IT1142313B - Composizione fotoreticolabile utile in particolare come adesivo sensibile a pressione nastro adesivo che ne fa impiego e relativo procedimento di produzione - Google Patents

Composizione fotoreticolabile utile in particolare come adesivo sensibile a pressione nastro adesivo che ne fa impiego e relativo procedimento di produzione

Info

Publication number
IT1142313B
IT1142313B IT47795/81A IT4779581A IT1142313B IT 1142313 B IT1142313 B IT 1142313B IT 47795/81 A IT47795/81 A IT 47795/81A IT 4779581 A IT4779581 A IT 4779581A IT 1142313 B IT1142313 B IT 1142313B
Authority
IT
Italy
Prior art keywords
production process
pressure sensitive
composition useful
sensitive adhesive
adhesive tape
Prior art date
Application number
IT47795/81A
Other languages
English (en)
Italian (it)
Other versions
IT8147795A0 (it
Inventor
George F Vesley
Original Assignee
Minnesota Mining & Mfg
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Minnesota Mining & Mfg filed Critical Minnesota Mining & Mfg
Publication of IT8147795A0 publication Critical patent/IT8147795A0/it
Application granted granted Critical
Publication of IT1142313B publication Critical patent/IT1142313B/it

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/029Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
    • G03F7/0295Photolytic halogen compounds
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00Processes of polymerisation
    • C08F2/46Polymerisation initiated by wave energy or particle radiation
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00Processes of polymerisation
    • C08F2/46Polymerisation initiated by wave energy or particle radiation
    • C08F2/48Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
    • C08F2/50Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F20/00Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride, ester, amide, imide or nitrile thereof
    • C08F20/02Monocarboxylic acids having less than ten carbon atoms, Derivatives thereof
    • C08F20/10Esters
    • C08F20/12Esters of monohydric alcohols or phenols
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J133/00Adhesives based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Adhesives based on derivatives of such polymers
    • C09J133/04Homopolymers or copolymers of esters
    • C09J133/06Homopolymers or copolymers of esters of esters containing only carbon, hydrogen and oxygen, the oxygen atom being present only as part of the carboxyl radical
    • C09J133/08Homopolymers or copolymers of acrylic acid esters
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J7/00Adhesives in the form of films or foils
    • C09J7/30Adhesives in the form of films or foils characterised by the adhesive composition
    • C09J7/38Pressure-sensitive adhesives [PSA]
    • C09J7/381Pressure-sensitive adhesives [PSA] based on macromolecular compounds obtained by reactions involving only carbon-to-carbon unsaturated bonds
    • C09J7/385Acrylic polymers
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08LCOMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L2666/00Composition of polymers characterized by a further compound in the blend, being organic macromolecular compounds, natural resins, waxes or and bituminous materials, non-macromolecular organic substances, inorganic substances or characterized by their function in the composition
    • C08L2666/28Non-macromolecular organic substances
    • C08L2666/36Nitrogen-containing compounds
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J2301/00Additional features of adhesives in the form of films or foils
    • C09J2301/30Additional features of adhesives in the form of films or foils characterized by the chemical, physicochemical or physical properties of the adhesive or the carrier
    • C09J2301/302Additional features of adhesives in the form of films or foils characterized by the chemical, physicochemical or physical properties of the adhesive or the carrier the adhesive being pressure-sensitive, i.e. tacky at temperatures inferior to 30°C
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055Radiation sensitive composition or product or process of making
    • Y10S430/114Initiator containing
    • Y10S430/12Nitrogen compound containing
    • Y10S430/121Nitrogen in heterocyclic ring
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00Stock material or miscellaneous articles
    • Y10T428/26Web or sheet containing structurally defined element or component, the element or component having a specified physical dimension
    • Y10T428/263Coating layer not in excess of 5 mils thick or equivalent
    • Y10T428/264Up to 3 mils
    • Y10T428/2651 mil or less
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00Stock material or miscellaneous articles
    • Y10T428/26Web or sheet containing structurally defined element or component, the element or component having a specified physical dimension
    • Y10T428/269Web or sheet containing structurally defined element or component, the element or component having a specified physical dimension including synthetic resin or polymer layer or component
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00Stock material or miscellaneous articles
    • Y10T428/28Web or sheet containing structurally defined element or component and having an adhesive outermost layer
    • Y10T428/2809Web or sheet containing structurally defined element or component and having an adhesive outermost layer including irradiated or wave energy treated component
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00Stock material or miscellaneous articles
    • Y10T428/28Web or sheet containing structurally defined element or component and having an adhesive outermost layer
    • Y10T428/2852Adhesive compositions
    • Y10T428/2878Adhesive compositions including addition polymer from unsaturated monomer
    • Y10T428/2887Adhesive compositions including addition polymer from unsaturated monomer including nitrogen containing polymer [e.g., polyacrylonitrile, polymethacrylonitrile, etc.]
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00Stock material or miscellaneous articles
    • Y10T428/28Web or sheet containing structurally defined element or component and having an adhesive outermost layer
    • Y10T428/2852Adhesive compositions
    • Y10T428/2878Adhesive compositions including addition polymer from unsaturated monomer
    • Y10T428/2891Adhesive compositions including addition polymer from unsaturated monomer including addition polymer from alpha-beta unsaturated carboxylic acid [e.g., acrylic acid, methacrylic acid, etc.] Or derivative thereof

