IT1086231B - Disposizione e fotometro per la misurazione e la regolazione dell spessore di strati sottili di materiale attivi otticamente - Google Patents

Disposizione e fotometro per la misurazione e la regolazione dell spessore di strati sottili di materiale attivi otticamente

Info

Publication number
IT1086231B
IT1086231B IT24553/77A IT2455377A IT1086231B IT 1086231 B IT1086231 B IT 1086231B IT 24553/77 A IT24553/77 A IT 24553/77A IT 2455377 A IT2455377 A IT 2455377A IT 1086231 B IT1086231 B IT 1086231B
Authority
IT
Italy
Prior art keywords
photometer
provision
adjustment
measurement
thickness
Prior art date
Application number
IT24553/77A
Other languages
English (en)
Italian (it)
Original Assignee
Leybold Heraeus Gmbh & Co Kg
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Leybold Heraeus Gmbh & Co Kg filed Critical Leybold Heraeus Gmbh & Co Kg
Application granted granted Critical
Publication of IT1086231B publication Critical patent/IT1086231B/it

Links

Classifications

    • GPHYSICS
    • G01MEASURING; TESTING
    • G01BMEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00Measuring arrangements characterised by the use of optical techniques
    • G01B11/02Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness
    • G01B11/06Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material
    • G01B11/0616Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating
    • G01B11/0683Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating measurement during deposition or removal of the layer
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/54Controlling or regulating the coating process
    • C23C14/542Controlling the film thickness or evaporation rate
    • C23C14/545Controlling the film thickness or evaporation rate using measurement on deposited material
    • C23C14/547Controlling the film thickness or evaporation rate using measurement on deposited material using optical methods
    • GPHYSICS
    • G05CONTROLLING; REGULATING
    • G05DSYSTEMS FOR CONTROLLING OR REGULATING NON-ELECTRIC VARIABLES
    • G05D5/00Control of dimensions of material
    • G05D5/02Control of dimensions of material of thickness, e.g. of rolled material
    • G05D5/03Control of dimensions of material of thickness, e.g. of rolled material characterised by the use of electric means

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Automation & Control Theory (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Investigating Or Analysing Materials By Optical Means (AREA)
IT24553/77A 1976-06-21 1977-06-09 Disposizione e fotometro per la misurazione e la regolazione dell spessore di strati sottili di materiale attivi otticamente IT1086231B (it)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE2627753A DE2627753C2 (de) 1976-06-21 1976-06-21 Anordnung zur Dickenmessung und -steuerung optisch wirksamer Dünnschichten

Publications (1)

Publication Number Publication Date
IT1086231B true IT1086231B (it) 1985-05-28

Family

ID=5981051

Family Applications (1)

Application Number Title Priority Date Filing Date
IT24553/77A IT1086231B (it) 1976-06-21 1977-06-09 Disposizione e fotometro per la misurazione e la regolazione dell spessore di strati sottili di materiale attivi otticamente

Country Status (16)

Country Link
US (1) US4207835A (US08063081-20111122-C00044.png)
JP (1) JPS5322456A (US08063081-20111122-C00044.png)
AT (1) AT366505B (US08063081-20111122-C00044.png)
AU (1) AU520695B2 (US08063081-20111122-C00044.png)
BE (1) BE855932A (US08063081-20111122-C00044.png)
CA (1) CA1082486A (US08063081-20111122-C00044.png)
CH (1) CH616502A5 (US08063081-20111122-C00044.png)
DE (1) DE2627753C2 (US08063081-20111122-C00044.png)
ES (2) ES459933A1 (US08063081-20111122-C00044.png)
FR (1) FR2356191A1 (US08063081-20111122-C00044.png)
GB (2) GB1567555A (US08063081-20111122-C00044.png)
IT (1) IT1086231B (US08063081-20111122-C00044.png)
NL (1) NL186235C (US08063081-20111122-C00044.png)
SE (2) SE433003B (US08063081-20111122-C00044.png)
SU (1) SU845804A3 (US08063081-20111122-C00044.png)
ZA (1) ZA773609B (US08063081-20111122-C00044.png)

