JPS53100230A - Ring zone fielddoffview optical system - Google Patents

Ring zone fielddoffview optical system

Info

Publication number
JPS53100230A
JPS53100230A JP1485178A JP1485178A JPS53100230A JP S53100230 A JPS53100230 A JP S53100230A JP 1485178 A JP1485178 A JP 1485178A JP 1485178 A JP1485178 A JP 1485178A JP S53100230 A JPS53100230 A JP S53100230A
Authority
JP
Japan
Prior art keywords
fielddoffview
optical system
ring zone
zone
ring
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP1485178A
Other languages
English (en)
Other versions
JPH0130125B2 (ja
Inventor
Ofunaa Abe
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Applied Biosystems Inc
Original Assignee
Perkin Elmer Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Perkin Elmer Corp filed Critical Perkin Elmer Corp
Publication of JPS53100230A publication Critical patent/JPS53100230A/ja
Publication of JPH0130125B2 publication Critical patent/JPH0130125B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
    • G02B17/08—Catadioptric systems
    • G02B17/0836—Catadioptric systems using more than three curved mirrors
    • G02B17/0844—Catadioptric systems using more than three curved mirrors off-axis or unobscured systems in which all of the mirrors share a common axis of rotational symmetry
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
    • G02B17/008—Systems specially adapted to form image relays or chained systems
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
    • G02B17/08—Catadioptric systems
    • G02B17/0804—Catadioptric systems using two curved mirrors
    • G02B17/0812—Catadioptric systems using two curved mirrors off-axis or unobscured systems in which all of the mirrors share a common axis of rotational symmetry
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70225—Optical aspects of catadioptric systems, i.e. comprising reflective and refractive elements
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70275—Multiple projection paths, e.g. array of projection systems, microlens projection systems or tandem projection systems

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Lenses (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Stereoscopic And Panoramic Photography (AREA)
JP1485178A 1977-02-11 1978-02-10 Ring zone fielddoffview optical system Granted JPS53100230A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US76790677A 1977-02-11 1977-02-11

Publications (2)

Publication Number Publication Date
JPS53100230A true JPS53100230A (en) 1978-09-01
JPH0130125B2 JPH0130125B2 (ja) 1989-06-16

Family

ID=25080934

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1485178A Granted JPS53100230A (en) 1977-02-11 1978-02-10 Ring zone fielddoffview optical system

Country Status (7)

Country Link
JP (1) JPS53100230A (ja)
CA (1) CA1103498A (ja)
CH (1) CH625055A5 (ja)
DE (1) DE2801882A1 (ja)
FR (1) FR2380563A1 (ja)
GB (2) GB1605161A (ja)
IT (1) IT1101789B (ja)

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5685722A (en) * 1979-10-09 1981-07-13 Perkin Elmer Corp Monoocentric optical system
JPS5890610A (ja) * 1981-11-24 1983-05-30 Matsushita Electric Ind Co Ltd カタデイオプトリツク光学系
JPS58219517A (ja) * 1982-06-01 1983-12-21 エスヴィージー・リトグラフィー・システムズ・インコーポレイテッド 狭角オフアクシス光学装置
JPS6147916A (ja) * 1984-08-14 1986-03-08 Canon Inc 反射光学系
JPH08139012A (ja) * 1995-04-05 1996-05-31 Canon Inc 回路の製造方法及び露光装置
JP2008286888A (ja) * 2007-05-15 2008-11-27 Canon Inc 露光装置
JP2020052342A (ja) * 2018-09-28 2020-04-02 キヤノン株式会社 光学機器

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59144127A (ja) * 1983-02-07 1984-08-18 Canon Inc 像調整された光学装置
JPS6093410A (ja) * 1983-10-27 1985-05-25 Canon Inc 反射光学系
US4747678A (en) * 1986-12-17 1988-05-31 The Perkin-Elmer Corporation Optical relay system with magnification
CN102981255B (zh) * 2011-09-07 2016-04-20 上海微电子装备有限公司 一种大视场投影物镜

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2344756A (en) * 1941-01-06 1944-03-21 Taylor Taylor & Hobson Ltd Optical objective
US2682197A (en) * 1951-08-13 1954-06-29 American Optical Corp Folded reflecting optical system of the schmidt type
SU126911A1 (ru) * 1959-03-30 1959-11-30 Н.Н. Петрушов Зеркально-линзовый объектив
US3821763A (en) * 1971-06-21 1974-06-28 Perkin Elmer Corp Annular field optical imaging system
US3748015A (en) * 1971-06-21 1973-07-24 Perkin Elmer Corp Unit power imaging catoptric anastigmat
US3951546A (en) * 1974-09-26 1976-04-20 The Perkin-Elmer Corporation Three-fold mirror assembly for a scanning projection system

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5685722A (en) * 1979-10-09 1981-07-13 Perkin Elmer Corp Monoocentric optical system
JPS5890610A (ja) * 1981-11-24 1983-05-30 Matsushita Electric Ind Co Ltd カタデイオプトリツク光学系
JPS6232450B2 (ja) * 1981-11-24 1987-07-15 Matsushita Electric Ind Co Ltd
JPS58219517A (ja) * 1982-06-01 1983-12-21 エスヴィージー・リトグラフィー・システムズ・インコーポレイテッド 狭角オフアクシス光学装置
JPS6147916A (ja) * 1984-08-14 1986-03-08 Canon Inc 反射光学系
JPH08139012A (ja) * 1995-04-05 1996-05-31 Canon Inc 回路の製造方法及び露光装置
JP2008286888A (ja) * 2007-05-15 2008-11-27 Canon Inc 露光装置
JP2020052342A (ja) * 2018-09-28 2020-04-02 キヤノン株式会社 光学機器

Also Published As

Publication number Publication date
IT1101789B (it) 1985-10-07
CA1103498A (en) 1981-06-23
FR2380563B1 (ja) 1984-01-20
GB1605160A (en) 1982-08-11
DE2801882C2 (ja) 1988-02-04
GB1605161A (en) 1982-08-11
DE2801882A1 (de) 1978-08-17
CH625055A5 (en) 1981-08-31
FR2380563A1 (fr) 1978-09-08
JPH0130125B2 (ja) 1989-06-16
IT7848011A0 (it) 1978-02-10

Similar Documents

Publication Publication Date Title
GB2000604B (en) Optical systems
JPS5451575A (en) Optical detector
GB2009384A (en) Light refelctor
JPS5427484A (en) Optical pyrometer
GB2004113B (en) Ring laser gyroscope
JPS5477849A (en) C type retaining ring
IL53779A (en) Ring laser gyroscope
JPS5492282A (en) Optical system
GB2007386B (en) Optical alignment systems
JPS5417019A (en) Optical system
DE2861495D1 (en) Retaining ring
GB2006955B (en) Optical smoce detector
GB2006461B (en) Optical system
JPS53100230A (en) Ring zone fielddoffview optical system
GB2005044B (en) Optical systems
JPS5399985A (en) Optical system apparatus
GB2013330B (en) Optical detector
JPS5429769A (en) Antileak ring
JPS5482500A (en) Special fiber
JPS53121596A (en) Ring laser gyroscope
GB2008355B (en) Optical focousing system
JPS5393024A (en) Optical system
JPS53144697A (en) Ring laser gyroscope
GB2002534B (en) Lens system
JPS5485721A (en) Lens system