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Health & Medical Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Inorganic Chemistry (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Adhesives Or Adhesive Processes (AREA)
  • Adhesive Tapes (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
IT47795/81A 1980-02-14 1981-02-13 Composizione fotoreticolabile utile in particolare come adesivo sensibile a pressione nastro adesivo che ne fa impiego e relativo procedimento di produzione IT1142313B (it)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US06/121,404 US4330590A (en) 1980-02-14 1980-02-14 Photoactive mixture of acrylic monomers and chromophore-substituted halomethyl-2-triazine

Publications (2)

Publication Number Publication Date
IT8147795A0 IT8147795A0 (it) 1981-02-13
IT1142313B true IT1142313B (it) 1986-10-08

Family

ID=22396494

Family Applications (1)

Application Number Title Priority Date Filing Date
IT47795/81A IT1142313B (it) 1980-02-14 1981-02-13 Composizione fotoreticolabile utile in particolare come adesivo sensibile a pressione nastro adesivo che ne fa impiego e relativo procedimento di produzione

Country Status (11)

Country Link
US (1) US4330590A (cg-RX-API-DMAC7.html)
EP (1) EP0045802B1 (cg-RX-API-DMAC7.html)
JP (1) JPH0372664B2 (cg-RX-API-DMAC7.html)
KR (1) KR840001929B1 (cg-RX-API-DMAC7.html)
BR (1) BR8106438A (cg-RX-API-DMAC7.html)
CA (1) CA1157998A (cg-RX-API-DMAC7.html)
DE (1) DE3105343A1 (cg-RX-API-DMAC7.html)
ES (1) ES499310A0 (cg-RX-API-DMAC7.html)
IT (1) IT1142313B (cg-RX-API-DMAC7.html)
WO (1) WO1981002262A1 (cg-RX-API-DMAC7.html)
ZA (1) ZA81989B (cg-RX-API-DMAC7.html)

Families Citing this family (246)

