IT1060415B - Metodo per la formazione di rivestimenti su dispositivo semiconduttori a circuito integrato - Google Patents

Metodo per la formazione di rivestimenti su dispositivo semiconduttori a circuito integrato

Info

Publication number
IT1060415B
IT1060415B IT23115/76A IT2311576A IT1060415B IT 1060415 B IT1060415 B IT 1060415B IT 23115/76 A IT23115/76 A IT 23115/76A IT 2311576 A IT2311576 A IT 2311576A IT 1060415 B IT1060415 B IT 1060415B
Authority
IT
Italy
Prior art keywords
coverings
formation
integrated circuit
semiconductor integrated
circuit devices
Prior art date
Application number
IT23115/76A
Other languages
English (en)
Italian (it)
Original Assignee
Ncr Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ncr Co filed Critical Ncr Co
Application granted granted Critical
Publication of IT1060415B publication Critical patent/IT1060415B/it

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/04Coating on selected surface areas, e.g. using masks
    • C23C16/042Coating on selected surface areas, e.g. using masks using masks
    • H10P14/6334
    • H10P14/6682
    • H10P14/69215
    • H10P95/00
    • H10W74/131
    • H10W72/0198
    • H10W72/073
    • H10W72/07336
    • H10W72/07533
    • H10W72/076
    • H10W72/5449
    • H10W72/884
    • H10W74/00
    • H10W90/736
    • H10W90/756

Landscapes

  • Chemical & Material Sciences (AREA)
  • Metallurgy (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • General Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Lead Frames For Integrated Circuits (AREA)
  • Wire Bonding (AREA)
  • Encapsulation Of And Coatings For Semiconductor Or Solid State Devices (AREA)
  • Chemical Vapour Deposition (AREA)
  • Formation Of Insulating Films (AREA)
  • Non-Metallic Protective Coatings For Printed Circuits (AREA)
  • Electrodes Of Semiconductors (AREA)
IT23115/76A 1975-05-12 1976-05-07 Metodo per la formazione di rivestimenti su dispositivo semiconduttori a circuito integrato IT1060415B (it)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US05/576,517 US4041896A (en) 1975-05-12 1975-05-12 Microelectronic circuit coating system

Publications (1)

Publication Number Publication Date
IT1060415B true IT1060415B (it) 1982-08-20

Family

ID=24304755

Family Applications (1)

Application Number Title Priority Date Filing Date
IT23115/76A IT1060415B (it) 1975-05-12 1976-05-07 Metodo per la formazione di rivestimenti su dispositivo semiconduttori a circuito integrato

Country Status (8)

Country Link
US (1) US4041896A (enExample)
JP (1) JPS51135471A (enExample)
CA (1) CA1059648A (enExample)
DE (1) DE2620707C3 (enExample)
FR (1) FR2311404A1 (enExample)
GB (1) GB1519251A (enExample)
IT (1) IT1060415B (enExample)
NL (1) NL7604980A (enExample)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4401053A (en) * 1981-07-17 1983-08-30 Riley Thomas J Coating fixture

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2704992A (en) * 1951-12-28 1955-03-29 Erie Resistor Corp Gas plating apparatus
US2879188A (en) * 1956-03-05 1959-03-24 Westinghouse Electric Corp Processes for making transistors
US3117025A (en) * 1961-08-31 1964-01-07 Space Technology Lab Inc Thin filming apparatus
BE623233A (enExample) * 1961-10-12 1900-01-01
US3207126A (en) * 1961-11-14 1965-09-21 Byron Ernest Mask changer means for vacuum deposition device
US3312572A (en) * 1963-06-07 1967-04-04 Barnes Eng Co Process of preparing thin film semiconductor thermistor bolometers and articles
US3276423A (en) * 1963-10-04 1966-10-04 David P Triller Pattern mask for use in making thin film circuitry
US3465209A (en) * 1966-07-07 1969-09-02 Rca Corp Semiconductor devices and methods of manufacture thereof
FR1518843A (fr) * 1967-02-13 1968-03-29 Radiotechnique Coprim Rtc Dispositif pour le dépôt de couches minces sur des supports semi-conducteurs
US3597834A (en) * 1968-02-14 1971-08-10 Texas Instruments Inc Method in forming electrically continuous circuit through insulating layer
US3621812A (en) * 1969-06-18 1971-11-23 Texas Instruments Inc Epitaxial deposition reactor
US3647533A (en) * 1969-08-08 1972-03-07 Us Navy Substrate bonding bumps for large scale arrays
US3785046A (en) * 1970-03-06 1974-01-15 Hull Corp Thin film coils and method and apparatus for making the same
US3678892A (en) * 1970-05-19 1972-07-25 Western Electric Co Pallet and mask for substrates

Also Published As

Publication number Publication date
FR2311404B1 (enExample) 1979-03-02
US4041896A (en) 1977-08-16
DE2620707C3 (de) 1979-05-23
DE2620707B2 (de) 1978-09-21
JPS51135471A (en) 1976-11-24
NL7604980A (nl) 1976-11-16
CA1059648A (en) 1979-07-31
DE2620707A1 (de) 1976-11-18
FR2311404A1 (fr) 1976-12-10
GB1519251A (en) 1978-07-26

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