 |
FR2380563A1 (fr) | 1978-09-08 |
FR2380563B1 (it) | 1984-01-20 |
GB1605160A (en) | 1982-08-11 |
DE2801882C2 (it) | 1988-02-04 |
IT1101789B (it) | 1985-10-07 |
CA1103498A (en) | 1981-06-23 |
JPS53100230A (en) | 1978-09-01 |
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