* Cited by examiner, † Cited by third party
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US4522870A (en) * 1982-11-04 1985-06-11 Minnesota Mining And Manufacturing Company Linerless double-coated pressure-sensitive adhesive tape
USRE32249E (en) * 1982-11-04 1986-09-23 Minnesota Mining And Manufacturing Company Linerless double-coated pressure-sensitive adhesive tape
US4557960A (en) * 1983-12-07 1985-12-10 Minnesota Mining And Manufacturing Co. Pressure sensitive adhesive transfer tape containing organic filaments
US4946373A (en) * 1985-02-28 1990-08-07 Hoechst Celanese Corporation Radiation-polymerizable composition
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US5888335A (en) * 1989-10-26 1999-03-30 Minnesota Mining And Manufacturing Company Multiple releasable contact responsive fasteners
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US5024880A (en) * 1990-01-03 1991-06-18 Minnesota Mining And Manufacturing Company Cellular pressure-sensitive adhesive membrane
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CA2048232A1 (en) * 1990-09-05 1992-03-06 Jerry W. Williams Energy curable pressure-sensitive compositions
DE69208085T2 (de) * 1991-03-20 1996-11-14 Minnesota Mining & Mfg Strahlenhärtbare Vinyl/Silikon-Trennmittelüberzug
JPH06508862A (ja) * 1991-03-20 1994-10-06 ミネソタ マイニング アンド マニュファクチャリング カンパニー 放射線硬化性アクリレート/シリコーン感圧接着剤配合物
US5308887A (en) * 1991-05-23 1994-05-03 Minnesota Mining & Manufacturing Company Pressure-sensitive adhesives
US5464659A (en) * 1991-05-23 1995-11-07 Minnesota Mining And Manufacturing Company Silicone/acrylate vibration dampers
US5275856A (en) * 1991-11-12 1994-01-04 Minnesota Mining And Manufacturing Company Electrically conductive adhesive web
US5237355A (en) * 1991-11-15 1993-08-17 Minnesota Mining And Manufacturing Company Envelope for transparency having increased flexibility
US5266987A (en) * 1991-11-15 1993-11-30 Minnesota Mining And Manufacturing Company Envelope for transparencies
US5371560A (en) * 1991-11-15 1994-12-06 Minnesota Mining And Manufacturing Company Envelope for transparency
US5424122A (en) * 1991-12-09 1995-06-13 Minnesota Mining And Manufacturing Company Nonionic, Ph-neutral pressure sensitive adhesive
US5176948A (en) * 1991-12-11 1993-01-05 Minnesota Mining And Manufacturing Company Permanent marking article
DE69211360T2 (de) * 1992-02-10 1997-01-30 Minnesota Mining & Mfg Strahlungsvernetzte Elastomere
US5360270A (en) * 1992-04-28 1994-11-01 Minnesota Mining And Manufacturing Company Reusable security enclosure
US5201101A (en) * 1992-04-28 1993-04-13 Minnesota Mining And Manufacturing Company Method of attaching articles and a pair of articles fastened by the method
US5349004A (en) * 1992-09-18 1994-09-20 Minnesota Mining And Manufacturing Company Fluoroalkyl siloxane/vinyl copolymer dispersions and pressure-sensitive adhesives having improved solvent resistance prepared therefrom
GB2273101B (en) * 1992-11-10 1997-03-05 Tokyo Ohka Kogyo Co Ltd Photosensitive resin composition
US6010824A (en) * 1992-11-10 2000-01-04 Tokyo Ohka Kogyo Co., Ltd. Photosensitive resin composition containing a triazine compound and a pre-sensitized plate using the same, and photosensitive resin composition containing acridine and triazine compounds and a color filter and a pre-sensitized plate using the same
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CA2118960A1 (en) * 1993-03-16 1994-09-17 Albert I. Everaerts Pressure-sensitive adhesives having improved adhesion to acid-rain resistant automotive paints
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JP3878205B2 (ja) * 1993-11-10 2007-02-07 スリーエム カンパニー 感圧接着剤
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US5654387A (en) * 1993-11-10 1997-08-05 Minnesota Mining And Manufacturing Company Pressure sensitive adhesives
US5683798A (en) * 1993-11-10 1997-11-04 Minnesota Mining And Manufacturing Company Tackified pressure sensitive adhesives
US5616670A (en) * 1993-11-10 1997-04-01 Minnesota Mining And Manufacturing Company Pressure sensitive adhesives with good oily surface adhesion
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US5695837A (en) * 1995-04-20 1997-12-09 Minnesota Mining And Manufacturing Company Tackified acrylic adhesives
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KR840001929B1 (ko) 1984-10-25
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EP0045802A1 (en) 1982-02-17
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DE3105343A1 (de) 1981-12-10
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