IT1081184B - Dispositivo per aggiustare un substrato a disco rispetto ad una fotomaschera in un apparecchio di esposizione a raggirontgen - Google Patents

Dispositivo per aggiustare un substrato a disco rispetto ad una fotomaschera in un apparecchio di esposizione a raggirontgen

Info

Publication number
IT1081184B
IT1081184B IT2616277A IT2616277A IT1081184B IT 1081184 B IT1081184 B IT 1081184B IT 2616277 A IT2616277 A IT 2616277A IT 2616277 A IT2616277 A IT 2616277A IT 1081184 B IT1081184 B IT 1081184B
Authority
IT
Italy
Prior art keywords
photomasker
ray
adjusting
disc substrate
substrate compared
Prior art date
Application number
IT2616277A
Other languages
English (en)
Italian (it)
Original Assignee
Siemens Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Siemens Ag filed Critical Siemens Ag
Application granted granted Critical
Publication of IT1081184B publication Critical patent/IT1081184B/it

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
IT2616277A 1976-08-05 1977-07-27 Dispositivo per aggiustare un substrato a disco rispetto ad una fotomaschera in un apparecchio di esposizione a raggirontgen IT1081184B (it)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE19762635275 DE2635275C2 (de) 1976-08-05 1976-08-05 Verfahren zur Justierung eines scheibenförmigen Substrates relativ zu einer Fotomaske in einem Röntgenstrahlbelichtungsgerät

Publications (1)

Publication Number Publication Date
IT1081184B true IT1081184B (it) 1985-05-16

Family

ID=5984815

Family Applications (1)

Application Number Title Priority Date Filing Date
IT2616277A IT1081184B (it) 1976-08-05 1977-07-27 Dispositivo per aggiustare un substrato a disco rispetto ad una fotomaschera in un apparecchio di esposizione a raggirontgen

Country Status (7)

Country Link
JP (1) JPS5318970A (de)
BE (1) BE857539A (de)
DE (1) DE2635275C2 (de)
FR (1) FR2360916A1 (de)
GB (1) GB1589286A (de)
IT (1) IT1081184B (de)
NL (1) NL7708652A (de)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5655041A (en) * 1979-10-11 1981-05-15 Nippon Telegr & Teleph Corp <Ntt> Positioning exposure

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3657545A (en) * 1967-10-27 1972-04-18 Rank Organisation Ltd Method and apparatus for reproducing a pattern from one planar element upon another planar element
US3745358A (en) * 1971-05-10 1973-07-10 Radiant Energy Systems Alignment method and apparatus for electron projection systems
US3743842A (en) * 1972-01-14 1973-07-03 Massachusetts Inst Technology Soft x-ray lithographic apparatus and process
US3742229A (en) * 1972-06-29 1973-06-26 Massachusetts Inst Technology Soft x-ray mask alignment system
DE2460914C2 (de) * 1974-12-21 1983-08-18 Ibm Deutschland Gmbh, 7000 Stuttgart Photolithographische Projektionsvorrichtung
US4085329A (en) * 1976-05-03 1978-04-18 Hughes Aircraft Company Hard X-ray and fluorescent X-ray detection of alignment marks for precision mask alignment

Also Published As

Publication number Publication date
BE857539A (fr) 1977-12-01
FR2360916A1 (fr) 1978-03-03
GB1589286A (en) 1981-05-07
NL7708652A (nl) 1978-02-07
DE2635275A1 (de) 1978-02-09
JPS5318970A (en) 1978-02-21
DE2635275C2 (de) 1984-09-06
FR2360916B1 (de) 1982-05-21

Similar Documents

Publication Publication Date Title
IT1196932B (it) Dispositivo semiconduttore a struttura planare per alte tensioni
IT1054083B (it) Dispositivo di memorizzazione a semiconduttore
IT1072851B (it) Apparecchiatura per mantenere un wafer semiconduttore in una posizione predeterminata per il taglio dei vari chip
ES505199A0 (es) Un dispositivo semiconductor perfeccionado
IT1131636B (it) Dispositivo laser a semiconduttore
IT1157397B (it) Aeromobile a forma di disco
GB1545194A (en) Semiconductor laser device
SE7701434L (sv) Halvledaranordning
IT8022509A0 (it) Metodo per saldare dispositivi semiconduttori a substrati disupporto.
SE7701316L (sv) Halvledaranordning
BR7808124A (pt) Dispositivo semicondutor
IT1083910B (it) Apparecchiatura a semiconduttori
SE7708723L (sv) Halvledaranordning
IT1140324B (it) Dispositivo a semiconduttore,in particolare transistor di potenza
BR7702480A (pt) Freio a disco
SE7709019L (sv) Halvledaranordning
BR7800627A (pt) Dispositivo semicondutor
IT1141373B (it) Dispositivo a semiconduttore
IT1086953B (it) Dispositivo di aggiustaggio di maschere di esposizione rispetto ad un disco di substrato
IT1081002B (it) Dispositivo conficcatore di cunei per martinetti tenditori
IT1096846B (it) Dispositivo per pulire lastre a forma di disco
SE7709857L (sv) Halvledardiodanordning
IT1081184B (it) Dispositivo per aggiustare un substrato a disco rispetto ad una fotomaschera in un apparecchio di esposizione a raggirontgen
IT1088746B (it) Dispositivo tiristore a semiconduttore
BR7800732A (pt) Dispositivo semi-condutor