Families Citing this family (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS52102783A (en) * 1976-02-25 1977-08-29 Kanagawa Prefecture Method of measuring maximum diameter of bruise in brinell hardness test
FI69370C (fi) * 1981-08-18 1986-01-10 Topwave Instr Oy Foerfarande foer maetning av egenskaperna hos ett plastskikt med hjaelp av infraroed straolning
DE3135443A1 (de) * 1981-09-08 1983-03-24 Leybold-Heraeus GmbH, 5000 Köln Verfahren und fotometrische anordnung zur dickenmessung und -steuerung optisch wirksamer schichten
DE3234534C2 (de) * 1982-09-17 1986-09-11 Kievskoe naučno-proizvodstvennoe obiedinenie "Analitpribor", Kiev Anordnung zum Aufstäuben von optischen Filmschichten
DE3220282C3 (de) * 1982-05-28 1995-05-18 Roland Man Druckmasch Vorrichtung zum betrieblichen Erfassen eines Maßes für die Feuchtmittelmenge auf der rotierenden Druckplatte in Offset-Druckmaschinen
FR2531775A1 (fr) * 1982-08-12 1984-02-17 Cit Alcatel Dispositif de mesure de l'epaisseur d'une couche deposee sur un substrat transparent
US4676883A (en) * 1986-03-03 1987-06-30 Sierracin Corporation Optical disk transmission monitor for deposited films
EP0290657A1 (de) * 1987-05-15 1988-11-17 KSB Aktiengesellschaft Verfahren und Vorrichtung zur Messung der optischen Eigenschaften von dünnen Schichten
US4669418A (en) * 1986-05-19 1987-06-02 Gte Laboratories Incorporated Optical coating apparatus
DE3623106C1 (en) * 1986-07-09 1987-12-10 Hewlett Packard Gmbh Optoelectronic measuring device having a light (optical) chopper
DE3803840A1 (de) * 1988-02-09 1989-08-17 Leybold Ag Fotometer
DE4123589C2 (de) * 1991-07-17 2001-03-29 Leybold Ag Vorrichtung zum Messen der Lichtstrahlung eines Plasmas
US5504695A (en) * 1992-11-17 1996-04-02 Nissan Motor Co., Ltd. Apparatus for measuring paint film thickness based on dynamic levelling property of wet paint film surface
DE4314251C2 (de) * 1993-04-30 2002-02-21 Unaxis Deutschland Holding Verfahren und Vorrichtung zum Aufdampfen absorbierender dünner Schichten auf ein Substrat
DE102005008889B4 (de) * 2005-02-26 2016-07-07 Leybold Optics Gmbh Optisches Monitoringsystem für Beschichtungsprozesse
US8958156B1 (en) 2007-05-30 2015-02-17 Semrock, Inc. Interference filter for non-zero angle of incidence spectroscopy
DE102018205236A1 (de) * 2018-04-06 2019-10-10 Bhs-Sonthofen Gmbh Vorrichtung und Verfahren zur Messung einer Filterkuchendicke

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE1079920B (de) * 1952-04-25 1960-04-14 Technicolor Corp Verfahren und Vorrichtung zum Aufdampfen von mehrschichtigen dichromatischen Interferenzueberzuegen im Vakuum
DE1797108U (de) 1959-07-17 1959-10-01 Schubert & Salzer Maschinen Speisevorrichtung fuer karden schlagmaschinen u. dgl.
DE1276976B (de) * 1962-01-29 1968-09-05 Lab Pristroje Narodni Podnik Verfahren und Vorrichtung zur optischen Schichtdickenmessung duenner Schichten waehrend ihrer Herstellung durch Aufdampfen im Vakuum
DE1548262B2 (de) * 1966-10-13 1970-05-06 Leybold-Heraeus GmbH & Co KG, 5OOO Köln-Bayenthal Optisches Gerät zur Messung von Schichtdicken in Vakuumaufdampfprozessen
US3491240A (en) * 1967-03-29 1970-01-20 Itek Corp Noncontacting surface sensor
US3526460A (en) * 1967-06-27 1970-09-01 Webb James E Optical characteristics measuring apparatus
FR1539538A (fr) * 1967-10-05 1968-09-13 Leybold Hochvakuum Anlagen Gmb Instrument optique de mesure de l'épaisseur de couches déposées par métallisationsous vide
US3654109A (en) * 1968-04-25 1972-04-04 Ibm Apparatus and method for measuring rate in flow processes
US3737237A (en) * 1971-11-18 1973-06-05 Nasa Monitoring deposition of films
DE2220231A1 (de) * 1972-04-25 1973-11-08 Serv Anstalt Photometer zur digitalen anzeige der lichtabsorption einer messprobe in einer kuevette
US3869211A (en) * 1972-06-29 1975-03-04 Canon Kk Instrument for measuring thickness of thin film
US3892490A (en) * 1974-03-06 1975-07-01 Minolta Camera Kk Monitoring system for coating a substrate
US4024291A (en) * 1975-06-17 1977-05-17 Leybold-Heraeus Gmbh & Co. Kg Control of vapor deposition

Also Published As

Publication number Publication date
GB1567556A (en) 1980-05-14
SE8204900L (sv) 1982-08-27
ATA434977A (de) 1981-08-15
SE7707141L (sv) 1977-12-22
AU2625977A (en) 1979-01-04
AU520695B2 (en) 1982-02-25
ZA773609B (en) 1978-06-28
NL186235C (nl) 1990-10-16
GB1567555A (en) 1980-05-14
ES459933A1 (es) 1978-04-16
CH616502A5 (US08063081-20111122-C00044.png) 1980-03-31
BE855932A (fr) 1977-10-17
AT366505B (de) 1982-04-26
SU845804A3 (ru) 1981-07-07
FR2356191B1 (US08063081-20111122-C00044.png) 1984-06-22
SE8204900D0 (sv) 1982-08-27
DE2627753C2 (de) 1983-09-01
ES462916A1 (es) 1978-06-16
SE456775B (sv) 1988-10-31
CA1082486A (en) 1980-07-29
NL7706712A (nl) 1977-12-23
JPS5322456A (en) 1978-03-01
DE2627753A1 (de) 1977-12-29
US4207835A (en) 1980-06-17
NL186235B (nl) 1990-05-16
FR2356191A1 (fr) 1978-01-20
SE433003B (sv) 1984-04-30

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